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    Particle beam processing apparatus
    171.
    发明授权
    Particle beam processing apparatus 有权

    公开(公告)号：US06610376B1

    公开(公告)日：2003-08-26

    申请号：US09725471

    申请日：2000-11-30

    Applicant: Imtiaz Rangwalla ,  Harvey Clough ,  George Hannafin

    Inventor： Imtiaz Rangwalla ,  Harvey Clough ,  George Hannafin

    IPC: C08F252

    CPC classification number: H01J33/00 ,  B05D3/068

    Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.

    Microminiature microwave electron source
    172.
    发明申请
    Microminiature microwave electron source 有权

    公开(公告)号：US20030052612A1

    公开(公告)日：2003-03-20

    申请号：US10080658

    申请日：2002-02-25

    Inventor： Eiji Tanabe

    IPC: H01J007/46

    CPC classification number: B82Y10/00 ,  H01J7/46 ,  H01J33/00 ,  H01J35/06

    Abstract: A microminiature microwave electron source excited by a pulsed microwave power through a coaxial to emit electrons includes an electrically conductive chamber that is connected to an external conductor of the coaxial cable at an openings end thereof and has an opening anode in a bottom portion thereof, a central conductor adjacent to the electron source, the central conductor having one end thereof connected to a central conductor of the coaxial cable, a carbon nanotube cold cathode formed on the other end thereof being supported by the chamber such that the cold cathode opposes the anode, a coupling iris that airtightly and fixedly supports the central conductor at an opening end of the chamber, and a connecting device for electrically and mechanically connecting the opening end of the chamber to the central conductor of the coaxial cable so as to connect the central of the electron source to the central conductor of the coaxial cable.

    Particle beam processing apparatus and materials treatable using the apparatus
    173.
    发明申请
    Particle beam processing apparatus and materials treatable using the apparatus 审中-公开
    使用该设备可处理的粒子束处理设备和材料

    公开(公告)号：US20030001108A1

    公开(公告)日：2003-01-02

    申请号：US10153622

    申请日：2002-05-24

    Applicant: Energy Sciences, Inc.

    Inventor： Imtiaz Rangwalla ,  Harvey Clough ,  George Hannafin

    IPC: H01J033/00

    CPC classification number: B05D3/068 ,  B41M7/0045 ,  B41M7/0081 ,  G21K5/10 ,  H01J33/00 ,  H01J33/04

    Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

    Abstract translation: 本发明涉及一种尺寸较小并以更高效率操作的粒子束加工装置，并且还针对这种装置的应用来处理可处理材料的基底上的涂层，例如用于柔性包装。 处理装置包括粒子束产生组件，箔支撑组件和处理组件。 在粒子束产生组件中，产生并加速电子以通过箔支撑组件。 在柔性封装应用中，将衬底馈送到在低电压（例如110kV或更低）下工作的处理设备，并暴露于加速电子以处理衬底上的涂层。

    Vibratory table apparatus and associated equipment and methods for radiation treatment of polymeric materials
    174.
    发明授权
    Vibratory table apparatus and associated equipment and methods for radiation treatment of polymeric materials 有权
    振动台设备及相关设备及聚合材料辐射处理方法

    公开(公告)号：US06486481B1

    公开(公告)日：2002-11-26

    申请号：US09439017

    申请日：1999-11-12

    Applicant: Arturo Geraldo Tigera

    Inventor： Arturo Geraldo Tigera

    IPC: H01J3730

    CPC classification number: B29B13/08 ,  B29C35/0277 ,  B29C2035/0877 ,  B29K2027/18 ,  H01J33/00

    Abstract: Apparatus and a method for treating polymeric material, such as polytetrafluoroethylene, with radiation. The polytetrafluoroethylene is moved under an electron beam in an even and consistent depth on an adapted vibratory table. The vibratory table is sealably covered which allows a controlled environment. The polymeric material can be degraded to lower molecular weight forms or reacted with other materials.

    Abstract translation: 用辐射处理聚合材料如聚四氟乙烯的装置和方法。 聚四氟乙烯在电子束下以均匀且一致的深度在适配的振动台上移动。 振动台被密封地覆盖，这允许受控的环境。 聚合物材料可以降解成较低的分子量形式或与其他材料反应。

    Particle beam processing apparatus
    175.
    发明授权
    Particle beam processing apparatus 有权
    粒子束处理装置

    公开(公告)号：US06426507B1

    公开(公告)日：2002-07-30

    申请号：US09434380

    申请日：1999-11-05

    Applicant: Imtiaz Rangwalla ,  Harvey Clough ,  George Hannafin

    Inventor： Imtiaz Rangwalla ,  Harvey Clough ,  George Hannafin

    IPC: A61N500

    CPC classification number: H01J33/00 ,  B05D3/068

    Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.

    Abstract translation: 本发明涉及一种尺寸更小并以更高效率工作的粒子束处理装置。 处理装置包括粒子束产生组件，箔支撑组件和处理组件。 在粒子束产生组件中，通过加热至少一根钨丝来产生颗粒云，例如电子。 然后提取电子以高速行进到箔片支撑组件，箔片支撑组件设置在比颗粒束产生组件低得多的电压下。 衬底通过处理区被馈送到处理装置，并暴露于离开粒子束产生组件并进入处理区的电子。 电子穿透和固化基板，导致化学反应，如聚合，交联或灭菌。

    Selective crosslink scanning system
    177.
    发明授权
    Selective crosslink scanning system 失效
    选择性交联扫描系统

    公开(公告)号：US5521388A

    公开(公告)日：1996-05-28

    申请号：US475258

    申请日：1995-06-07

    Applicant: Marlin N. Schuetz ,  Patrick W. Wallace

    Inventor： Marlin N. Schuetz ,  Patrick W. Wallace

    IPC: G21K1/093 ,  G21K5/04 ,  H01J33/00 ,  H01J37/147 ,  H01J3/26

    CPC classification number: H01J33/00 ,  H01J37/1475 ,  H01J2237/1504

    Abstract: A scanning system (25) for controlling a scanning servo (28,30) includes a scanning signal generator (50) which generates (51) a series of square wave scan signals, a pulse signal generator which generates (52) a pattern of pulses having short durations relative to the scan signal from the first generator, the generators being synchronized, and the scan signals and pulses then being separately applied to the scanner servo (30) to control it such that the resulting scanning behavior of the servo corresponds to the scan signals modified by the pattern of pulses.

    Abstract translation: 一种用于控制扫描伺服（28,30）的扫描系统（25）包括产生（51）一系列方波扫描信号的扫描信号发生器（50），产生（52）脉冲图形的脉冲信号发生器 具有相对于来自第一发生器的扫描信号的持续时间短，发生器是同步的，然后将扫描信号和脉冲分别施加到扫描器伺服器（30）以便控制它，使得所得到的伺服的扫描行为对应于 由脉冲模式修改的扫描信号。

    Ion plasma electron gun
    180.
    发明授权
    Ion plasma electron gun 失效
    离子等离子体电子枪

    公开(公告)号：US4755722A

    公开(公告)日：1988-07-05

    申请号：US22123

    申请日：1987-03-05

    Applicant: George Wakalopulos

    Inventor： George Wakalopulos

    IPC: H01J3/02 ,  H01J33/00 ,  H01S3/038 ,  H01S3/0959 ,  H01J7/24

    CPC classification number: H01J33/00 ,  H01J3/021 ,  H01J3/025 ,  H01S3/038 ,  H01S3/0959

    Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

    Abstract translation: 一种用于产生具有均匀电子分布的大面积电子束的离子等离子体电子枪。 通过等离子体放电室中的线产生的正离子通过提取栅格被加速到包含高压冷阴极的第二室中。 这些正离子轰击阴极的表面，导致阴极发射形成电子束的二次电子。 在通过提取格栅和等离子体放电室之后，电子束通过第二格栅和支撑在第二格栅上的箔窗口从枪射出。 枪被构造成使得通过箔窗的电子束具有相当大的面积和均匀的电子分布，其基本上与入射到阴极上的离子束的离子分布相同。 所产生的电子束的控制是通过在电极和等离子体室的接地壳体之间施加控制电压来控制正离子轰击阴极的密度来实现的。

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