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    Multiple beam ellipsometer
    11.
    发明申请
    Multiple beam ellipsometer 有权

    公开(公告)号：US20060033914A1

    公开(公告)日：2006-02-16

    申请号：US11256841

    申请日：2005-10-24

    Applicant: Martin Ebert ,  Li Chen

    Inventor： Martin Ebert ,  Li Chen

    IPC: G01J4/00

    CPC classification number: G01N21/211 ,  G01J4/04

    Abstract: An ellipsometric apparatus provides two impinging focused probe beams directed to reflect off the sample along two mutually distinct and preferably substantially perpendicular directions. A rotating stage rotates sections of the wafer into the travel area defined by two linear axes of two perpendicularly oriented linear stages. As a result, an entire wafer is accessed for measurement with the linear stages having a travel range of only half the wafer diameter. The reduced linear travel results in a small travel envelope occupied by the wafer and, consequently, a small footprint of the apparatus. The use of two perpendicularly directed probe beams permits measurement of periodic structures along a preferred direction while permitting the use of a reduced motion stage.

    System for performing ellipsometry using an auxiliary pump beam to reduce effective measurement spot size
    12.
    发明授权
    System for performing ellipsometry using an auxiliary pump beam to reduce effective measurement spot size 失效
    使用辅助泵浦光束执行椭偏仪的系统，以减少有效的测量光斑尺寸

    公开(公告)号：US06952261B2

    公开(公告)日：2005-10-04

    申请号：US10403489

    申请日：2003-03-31

    Applicant: Martin Ebert

    Inventor： Martin Ebert

    IPC: G01J4/00 ,  G01N21/21 ,  G01N21/95

    CPC classification number: G01N21/211 ,  G01J4/00 ,  G01N21/9501

    Abstract: An ellipsometer includes a light source for generating a probe beam of polychromatic light for interacting with a sample. The probe beam is passed through a first polarizer that imparts a known polarization state to the probe beam. The polarized probe beam is then directed to reflect from the sample. A second illumination source is switched on and off at a predetermined frequency to create an intensity modulated pump beam (the beam may also be chopped). The pump beam is directed normally against the subject producing a small illumination spot within the area illuminated by the probe beam. The pump induces localized changes in the dielectric properties of the subject. The pump-beam induced oscillations are picked up by the portion of the probe beam that is reflected from within the illumination spot of the pump beam. By analyzing only the portion of the reflected probe beam that includes the pump beam induced oscillation, the size of the measurement spot is effectively limited to the illumination spot size of the normally directed pump beam.

    Abstract translation: 椭偏仪包括用于产生用于与样品相互作用的多色光的探测光束的光源。 探测光束通过第一偏振器，其将已知的偏振状态赋予探测光束。 然后将极化探针光束引导从样品反射。 第二照明源以预定的频率被打开和关闭以产生强度调制的泵浦光束（该光束也可以被切碎）。 泵浦光束正常地对准对象，从而在由探测光束照射的区域内产生小的照明点。 泵引起受试者的介电性质的局部变化。 泵浦光束感应振荡由从泵浦光束的照明光点内反射的探测光束的部分拾取。 通过仅分析包括泵浦光束振荡的反射的探测光束的部分，测量光斑的尺寸被有效地限制在正向定向的泵浦光束的照明光斑尺寸上。

    Multiple beam ellipsometer
    13.
    发明授权
    Multiple beam ellipsometer 有权
    多光束椭偏仪

    公开(公告)号：US06798512B2

    公开(公告)日：2004-09-28

    申请号：US10042592

    申请日：2002-01-09

    Applicant: Martin Ebert ,  Li Chen

    Inventor： Martin Ebert ,  Li Chen

    IPC: G01J400

    CPC classification number: G01N21/211 ,  G01J4/04

    Abstract: An ellipsometric apparatus provides two impinging focused probe beams directed to reflect off the sample along two mutually distinct and preferably substantially perpendicular directions. A rotating stage rotates sections of the wafer into the travel area defined by two linear axes of two perpendicularly oriented linear stages. As a result, an entire wafer is accessed for measurement with the linear stages having a travel range of only half the wafer diameter. The reduced linear travel results in a small travel envelope occupied by the wafer and consequently in a small footprint of the apparatus. The use of two perpendicularly directed probe beams permits measurement of periodic structures along a preferred direction while permitting the use of a reduced motion stage.

    Abstract translation: 椭圆仪器提供了两个撞击的聚焦探针光束，其被引导以沿两个相互不同的，优选地基本垂直的方向反射出样品。 旋转台将晶片的部分旋转到由两个垂直取向的线性级的两个线性轴限定的行进区域中。 结果，整个晶片被访问用于测量，线性级的行程范围仅为晶片直径的一半。 减小的线性行程导致由晶片占据的小行程信封，因此在该设备的小占地面积内。 使用两个垂直定向的探针光束允许沿优选方向测量周期性结构，同时允许使用减小的运动级。

    Multiple beam ellipsometer
    15.
    发明授权
    Multiple beam ellipsometer 有权
    多光束椭偏仪

    公开(公告)号：US07321427B2

    公开(公告)日：2008-01-22

    申请号：US11545434

    申请日：2006-10-10

    Applicant: Martin Ebert ,  Li Chen

    Inventor： Martin Ebert ,  Li Chen

    IPC: G01J4/00

    CPC classification number: G01N21/211 ,  G01J4/04

    Abstract: An ellipsometric apparatus provides two impinging focused probe beams directed to reflect off the sample along two mutually distinct and preferably substantially perpendicular directions. A rotating stage rotates sections of the wafer into the travel area defined by two linear axes of two perpendicularly oriented linear stages. As a result, an entire wafer is accessed for measurement with the linear stages having a travel range of only half the wafer diameter. The reduced linear travel results in a small travel envelope occupied by the wafer and, consequently, a small footprint of the apparatus. The use of two perpendicularly directed probe beams permits measurement of periodic structures along a preferred direction while permitting the use of a reduced motion stage.

    Abstract translation: 椭圆仪器提供了两个撞击的聚焦探针光束，其被引导以沿两个相互不同的，优选地基本垂直的方向反射出样品。 旋转台将晶片的部分旋转到由两个垂直取向的线性级的两个线性轴限定的行进区域中。 结果，整个晶片被访问用于测量，线性级的行程范围仅为晶片直径的一半。 减小的线性行程导致由晶片占据的小行程信封，并且因此导致该装置的小占地面积。 使用两个垂直定向的探针光束允许沿优选方向测量周期性结构，同时允许使用减小的运动级。

    Method for noise improvement in ellipsometers
    16.
    发明申请
    Method for noise improvement in ellipsometers 失效
    椭偏仪噪声改善方法

    公开(公告)号：US20060132773A1

    公开(公告)日：2006-06-22

    申请号：US11287701

    申请日：2005-11-28

    Applicant: Martin Ebert ,  Lanhua Wei

    Inventor： Martin Ebert ,  Lanhua Wei

    IPC: G01J4/00

    CPC classification number: G01J4/00 ,  G01N21/211 ,  G01N2021/213

    Abstract: A normalization procedure for an ellipsometric system having a rotating optical element such as a polarizer or compensator is disclosed. In operation, a first DC component is extracted from the measured output signals obtained during the first 180 degrees of rotation of the optical element and a second DC component is extracted from the output signals obtained during the second 180 degrees of rotation of the optical element. The first DC component is used to normalize the output signals obtained during the first 180 degrees of rotation of the optical element and the second DC component is used to normalize the output signals obtained during the second 180 degrees of rotation of the optical element.

    Abstract translation: 公开了具有诸如偏振器或补偿器之类的旋转光学元件的椭偏系统的归一化程序。 在操作中，从在光学元件的第一180度旋转期间获得的测量输出信号中提取第一DC分量，并且从在光学元件的第二180度旋转期间获得的输出信号中提取第二DC分量。 第一直流分量被用于归一化在光学元件的第一180度旋转期间获得的输出信号，并且第二直流分量用于对在光学元件的第二180度旋转期间获得的输出信号进行归一化。

    System and method for finding the center of rotation of an R-theta stage
    17.
    发明授权
    System and method for finding the center of rotation of an R-theta stage 有权
    用于找出R-θ级旋转中心的系统和方法

    公开(公告)号：US06747746B2

    公开(公告)日：2004-06-08

    申请号：US10044208

    申请日：2002-01-11

    Applicant: Ilya Chizhov ,  Martin Ebert

    Inventor： Ilya Chizhov ,  Martin Ebert

    IPC: G01B1114

    CPC classification number: G01B11/27

    Abstract: An optical inspection system and method which uses a procedure for determining an offset between a field of view and a center or rotation of an R-theta stage, or polar coordinate stage. Determining this offset allows the precise location of a site being inspected on a wafer to be determined. The system and method take advantage of the fact that in a R-theta system there can be only two positions for the R-theta stage that will position a particular site under the lens of the imaging system of the optical inspection system. By moving the stage from a first position where a particular site is positioned in the field of view, to the second position where the particular site is positioned in the field of view, the offset can be determined.

    Abstract translation: 光学检查系统和方法，其使用用于确定视场与R-θ级或极坐标级的中心或旋转之间的偏移的过程。 确定该偏移允许确定在晶片上检查的位置的精确位置。 该系统和方法利用了以下事实：在R-theta系统中，对于R-θ级只能有两个位置来定位光学检查系统的成像系统的镜头下的特定位置。 通过将舞台从特定场所位于视野中的第一位置移动到特定场所位于视野中的第二位置，可以确定偏移。

    BUSINESS COCKPITS BASED ON IN-MEMORY DATABASE
    18.
    发明申请
    BUSINESS COCKPITS BASED ON IN-MEMORY DATABASE 审中-公开
    基于内存数据库的业务组合

    公开(公告)号：US20140344024A1

    公开(公告)日：2014-11-20

    申请号：US13955882

    申请日：2013-07-31

    Applicant: Dirk Kempf ,  Daniel Huber ,  Martin Ebert ,  Marcus Behrens ,  Christoph Boehm ,  Marcel Waechter ,  Holger Bohle ,  Harish Rama Rao ,  Anirban Kundu ,  Thomas Fleckenstein

    Inventor： Dirk Kempf ,  Daniel Huber ,  Martin Ebert ,  Marcus Behrens ,  Christoph Boehm ,  Marcel Waechter ,  Holger Bohle ,  Harish Rama Rao ,  Anirban Kundu ,  Thomas Fleckenstein

    IPC: G06Q10/06 ,  G06F17/22 ,  G06F3/0482

    CPC classification number: G06Q10/06393 ,  G06F3/0483

    Abstract: Embodiments of the present disclosure provide systems and methods for a lightweight monitoring application with key performance indicators (KPI) reporting and management. The method may include displaying a page with a plurality of tiles on a user device. The tiles displayed on the page may include a plurality of key performance indicator (KPI) tiles and at least one of a report tile, a news tile and a collaboration tile. The method may retrieve metadata from an in-memory database, the metadata from the in-memory database may correspond to content displayed in at least one of the KPI tiles on the page. In response to an input from a user input apparatus selecting one of the tiles displayed on the page, the method may display additional details or controls for the selected tile.

    Abstract translation: 本公开的实施例提供了具有关键性能指标（KPI）报告和管理的轻量级监控应用的系统和方法。 该方法可以包括在用户设备上显示具有多个瓦片的页面。 显示在页面上的瓦片可以包括多个关键性能指标（KPI）瓦片和报告瓦片，新闻瓦片和协作瓦片中的至少一个。 该方法可以从内存数据库检索元数据，来自内存数据库的元数据可以对应于在页面上的至少一个KPI瓦片中显示的内容。 响应于来自用户输入装置的输入选择页面上显示的瓦片之一，该方法可以显示所选择的瓦片的附加细节或控制。

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