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    Fast wafer positioning method for optical metrology
    1.
    发明授权
    Fast wafer positioning method for optical metrology 有权
    光学测量用快速晶圆定位方法

    公开(公告)号：US07030984B2

    公开(公告)日：2006-04-18

    申请号：US10424263

    申请日：2003-04-28

    Applicant: Martin Ebert ,  Ilya Chizhov

    Inventor： Martin Ebert ,  Ilya Chizhov

    IPC: G01B11/00

    CPC classification number: G03F7/70533 ,  G03F7/70616

    Abstract: A fast wafer positioning method for optical metrology includes three main steps. In the first step, an initial measurement recipe is constructed for the host system and target wafer. In the next step, the host system performs a test run using the initial measurement and the target wafer. In this step, the initial measurement recipe is refined to eliminate positioning errors produced by the host system. In the final step, the refined measurement recipe is used by the host system to process production wafers (e.g., as part of a production environment). This is performed using the information included in the refined measurement recipe without reference to optical images of the wafers being processed.

    Abstract translation: 用于光学测量的快速晶片定位方法包括三个主要步骤。 在第一步中，为主机系统和目标晶圆构建初始测量配方。 在下一步中，主机系统使用初始测量和目标晶圆进行测试运行。 在此步骤中，初始测量配方被细化以消除由主机系统产生的定位误差。 在最后一步中，主机系统使用精细测量配方来处理生产晶片（例如，作为生产环境的一部分）。 这是使用包括在精细测量配方中的信息而不参考正在处理的晶片的光学图像来执行的。

    BUSINESS COCKPITS BASED ON IN-MEMORY DATABASE
    2.
    发明申请
    BUSINESS COCKPITS BASED ON IN-MEMORY DATABASE 审中-公开
    基于内存数据库的业务组合

    公开(公告)号：US20140344024A1

    公开(公告)日：2014-11-20

    申请号：US13955882

    申请日：2013-07-31

    Applicant: Dirk Kempf ,  Daniel Huber ,  Martin Ebert ,  Marcus Behrens ,  Christoph Boehm ,  Marcel Waechter ,  Holger Bohle ,  Harish Rama Rao ,  Anirban Kundu ,  Thomas Fleckenstein

    Inventor： Dirk Kempf ,  Daniel Huber ,  Martin Ebert ,  Marcus Behrens ,  Christoph Boehm ,  Marcel Waechter ,  Holger Bohle ,  Harish Rama Rao ,  Anirban Kundu ,  Thomas Fleckenstein

    IPC: G06Q10/06 ,  G06F17/22 ,  G06F3/0482

    CPC classification number: G06Q10/06393 ,  G06F3/0483

    Abstract: Embodiments of the present disclosure provide systems and methods for a lightweight monitoring application with key performance indicators (KPI) reporting and management. The method may include displaying a page with a plurality of tiles on a user device. The tiles displayed on the page may include a plurality of key performance indicator (KPI) tiles and at least one of a report tile, a news tile and a collaboration tile. The method may retrieve metadata from an in-memory database, the metadata from the in-memory database may correspond to content displayed in at least one of the KPI tiles on the page. In response to an input from a user input apparatus selecting one of the tiles displayed on the page, the method may display additional details or controls for the selected tile.

    Abstract translation: 本公开的实施例提供了具有关键性能指标（KPI）报告和管理的轻量级监控应用的系统和方法。 该方法可以包括在用户设备上显示具有多个瓦片的页面。 显示在页面上的瓦片可以包括多个关键性能指标（KPI）瓦片和报告瓦片，新闻瓦片和协作瓦片中的至少一个。 该方法可以从内存数据库检索元数据，来自内存数据库的元数据可以对应于在页面上的至少一个KPI瓦片中显示的内容。 响应于来自用户输入装置的输入选择页面上显示的瓦片之一，该方法可以显示所选择的瓦片的附加细节或控制。

    Autofocus system
    5.
    发明授权
    Autofocus system 失效

    公开(公告)号：US06624403B2

    公开(公告)日：2003-09-23

    申请号：US09975515

    申请日：2001-10-11

    Applicant: Li Chen ,  Martin Ebert ,  Dale Linseth

    Inventor： Li Chen ,  Martin Ebert ,  Dale Linseth

    IPC: G02B2740

    CPC classification number: G02B7/32

    Abstract: An autofocus system for maintaining a sample in the focal plane of a primary lens is disclosed. A light source generates a monitor beam which is focused onto the sample through the primary lens. The reflected beam passes back through the primary lens and is directed to a secondary lens. The beam is then split by a reflective wedge into two portions with different path lengths such that the beam waists of the two portions are spatially separated. An aperture is located between the two beam waists. A bi-cell photodetector measures the intensity of the two beam portions transmitted by the aperture. The measured intensity levels vary with respect to the position of the sample. By comparing the measured intensity levels, an indication of the position of the sample can be obtained.

    Method of reducing noise generated by arc lamps in optical systems employing slits
    6.
    发明授权
    Method of reducing noise generated by arc lamps in optical systems employing slits 失效
    降低采用狭缝的光学系统中的电弧灯产生的噪音的方法

    公开(公告)号：US06411381B1

    公开(公告)日：2002-06-25

    申请号：US09562256

    申请日：2000-05-02

    Applicant: David E. Aspnes ,  Martin Ebert

    Inventor： David E. Aspnes ,  Martin Ebert

    IPC: G01J304

    CPC classification number: G01J3/10 ,  G01J3/024 ,  G01J3/04

    Abstract: A spectroscopy system having enhanced noise reduction that comprises (i) an arc lamp light source of emitted light, which emitted light is projected as an image of the light source; (ii) a slit aperture through which the emitted light is projected; and (iii) a detector operably associated with the slit aperture for detecting the emitted light. The slit aperture, the arc lamp, and the image of the arc lamp each have a major axis. The major axis of the slit aperture is oriented essentially orthogonally to the major axis of the image of the arc lamp, so that the signal-to-noise ratio of the spectroscopy system is improved as compared to the signal-to-noise ratio of the spectroscopy system when the major axis of the slit aperture is oriented essentially parallel to the major axis of the image of the arc lamp.

    Abstract translation: 一种具有增强的噪声降低的光谱系统，其包括（i）发射的光的弧光灯光源，其被发射为光源的图像; （ii）狭缝孔，所述发射的光被投射通过所述狭缝孔; 和（iii）与狭缝孔可操作地相关联的检测发射光的检测器。 狭缝孔径，弧光灯和弧光灯的图像各自具有长轴。 狭缝孔的长轴基本上与弧光灯的图像的主轴正交地定向，使得与信号噪声比的信噪比相比，光谱系统的信噪比得到改善 当狭缝孔的长轴基本上平行于电弧灯的图像的长轴取向时，光谱系统。

    Multiple beam ellipsometer
    8.
    发明授权
    Multiple beam ellipsometer 有权
    多光束椭偏仪

    公开(公告)号：US07321427B2

    公开(公告)日：2008-01-22

    申请号：US11545434

    申请日：2006-10-10

    Applicant: Martin Ebert ,  Li Chen

    Inventor： Martin Ebert ,  Li Chen

    IPC: G01J4/00

    CPC classification number: G01N21/211 ,  G01J4/04

    Abstract: An ellipsometric apparatus provides two impinging focused probe beams directed to reflect off the sample along two mutually distinct and preferably substantially perpendicular directions. A rotating stage rotates sections of the wafer into the travel area defined by two linear axes of two perpendicularly oriented linear stages. As a result, an entire wafer is accessed for measurement with the linear stages having a travel range of only half the wafer diameter. The reduced linear travel results in a small travel envelope occupied by the wafer and, consequently, a small footprint of the apparatus. The use of two perpendicularly directed probe beams permits measurement of periodic structures along a preferred direction while permitting the use of a reduced motion stage.

    Abstract translation: 椭圆仪器提供了两个撞击的聚焦探针光束，其被引导以沿两个相互不同的，优选地基本垂直的方向反射出样品。 旋转台将晶片的部分旋转到由两个垂直取向的线性级的两个线性轴限定的行进区域中。 结果，整个晶片被访问用于测量，线性级的行程范围仅为晶片直径的一半。 减小的线性行程导致由晶片占据的小行程信封，并且因此导致该装置的小占地面积。 使用两个垂直定向的探针光束允许沿优选方向测量周期性结构，同时允许使用减小的运动级。

    Method for noise improvement in ellipsometers
    9.
    发明申请
    Method for noise improvement in ellipsometers 失效
    椭偏仪噪声改善方法

    公开(公告)号：US20060132773A1

    公开(公告)日：2006-06-22

    申请号：US11287701

    申请日：2005-11-28

    Applicant: Martin Ebert ,  Lanhua Wei

    Inventor： Martin Ebert ,  Lanhua Wei

    IPC: G01J4/00

    CPC classification number: G01J4/00 ,  G01N21/211 ,  G01N2021/213

    Abstract: A normalization procedure for an ellipsometric system having a rotating optical element such as a polarizer or compensator is disclosed. In operation, a first DC component is extracted from the measured output signals obtained during the first 180 degrees of rotation of the optical element and a second DC component is extracted from the output signals obtained during the second 180 degrees of rotation of the optical element. The first DC component is used to normalize the output signals obtained during the first 180 degrees of rotation of the optical element and the second DC component is used to normalize the output signals obtained during the second 180 degrees of rotation of the optical element.

    Abstract translation: 公开了具有诸如偏振器或补偿器之类的旋转光学元件的椭偏系统的归一化程序。 在操作中，从在光学元件的第一180度旋转期间获得的测量输出信号中提取第一DC分量，并且从在光学元件的第二180度旋转期间获得的输出信号中提取第二DC分量。 第一直流分量被用于归一化在光学元件的第一180度旋转期间获得的输出信号，并且第二直流分量用于对在光学元件的第二180度旋转期间获得的输出信号进行归一化。

    System and method for finding the center of rotation of an R-theta stage
    10.
    发明授权
    System and method for finding the center of rotation of an R-theta stage 有权
    用于找出R-θ级旋转中心的系统和方法

    公开(公告)号：US06747746B2

    公开(公告)日：2004-06-08

    申请号：US10044208

    申请日：2002-01-11

    Applicant: Ilya Chizhov ,  Martin Ebert

    Inventor： Ilya Chizhov ,  Martin Ebert

    IPC: G01B1114

    CPC classification number: G01B11/27

    Abstract: An optical inspection system and method which uses a procedure for determining an offset between a field of view and a center or rotation of an R-theta stage, or polar coordinate stage. Determining this offset allows the precise location of a site being inspected on a wafer to be determined. The system and method take advantage of the fact that in a R-theta system there can be only two positions for the R-theta stage that will position a particular site under the lens of the imaging system of the optical inspection system. By moving the stage from a first position where a particular site is positioned in the field of view, to the second position where the particular site is positioned in the field of view, the offset can be determined.

    Abstract translation: 光学检查系统和方法，其使用用于确定视场与R-θ级或极坐标级的中心或旋转之间的偏移的过程。 确定该偏移允许确定在晶片上检查的位置的精确位置。 该系统和方法利用了以下事实：在R-theta系统中，对于R-θ级只能有两个位置来定位光学检查系统的成像系统的镜头下的特定位置。 通过将舞台从特定场所位于视野中的第一位置移动到特定场所位于视野中的第二位置，可以确定偏移。

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