公开(公告)号：US20230193064A1

公开(公告)日：2023-06-22

申请号：US17989961

申请日：2022-11-18

Applicant: Applied Materials, Inc.

Inventor： Yingdong LUO ,  Xiaopei DENG ,  Kang LUO ,  Rami HOURANI ,  Daihua ZHANG ,  Ludovic GODET

IPC: C09D11/38 ,  B41M5/52

CPC classification number: C09D11/38 ,  H01L51/0005 ,  B41M5/5209

Abstract: A method and apparatus for forming an optical device are described. The optical device is formed by depositing a plurality of ink drops on a surface of a substrate. The plurality of ink drops are contained within a chemical stopper, such that the chemical stopper surrounds each individual ink drop. The chemical stopper is configured to reduce reflow of the ink drops and is a fraction of the height of each of the ink drops. The ink drops are baked after being deposited within the chemical stoppers as liquid ink drops.

公开(公告)号：US20220363064A1

公开(公告)日：2022-11-17

申请号：US17647820

申请日：2022-01-12

Applicant: Applied Materials, Inc.

Inventor： Daihua ZHANG ,  Ludovic Godet ,  Michael David-Scott Kemp ,  Kang Luo ,  Kazuya Daito ,  Kenneth S. Ledford ,  Bahubali S. Upadhye ,  Hemantha Raju ,  John Rusconi ,  Elsa Massonneau ,  Mahendran Chidambaram ,  Alexey Stepanov ,  Visweswaren Sivaramakrishnan

IPC: B41J2/175

Abstract: Embodiments described herein relate to an inkjet printing platform. The inkjet printing platform is utilized for fabrication of optical films and optical device structures. The inkjet printing platform includes a transfer chamber, one or more inkjet chambers, a plurality of auxiliary modules, a substrate flipper, and load ports. The inkjet printing platform is operable to perform an inkjet printing process on a substrate to form an optical film and/or an optical device.

公开(公告)号：US20220363060A1

公开(公告)日：2022-11-17

申请号：US17647780

申请日：2022-01-12

Applicant: Applied Materials, Inc.

Inventor： Daihua ZHANG ,  Kang LUO ,  Kazuya DAITO ,  Kenneth S. LEDFORD ,  Elsa MASSONNEAU ,  Alexey STEPANOV ,  Ludovic GODET ,  Mahendran CHIDAMBARAM ,  Visweswaren SIVARAMAKRISHNAN ,  Bahubali S. UPADHYE ,  Hemantha RAJU

IPC: B41J2/165

Abstract: Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.

公开(公告)号：US20220355589A1

公开(公告)日：2022-11-10

申请号：US17647791

申请日：2022-01-12

Applicant: Applied Materials, Inc.

Inventor： Daihua ZHANG ,  Kazuya DAITO ,  Kang LUO ,  Elsa MASSONNEAU ,  Alexey STEPANOV ,  Ludovic GODET

IPC: B41J2/165

Abstract: Embodiments described herein provide for a fluid management system and a method of utilizing the fluid management system. The fluid management system includes a servicing fluid management system and an ink management system. The servicing fluid management system and the ink management system run in parallel within an inkjet chamber. The ink management system supports the flow of inkjet materials between a waste tank, one or more inkjet material supply tanks, an ink management module, and the inkjet printer. The servicing fluid management system supports the flow of servicing fluids between the waste tank, one or more servicing fluid supply tanks, a servicing fluid management module, and the inkjet printer.

公开(公告)号：US20220152724A1

公开(公告)日：2022-05-19

申请号：US17455288

申请日：2021-11-17

Applicant: Applied Materials, Inc.

Inventor： Kang LUO ,  Ludovic GODET ,  Daihua ZHANG ,  Nai-Wen PI ,  Jinrui GUO ,  Rami HOURANI

IPC: B23K10/00 ,  F21V8/00

Abstract: The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.

公开(公告)号：US20190139788A1

公开(公告)日：2019-05-09

申请号：US16171000

申请日：2018-10-25

Applicant: Applied Materials, Inc.

Inventor： Boyi FU ,  Han-Wen CHEN ,  Kyuil CHO ,  Sivapackia GANAPATHIAPPAN ,  Roman GOUK ,  Steven VERHAVERBEKE ,  Nag B. PATIBANDLA ,  Yan ZHAO ,  Hou T. NG ,  Ankit VORA ,  Daihua ZHANG

IPC: H01L21/56 ,  H01L21/67

Abstract: Aspects of the disclosure generally relate to methods of immobilizing die on a substrate. In one method one or more immobilization features are formed in a selected pattern on a substrate. A die is positioned in contact with the one or more immobilization features and the substrate. The one or more immobilization features are cured, and a mold layer is formed on top of the cured one or more immobilization features and the die so as to encapsulate the die.