公开(公告)号：US10475650B2

公开(公告)日：2019-11-12

申请号：US16055287

申请日：2018-08-06

Applicant: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION ,  GIGAPHOTON INC.

Inventor： Hiroshi Ikenoue ,  Akira Suwa ,  Osamu Wakabayashi

IPC: H01L21/228 ,  H01L21/268 ,  B23K26/00 ,  B23K26/06 ,  B23K26/067 ,  B23K26/073 ,  B23K26/08 ,  B23K26/354 ,  B23K26/0622 ,  B23K26/066 ,  B23K26/12 ,  B23K103/00 ,  B23K101/34 ,  B23K101/40 ,  B23K103/16 ,  B23K103/18

Abstract: A laser doping device includes: a solution supply system configured to supply a solution containing dopant to a doping region; a pulse laser system configured to output pulse laser light including a plurality of pulses, the pulse laser light transmitting through the solution; a first control unit configured to control a number of pulses of the pulse laser light for allowing the doping region to be irradiated, and to control a fluence of the pulse laser light in the doping region; and a second control unit configured to control a flow velocity of the solution so as to move bubbles, from the doping region, occurring in the solution every time of irradiation with the pulse.

公开(公告)号：US10306743B1

公开(公告)日：2019-05-28

申请号：US16221699

申请日：2018-12-17

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/104 ,  H01S3/23 ,  H01S3/00 ,  H01S3/09 ,  H01S3/16 ,  H01S3/11 ,  H01S3/223 ,  H01S3/102

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US10164396B2

公开(公告)日：2018-12-25

申请号：US15720122

申请日：2017-09-29

Applicant: GIGAPHOTON INC.

Inventor： Akihiko Kurosu ,  Takashi Matsunaga ,  Hiroyuki Masuda ,  Osamu Wakabayashi ,  Hiroaki Tsushima ,  Masanori Yashiro ,  Takeshi Ohta

IPC: H01S3/036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/04 ,  H01S3/03 ,  H01S3/08 ,  H01S3/134 ,  H01S3/13 ,  H01S3/225 ,  H01S3/041

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

公开(公告)号：US10074956B2

公开(公告)日：2018-09-11

申请号：US15352543

申请日：2016-11-15

Applicant: GIGAPHOTON INC.

Inventor： Tatsuya Yanagida ,  Osamu Wakabayashi

IPC: H01S3/10 ,  H05G2/00 ,  H01S3/08 ,  H01S3/23

CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

公开(公告)号：US09891012B2

公开(公告)日：2018-02-13

申请号：US14279248

申请日：2014-05-15

Applicant: GIGAPHOTON INC.

Inventor： Yasufumi Kawasuji ,  Masazumi Komori ,  Osamu Wakabayashi

IPC: G05D23/00 ,  F28F27/00 ,  G05D23/19

CPC classification number: F28F27/02 ,  F28F27/00 ,  F28F2250/08 ,  G05D23/1917 ,  G21K1/062 ,  H05G2/008

Abstract: A device for controlling the temperature of cooling water includes a three-way valve having a first inlet, a second inlet, and an outlet; a first feed pipe; a second feed pipe; and a return pipe for connecting between an outlet of the temperature-control target and an inlet of the cooling water supply unit. The device also includes a return-side bypass pipe for connecting between the return pipe and the second inlet of the three-way valve; a pump provided on the second feed pipe for circulating the cooling water between the three-way valve and the temperature-control target; and a temperature measuring unit for measuring a temperature of the cooling water flowing in the second feed pipe. In addition, the device includes a controller for controlling the three-way valve and the pump in accordance with a detection result of the temperature measuring unit.

公开(公告)号：US09825417B2

公开(公告)日：2017-11-21

申请号：US15144081

申请日：2016-05-02

Applicant: GIGAPHOTON INC.

Inventor： Akihiko Kurosu ,  Takashi Matsunaga ,  Hiroyuki Masuda ,  Osamu Wakabayashi ,  Hiroaki Tsushima ,  Masanori Yashiro ,  Takeshi Ohta

IPC: H01S3/036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/04 ,  H01S3/03 ,  H01S3/08 ,  H01S3/134 ,  H01S3/13 ,  H01S3/225 ,  H01S3/041

CPC classification number: H01S3/036 ,  H01S3/03 ,  H01S3/0404 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/1306 ,  H01S3/134 ,  H01S3/2258

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

公开(公告)号：US09812841B2

公开(公告)日：2017-11-07

申请号：US15227028

申请日：2016-08-03

Applicant: GIGAPHOTON INC.

Inventor： Takashi Onose ,  Kouji Kakizaki ,  Osamu Wakabayashi

IPC: H01S3/23 ,  H01S3/225 ,  H01S3/30 ,  H01S3/00 ,  H01S3/10 ,  H05G2/00 ,  H01S3/13

CPC classification number: H01S3/2391 ,  H01S3/0092 ,  H01S3/10015 ,  H01S3/1301 ,  H01S3/2251 ,  H01S3/30 ,  H01S3/305 ,  H05G2/00

Abstract: There is provided a laser system that may include a Raman cell, a pumping light generator, and a Raman cell laser unit. The pumping light generator may include one or more optical parametric amplifiers (OPAs), and may be configured to output first Raman-cell pumping light and second Raman-cell pumping light to the Raman cell. The Raman cell laser unit may be configured to output probing light as a target of wavelength conversion to the Raman cell.

公开(公告)号：US09601893B2

公开(公告)日：2017-03-21

申请号：US15060148

申请日：2016-03-03

Applicant: GIGAPHOTON INC.

Inventor： Kouji Kakizaki ,  Takeshi Asayama ,  Osamu Wakabayashi

IPC: H01S3/038 ,  H01S3/134 ,  H01S3/225 ,  H01S3/08

CPC classification number: H01S3/038 ,  H01S3/08009 ,  H01S3/134 ,  H01S3/225

Abstract: There may be provided a laser apparatus including: an optical resonator including an output coupler; a laser chamber containing a laser medium and disposed in an optical path inside the optical resonator; a pair of discharge electrodes disposed inside the laser chamber; an electrode gap varying section configured to vary a gap between the discharge electrodes; a laser beam measurement section disposed in an optical path of a laser beam outputted from the output coupler, the laser beam resulting from electric discharge between the discharge electrodes; and a controller configured to control the gap between the discharge electrodes through activating the electrode gap varying section, based on a beam parameter of the laser beam measured by the laser beam measurement section.

公开(公告)号：US09510434B2

公开(公告)日：2016-11-29

申请号：US14824270

申请日：2015-08-12

Applicant: GIGAPHOTON INC.

Inventor： Hakaru Mizoguchi ,  Yasufumi Kawasuji ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G21K1/06 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/067 ,  H05G2/003 ,  H05G2/005

Abstract: Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber.

Abstract translation: 提供一种极紫外光发生装置，其可以包括：容纳一种或多种气体的室; 光浓缩光学系统，其设置在从激光单元输出的脉冲激光的光路中，并且将脉冲激光聚焦成浓缩光束; 以及摄像部，其设置在所述脉冲激光的光路外的位置处，并且被配置为拾取作为所述室中的等离子体发射的图像的等离子体发射图像。 等离子体发射是通过将浓缩的束施加到腔室中的一种或多种气体而引起的。

公开(公告)号：US09429847B2

公开(公告)日：2016-08-30

申请号：US15064019

申请日：2016-03-08

Applicant: Gigaphoton Inc.

Inventor： Toshihiro Nishisaka ,  Yukio Watanabe ,  Osamu Wakabayashi ,  Kouji Kakizaki ,  Michio Shinozaki

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.