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公开(公告)号：US11081850B2
公开(公告)日：2021-08-03
申请号：US16853489
申请日：2020-04-20
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
IPC: H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US10038295B2
公开(公告)日：2018-07-31
申请号：US15631676
申请日：2017-06-23
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
CPC classification number: H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US09722384B2
公开(公告)日：2017-08-01
申请号：US15145016
申请日：2016-05-03
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
CPC classification number: H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US08867583B2
公开(公告)日：2014-10-21
申请号：US13656917
申请日：2012-10-22
Applicant: Gigaphoton Inc.
Inventor： Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。
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公开(公告)号：US10971883B2
公开(公告)日：2021-04-06
申请号：US16178351
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
IPC: H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
Abstract: A gas purification system may include: a circulation gas pipe in which a second end is connected at a first position to a second pipe through which gas is supplied from a gas supply source; a booster pump; a gas purification unit; a first tank in the circulation gas pipe; a first valve positioned between the gas supply source and the first position, the first valve having an open position and a closed position; and a second valve positioned between the first tank and the second end, the second valve having an open position and a closed position, the second valve configured to be in the closed position when the first valve is in the open position.
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Patent Agency Ranking
公开(公告)号：US10965085B2
公开(公告)日：2021-03-30
申请号：US15864017
申请日：2018-01-08
Applicant: Gigaphoton Inc.
Inventor： Hisakazu Katsuumi , Hiroaki Tsushima
Abstract: A laser chamber may include a first discharge electrode, a second discharge electrode, a fan making a laser gas flow through a discharge space between the first and second discharge electrodes, a first insulating member disposed on upstream side and downstream side of the first discharge electrode in the laser gas flow, a first metal damper member disposed on upstream side of the second discharge electrode and a second insulating member disposed on downstream side of the second discharge electrode in the laser gas flow, and a second metal damper member disposed on downstream side of the second insulating member in the laser gas flow. In a boundary portion between the second metal damper member and the second insulating member, a first discharge space side surface of the second metal damper member may be located further toward the opposite side to the discharge space than a second discharge space side surface of the second insulating member. A first corner formed by the first surface and a first side surface of the second metal damper member, the first side surface being on the side of the second insulating member, may be in contact with a second side surface of the second insulating member, the second side surface being on the side of the second metal damper member.
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公开(公告)号：US09954340B2
公开(公告)日：2018-04-24
申请号：US15208637
申请日：2016-07-13
Applicant: Gigaphoton Inc.
Inventor： Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
IPC: H01S3/22 , H01S3/036 , H01S3/225 , H01S3/10 , H01S3/134 , H01S3/23 , H01S3/097 , H01S3/13 , H01S3/08
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: Problem: to suppress the number of times complete gas replacement in a laser chamber.Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
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公开(公告)号：US09748727B2
公开(公告)日：2017-08-29
申请号：US14956709
申请日：2015-12-02
Applicant: Gigaphoton Inc.
Inventor： Kouji Kakizaki , Hiroaki Tsushima , Junichi Fujimoto , Natsushi Suzuki , Hisakazu Katsuumi
IPC: H01S3/0977 , H01S3/0971 , H01S3/038 , H01S3/08
CPC classification number: H01S3/09713 , H01S3/0384 , H01S3/08009 , H01S3/0977
Abstract: A preliminary ionization discharge device used in a laser chamber of a laser apparatus using preliminary ionization includes a dielectric pipe; a preliminary ionization inner electrode provided inside the dielectric pipe; and a preliminary ionization outer electrode provided outside the dielectric pipe. The preliminary ionization outer electrode includes: a contact plate part configured to contact the dielectric pipe; and an elastic part configured to exert a force in a direction in which the contact plate part pushes the dielectric pipe.
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公开(公告)号：US09350133B2
公开(公告)日：2016-05-24
申请号：US14579698
申请日：2014-12-22
Applicant: GIGAPHOTON INC.
Inventor： Osamu Wakabayashi , Hiroaki Tsushima , Kouji Kakizaki
CPC classification number: H01S3/0014 , H01S3/034 , H01S3/036 , H01S3/10069 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
Abstract: A method of controlling a laser apparatus may include: exchanging a gain medium in a chamber configured to output a laser beam by exciting the gain medium; first measuring, after the exchanging, pulse energy of a laser beam which is oscillated in the chamber under a specific gas pressure and a specific charge voltage; calculating an approximate expression indicating a relationship between the pulse energy of the laser beam and the gas pressure in the chamber and the charge voltage, or a table representing a correlationship between the pulse energy, the gas pressure and the charge voltage, based on the specific pressure, the specific charge voltage and the pulse energy in the first measuring; storing the approximate expression or the table; second measuring, after the first measuring, pulse energy Er of a laser beam oscillated in the chamber; calculating pulse energy Eec which is supposed to be obtained directly after the exchanging under the gas pressure and the charge voltage in the second measuring based on the approximate expression or the table; calculating a reduction amount ΔEd of pulse energy based on the pulse energy Eec and the pulse energy Er using ΔEd=Eec−Er; and calculating a partial gas exchange amount Q for partial gas exchange in the chamber based on the reduction amount ΔEd of pulse energy.
Abstract translation: 控制激光装置的方法可以包括：在配置成通过激励增益介质输出激光束的腔室中交换增益介质; 在交换之后，首先测量在特定气体压力和特定充电电压下在腔室中振荡的激光束的脉冲能量; 计算表示激光束的脉冲能量与腔室中的气体压力与充电电压之间的关系的近似表达式，或表示脉冲能量，气体压力和充电电压之间的相关性的表格， 压力，第一次测量中的具体充电电压和脉冲能量; 存储近似表达式或表格; 在第一次测量之后，第二次测量激光束的脉冲能量Er在腔室中振荡; 基于近似表达式或表格，计算在气体压力下的交换和第二测量中的充电电压之间直接获得的脉冲能量Eec; 使用＆Dgr; Ed = Eec-Er计算基于脉冲能量Eec和脉冲能量Er的脉冲能量的减少量＆Dgr; Ed; 并且基于脉冲能量的减少量＆Dgr; Ed计算腔室中部分气体交换的部分气体交换量Q。
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公开(公告)号：US10673200B2
公开(公告)日：2020-06-02
申请号：US15973846
申请日：2018-05-08
Applicant: Gigaphoton Inc.
Inventor： Yousuke Fujimaki , Hiroaki Tsushima , Hiroyuki Ikeda , Osamu Wakabayashi
IPC: H01S3/134 , H01S3/036 , H01S3/038 , H01S3/097 , H01S3/11 , H01S3/225 , H01S3/23 , H01S3/08 , H01S3/13
Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.
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