公开(公告)号：US12283453B2

公开(公告)日：2025-04-22

申请号：US17830244

申请日：2022-06-01

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/073 ,  H01J37/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam device also includes electrodes to extract the plurality of electron beamlets from the front side of the photocathode film and to control shapes of the plurality of electron beamlets.

公开(公告)号：US20250112017A1

公开(公告)日：2025-04-03

申请号：US18375512

申请日：2023-09-30

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Luca Grella

IPC: H01J37/12 ,  H01J37/05 ,  H01J37/073 ,  H01J37/147 ,  H01J37/285

Abstract: Beamlets are generated from the electron beam using an aperture array downstream of the single global collimated lens. The beamlets are directed through an image lens array in a path of the beamlets downstream of the aperture array that individually focuses the beamlets onto the intermediate image plane with the image lens array. The beamlets are then directed at a workpiece on a stage using a transfer lens array downstream of the image lens array. A path of the beamlets does not include a crossover.

公开(公告)号：US12165838B2

公开(公告)日：2024-12-10

申请号：US16697347

申请日：2019-11-27

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/28 ,  H01J37/073 ,  H01J37/22

Abstract: A scanning electron microscopy system may include an electron-optical sub-system and a controller. The electron-optical sub-system may include an electron source and an electron-optical column configured to direct an electron beam to a sample. The electron-optical column may include a double-lens assembly, a beam limiting aperture disposed between a first and second lens of the double-lens assembly, and a detector assembly configured to detect electrons scattered from the sample. In embodiments, the controller of the scanning electron microscopy system may be configured to: cause the electron-optical sub-system to form a flooding electron beam and perform flooding scans of the sample with the flooding electron beam; cause the electron-optical sub-system to form an imaging electron beam and perform imaging scans of the sample with the imaging electron beam; receive images acquired by the detector assembly during the imaging scans; and determine characteristics of the sample based on the images.

公开(公告)号：US12165831B2

公开(公告)日：2024-12-10

申请号：US17829230

申请日：2022-05-31

Applicant: KLA CORPORATION

Inventor： Xinrong Jiang ,  Christopher Sears ,  Youfei Jiang ,  Sameet K. Shriyan ,  Jeong Ho Lee ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/153 ,  H01J37/06 ,  H01J37/12 ,  H01J37/244 ,  H01J37/28

Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

公开(公告)号：US20240153737A1

公开(公告)日：2024-05-09

申请号：US17981141

申请日：2022-11-04

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Ralph Nyffenegger ,  Michael Steigerwald

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/261

Abstract: A system and method of a tilt-column electron beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include a plurality of electron beam sources configured to generate a plurality of beamlets. The imaging sub-system may further include a plurality of tilt-illumination columns, where a respective tilt-illumination column is configured to receive a respective beamlet from a respective electron beam source. For the system and method, a first tilt axis of a first tilt-illumination column may be orientated along a first angle and at least one additional tilt axis of at least one additional tilt-illumination column may be orientated along at least one additional angle different from the first angle, where each of the plurality of beam lets pass through a first common crossover volume.

公开(公告)号：US20230066086A1

公开(公告)日：2023-03-02

申请号：US17412242

申请日：2021-08-25

Applicant: KLA Corporation

Inventor： Xinrong Jiang

IPC: H01J37/12 ,  H01J37/14

Abstract: For an electron beam system, a Wien filter is in the path of the electron beam between a transfer lens and a stage. The system includes a ground electrode between the Wien filter and the stage, a charge control plate between the ground electrode and the stage, and an acceleration electrode between the ground electrode and the charge control plate. The system can be magnetic or electrostatic.

公开(公告)号：US20220254667A1

公开(公告)日：2022-08-11

申请号：US17170871

申请日：2021-02-08

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Nikolai Chubun ,  Luca Grella

IPC: H01L21/67 ,  H01J37/147 ,  H01J37/21 ,  G01N23/00

Abstract: An electron source emits an electron beam. The electron beam is received by a beam limiting assembly. The beam limiting assembly has a first beam limiting aperture with a first diameter and a second beam limiting aperture with a second diameter larger than the first diameter. The first beam limiting aperture receives the electron beam. This beam limiting assembly reduces the influence of Coulomb interactions.

公开(公告)号：US11056312B1

公开(公告)日：2021-07-06

申请号：US16782273

申请日：2020-02-05

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/153 ,  H01J37/10

Abstract: A system is disclosed. In embodiments, the system includes an electron source and a micro-lens array (MLA) configured to receive one or more primary electron beams from the electron source and split the one or more primary electron beams into a plurality of primary electron beamlets. In embodiments, the system further includes a micro-stigmator array (MSA) including a plurality of dodecapole electrostatic stigmators, wherein the MSA is configured to eliminate at least one of fourth-order focusing aberrations or sixth-order focusing aberrations of the plurality of primary electron beamlets. In embodiments, the system further includes projection optics configured to receive the plurality of primary electron beamlets and focus the plurality of primary electron beamlets onto a surface of a sample.