公开(公告)号：US12068129B2

公开(公告)日：2024-08-20

申请号：US17981141

申请日：2022-11-04

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Ralph Nyffenegger ,  Michael Steigerwald

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/261

Abstract: A system and method of a tilt-column electron beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include a plurality of electron beam sources configured to generate a plurality of beamlets. The imaging sub-system may further include a plurality of tilt-illumination columns, where a respective tilt-illumination column is configured to receive a respective beamlet from a respective electron beam source. For the system and method, a first tilt axis of a first tilt-illumination column may be orientated along a first angle and at least one additional tilt axis of at least one additional tilt-illumination column may be orientated along at least one additional angle different from the first angle, where each of the plurality of beamlets pass through a first common crossover volume.

公开(公告)号：US11335608B2

公开(公告)日：2022-05-17

申请号：US17224407

申请日：2021-04-07

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/00 ,  H01L21/66 ,  H01J37/063 ,  H01J37/065 ,  H01J37/244 ,  H01J37/14

Abstract: An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.

公开(公告)号：US11869743B2

公开(公告)日：2024-01-09

申请号：US17317861

申请日：2021-05-11

Applicant: KLA Corporation

Inventor： Xinrong Jiang

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/073 ,  H01J37/14

CPC classification number: H01J37/09 ,  H01J37/073 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/0453 ,  H01J2237/0473

Abstract: Multiple electron beamlets are split from a single electron beam. The electron beam passes through an acceleration tube, a beam-limiting aperture, an anode disposed between an electron beam source and the acceleration tube, a focusing lens downstream from the beam-limiting aperture, and a micro aperture array downstream from the acceleration tube. The micro aperture array generates beamlets from the electron beam. The electron beam can be focused from a divergent illumination beam into a telecentric illumination beam.

公开(公告)号：US20230395349A1

公开(公告)日：2023-12-07

申请号：US17830244

申请日：2022-06-01

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Michael Steigerwald ,  Ralph Nyffenegger

IPC: H01J37/073 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/12 ,  H01J37/14

CPC classification number: H01J37/073 ,  H01J37/28 ,  H01J37/1472 ,  H01J37/22 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/103 ,  H01J2237/2448 ,  H01J2237/0492 ,  H01J2237/06333

Abstract: An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam device also includes electrodes to extract the plurality of electron beamlets from the front side of the photocathode film and to control shapes of the plurality of electron beamlets.

公开(公告)号：US20220367140A1

公开(公告)日：2022-11-17

申请号：US17317861

申请日：2021-05-11

Applicant: KLA Corporation

Inventor： Xinrong Jiang

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/14 ,  H01J37/073

Abstract: Multiple electron beamlets are split from a single electron beam. The electron beam passes through an acceleration tube, a beam-limiting aperture, an anode disposed between an electron beam source and the acceleration tube, a focusing lens downstream from the beam-limiting aperture, and a micro aperture array downstream from the acceleration tube. The micro aperture array generates beamlets from the electron beam. The electron beam can be focused from a divergent illumination beam into a telecentric illumination beam.

公开(公告)号：US20220108862A1

公开(公告)日：2022-04-07

申请号：US17135279

申请日：2020-12-28

Applicant: KLA Corporation

Inventor： Nikolai Chubun ,  Xinrong Jiang ,  Youfei Jiang ,  Christopher Sears

IPC: H01J37/063 ,  H01J37/32 ,  H01J37/09 ,  H01J37/14

Abstract: An electron source is disclosed. The electron source may include an electron emitter configured to generate one or more electron beams. The electron source may further include a magnetic suppressor electrode surrounding at least a portion of the electron emitter. The magnetic suppressor electrode may be formed from one or more magnetic materials. The magnetic suppressor may be configured to shield at least a portion of the electron emitter from an axial magnetic field. The electron source may further include an extractor electrode positioned adjacent to a tip of the electron emitter.

公开(公告)号：US20210327770A1

公开(公告)日：2021-10-21

申请号：US17224407

申请日：2021-04-07

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01L21/66 ,  H01J37/063 ,  H01J37/065 ,  H01J37/14 ,  H01J37/244

Abstract: An electron beam system for wafer inspection and review of 3D devices provides a depth of focus up to 20 microns. To inspect and review wafer surfaces or sub-micron-below surface defects with low landing energies in hundreds to thousands of electron Volts, a Wien-filter-free beam splitting optics with three magnetic deflectors can be used with an energy-boosting upper Wehnelt electrode to reduce spherical and chromatic aberration coefficients of the objective lens.

公开(公告)号：US20240194440A1

公开(公告)日：2024-06-13

申请号：US18078828

申请日：2022-12-09

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Youfei Jiang ,  Amir Azordegan

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: A system and method of an electron multi-beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include one or more electron beam sources configured to generate a plurality of beamlets to simultaneously probe a plurality of measurement regions on a sample. The imaging sub-system may further include one or more electron optics configured to adjust the plurality of beamlets. The imaging sub-system may further include a detector array, where the detector array includes a plurality of detectors configured to detect electrons emanating from a measurement region of the sample. For the system and method, each detector may include a pass-through channel configured for receiving a beamlet of the plurality of beamlets.

公开(公告)号：US11651934B2

公开(公告)日：2023-05-16

申请号：US17490405

申请日：2021-09-30

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Sameet Shriyan ,  Luca Grella ,  Kevin Cummings ,  Christopher Sears

IPC: H01J37/09 ,  H01J37/14 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J37/14 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/0453

Abstract: An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.

公开(公告)号：US11508591B2

公开(公告)日：2022-11-22

申请号：US17170871

申请日：2021-02-08

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Nikolai Chubun ,  Luca Grella

IPC: H01J37/147 ,  H01L21/67 ,  G01N23/00 ,  H01J37/21

Abstract: An electron source emits an electron beam. The electron beam is received by a beam limiting assembly. The beam limiting assembly has a first beam limiting aperture with a first diameter and a second beam limiting aperture with a second diameter larger than the first diameter. The first beam limiting aperture receives the electron beam. This beam limiting assembly reduces the influence of Coulomb interactions.