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    Electron beam emitters with ruthenium coating
    15.
    发明授权
    Electron beam emitters with ruthenium coating 有权

    公开(公告)号：US10141155B2

    公开(公告)日：2018-11-27

    申请号：US15588006

    申请日：2017-05-05

    Applicant: KLA-Tencor Corporation

    Inventor： Gildardo R. Delgado ,  Edgardo Garcia Berrios ,  Frances Hill ,  Rudy Garcia

    IPC: H01J37/06 ,  H01J37/28

    Abstract: An emitter with a protective cap layer on an exterior surface of the emitter is disclosed. The emitter can have a diameter of 100 nm or less. The protective cap layer includes ruthenium. Ruthenium is resistant to oxidation and carbon growth. The protective cap layer also can have relatively low sputter yields to withstand erosion by ions. The emitter may be part of a system with an electron beam source. An electric field can be applied to the emitter and an electron beam can be generated from the emitter. The protective cap layer may be applied to the emitter by sputter deposition, atomic layer deposition (ALD), or ion sputtering.

    Particle and chemical control using tunnel flow
    16.
    发明授权
    Particle and chemical control using tunnel flow 有权

    公开(公告)号：US09759912B2

    公开(公告)日：2017-09-12

    申请号：US14034273

    申请日：2013-09-23

    Applicant: KLA-Tencor Corporation ,  Sandia Corporation

    Inventor： Frank Chilese ,  Gildardo R. Delgado ,  Daniel Wack ,  John R. Torczynski ,  Leonard E. Klebanoff

    IPC: G02B27/00

    CPC classification number: G02B27/0006

    Abstract: An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.

    Methods and apparatus for use with extreme ultraviolet light having contamination protection
    17.
    发明授权
    Methods and apparatus for use with extreme ultraviolet light having contamination protection 有权
    用于具有污染防护的极紫外光的方法和设备

    公开(公告)号：US09389180B2

    公开(公告)日：2016-07-12

    申请号：US14176587

    申请日：2014-02-10

    Applicant: KLA-Tencor Corporation

    Inventor： Francis C. Chilese ,  John R. Torczynski ,  Rudy Garcia ,  Leonard E. Klebanoff ,  Gildardo R. Delgado ,  Daniel J. Rader ,  Anthony S. Geller ,  Michail A. Gallis

    IPC: G01J1/42 ,  G01N21/59 ,  G03F7/20

    CPC classification number: G01N21/59 ,  G03F7/70933 ,  G03F7/70983

    Abstract: An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.

    Abstract translation: 一种用于极紫外（EUV）光的装置，包括：A）具有第一端开口，第二端开口和中间开口的管道，所述第一端开口位于第二端开口的中间，B）设置成接收EUV光的光学部件 从第二端开口或通过第二端开口发射光，以及C）处于第一压力的低压气体源流过管道，该气体具有高透光率的EUV光，其流体耦合到中间开口 。 除了或不是气体流动之外，装置可以具有A）具有热耦合到管道和光学部件中的至少一个的热控制单元的低压气体和/或B）用于在第一 二重奏部分和第二部分之间具有接地绝缘部分。

    Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation
    18.
    发明授权
    Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation 有权
    通过使用光子辐射产生反应离子来清洁光学仪器室内的物体的方法和装置

    公开(公告)号：US09156068B2

    公开(公告)日：2015-10-13

    申请号：US14482510

    申请日：2014-09-10

    Applicant: KLA-Tencor Corporation ,  Sandia Corporation

    Inventor： Leonard E. Klebanoff ,  Gildardo R. Delgado ,  Jeromy T. Hollenshead ,  Karl R. Umstadter ,  Elena Starodub ,  Guorong V. Zhuang

    IPC: H01J49/14 ,  H01J49/24 ,  B08B7/00 ,  G03F7/20

    CPC classification number: B08B7/0057 ,  G03F1/84 ,  G03F7/70925

    Abstract: An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.

    Abstract translation: 一种光学仪器，包括室，暴露于室内的物体，低压气体源，气体包括低压分子氢气，低压分子氧和低压中的至少一种 惰性气体，低压气体源流体耦合到腔室，低压源电耦合在物体与仪器的剩余部分之间，暴露于腔室的内部，以将物体保持在低位 相对于其余部分的电压以及EUV / VUV光源，其适于将EUV / VUV光通过室内的低压气体引导到物体上。 在这种系统中，当EUV / VUV光源被激活时，低压气体的离子被形成并被引导到物体。 离子可以是氢，氧或惰性气体的离子。

    METHODS AND APPARATUS FOR CLEANING OBJECTS IN A CHAMBER OF AN OPTICAL INSTRUMENT BY GENERATING REACTIVE IONS USING PHOTON RADIATION
    19.
    发明申请
    METHODS AND APPARATUS FOR CLEANING OBJECTS IN A CHAMBER OF AN OPTICAL INSTRUMENT BY GENERATING REACTIVE IONS USING PHOTON RADIATION 有权
    通过使用光子辐射产生反应离子来清洁光学仪器室内的物体的方法和装置

    公开(公告)号：US20140374619A1

    公开(公告)日：2014-12-25

    申请号：US14482510

    申请日：2014-09-10

    Applicant: KLA-Tencor Corporation ,  Sandia Corporation

    Inventor： Leonard E. Klebanoff ,  Gildardo R. Delgado ,  Jeromy T. Hollenshead ,  Karl R. Umstadter ,  Elena Starodub ,  Guorong V. Zhuang

    IPC: B08B7/00

    CPC classification number: B08B7/0057 ,  G03F1/84 ,  G03F7/70925

    Abstract: An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUV light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.

    Abstract translation: 一种光学仪器，包括室，暴露于室内的物体，低压气体源，气体包括低压分子氢气，低压分子氧和低压中的至少一种 惰性气体，低压气体源流体耦合到腔室，低压源电耦合在物体与仪器的剩余部分之间，暴露于腔室的内部，以将物体保持在低位 相对于其余部分的电压以及EUV / VUV光源，其适于将EUV / VUV光通过室内的低压气体引导到物体上。 在这种系统中，当EUV / VUV光源被激活时，低压气体的离子被形成并被引导到物体。 离子可以是氢，氧或惰性气体的离子。

    PARTICLE AND CHEMICAL CONTROL USING TUNNEL FLOW
    20.
    发明申请
    PARTICLE AND CHEMICAL CONTROL USING TUNNEL FLOW 有权
    使用隧道流的颗粒和化学控制

    公开(公告)号：US20140085724A1

    公开(公告)日：2014-03-27

    申请号：US14034273

    申请日：2013-09-23

    Applicant: Sandia Corporation ,  KLA-Tencor Corporation

    Inventor： Frank Chilese ,  Gildardo R. Delgado ,  Daniel Wack ,  John R. Torczynski ,  Leonard E. Klebanoff

    IPC: G02B27/00

    CPC classification number: G02B27/0006

    Abstract: An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, a fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.

    Abstract translation: 一种用于污染物控制的装置，具有：第一光学组件，包括：第一光均化器隧道，其具有：连接到极紫外光源的第一端，与目的地室连通的第二端，第一封闭空间，以及 第一气体输入装置，其被布置成引入第一气体，使得第一气体沿第一方向朝向第一端部流动，并沿第二方向朝向第二端部流动。 所述装置交替地具有：第二光学组件，其包括：第二光均化器隧道，其具有连接到极紫外光源的第三端，与目的地室连通的第四端，第二封闭空间，扩散阻挡管 包括：面向第四端的第五端和与目的地室连通的第六端，以及在第二光均化器通道和扩散管之间的第二气体输入。

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