Multi-wavelength, multimode optical fibers
    13.
    发明申请
    Multi-wavelength, multimode optical fibers 有权
    多波长多模光纤

    公开(公告)号:US20080050075A1

    公开(公告)日:2008-02-28

    申请号:US11511174

    申请日:2006-08-28

    Abstract: A silicate optical fiber comprises a graded index silicate core co-doped with aluminum oxide, phosphorus oxide, germanium oxide and fluorine in unique compositions that we have discovered allow multimode, multi-wavelength operation without significant intermodal dispersion. Illustratively, the core comprises a multiplicity of compositions whose refractive indices are graded from a maximum at or near the center of the core to a minimum at the interface with the cladding. Each core composition resides within a sub-volume of a 5 dimensional phase space in which an optimum core profile shape is essentially constant over the wavelength range of operation of the fiber. For operation in the wavelength range of about 0.78 μm to 1.55 μm, each composition preferably comprises no more than approximately 6 mole % Al2O3, 9 mole % P2O5, 6 mole % GeO2, 6 mole % F, and 90-100 mole % SiO2.

    Abstract translation: 硅酸盐光纤包括与氧化铝,氧化磷,氧化锗和氟共掺杂的分级指数硅酸盐芯,其独特的组成,我们发现允许多模多波长操作,而没有显着的联合分散。 说明性地,芯包括多个组合物,其折射率从芯的中心处或附近的最大值到与包层的界面处最小。 每个核心组合物位于5维相位空间的子体积中,其中最佳核心轮廓形状在光纤的操作的波长范围上基本上是恒定的。 为了在约0.78μm至1.55μm的波长范围内操作,每个组合物优选包含不超过约6摩尔%的Al 2 O 3 N 3,9摩尔%P

    Method of making extreme ultraviolet lithography glass substrates
    19.
    发明申请
    Method of making extreme ultraviolet lithography glass substrates 审中-公开
    制造极紫外光刻玻璃基板的方法

    公开(公告)号:US20040025542A1

    公开(公告)日:2004-02-12

    申请号:US10456318

    申请日:2003-06-05

    Abstract: A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.

    Abstract translation: 用于制造极紫外光刻工具玻璃基板的方法包括产生等离子体,将包含二氧化硅前体和二氧化钛前体的反应物输送到等离子体中以产生二氧化钛和二氧化硅颗粒,并将二氧化钛和二氧化硅颗粒沉积在沉积表面上以形成均匀的 二氧化钛掺杂二氧化硅。 本发明提供了不含条纹变化的均匀玻璃基底,并提供有益的极紫外光刻反射光学器件。

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