Abstract:
An electron beam device for inspecting a sample with an electron beam is described. The electron beam device includes an electron beam source including a thermal field emitter, which includes an emitter tip having an emission facet configured for electron emission, wherein the emission facet has an emission facet width; and a first side facet and a second side facet, wherein an edge facet is formed between the first side facet and the second side facet, which has an edge facet width. The edge facet width is between 20% and 40% of the emission facet width. The electron beam source further includes an extractor device; and a heating device for heating the thermal field emitter. The electron beam device further includes electron beam optics and a detector device for detecting secondary charged particles generated at an impingement or hitting of the primary electron beam on the sample.
Abstract:
A method for producing an electrode (16) for a high-pressure discharge lamp (10), comprising the following steps: a) scanning at least part of the electrode surface for producing an oxide layer (step 120); b) at least partially sublimating the oxide layer formed in step a) (step 120); and c) reducing the rest of the oxide layer.
Abstract:
A method for producing an electrode (16) for a high-pressure discharge lamp (10), comprising the following steps: a) scanning at least part of the electrode surface for producing an oxide layer (step 120); b) at least partially sublimating the oxide layer formed in step a) (step 120); and c) reducing the rest of the oxide layer.