公开(公告)号：US20030202095A1

公开(公告)日：2003-10-30

申请号：US10414676

申请日：2003-04-16

Inventor： Howard J. Schultz

IPC: H04N007/18

CPC classification number: H01J3/14 ,  H04N1/00795 ,  H04N1/00827 ,  H04N13/221

Abstract: An optical scanner for three-dimensional scanning comprises: a support bed; a flat, transparent plate; guide rails under the transparent plate; a carriage slidably attached to the guide rails; and one or more sensors attached to the bed/case or carriage. For three-dimensional imaging, multiple scanned images of the object are obtained, each of which is from light reflecting off the object at a different angle with respect to the path of the carriage. This is done by shining light on the object and appropriately channeling reflected light, from at least two different directions, into the sensor(s). In one embodiment, the carriage has three CCD sensors, one oriented rearwards (with respect to the path of travel of the carriage), one oriented vertically, and one oriented forwardsnulleach effectively nullseesnull the object from a different orientation. The multiple scanned images can be used for stereoscopic viewing and/or three-dimensional rendering using a computer.

Abstract translation: 一种用于三维扫描的光学扫描器包括：支撑床; 平板，透明板; 透明板下的导轨; 可滑动地附接到导轨的托架; 以及一个或多个连接到床/箱或托架上的传感器。 对于三维成像，获得物体的多个扫描图像，每个扫描图像都是相对于托架路径以不同角度从物体反射的光。 这通过在对象上照射光并将反射光从至少两个不同方向适当地引导到传感器中来完成。 在一个实施例中，滑架具有三个CCD传感器，一个朝向后方（相对于滑架的行进路径），一个垂直定向，一个前进方向有效地从不同的方向“看到”物体。 多个扫描图像可以用于使用计算机的立体观看和/或三维渲染。

公开(公告)号：US4694457A

公开(公告)日：1987-09-15

申请号：US813452

申请日：1985-12-26

Applicant: John C. Kelly ,  Glenn W. Kentwell

Inventor： John C. Kelly ,  Glenn W. Kentwell

IPC: H01J37/147 ,  G21K1/093 ,  H01J3/14 ,  H01J35/00 ,  H01J49/20 ,  H01S3/09 ,  H05H7/00 ,  H01S3/00

CPC classification number: H01J37/14 ,  G21K1/093 ,  H01J3/14 ,  H01J35/00 ,  H01J49/20 ,  H01S3/0903 ,  H05H7/00 ,  H01J2237/31701

Abstract: An ion or electron beam is steered or focussed by a circular magnetic field produced by passing a large electrical current through a straight conducting wire, the magnetic field being co-axial with the wire. Annular beams of charged particles coaxial with the straight wire can be focussed onto a circular spot or, depending upon the entry radius of the annular beam and the magnetic field strength, can be induced to follow a looping trajectory. The effect of the steering or focussing system can be enhanced by the provision of a cylindrical conductor which is co-axial with the straight conducting wire and maintained at a voltage sufficient to produce the desired particle trajectory such that the particle beam passes between the wire and the cylindrical conductor. The beam steering or focussing systems is applicable to the fields of beam current density intensification, ion implantation, ion separation and free electron lasers.

Abstract translation: 离子或电子束被通过使大电流通过直线导线产生的圆形磁场而被引导或聚焦，该磁场与电线同轴。 与直线同轴的带电粒子的环状光束可以聚焦到圆形点上，或者根据环形光束的入射半径和磁场强度可以被诱导跟随循环轨迹。 转向或聚焦系统的效果可以通过提供与直线导电线同轴并保持在足以产生所需粒子轨迹的电压的圆柱形导体来增强，使得粒子束在导线和 圆柱形导体。 光束转向或聚焦系统适用于束流密度增强，离子注入，离子分离和自由电子激光等领域。

公开(公告)号：US11747494B2

公开(公告)日：2023-09-05

申请号：US16907503

申请日：2020-06-22

Applicant: Plasma-Therm LLC

Inventor： Leslie Michael Lea ,  Linnell Martinez ,  Michael Morgan ,  Russell Westerman

IPC: G01T1/28 ,  H01J37/32 ,  H01J3/14 ,  H01J49/02 ,  H01L21/78

CPC classification number: G01T1/28 ,  H01J3/14 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32577 ,  H01J37/32633 ,  H01J37/32871 ,  H01J49/02 ,  H01L21/78

Abstract: The present invention provides a method for using ion filtering to adjust the number of ions delivered to a substrate. The method comprising a process chamber being provided that is operatively connected to a plasma source. The substrate is provided on a substrate support that is provided within the process chamber. An electrical bias source is provided that is operatively connected to an aperture plate that is provided in the process chamber. The substrate on the substrate support is processed using a plasma generated using the plasma source. A variable bias voltage from the electrical bias source is applied to the aperture plate during the plasma processing of the substrate. The plasma processing of the substrate can further comprise exposing the substrate to a plasma time division multiplex process which alternates between deposition and etching on the substrate.

公开(公告)号：US20170302498A1

公开(公告)日：2017-10-19

申请号：US15513121

申请日：2015-06-22

Applicant: CITIZEN WATCH CO., LTD.

Inventor： Ayano TANABE

IPC: H04L27/38 ,  H01J3/14 ,  G02B21/08 ,  G02B21/00 ,  H04L27/36

CPC classification number: H04L27/389 ,  G02B21/00 ,  G02B21/0028 ,  G02B21/0032 ,  G02B21/0036 ,  G02B21/0072 ,  G02B21/0076 ,  G02B21/0088 ,  G02B21/082 ,  G02B26/06 ,  G02B27/0068 ,  G02F1/13 ,  G02F2203/18 ,  G02F2203/50 ,  H01J3/14 ,  H04L27/361

Abstract: The phase modulation device 3 includes a first phase modulation element 11 which modulates a phase of a light flux in accordance with a voltage applied to each of a plurality of first electrodes in accordance with a first ratio of a second aberration component to a first aberration component of a wave front aberration generated by an optical system including an objective lens 4; a second phase modulation element 12 which modulates a phase of a light flux in accordance with a voltage applied to each of a plurality of second electrodes in accordance with a second ratio of the second aberration component to the first aberration component; and a control circuit 13 which controls voltages applied to each of first electrodes and each of second electrodes in accordance with a distance from the objective lens to a light focusing position of the light flux.

公开(公告)号：US09728370B2

公开(公告)日：2017-08-08

申请号：US14610981

申请日：2015-01-30

Applicant: VAREX IMAGING CORPORATION

Inventor： Paul D. Moore ,  Kasey Otho Greenland

IPC: H01J35/14 ,  H01J35/06 ,  H01J3/14 ,  H01J35/26

CPC classification number: H01J35/14 ,  H01J3/14 ,  H01J35/06 ,  H01J35/26

Abstract: An example embodiment includes a cathode assembly. The cathode assembly includes a cathode head, a filament, a focusing structure, and a non-rectilinear focusing aperture. The cathode head defines a filament slot. The filament is positioned in the filament slot that is capable of emitting electrons by thermionic emission. The focusing structure is positioned at least partially between the filament and an anode. The non-rectilinear focusing aperture is defined in the focusing structure. The non-rectilinear focusing aperture is configured to shape an emission profile of electrons emitted by the filament.

公开(公告)号：US09128192B2

公开(公告)日：2015-09-08

申请号：US13019675

申请日：2011-02-02

Applicant: Marc Christophersen ,  Bernard F. Phlips

Inventor： Marc Christophersen ,  Bernard F. Phlips

IPC: G01T1/02 ,  H01J3/14 ,  G02F1/167

CPC classification number: G01T1/02 ,  G02F1/167 ,  H01J3/14

Abstract: Caesium-137 irradiates electronic paper. An incoming gamma-ray from the Cs-137 interacts with a particle inside a micro-container by generating a recoil electron and/or a hole. Because the recoil electron physically leaves the particle, the particle is charged depending on the dose from the radiation source. And, the charge of the particles change, which results in a movement of the particles within the micro-container. After refreshing the electronic paper, a visible difference in the gray-scale can be seen. Thus, the visible difference in the gray-scale is an effect caused by the irradiation of the electronic paper, showing sensitivity to high energy radiation—thus, non-optimized electronic paper is sensitive to high energy radiation and can be used as a radiation dosimeter. In addition, electronic paper can be used for sensing chemical and bio-chemical agents, as well as detecting high energy radiation.

Abstract translation: 铯-133辐射电子纸。 来自Cs-137的进入的γ射线通过产生反冲电子和/或孔而与微容器内的颗粒相互作用。 因为反冲电子物理地离开颗粒，所以根据辐射源的剂量对颗粒进行充电。 并且，颗粒的电荷改变，这导致微粒在微型容器内的移动。 刷新电子纸后，可以看出灰度的明显差异。 因此，灰度的可见差异是由电子纸的照射引起的影响，显示出对高能量辐射的敏感性，因此，未优化的电子纸对高能辐射敏感，并且可以用作辐射剂量计 。 此外，电子纸可用于感测化学和生物化学试剂，以及检测高能量辐射。

公开(公告)号：US08952343B2

公开(公告)日：2015-02-10

申请号：US13887071

申请日：2013-05-03

Applicant: Varian Medical Systems Particle Therapy GmbH

Inventor： Thomas Stephani ,  Uwe Behrens ,  Heinrich Roecken ,  Jan Timmer ,  Christian Baumgarten

IPC: A61N5/10 ,  H05H7/02 ,  H01J3/14 ,  H05H13/00 ,  H05H7/12

CPC classification number: H05H7/02 ,  A61N5/10 ,  A61N5/1077 ,  A61N2005/1087 ,  H01J3/14 ,  H05H13/005 ,  H05H2007/122 ,  H05H2277/11

Abstract: Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.

Abstract translation: 提供系统和方法来执行有效的自动回旋加速器初始化，校准和光束调整。 提供了一个过程，允许自动化过夜后的回旋加速器的初始化或维护关闭。 在一个实施例中，定义了五个独立的回旋加速器系统状态，并且一个状态与另一个状态之间的转换可以例如由回旋加速器的控制系统自动化。 根据这些实施例，由此可以在最少的手动输入之后实现停机后的光束操作。 通过应用自动程序，回旋加速器的所有有源装置（例如，RF系统，提取偏转器，离子源）分别斜坡到预定参数。

公开(公告)号：US08927946B2

公开(公告)日：2015-01-06

申请号：US13887086

申请日：2013-05-03

Applicant: Varian Medical Systems Particle Therapy GmbH

Inventor： Uwe Behrens ,  Thomas Stephani

IPC: A61N5/10 ,  H01J3/14 ,  G21K5/00 ,  H05H13/00 ,  H05H7/02 ,  H05H7/12

CPC classification number: H05H7/02 ,  A61N5/10 ,  A61N5/1077 ,  A61N2005/1087 ,  H01J3/14 ,  H05H13/005 ,  H05H2007/122 ,  H05H2277/11

Abstract: Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.

Abstract translation: 提供系统和方法以在相同的患者和治疗期间内的多个处理层的宽范围内对回旋加速器束电流进行有效的自动调节。 在一个实施例中，通过使用安装在回旋加速器的内部中心的静电垂直偏转器来使用束流衰减来实现有效的调节。 例如，束电流可以通过施加到静电垂直偏转器的高电压来调节。 在每次处理前，记录垂直偏转器的衰减曲线。 基于该衰减曲线，对每个照射层所需的束电流的垂直偏转器电压进行插值。 通过该程序，可以在很宽的范围内以最小的时间自动调整光束电流，同时保持高精度。

公开(公告)号：US20140346327A1

公开(公告)日：2014-11-27

申请号：US14456757

申请日：2014-08-11

Applicant: SCHWEITZER ENGINEERING LABORATORIES, INC.

Inventor： James R. Kesler ,  Douglas M. Trout ,  Gary W. Scheer

IPC: H02H1/00 ,  H01J3/14

CPC classification number: H02H1/0023 ,  H01J3/14

Abstract: An electro-optical (EO) radiation collector for collecting and/or transmitting EO radiation (which may include EO radiation in the visible wavelengths) for transmission to an EO sensor. The EO radiation collector may be used with an arc flash detection device or other protective system, such as an intelligent electronic device (IED). The arc flash detection device may detect an arc flash event based upon EO radiation collected by and/or transmitted from the EO radiation collector. The EO radiation collector may receive an EO conductor cable, an end of which may be configured to receive EO radiation. A portion of the EO radiation received by the EO radiation collector may be transmitted into the EO conductor cable and transmitted to the arc flash detection device. The EO radiation collector may be adapted to receive a second EO conductor cable, which may be used to provide redundant EO transmission and/or self-test capabilities.

Abstract translation: 用于收集和/或传输EO辐射（其可以包括可见波长中的EO辐射）的电光（EO）辐射收集器，用于传输到EO传感器。 EO辐射收集器可以与电弧闪光检测装置或诸如智能电子装置（IED）的其它保护系统一起使用。 电弧闪光检测装置可以基于由EO辐射收集器收集的和/或从其发射的EO辐射来检测电弧闪光事件。 EO辐射收集器可以接收EO导体电缆，其端部可被配置为接收EO辐射。 由EO辐射收集器接收的EO辐射的一部分可以传输到EO导体电缆中并传输到电弧闪光检测装置。 EO辐射收集器可以适于接收可用于提供冗余EO传输和/或自检能力的第二EO导体电缆。

公开(公告)号：US08822911B2

公开(公告)日：2014-09-02

申请号：US13839989

申请日：2013-03-15

Applicant: Hitachi High-Tech Science Corporation

Inventor： Yasuhiko Sugiyama ,  Tatsuya Asahata ,  Toshio Doi ,  Hiroshi Oba

IPC: H01J3/14

CPC classification number: H01J3/14 ,  H01J37/304 ,  H01J2237/0458 ,  H01J2237/30433 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: Provided is a focused ion beam apparatus including a control portion configured to: store in advance, in a condenser voltage table, a calculation value of a condenser voltage for obtaining a reference beam current for all each of a plurality of apertures; obtain an experimental value of the condenser voltage for obtaining the reference beam current for a reference aperture; obtain a correction value of the condenser voltage by subtracting the calculation value stored for the reference aperture from the experimental value for the reference aperture; obtain setting values of the condenser voltage by adding the correction value to the calculation values stored for each of the plurality of the apertures; and store the obtained setting value in the condenser voltage table.

Abstract translation: 提供了一种聚焦离子束装置，其包括控制部分，该控制部分被配置为：预先存储在聚光器电压表中的用于为多个孔中的每一个获得参考光束电流的聚光器电压的计算值; 获得用于获得参考光圈的参考光束电流的电容器电压的实验值; 通过从参考孔径的实验值中减去存储在参考孔径上的计算值来获得冷凝器电压的校正值; 通过将所述校正值与对于所述多个孔中的每一个存储的计算值相加来获得所述冷凝器电压的设定值; 并将获得的设定值存储在冷凝器电压表中。