公开(公告)号：US10465342B2

公开(公告)日：2019-11-05

申请号：US15844969

申请日：2017-12-18

Applicant: Westlake David Buschman

Inventor： Westlake David Buschman

IPC: B05C11/02 ,  D21H25/06 ,  D21G3/04 ,  D21G3/00 ,  D21H25/12 ,  B05C1/08 ,  B05C11/04

Abstract: A metering rod holder assembly for supporting a metering rod in compressive engagement with a surface from which a fluid is to be metered. The rod holder assembly includes a base member having a channel opening to a first face thereof, and a rod bed insert at least partially received in the channel of the base member in spaced relation to a base wall of the channel. The rod bed insert includes a metering rod slot for receiving a metering rod, and a flank engaging surface engaged with at least one flank surface of the base member, the rod bed insert movable from a first position to a second position within the channel.

公开(公告)号：US10434809B2

公开(公告)日：2019-10-08

申请号：US14913598

申请日：2014-10-16

Applicant: LG CHEM, LTD.

Inventor： Beom Mo Koo ,  Seung Heon Lee ,  Ji Young Hwang ,  Yong Goo Son ,  Jooyeon Kim ,  Jeseob Park ,  Kun Seok Lee

IPC: B05C11/04 ,  B05C11/02 ,  B41N10/02 ,  B05D3/00

Abstract: The present specification relates to an apparatus for manufacturing a blanket. The apparatus includes a surface plate on which a substrate film is supplied; a coating unit coating a blanket composition on the substrate film; and a comma blade horizontally moving on the surface plate coated with the blanket composition. Of the whole surface of the comma blade, the surface contacting the blanket composition is an angular surface. This application also relates to a method for manufacturing a blanket, a blanket manufactured using the same, a reverse offset printing roll provided with the blanket, and a reverse offset printing apparatus including the same.

公开(公告)号：US20170275896A1

公开(公告)日：2017-09-28

申请号：US15469793

申请日：2017-03-27

Applicant: Christopher Valliant

Inventor： Christopher Valliant

IPC: E04F21/24 ,  B05C5/00 ,  B05C11/04 ,  E04B1/66

CPC classification number: E04F21/248 ,  B05C17/00503 ,  B05C17/0136 ,  B05C17/015 ,  B05C17/10 ,  E04F21/165

Abstract: An apparatus and method for spreading grout configured to apply and spread grout, sealant, and other similar materials.

公开(公告)号：US09751104B2

公开(公告)日：2017-09-05

申请号：US13968354

申请日：2013-08-15

Applicant: NANCHANG O-FILM TECH CO., LTD ,  SUZHOU O-FILM TECH CO., LTD. ,  SHENZHEN O-FILM TECH CO., LTD.

Inventor： Sheng Zhang ,  Yulong Gao

IPC: B05C9/04 ,  B05C11/04 ,  B05C11/10 ,  B05C5/02 ,  H05K3/12

CPC classification number: B05C9/04 ,  B05C5/0245 ,  B05C11/04 ,  B05C11/048 ,  B05C11/1039 ,  H05K3/1258 ,  H05K2203/0139

Abstract: The present invention provides a substrate double-surface hole-filling apparatus for carrying out a hole-filling operation on a substrate which has a first surface and a second surface, comprises a first feeding device, a first scraping device, a first drying device, a second feeding device, a second scraping device, a second drying device and a turnover device. The substrate double-surface hole-filling apparatus has a turnover device turning over the substrate which needs to be carried out with hole-filling operation. Therefore, the substrate double-surface hole-filling apparatus can automatically carry out the hole-filling operation on two surfaces of the substrate without manual turnover of the substrate, thus improving production efficiency.

公开(公告)号：US09669421B2

公开(公告)日：2017-06-06

申请号：US14389449

申请日：2014-03-12

Applicant: FUJI KIKAI KOGYO CO., LTD. ,  TOYOTA JIDOSHA KABUSHIKI KAISHA

Inventor： Hidenobu Miura ,  Masakazu Umehara

IPC: B05C1/08 ,  B41F9/10 ,  B41F31/02 ,  B05C11/04

CPC classification number: B05C1/0813 ,  B05C1/0808 ,  B05C1/0817 ,  B05C1/0826 ,  B05C1/0839 ,  B05C11/047 ,  B41F9/10 ,  B41F31/027

Abstract: A gravure kiss coater 1 includes a paint feeder 30 placed along a small-diameter gravure roll 10 having an outside diameter D in a range of 45-150 mm. The paint feeder 30 includes a doctor blade 32, a case 31, and a coating feed path 34, 35. A distal end 32a of the doctor blade 32 is directed in a direction opposite to a direction of rotation of the small-diameter gravure roll 10, and the small-diameter gravure roll 10 is capable of contacting the substrate S within a range of rotation angles equal to or less than 90° from the distal end 32a of the doctor blade 32.

公开(公告)号：US09305790B2

公开(公告)日：2016-04-05

申请号：US14113664

申请日：2012-05-03

Applicant: Nicolas Karst ,  Simon Perraud

Inventor： Nicolas Karst ,  Simon Perraud

IPC: B05C11/04 ,  H01L21/288 ,  B05C5/00 ,  H01L31/032 ,  H01L31/18 ,  H01L21/48 ,  B05C5/02 ,  B05C3/18

CPC classification number: H01L21/288 ,  B05C3/18 ,  B05C5/001 ,  B05C5/0254 ,  B05C11/04 ,  H01L21/4885 ,  H01L31/0322 ,  H01L31/18 ,  Y02E10/541 ,  Y02P70/521

Abstract: The device for knife coating a layer of ink based on copper and indium on a substrate includes a supply tank of an ink, said tank collaborating with a coating knife. In addition, the device includes means that allow the ink, the substrate and the coating knife to be kept at different and increasing respective temperatures.

Abstract translation: 用于在基板上涂覆基于铜和铟的一层油墨的装置包括油墨供应罐，所述罐与涂布刀协作。 此外，该装置包括允许墨，基底和涂布刀保持不同并增加相应温度的装置。

公开(公告)号：US09132687B2

公开(公告)日：2015-09-15

申请号：US13522539

申请日：2010-01-20

Applicant: Hans Jörg Brudermann ,  Sibylle Stiltz ,  Andreas Hügli

Inventor： Hans Jörg Brudermann ,  Sibylle Stiltz ,  Andreas Hügli

IPC: B41F9/10 ,  B41N10/00 ,  B05C11/04 ,  B41F31/04

CPC classification number: B41N10/005 ,  B05C11/045 ,  B41F9/1072 ,  B41F31/04

Abstract: A doctor blade for scraping printing ink from a surface of a printing plate, comprising a flat and elongated main body having a working edge area formed in a longitudinal direction, the working edge area being coated with at least one first coating on the basis of a nickel-phosphorus alloy, and is characterized in that the first coating contains at least one additional component for improving the wear behavior of the doctor blade.

Abstract translation: 一种用于从印版的表面刮擦印刷油墨的刮刀，包括具有沿纵向方向形成的工作边缘区域的平坦且细长的主体，所述工作边缘区域涂覆有至少一个第一涂层，所述第一涂层基于 镍磷合金，其特征在于，第一涂层含有至少一种附加组分，用于改善刮刀的磨损行为。

公开(公告)号：US09099504B2

公开(公告)日：2015-08-04

申请号：US12362945

申请日：2009-01-30

Applicant: Kazunari Nada ,  Kenichiro Arai

Inventor： Kazunari Nada ,  Kenichiro Arai

IPC: C23F1/00 ,  C23F1/08 ,  H01L21/67 ,  B05C5/02 ,  B05C11/04 ,  B05C11/08

CPC classification number: H01L21/6708 ,  B05C5/0254 ,  B05C11/04 ,  B05C11/08 ,  G03F1/80

Abstract: The substrate treatment apparatus according to the present invention includes a substrate holding mechanism which holds a substrate, a nozzle body having a spout which spouts an etching liquid toward a major surface of the substrate held by the substrate holding mechanism, a nozzle body movement mechanism which moves the nozzle body in a predetermined movement direction so as to move an etching liquid application position at which the etching liquid is applied on the major surface, a first flexible sheet attached to the nozzle body to be brought into contact with a portion of the major surface located on one of opposite sides of the etching liquid application position with respect to the movement direction, and a second flexible sheet attached to the nozzle body to be brought into contact with a portion of the major surface located on the other side of the etching liquid application position with respect to the movement direction.

Abstract translation: 根据本发明的基板处理装置包括保持基板的基板保持机构，具有喷嘴的喷嘴体，喷嘴主体朝向由基板保持机构保持的基板的主表面喷出蚀刻液;喷嘴主体移动机构， 使喷嘴体沿预定的移动方向移动，以移动在主表面上施加蚀刻液的蚀刻液施加位置，附接到喷嘴体的第一柔性片，以与主体的一部分接触 表面位于相对于运动方向的蚀刻液施加位置的相对侧中的一侧上，以及附接到喷嘴体的第二柔性片，以与位于蚀刻的另一侧的主表面的一部分接触 相对于移动方向的液体施加位置。

公开(公告)号：US09088043B2

公开(公告)日：2015-07-21

申请号：US13617068

申请日：2012-09-14

Applicant: So-Il Moon ,  Jee-Sang Hwang ,  Su-Hwan Kim ,  Hyoung-No Lee

Inventor： So-Il Moon ,  Jee-Sang Hwang ,  Su-Hwan Kim ,  Hyoung-No Lee

IPC: B05C11/04 ,  B05D3/12 ,  H01M4/04 ,  H01M4/36 ,  B05C1/16 ,  B05C1/12 ,  B05C1/08 ,  H01M10/04 ,  H01M10/42 ,  B05D1/28

CPC classification number: H01M4/366 ,  B05C1/0817 ,  B05C1/0826 ,  B05C1/083 ,  B05C1/0856 ,  B05C1/0869 ,  B05C1/12 ,  B05C1/165 ,  B05C11/04 ,  B05C11/041 ,  B05D1/28 ,  H01M4/0402 ,  H01M4/0404 ,  H01M4/0409 ,  H01M10/0431 ,  H01M10/4235 ,  Y02E60/122

Abstract: An apparatus and method for coating a functional layer on a current collector with an active material layer thereon, the apparatus including a first roll and a second roll, the first roll and second roll being for advancing the current collector; a gravure roll, the gravure roll being configured to coat the functional layer on the active material layer; a thickness measurer, the thickness measurer being configured to measure at least one of a thickness of the active material layer and a sum thickness of the active material layer and the functional layer; and a controller, the controller being in communication with the thickness measurer and being configured to control a rotation speed of the gravure roll.

Abstract translation: 一种用于在其上具有活性材料层的集电器上涂覆功能层的装置和方法，该装置包括第一辊和第二辊，第一辊和第二辊用于使集流体前进; 凹版辊，凹版辊被配置为涂覆活性材料层上的功能层; 厚度测量器，厚度测量器被配置为测量活性材料层的厚度和活性材料层和功能层的总厚度中的至少一个; 以及控制器，所述控制器与所述厚度测量器连通并且被配置为控制所述凹版辊的旋转速度。

公开(公告)号：US08899172B2

公开(公告)日：2014-12-02

申请号：US12722135

申请日：2010-03-11

Applicant: Koji Hashimoto

Inventor： Koji Hashimoto

IPC: B05C11/08 ,  B05B3/00 ,  H01L21/67 ,  B05C5/02 ,  B05C11/02 ,  B05C11/04

CPC classification number: B05B13/0228 ,  B05C5/0208 ,  B05C11/023 ,  B05C11/044 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/68792

Abstract: A substrate treatment apparatus includes: a substrate holding unit which horizontally holds a substrate; a substrate rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; a treatment liquid supplying unit which supplies a treatment liquid to an upper surface of the substrate held by the substrate holding unit; an opposing member to be located in opposed spaced relation to the upper surface of the substrate held by the substrate holding unit in contact with a film of the treatment liquid formed on the upper surface of the substrate so as to receive a lift force from the liquid film; a support member which supports the opposing member; and an opposing member holding mechanism which causes the support member to hold the opposing member in a vertically relatively movable manner.

Abstract translation: 基板处理装置包括：水平保持基板的基板保持单元; 基板旋转单元，其使由所述基板保持单元保持的所述基板绕垂直轴旋转; 处理液供给部，其将处理液供给到由所述基板保持单元保持的所述基板的上表面; 相对构件被定位成与由基板保持单元保持的基板的上表面相对的间隔开，与形成在基板的上表面上的处理液的膜接触，以便从液体接收提升力 电影; 支撑构件，其支撑相对构件; 以及相对构件保持机构，其使得支撑构件以相对于竖直方向相对移动的方式保持相对构件。