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    Niobium doped silica titania glass and method of preparation
    193.
    发明授权
    Niobium doped silica titania glass and method of preparation 有权
    掺铌二氧化硅玻璃及其制备方法

    公开(公告)号：US08987155B2

    公开(公告)日：2015-03-24

    申请号：US13973428

    申请日：2013-08-22

    Applicant: Corning Incorporated

    Inventor： Sezhian Annamalai ,  Steven Bruce Dawes ,  Kenneth Edward Hrdina

    IPC: C03C3/06 ,  C03C3/097 ,  C03C3/076 ,  C03C3/095 ,  C03C4/00 ,  C03B19/12

    CPC classification number: C03C3/097 ,  C03B19/12 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C3/095 ,  C03C4/0085 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/34 ,  C03C2203/42 ,  C03C2203/50

    Abstract: This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO2—TiO2—Nb2O5) glass, determined as the oxides, is Nb2O5 in an amount in the range of 0.005 wt. % to 1.2 wt. %, TiO2 in an amount in the range of 5 wt. % to 10 wt. %, and the remainder of glass is SiO2. In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600° C. to 1700° C. in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050° C., and then from 1050° C. to 700° C. followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace.

    Abstract translation: 本公开涉及二氧化硅 - 二氧化钛 - 铌玻璃和制造该玻璃的方法。 作为氧化物测定的二氧化硅 - 二氧化钛 - 氧化铌（SiO2-TiO2-Nb2O5）玻璃的组成为Nb2O5，其量为0.005重量％ ％〜1.2重量％ ％，TiO 2的量为5wt。 ％〜10重量％ ％，玻璃的其余部分为SiO2。 在该方法中，通过在流动氦中加热至1600℃至1700℃的温度6小时至10小时，将STN玻璃前体固结成玻璃。 当达到这个温度时，氦气流可以在一段时间内用氩气代替。 随后将玻璃冷却至约1050℃，然后冷却至1050℃至700℃，随后关闭炉，并以炉的自然冷却速率将玻璃冷却至室温。

    ULTRALOW EXPANSION GLASS
    194.
    发明申请
    ULTRALOW EXPANSION GLASS 有权
    超声膨胀玻璃

    公开(公告)号：US20150080206A1

    公开(公告)日：2015-03-19

    申请号：US14474427

    申请日：2014-09-02

    Applicant: Corning Incorporated

    Inventor： Carlos Alberto Duran

    IPC: C03B25/02 ,  C03C3/06

    CPC classification number: C03B25/00 ,  C03B25/02 ,  C03B25/08 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/00 ,  C03C2201/42 ,  Y02P40/57

    Abstract: Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

    Abstract translation: 在宽范围的零交叉温度下具有小的温度变化系数的二氧化硅 - 二氧化钛玻璃以及用于制造眼镜的方法。 该方法包括在两种不同温度方案下具有受控退火的冷却方案。 较高的温度控制退火可能在750°C-950°C的温度区间或其次间隔发生。 较低的温度控制退火可以在650℃-875℃或其子间隔的温度区间内进行。 受控退火允许独立控制二氧化硅 - 二氧化钛玻璃的CTE斜率和Tzc。 独立控制提供固体组合物的二氧化硅 - 二氧化钛玻璃的CTE斜率和Tzc值，迄今为止只能通过组成变化来实现。

    Titania-doped quartz glass and making method
    195.
    发明授权
    Titania-doped quartz glass and making method 有权
    二氧化钛掺杂石英玻璃及其制备方法

    公开(公告)号：US08820122B2

    公开(公告)日：2014-09-02

    申请号：US13223808

    申请日：2011-09-01

    Applicant: Shigeru Maida ,  Hisatoshi Otsuka ,  Osamu Sekizawa ,  Naoki Yanagisawa

    Inventor： Shigeru Maida ,  Hisatoshi Otsuka ,  Osamu Sekizawa ,  Naoki Yanagisawa

    IPC: C03B37/018

    CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/62 ,  C03B2207/64 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/42

    Abstract: A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip.

    Abstract translation: 通过将供氧反应气体和提供钛的反应气体与氢气和氧气一起通过燃烧器进行供给，使反应物气体进行氧化或火焰水解以形成合成物，制备适合作为EUV光刻元件的二氧化钛掺杂石英玻璃 二氧化硅 - 二氧化钛细颗粒，将颗粒沉积在旋转靶上，并同时熔化和玻璃化沉积的颗粒以生长掺杂二氧化钛的石英玻璃的锭。 目标被缩回，使得锭的生长前部可以与燃烧器尖端间隔至少250mm的距离。

    NIOBIUM DOPED SILICA TITANIA GLASS AND METHOD OF PREPARATION
    197.
    发明申请
    NIOBIUM DOPED SILICA TITANIA GLASS AND METHOD OF PREPARATION 有权
    铌酸钡硅酸盐玻璃及其制备方法

    公开(公告)号：US20140066286A1

    公开(公告)日：2014-03-06

    申请号：US13973428

    申请日：2013-08-22

    Applicant: CORNING INCORPORATED

    Inventor： Sezhian Annamalai ,  Steven Bruce Dawes ,  Kenneth Edward Hrdina

    IPC: C03C3/097 ,  C03B19/12 ,  C03C3/06

    CPC classification number: C03C3/097 ,  C03B19/12 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C3/095 ,  C03C4/0085 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/34 ,  C03C2203/42 ,  C03C2203/50

    Abstract: This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO2—TiO2—Nb2O5) glass, determined as the oxides, is Nb2O5 in an amount in the range of 0.005 wt. % to 1.2 wt. %, TiO2 in an amount in the range of 5 wt. % to 10 wt. %, and the remainder of glass is SiO2. In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600° C. to 1700° C. in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050° C., and then from 1050° C. to 700° C. followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace.

    Abstract translation: 本公开涉及二氧化硅 - 二氧化钛 - 铌玻璃和制造该玻璃的方法。 作为氧化物测定的二氧化硅 - 二氧化钛 - 氧化铌（SiO2-TiO2-Nb2O5）玻璃的组成为Nb2O5，其量为0.005重量％ ％〜1.2重量％ ％，TiO 2的量为5wt。 ％〜10重量％ ％，玻璃的其余部分为SiO2。 在该方法中，通过在流动氦中加热至1600℃至1700℃的温度6小时至10小时，将STN玻璃前体固结成玻璃。 当达到这个温度时，氦气流可以在一段时间内用氩气代替。 随后将玻璃冷却至约1050℃，然后冷却至1050℃至700℃，随后关闭炉，并以炉的自然冷却速率将玻璃冷却至室温。

    TITANIA AND SULFUR CO-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD
    198.
    发明申请
    TITANIA AND SULFUR CO-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD 有权
    TITANIA和SULFUR CODOPED QUARTZ玻璃会员和制作方法

    公开(公告)号：US20130149637A1

    公开(公告)日：2013-06-13

    申请号：US13761881

    申请日：2013-02-07

    Applicant: SHIN-ETSU CHEMICAL CO., LTD.

    Inventor： Shigeru MAIDA ,  Hisatoshi Otsuka

    IPC: G03F1/22

    CPC classification number: G03F1/22 ,  C03B19/1423 ,  C03B2201/20 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/20 ,  C03C2201/42 ,  Y02P40/57

    Abstract: A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A manufacturing method and an optical member for EUV lithography are also provided.

    Abstract translation: 提供二氧化钛和硫共掺杂石英玻璃构件。 由于二氧化钛和硫的共掺杂，石英玻璃构件在宽温度范围内在一定温度下经历零膨胀和低热膨胀，因此适用于商业EUV光刻工具。 还提供了用于EUV光刻的制造方法和光学构件。

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