公开(公告)号：US20050187092A1

公开(公告)日：2005-08-25

申请号：US11064341

申请日：2005-02-22

Applicant: Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

Inventor： Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C21/00 ,  C03C23/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3,and preferably less than about 2.0×1017 molecules/cm3.

Abstract translation: 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤， 特别是在经受100nm脉冲激光在约193nm下操作的激光诱导波前失真（在633nm处），介于约-1.0和1.0nm / cm之间，并且流量约为70μJ/ cm 2 。 本发明的合成石英玻璃光学材料包含小于约600ppm，优选小于200ppm的OH浓度水平和小于约5.0×10 17 H 2 O 2浓度水平， SUP>分子/ cm 3，优选小于约2.0×10 17分子/ cm 3。

公开(公告)号：US06904772B2

公开(公告)日：2005-06-14

申请号：US10023291

申请日：2001-12-14

Applicant: George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Dale R. Powers

Inventor： George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Dale R. Powers

IPC: C03B37/014 ,  C03C13/04 ,  C03C25/60 ,  G02B6/02 ,  C03B37/027

CPC classification number: C03C25/607 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/01486 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/31 ,  C03C3/06 ,  C03C13/045 ,  C03C13/047 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2203/54 ,  G02B6/02

Abstract: Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.

Abstract translation: 具有低水峰的光波导纤维以及光波导纤维预制件以及制造出低水峰值和/或低氢老化衰减光波导纤维的光波导纤维预制棒的方法，包括通过OVD制造的光波导纤维和预制棒。 纤维可以是耐氢性的，即表现出低氢老化衰减。 公开了一种低水峰，耐氢光波导纤维，其在约1383nm的波长处表现出光衰减，其小于或等于在约1310nm的波长处显示的光衰减。

公开(公告)号：US20050063656A1

公开(公告)日：2005-03-24

申请号：US10670013

申请日：2003-09-24

Applicant: Donald Jablonowski ,  David Kalish ,  Jinkee Kim ,  Robert Lingle

Inventor： Donald Jablonowski ,  David Kalish ,  Jinkee Kim ,  Robert Lingle

IPC: G02B6/00 ,  G02B6/02 ,  G02B6/036 ,  G02F1/35 ,  H04B10/17 ,  H04B10/18 ,  G02B6/22

CPC classification number: H04B10/2563 ,  C03B37/01211 ,  C03B2201/075 ,  C03B2203/22 ,  G02B6/02271 ,  G02B6/03611 ,  G02B6/03666 ,  H04B10/2916

Abstract: An improved optical fiber design has been found to exhibit a relatively low attenuation at the wavelength of 1385 nm (the “water peak”), allowing for Raman amplification to be efficient and effective at wavelengths in the S-band range of 1460 to 1530 nm. An ultra-dry process is used to mate an inner core rod (core plus surrounding trench) with a cladding tube (ring region plus cladding layers) and provide a water peak loss on the order of 0.325 dB/km. The low water peak is combined with appropriate dispersion values and zero dispersion wavelength to form a fiber that supports transmission and Raman amplification in the S-, C- and L-bands of interest for optical transmission systems.

Abstract translation: 已经发现改进的光纤设计在1385nm波长（“水峰”）处呈现相当低的衰减，允许拉曼放大在1460至1530nm的S波段范围内的波长下有效和有效 。 使用超干法将内芯棒（芯加周围沟槽）与包层管（环区加覆层）配合，并提供大约0.325 dB / km的水峰值损耗。 将低水峰与适当的色散值和零色散波长组合以形成支持光传输系统感兴趣的S，C和L波段中的透射和拉曼放大的光纤。

公开(公告)号：US06833949B2

公开(公告)日：2004-12-21

申请号：US10238099

申请日：2002-09-09

Applicant: Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

Inventor： Robert L. Maier ,  Lisa A. Moore ,  Charlene M. Smith

IPC: G02B1314

CPC classification number: C03C17/02 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03C3/06 ,  C03C17/3452 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/46 ,  G02B1/105 ,  G02B1/14 ,  G02B5/208 ,  G03F7/70958

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract translation: 本发明提供涂覆光学光刻元件和涂覆光学元件的方法，特别是用于使用不大于约193nm的真空紫外光（VUV）光刻波长的240nm以下的光学光刻系统的光学光刻元件，例如VUV投影光刻系统 利用193nm或157nm区域中的波长。 光学器件利用沉积的氟氧化硅膜操纵小于250nm的真空紫外光刻光。 沉积的氟氧化硅光学涂层有助于对入射光的操纵并保护底层的光学材料，层和表面。

公开(公告)号：US20040060327A1

公开(公告)日：2004-04-01

申请号：US10663475

申请日：2003-09-15

Inventor： George E Berkey ,  Dana C Bookbinder ,  Richard M Fiacco ,  Jeffrey T Kohli ,  Dale R Powers

IPC: C03B037/018

CPC classification number: C03C3/06 ,  C03B37/01446 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2203/22 ,  C03C13/047 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2203/54

Abstract: A method of forming an optical fiber preform that includes providing a consolidated glass preform, depositing a layer of silica soot onto the consolidated glass preform to form a composite preform having a consolidated glass portion and a silica soot portion, and exposing the composite preform to an atmosphere containing a concentration of a deuterium compound for a time and at a temperature sufficient to cause the deuterium compound to penetrate the consolidated glass portion without pervading the entire glass portion. Preferably, the deuterium compound penetrates the glass portion to a desired depth.

Abstract translation: 一种形成光纤预型件的方法，包括提供固结的玻璃预制件，在固结的玻璃预制件上沉积二氧化硅烟灰层以形成具有固结的玻璃部分和二氧化硅烟灰部分的复合预制件，并将复合预制件暴露于 含有浓度的氘化合物的气氛一段时间并且足以使氘化合物渗透固结的玻璃部分而不渗透整个玻璃部分的温度。 优选地，氘化合物将玻璃部分穿透到期望的深度。

公开(公告)号：US20030195107A1

公开(公告)日：2003-10-16

申请号：US10317068

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C010/16 ,  C03C003/112

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cmnull1 (I2250) to the scattering peak intensity of 800 cmnull1 (I800), i.e. I2250/I800, of at most 1null10null4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2null10null3 cmnull1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在含有氟的紫外线区域至真空紫外线区域的范围内的光照射而使用，该散射峰强度比例为2250cm <上标> -1 >（I <下标> 2250 ）到800 cm <上标> -1>（I <下标> 800 ）的散射峰强度，即I <下标> 2250 / I 在激光拉曼光谱中，最多为1×10 <上标> -4>的<下标> 800 ，其吸光系数为245nm，最多为2×10 <上标> -3> cm -1>。

公开(公告)号：US06550277B1

公开(公告)日：2003-04-22

申请号：US09709168

申请日：2000-11-10

Applicant: Bruno Uebbing ,  Jan Vydra

Inventor： Bruno Uebbing ,  Jan Vydra

IPC: C03B1906

CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C2201/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2203/40 ,  Y10S65/08 ,  Y10S65/16 ,  Y10S501/905

Abstract: The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850° C. to 1600° C. before the vitrification, the last stage comprising sintering at a temperature between 1300° C. and 1600° C. in an atmosphere containing hydrogen or oxygen, or a nonflammable mixture of these substances.

Abstract translation: 本发明涉及一种用于传输波长为250nm以下，特别是波长为157nm的紫外线的光学部件的石英玻璃体，以及用于制造石英玻璃体的方法，其中精细的石英 通过硅化合物的火焰水解形成玻璃颗粒，沉积并玻璃化。 由高碱性透射和耐辐射性表示的石英玻璃的适用性取决于由局部化学计量偏差引起的结构特性以及化学成分。 根据本发明的石英玻璃体的特征在于在155nm至250nm（辐射穿透深度为10mm）的波长范围内的均匀的基底透射率（基底透射率的相对变化<= 1％）为至少80％ 低OH含量（小于10ppm重量）和基本上不含氧缺陷中心的玻璃结构。 这种石英玻璃体是通过允许将氢气或氧气大量嵌入玻璃网络的方法来制造的，因为至少在两个阶段之间的热处理在850℃至1600℃之间的温度下进行 玻璃化，最后阶段包括在含有氢气或氧气的气氛中在1300℃和1600℃之间的温度下烧结，或这些物质的不可燃混合物。

公开(公告)号：US06502426B2

公开(公告)日：2003-01-07

申请号：US09997782

申请日：2001-11-28

Applicant: Lisa A. Moore ,  Charlene M. Smith

Inventor： Lisa A. Moore ,  Charlene M. Smith

IPC: C03B3200

CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  G03F1/60

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which contains doped O2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm contains intersticial O2 molecules which provide improved endurance to laser exposure. Preferably the O2 doped silicon oxyfluoride glass is characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2分子并且在真空紫外（VUV）波长区域中显示非常高的透射率和激光透射耐久性的“干式”氟氧化硅玻璃。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的氟氧化硅玻璃含有间隔的O 2分子，其提供了对激光曝光的改善的耐久性。 优选地，掺杂氧的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06477305B1

公开(公告)日：2002-11-05

申请号：US09547598

申请日：2000-04-11

Applicant: George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Cynthia B. Giroux ,  Daniel W. Hawtof ,  Dale R. Powers ,  V. Srikant

Inventor： George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Cynthia B. Giroux ,  Daniel W. Hawtof ,  Dale R. Powers ,  V. Srikant

IPC: G02B602

CPC classification number: C03B37/01486 ,  C03B37/0124 ,  C03B37/01446 ,  C03B37/01473 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/31 ,  C03C3/06 ,  C03C13/047 ,  C03C2201/22 ,  C03C2203/54 ,  G02B6/02

Abstract: A cylindrical glass body having a low water content centerline region and method of manufacturing such a cylindrical glass body for use in the manufacture of optical waveguide fiber is disclosed. The centerline region of the cylindrical glass body has a water content sufficiently low such that an optical waveguide fiber made from the cylindrical glass body of the present invention exhibits an optical attenuation of less than about 0.35 dB/km, and preferably less than about 0.31 dB/km at a measured wavelength of 1380 nm. A low water content plug used in the manufacture of such a cylindrical glass body, an optical waveguide fiber having a low water peak, and an optical fiber communication system incorporating such an optical waveguide fiber is also disclosed.

Abstract translation: 公开了一种具有低含水率中心线区域的圆柱形玻璃体及其制造用于制造光波导纤维的圆柱形玻璃体的方法。 圆柱形玻璃体的中心线区域的水含量足够低，使得由本发明的圆柱形玻璃体制成的光波导纤维的光衰减小于约0.35dB / km，优选小于约0.31dB / km，测量波长为1380 nm。 还公开了用于制造这种圆柱形玻璃体的低含水量塞子，具有低水峰的光波导纤维和包含这种光波导纤维的光纤通信系统。

公开(公告)号：US06376401B1

公开(公告)日：2002-04-23

申请号：US09387773

申请日：1999-09-01

Applicant: Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

Inventor： Shinichi Kondo ,  Takayuki Nakamura ,  Kazuhiko Fukuda ,  Naoyoshi Kamisugi ,  Nobu Kuzuu ,  Yoshinao Ihara ,  Hidetoshi Wakamatsu

IPC: C03B2000

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2203/44

Abstract: A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C. or less and a transmittance of 157 nm ultraviolet rays through a 10 mm optical path of 60% or more, and optically a OH group content of 1 to 70 ppm, a Cl content less than 1 ppm, a total content of impurity metals of 50 ppb or less, a content of each individual impurity metal less than 10 ppb, and an ultraviolet ray-transmittance at 172 to 200 nm of 40% or more even after the glass is exposed to an irradiation of ultraviolet rays at 160 to 300 nm for one hour.

Abstract translation: 对于真空紫外线具有高透射率的合成二氧化硅玻璃，例如波长为157nm的F2准分子激光束，高均匀性和高耐久性并且可用于紫外线透明光学玻璃材料由高纯度 硅化合物，例如四氯化硅，通过在不足够高的温度下热处理积聚的多孔二氧化硅材料，以在惰性气体气氛中将多孔二氧化硅材料转化为透明的石英玻璃足以使OH基团冷凝的时间 并且从玻璃中除去，并且基本上不含OH基团中的杂质含量，最高和最低虚构温度之间的差别为50℃或更低，通过10mm光路的157nm紫外线的透射率为60％或 更多地，光学地含有1至70ppm的OH基含量，小于1ppm的Cl含量，50ppb以下的杂质金属的总含量， 即使玻璃暴露于160〜300nm的紫外线照射1小时，每一种杂质金属小于10ppb，而在172〜200nm的紫外线透射率为40％以上。