Method of processing optical fiber

    公开(公告)号:US09919964B2

    公开(公告)日:2018-03-20

    申请号:US14791624

    申请日:2015-07-06

    Applicant: FUJIKURA LTD.

    Inventor: Hiroki Hamaguchi

    Abstract: A method of processing an optical fiber of the invention includes: a determination step of determining at least an ambient temperature of conditions of a diffusion treatment that causing an optical fiber to be subjected to an non-oxygen bridging atmosphere; an exposure step of exposing the optical fiber to a gas including an oxygen bridging element that is capable of processing the Non-Bridging Oxygen Hole Centers by being bonded to a non-bridging oxygen in the optical fiber, and causing the oxygen bridging element to infiltrate into the optical fiber; and a diffusion step of subsequently causing the optical fiber to be subjected to the non-oxygen bridging atmosphere in the exposure ambient temperature which is determined by the determination step and at which the optical fiber is subjected to the non-oxygen bridging atmosphere, and thereby diffusing the oxygen bridging element into the optical fiber.

    Optical fiber and method for manufacturing silica glass
    4.
    发明授权
    Optical fiber and method for manufacturing silica glass 有权
    光纤及石英玻璃制造方法

    公开(公告)号:US09025922B2

    公开(公告)日:2015-05-05

    申请号:US13403983

    申请日:2012-02-24

    Inventor: Hiroshi Oyamada

    CPC classification number: C03C25/607 C03C2201/21 C03C2201/22

    Abstract: A method for manufacturing deuterium-treated silica glass includes exposing silica glass to a deuterium-containing atmosphere for a predetermined period of time to diffuse deuterium molecules within the silica glass, maintaining the silica glass at 40° C. or higher, and cooling the silica glass to room temperature. The silica glass is a silica glass-based optical fiber having a core made of silica glass, where the core is positioned at a center of the optical fiber and contains at least germanium, and a clad made of silica glass, where the clad surrounds the core and has a lower refractive index than the core. A surface of the silica glass is covered with a resin coating.

    Abstract translation: 制备氘处理石英玻璃的方法包括将二氧化硅玻璃暴露于含氘气氛中一段预定的时间以将氘分子扩散到二氧化硅玻璃内,保持二氧化硅玻璃在40℃或更高,并冷却二氧化硅 玻璃到室温。 石英玻璃是具有由石英玻璃制成的芯的二氧化硅玻璃基光纤,其中芯位于光纤的中心并且至少包含锗,并且由石英玻璃制成的包层,其中包层围绕 并具有比芯更低的折射率。 石英玻璃的表面被树脂涂层覆盖。

    HIGH PURITY FUSED SILICA WITH LOW ABSOLUTE REFRACTIVE INDEX
    5.
    发明申请
    HIGH PURITY FUSED SILICA WITH LOW ABSOLUTE REFRACTIVE INDEX 有权
    具有低绝对折射率的高纯度二氧化硅

    公开(公告)号:US20100162759A1

    公开(公告)日:2010-07-01

    申请号:US12644563

    申请日:2009-12-22

    Abstract: A fused silica glass article having a low absolute refractive index and low concentrations of hydroxyl groups, halogens, and metal having a low absolute refractive index. The glass article contains less than about 10 ppm protium-containing and deuterium-containing hydroxyl groups by weight and less than about 20 ppm halogens by weight. The silica glass article also has an absolute refractive index (ARI) less than or equal to 1.560820. In one embodiment, the ARI of the fused silica article is achieved by lowering the fictive temperature of the fused silica. A method of lowering the fictive temperature is also described.

    Abstract translation: 具有低绝对折射率和低浓度羟基,卤素和具有低绝对折射率的金属的熔融石英玻璃制品。 玻璃制品含有重量少于约10ppm含氘羟基和重量小于约20ppm的卤素。 石英玻璃制品的绝对折射率(ARI)也小于或等于1.560820。 在一个实施方案中,熔融二氧化硅制品的ARI通过降低熔融二氧化硅的假想温度来实现。 还描述了降低虚构温度的方法。

    Treatment method for optical fiber
    6.
    发明授权
    Treatment method for optical fiber 有权
    光纤的处理方法

    公开(公告)号:US07596292B2

    公开(公告)日:2009-09-29

    申请号:US11289335

    申请日:2005-11-30

    CPC classification number: C03C25/607 C03C3/06 C03C2201/22 C03C2203/54 G02B6/02

    Abstract: A treatment method for an optical fiber including accommodating an optical fiber inside a treatment chamber; introducing a deuterium containing gas into the treatment chamber; and in a deuterium treatment step, exposing the optical fiber to atmosphere of the deuterium containing gas. In the deuterium treatment step, a deuterium concentration D in the treatment chamber during the deuterium treatment is calculated from an initial value A of a deuterium concentration in the deuterium containing gas inside the treatment chamber, a concentration B of oxygen in an ambient atmosphere of the treatment chamber, and a concentration C of oxygen in the deuterium containing gas inside the treatment chamber, and the deuterium concentration in the treatment chamber is controlled based on the deuterium concentration D calculated. Other gases such as hydrogen containing gas or nitrogen containing gas may also be used according to the invention.

    Abstract translation: 一种光纤的处理方法,包括在处理室内容纳光纤; 将含氘气体引入处理室中; 并且在氘处理步骤中,将光纤暴露于含氘气体的气氛中。 在氘处理工序中,从处理室内的含氘气体中的氘浓度的初始值A计算氘处理时的处理室中的氘浓度D,在室温下的氧气浓度B 处理室内的含氘气体中的氧浓度C和处理室中的氘浓度基于计算出的氘浓度D进行控制。 根据本发明,也可以使用其它气体,例如含氢气体或含氮气体。

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