公开(公告)号：US20150009504A1

公开(公告)日：2015-01-08

申请号：US14494981

申请日：2014-09-24

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Moshe FINAROV ,  Boaz BRILL

IPC: H01L21/66 ,  G01J3/45 ,  G01B9/02

CPC classification number: G01B11/24 ,  G01B9/02087 ,  G01J3/45 ,  G01N21/21 ,  H01L22/12 ,  H01L22/20

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure

Abstract translation: 提出了一种用于确定图案化结构中的线轮廓的方法和系统，其目的在于控制该结构的制造过程。 图案化结构包括多个不同的层，结构中的图案由图案化区域和未图案化区域形成。 进行至少第一次和第二次测量，每次利用具有在一定入射角度指向结构的入射光的宽波长带的结构照明，检测从该结构返回的光的光谱特性，以及产生测量 数据代表。 分析通过第一测量获得的测量数据，从而确定结构的至少一个参数。 然后，利用该确定的参数，同时分析通过第二测量获得的测量数据，使得能够确定结构的轮廓

公开(公告)号：US08643842B2

公开(公告)日：2014-02-04

申请号：US13652513

申请日：2012-10-16

Applicant: Nova Measuring Instruments Ltd.

Inventor： Yoel Cohen ,  Boaz Brill

IPC: G01B11/06 ,  G01J4/00 ,  G01N21/84

CPC classification number: G01N21/9501 ,  G01B11/0625 ,  G01B11/24 ,  G06F15/00

Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

Abstract translation: 提供了一种用于表征具有包括多个不同周期图案的位置的结构的物品的性质的方法和系统，其中方法包括提供指示由几何和材料参数限定的不同叠层的光学性质的预测的理论模型 所述位置在几何参数和材料参数中的至少一个中是常见的; 对物品的至少两个不同堆叠执行光学测量，并产生指示每个所测量的叠层的几何参数和材料组成参数的光学测量数据; 处理所述光学测量数据，所述处理包括同时将所述多个测量堆叠的所述光学测量数据与所述理论模型拟合并提取所述至少一个公共参数，从而能够表征单个物品内的多层结构的属性。

公开(公告)号：US20030169423A1

公开(公告)日：2003-09-11

申请号：US10303052

申请日：2002-11-25

Applicant: Nova Measuring Instruments Ltd.

Inventor： Moshe Finarov ,  David Scheiner

IPC: G01B011/00

CPC classification number: G03F7/70633

Abstract: An optical measurement method and system are presented for imaging two target structures in two parallel layers, respectively, of a sample, to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer. The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement, and the collected radiation response is split into two spatially separated radiation components. The split radiation components are directed towards at least one imaging plane along different optical channels characterized by optical paths of different lengths, respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures. This enables determination of the relative distance between the two target structures.

Abstract translation: 提出了一种光学测量方法和系统，用于分别对样本的两个平行层中的两个目标结构进行成像，以便能够沿着该层的两个相互垂直的轴确定两个目标结构之间的配准。 用入射辐射照射样品以产生样品的辐射响应。 辐射响应由物镜布置收集，并且收集的辐射响应被分成两个空间上分离的辐射分量。 分裂的辐射分量被引导到沿着不同长度的光路的不同光通道的至少一个成像平面。 在所述至少一个成像平面中检测到两个分离的辐射分量，从而获得两个图像部分，每个图像部分包含两个目标结构的图像。 这使得能够确定两个目标结构之间的相对距离。

公开(公告)号：US20020171828A1

公开(公告)日：2002-11-21

申请号：US10184953

申请日：2002-07-01

Applicant: Nova Measuring Instruments Ltd.

Inventor： Yoel Cohen ,  Moshe Finarov

IPC: G01J003/28

CPC classification number: G03F7/70558

Abstract: A method and measuring tool are presented for automatic control of photoresist-based processing of a workpiece progressing through a processing tool arrangement. Spectrophotometric measurements are applied to the workpiece prior to being processed, spectral characteristics of the workpiece are measured, thereby obtaining measured data indicative of at least one parameter of the workpiece that defines an optimal value of at least processing time parameter of the processing tool to be used in the processing of said workpiece to obtain certain process results. This data is analyzed to determine data indicative of the optimal value of said at least processing time parameter, and thereby enable calculation of a correction value to be applied to said processing time parameter prior to applying the processing tool to the workpiece.

Abstract translation: 提出了一种方法和测量工具，用于自动控制通过加工工具布置进行的工件的基于光致抗蚀剂的处理。 在处理之前将分光光度测量值应用于工件，测量工件的光谱特性，从而获得指示工件的至少一个参数的测量数据，其将处理工具的至少处理时间参数的最佳值定义为 用于处理所述工件以获得一定的工艺结果。 分析该数据以确定指示所述至少处理时间参数的最佳值的数据，从而能够在将加工工具应用于工件之前计算要应用于所述处理时间参数的校正值。

公开(公告)号：US20020090744A1

公开(公告)日：2002-07-11

申请号：US10005118

申请日：2001-12-07

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boaz Brill ,  Moshe Finarov

IPC: H01L021/00

CPC classification number: H01J37/28 ,  G01B15/00 ,  G01N21/47 ,  G01N21/956 ,  G01N23/225 ,  G03F7/70625 ,  H01J2237/2817

Abstract: A measurement method and system are presented for measuring parameters of a patterned structure. Scatterometry and SEM measurements are applied to the structure, measured data indicative of, respectively, the structure parameters and lateral pattern dimensions of the structure are generated. The entire measured data are analyzed so as to enable using measurement results of either one of the scatterometry and SEM measurements for optimizing the other measurement results.

Abstract translation: 提出了一种用于测量图案结构参数的测量方法和系统。 散射测量和SEM测量应用于结构，产生分别表示结构参数和结构的横向图形尺寸的测量数据。 分析整个测量数据，以便能够使用散射测量和SEM测量中的任一个的测量结果来优化其他测量结果。

公开(公告)号：US20020072003A1

公开(公告)日：2002-06-13

申请号：US09984640

申请日：2001-10-30

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boaz Brill ,  Yoel Cohen

IPC: G03F007/00 ,  G03F007/20 ,  G06F019/00 ,  G06F017/50

CPC classification number: G03F7/70491 ,  G03F7/705 ,  G03F7/70616 ,  H01L22/20

Abstract: A method is presented for controlling a process to be applied to a patterned structure in a production run. Reference data is provided being representative of diffraction signatures corresponding to a group of different fields in a structure similar to the patterned structure in the production line, and of a control window for the process parameters corresponding to a signature representative of desired process results. The group of different fields is characterized by different process parameters used in the manufacture of these fields. The method utilizes an expert system trained to be responsive to input data representative of a diffraction signature to provide output data representative of corresponding effective parameters of the process. Optical measurements are applied to different sites on the patterned structure in the production line to obtain diffraction signatures of thereof and generate corresponding measured data. The expert system analyses the measured data to determine effective parameters of the process applied to the patterned structure in the production line. The effective process parameters can then be analyzed to determine deviation thereof from corresponding nominal values, to thereby enable the process control.

Abstract translation: 提出了一种用于控制在生产运行中应用于图案化结构的工艺的方法。 提供了参考数据，其代表对应于类似于生产线中的图案化结构的结构中的一组不同场的衍射特征，以及对应于代表期望过程结果的签名的处理参数的控制窗口。 不同领域的组合的特征在于用于制造这些领域的不同工艺参数。 该方法利用受过训练的专家系统来响应代表衍射特征的输入数据，以提供代表该过程的相应有效参数的输出数据。 将光学测量应用于生产线上图案化结构上的不同位置，以获得其衍射特征并产生相应的测量数据。 专家系统分析测量数据，以确定应用于生产线上图案化结构的工艺的有效参数。 然后可以分析有效的工艺参数以确定其与相应的标称值的偏差，从而使得能够进行过程控制。

公开(公告)号：US20020033450A1

公开(公告)日：2002-03-21

申请号：US09942968

申请日：2001-08-31

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Moshe Finarov ,  Yoel Cohen

IPC: G21K007/00 ,  G01N023/00

CPC classification number: G01N21/956

Abstract: A method and system are presented for inspecting a structure containing a pattern in the form of a surface relief fabricated by a pattern-creating tool applied to the structure. Reference data is provided being indicative of photometric intensities of light components of different wavelengths returned from a structure having a pattern similar to the pattern of the structure under inspection. Spectrophotometric measurements are continuously applied to successive locations within the surface relief on the structure so as to form a measurement slice thereon. Measured data in the form of a spectrum indicative of photometric intensities of light components of different wavelengths returned from the successive locations within the slice is detected and analyzed to determine whether it correlates with the reference data in accordance with predetermined criteria results.

Abstract translation: 提出了一种方法和系统，用于检查包含由应用于结构的图案生成工具制成的表面浮雕形式的结构。 提供了参考数据，其指示从具有与被检查结构的图案类似的图案的结构返回的不同波长的光分量的光度强度。 分光光度测量连续地施加到结构上的表面浮雕内的连续位置，以便在其上形成测量切片。 检测并分析表示从切片内的连续位置返回的不同波长的光成分的光度强度的光谱的测量数据，以根据预定的标准结果来确定它是否与参考数据相关。

公开(公告)号：US20010015811A1

公开(公告)日：2001-08-23

申请号：US09789276

申请日：2001-02-20

Applicant: Nova Measuring Instruments Ltd.

Inventor： Avi Ravid ,  Vladimir Machavariani ,  Amit Weingarten ,  David Scheiner

IPC: G01B011/30

CPC classification number: B24B37/013 ,  B24B37/042 ,  B24B49/12 ,  B24B49/14 ,  H01L21/3212 ,  H01L22/34

Abstract: A test structure is presented to be formed on a patterned structure and to be used for controlling a CMP process applied to the patterned structure, which has a pattern area formed by spaced-apart metal-containing regions representative of real features of the patterned structure. The test structure thus undergoes the same CMP processing as the pattern area. The test structure comprises at least one pattern zone in the form of a metal area with at least one region included in the metal area and made of a material relatively transparent with respect to incident light, as compared to that of the metal.

Abstract translation: 呈现在图案化结构上形成的测试结构，并且用于控制施加到图案化结构的CMP工艺，其具有由表示图案化结构的实际特征的间隔开的含金属区域形成的图案区域。 因此，测试结构经历与图案区域相同的CMP处理。 测试结构包括金属区域形式的至少一个图案区域，其中至少一个区域包括在金属区域中并且由与金属相比相对于入射光相对透明的材料制成。

公开(公告)号：US20230131932A1

公开(公告)日：2023-04-27

申请号：US17904872

申请日：2021-02-23

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Dexin KONG ,  DANIEL SCHMIDT ,  Aron J. CEPLER ,  Marjorie CHENG ,  Roy KORET ,  Igor TUROVETS

IPC: G06N20/00 ,  G01J3/28

Abstract: A method, a system, and a non-transitory computer readable medium for measuring a local critical dimension uniformity of an array of two-dimensional structural elements, the method may include obtaining an acquired optical spectrometry spectrum of the array; feeding the acquired optical spectrometry spectrum of the array to a trained machine learning process, wherein the trained machine learning process is trained to map an optical spectrometry spectrum to an average critical dimension (CD) and a local critical dimension uniformity (LCDU); and outputting, by the trained machine learning process, the average CD and the LCDU of the array.

公开(公告)号：US20210364451A1

公开(公告)日：2021-11-25

申请号：US17303723

申请日：2021-06-06

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad BARAK ,  Danny GROSSMAN ,  Dror SHAFIR ,  Yoav BERLATZKY ,  Yanir HAINICK

IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.