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    MEASUREMENT SYSTEM AND A METHOD OF DIFFRACTING LIGHT
    22.
    发明申请
    MEASUREMENT SYSTEM AND A METHOD OF DIFFRACTING LIGHT 审中-公开

    公开(公告)号：US20200309598A1

    公开(公告)日：2020-10-01

    申请号：US16539930

    申请日：2019-08-13

    Applicant: Applied Materials, Inc.

    Inventor： Jinxin FU ,  Yifei WANG ,  Ian MCMACKIN ,  Rutger MEYER TIMMERMAN THIJSSEN ,  Ludovic GODET

    IPC: G01J3/18 ,  G01J3/02 ,  G02B7/04

    Abstract: Embodiments of the present disclosure relate to measurement systems and methods for diffracting light. The measurement system includes a stage, an optical arm, and one or more detector arms. The method of diffracting light includes a method of diffracting light is provided, including projecting light beams having wavelength λlaser to a first zone of a first substrate at the fixed beam angle θ0 and the maximum orientation angle ϕmax, obtaining a displacement angle Δθ, determining a target maximum beam angle θt-max, wherein θt-max=θ0=Δθ, and determining a test grating pitch Pt-grating by a modified grating pitch equation Pt-grating=λlaser/(sin θ0). The measurement system and method allow for measurement of nonuniform properties of regions of an optical device, such as grating pitches and grating orientations.

    GAP FILL OF IMPRINTED STRUCTURE WITH SPIN COATED HIGH REFRACTIVE INDEX MATERIAL FOR OPTICAL COMPONENTS
    24.
    发明申请
    GAP FILL OF IMPRINTED STRUCTURE WITH SPIN COATED HIGH REFRACTIVE INDEX MATERIAL FOR OPTICAL COMPONENTS 审中-公开

    公开(公告)号：US20200003936A1

    公开(公告)日：2020-01-02

    申请号：US16120733

    申请日：2018-09-04

    Applicant: Applied Materials, Inc.

    Inventor： Jinxin FU ,  Ludovic GODET ,  Wayne MCMILLAN

    IPC: G02B5/18 ,  G03F7/00

    Abstract: Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer.

    WETTING LAYERS FOR OPTICAL DEVICE ENHANCEMENT
    25.
    发明申请
    WETTING LAYERS FOR OPTICAL DEVICE ENHANCEMENT 审中-公开

    公开(公告)号：US20190232586A1

    公开(公告)日：2019-08-01

    申请号：US16253661

    申请日：2019-01-22

    Applicant: Applied Materials, Inc.

    Inventor： Karl J. ARMSTRONG ,  Jinxin FU ,  Wilson BANEZ

    IPC: B29D11/00

    CPC classification number: B29D11/00788 ,  B29D11/00211 ,  B29D11/00865

    Abstract: Embodiments described herein relate to methods and materials for optical device fabrication. In one embodiment, a method of fabricating an optical device is provided. The method includes depositing a dielectric film on a substrate, depositing a wetting layer on the dielectric film, and depositing a metal containing film on the wetting layer. In another embodiment, an optical device is provided. The device includes a substrate, a dielectric film deposited on and contacting the substrate, a wetting layer deposited on and contacting the dielectric film, and a metal containing film deposited on and contacting the wetting layer.

    CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION
    26.
    发明申请
    CONOSCOPIC WAFER ORIENTATION FOR ION IMPLANTATION 有权

    公开(公告)号：US20250095958A1

    公开(公告)日：2025-03-20

    申请号：US18794582

    申请日：2024-08-05

    Applicant: Applied Materials, Inc.

    Inventor： Frank SINCLAIR ,  Timothy THOMAS ,  Jinxin FU ,  Micha NIXON

    IPC: H01J37/304 ,  H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/317

    Abstract: An ion implanter may include an ion source to generate an ion beam. The ion implanter may include a set of beamline components to direct the ion beam to a substrate along a beam axis, as well as a process chamber to house the substrate to receive the ion beam. The ion implanter may include a conoscopy system, comprising: an illumination source to direct light to a substrate position; a first polarizer, having a first polarization axis, disposed between the illumination source and the substrate position; a second polarizer, the second polarizer being disposed to receive the light after passing through the substrate position. The conoscopy system may include a lens, to receive the light after passing through the substrate position, and a detector, to detect the light after passing through the lens.

    LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE
    27.
    发明公开
    LITHOGRAPHY METHOD TO FORM STRUCTURES WITH SLANTED ANGLE 审中-公开

    公开(公告)号：US20230408913A1

    公开(公告)日：2023-12-21

    申请号：US18241705

    申请日：2023-09-01

    Applicant: Applied Materials, Inc.

    Inventor： Yongan XU ,  Jinxin FU ,  Jhenghan YANG ,  Ludovic GODET

    IPC: G03F7/00 ,  G02B6/136 ,  G02B6/122

    CPC classification number: G03F7/0007 ,  G02B6/136 ,  G02B6/122

    Abstract: The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates. A first process of forming the nanostructures comprises depositing a first layer of a first material on a glass substrate, forming one or more trenches in the first layer, and depositing a second layer of a second material in the one or more holes to trenches a first alternating layer of alternating first portions of the first material and second portions of the second material. The first process is repeated one or more times to form additional alternating layers over the first alternating layer. Each first portion of each alternating layer is disposed in contact with and offset a distance from an adjacent first portion in adjacent alternating layers. A second process comprises removing either the first or the second portions from each alternating layer to form the plurality of nanostructures.

    HIGH-PRECISION AND HIGH-THROUGHPUT MEASUREMENT OF PERCENTAGE LIGHT LOSS OF OPTICAL DEVICES
    30.
    发明公开
    HIGH-PRECISION AND HIGH-THROUGHPUT MEASUREMENT OF PERCENTAGE LIGHT LOSS OF OPTICAL DEVICES 审中-公开

    公开(公告)号：US20230251161A1

    公开(公告)日：2023-08-10

    申请号：US18163766

    申请日：2023-02-02

    Applicant: Applied Materials, Inc.

    Inventor： Baochen WU ,  Yangyang SUN ,  Ravi KOMANDURI ,  Jinxin FU ,  Ludovic GODET

    IPC: G01M11/02

    CPC classification number: G01M11/0207

    Abstract: Embodiments described herein relate to an optical device metrology system including a light source to emit a light and a non-polarizing beam splitter to split the light into a first photodetector light path and an optical light path. A first photodetector is disposed in the first photodetector light path and measures a total power of the light. The optical device substrate is disposed in the optical light path and splits the light into a second and a third photodetector light path. A second photodetector is disposed in the second photodetector light path from the optical device substrate. The second photodetector measures a reflected power of the light. A third photodetector is disposed in the third photodetector light path. The third photodetector measures a transmitted power of the light. The controller receives measurements from the first, second, and third photodetectors to calculate a percentage light loss within the optical device substrate.

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