公开(公告)号：US20180247831A1

公开(公告)日：2018-08-30

申请号：US15758436

申请日：2016-07-22

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Richard C. Svrluga

IPC: H01L21/3213 ,  H01L21/02 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/308 ,  H01L21/311 ,  C03C15/02

CPC classification number: H01L21/32134 ,  C03C15/00 ,  C03C15/025 ,  H01J2237/061 ,  H01J2237/0812 ,  H01L21/02115 ,  H01L21/02167 ,  H01L21/02227 ,  H01L21/02238 ,  H01L21/02252 ,  H01L21/02274 ,  H01L21/02326 ,  H01L21/0234 ,  H01L21/26566 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/3105 ,  H01L21/31105 ,  H01L21/31111 ,  H01L21/31116

Abstract: A method for shallow etching a substrate surface forms a shallow modified substrate layer overlying unmodified substrate using an accelerated neutral beam and etches the modified layer, stopping at the unmodified substrate beneath, producing controlled shallow etched substrate surfaces.

公开(公告)号：US20180211813A1

公开(公告)日：2018-07-26

申请号：US15933121

申请日：2018-03-22

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Richard C. Svrluga

IPC: H01J37/05 ,  H05H3/02 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  A61F2/82 ,  A61F2/90 ,  A61F2240/001 ,  A61F2250/0068 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A medical device for surgical implantation adapted to serve as a drug delivery system has one or more drug loaded holes with barrier layers to control release or elution of the drug from the holes or to control inward diffusion of fluids into the holes. The barrier layers are non-polymers and are formed from the drug material itself by beam processing. The holes may be in patterns to spatially control drug delivery. Flexible options permit combinations of drugs, variable drug dose per hole, multiple drugs per hole, temporal control of drug release sequence and profile. Methods for forming such a drug delivery system are also disclosed. Gas cluster ion beam and/or accelerated Neutral Beam derived from an accelerated gas cluster ion beam may be employed.

公开(公告)号：US20150213996A1

公开(公告)日：2015-07-30

申请号：US14496412

申请日：2014-09-25

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: H01J37/05 ,  H01J37/317

CPC classification number: G03F1/80 ,  B24B37/04 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31111 ,  H01L29/36 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.

Abstract translation: 其装置，方法和产品提供从用于加工材料的加速气体簇离子束衍生的加速中性束。

公开(公告)号：US11735432B2

公开(公告)日：2023-08-22

申请号：US17225272

申请日：2021-04-08

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Kiet A. Chau ,  Thy Yam ,  Michael J. Walsh

IPC: H01L21/311 ,  C03C15/02 ,  H01L21/306 ,  H01L21/3213 ,  H01L21/02 ,  H01L21/3065 ,  H01L21/3105 ,  C03C15/00 ,  H01L21/265 ,  H01L21/308

CPC classification number: H01L21/32134 ,  C03C15/00 ,  C03C15/025 ,  H01L21/0234 ,  H01L21/02115 ,  H01L21/02167 ,  H01L21/02227 ,  H01L21/02238 ,  H01L21/02252 ,  H01L21/02274 ,  H01L21/02326 ,  H01L21/26566 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/30604 ,  H01L21/3105 ,  H01L21/31105 ,  H01L21/31111 ,  H01L21/31116 ,  H01J2237/061 ,  H01J2237/0812

Abstract: A method for removing amorphous regions from a surface of a crystal substrate uses an accelerated neutral beam including reactive gas species for removing or reactively modifying material surfaces without sputtering. Accelerated neutral atom beam enabled surface reactions remove surface contaminants from substrate surfaces to create an interface region with exposed crystal lattice in preparation for next phase processing.

公开(公告)号：US20210405523A1

公开(公告)日：2021-12-30

申请号：US17222467

申请日：2021-04-05

Applicant: Exogenesis Corporation

Inventor： Joseph Khoury ,  Sean R. Kirkpatrick ,  Michael J. Walsh ,  James G. Bachand ,  Allen R. Kirkpatrick ,  Thomas J. Webster

IPC: G03F1/80 ,  H05H3/02 ,  H01J37/317 ,  H01L21/02 ,  H01L21/265 ,  H01L21/311 ,  H01J37/05 ,  H01J37/147 ,  G03F1/82

Abstract: A device such as a medical device and a method for making same provides a device surfaces modified by beam irradiation, such as a gas cluster ion beams or a neutral beam, to inhibit or delay attachment or activation or clotting of platelets or to match surface energy of the device to that of a protein with the property of inhibition of bacterial colonization that can coat the all or part of the device surface to effect such inhibition.

公开(公告)号：US20210225661A1

公开(公告)日：2021-07-22

申请号：US17225272

申请日：2021-04-08

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Kiet A. Chau ,  Thy Yam ,  Michael J. Walsh

IPC: H01L21/3213 ,  H01L21/02 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/311 ,  H01L21/3105 ,  C03C15/00 ,  H01L21/265 ,  H01L21/308 ,  C03C15/02

Abstract: A method for removing amorphous regions from a surface of a crystal substrate uses an accelerated neutral beam including reactive gas species for removing or reactively modifying material surfaces without sputtering. Accelerated neutral atom beam enabled surface reactions remove surface contaminants from substrate surfaces to create an interface region with exposed crystal lattice in preparation for next phase processing.

公开(公告)号：US10825685B2

公开(公告)日：2020-11-03

申请号：US16246634

申请日：2019-01-14

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

IPC: H01J37/05 ,  H01L21/02 ,  H01L21/265 ,  H01L21/311 ,  H01L21/321 ,  C03C23/00 ,  H01J37/08 ,  H01J37/317 ,  H01J37/147 ,  H01L29/167 ,  H01L29/36 ,  H01L21/324

Abstract: A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.

公开(公告)号：US10556042B2

公开(公告)日：2020-02-11

申请号：US15624381

申请日：2017-06-15

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Richard C. Svrluga ,  Stephen M. Blinn

IPC: A61L31/16 ,  B05D1/02 ,  B05D3/06

Abstract: A method of modifying the surface of a medical device to release a drug in a controlled way by providing a barrier layer on the surface of one or more drug coatings. The barrier layer consists of modified drug material converted to a barrier layer by irradiation by an accelerated neutral beam derived from an accelerated gas cluster ion beam. Also medical devices formed thereby.

公开(公告)号：US20190279872A1

公开(公告)日：2019-09-12

申请号：US16246634

申请日：2019-01-14

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh ,  Richard C. Svrluga

IPC: H01L21/265 ,  H01L29/167 ,  H01J37/05 ,  H01L21/02 ,  H01L21/311 ,  H01L21/321 ,  C03C23/00 ,  H01J37/08 ,  H01J37/317 ,  H01J37/147

Abstract: A method for treating a silicon substrate, and a silicon substrate, provide a surface treated with an accelerated neutral beam.

公开(公告)号：US10409155B2

公开(公告)日：2019-09-10

申请号：US14496412

申请日：2014-09-25

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick

IPC: H01J37/05 ,  G03F1/80 ,  H01J37/317 ,  H01J37/147 ,  H05H3/02 ,  G03F1/82 ,  H01L21/02 ,  H01L21/265 ,  H01L21/311 ,  B24B37/04 ,  H01L29/36

Abstract: An apparatus, method and products thereof provide an accelerated neutral beam derived from an accelerated gas cluster ion beam for processing materials.