公开(公告)号：US20180373021A1

公开(公告)日：2018-12-27

申请号：US16065856

申请日：2017-05-01

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Takashi KASAHARA ,  Katsumi SHIBAYAMA ,  Masaki HIROSE ,  Toshimitsu KAWAI ,  Hiroki OYAMA ,  Yumi KURAMOTO

IPC: G02B26/00 ,  G01J3/26 ,  G02B5/28 ,  G01J3/02 ,  B23K26/064 ,  B81B3/00 ,  B81C1/00

Abstract: A method of manufacturing a Fabry-Perot interference filter includes a forming step of forming a first thinned region, a first mirror layer, a sacrificial layer, and a second mirror layer are formed on a first main surface of a wafer, and the first thinned region in which at least one of the first mirror layer, the sacrificial layer, and the second mirror layer is partially thinned along each of a plurality of lines is formed; a cutting step of cutting the wafer into a plurality of substrates along each of the plurality of lines by forming a modified region within the wafer along each of the plurality of lines through irradiation of a laser light, after the forming step; and a removing step of removing a portion from the sacrificial layer through etching, between the forming step and the cutting step or after the cutting step.