SYSTEM AND METHOD FOR DETERMINING PARAMETERS OF PATTERNED STRUCTURES FROM OPTICAL DATA

    公开(公告)号:US20250067683A1

    公开(公告)日:2025-02-27

    申请号:US18845415

    申请日:2023-03-09

    Applicant: NOVA LTD.

    Abstract: A control system and method are presented for use in optical measurements on patterned samples. The control system comprises a computer system configured for data communication with a measured data provider and comprising a data processor configured and operable to receive and process raw measured data of first and second types concurrently collected from the patterned sample being measured. said first and second types of the measured data comprising, respectively. scatterometry measured data. characterized by first relatively high signal-to-noise and predetermined first relatively low spatial resolution, and interferometric measured data characterized by second relatively low signal-to-noise and predetermined second relatively high spatial resolution, said data processor being configured to process the measured data to determine pattern parameters along said patterned sample characterized by said first signal to-noise and said second spatial resolution.

    Accurate Raman spectroscopy
    22.
    发明授权

    公开(公告)号:US12152993B2

    公开(公告)日:2024-11-26

    申请号:US18245161

    申请日:2021-09-14

    Applicant: NOVA LTD.

    Abstract: A method, a system, and a non-transitory computer readable medium for Raman spectroscopy. The method may include determining first acquisition parameters of a Raman spectroscope to provide a first acquisition set-up, the determining is based on at least one expected radiation pattern to be detected by a sensor of the Raman spectroscope as a result of an illumination of a first area of a sample, the first area comprises a first nano-scale structure, wherein at least a part of the at least one expected radiation pattern is indicative of at least one property of interest of the first nano-scale structure of the sample; wherein the first acquisition parameters belong to a group of acquisition parameters; setting the Raman spectroscope according to the first acquisition set-up; and acquiring at least one first Raman spectrum of the first nano-scale structure of the sample, while being set according to the first acquisition set-up.

    Optical phase measurement system and method

    公开(公告)号:US11946875B2

    公开(公告)日:2024-04-02

    申请号:US17935930

    申请日:2022-09-27

    Applicant: NOVA LTD.

    Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

    Optical metrology system and method

    公开(公告)号:US11868054B2

    公开(公告)日:2024-01-09

    申请号:US17904950

    申请日:2021-02-24

    Applicant: NOVA LTD.

    CPC classification number: G03F7/70625 G01B9/02044

    Abstract: A measurement system is provided for use in optical metrology measurements. The measurement system comprises a control system which processes raw measured data indicative of spectral interferometric signals measured on a sample in response to illuminating electromagnetic field incident onto a top portion of the sample and comprising at least one spectral range to which said sample is substantially not absorbing. The processing comprises: extracting, from the raw measured data, a portion of spectral interferometric signals describing signal intensity variation with change of optical path difference during interferometric measurements, the extracted signal portion being independent of interferometric signals returned from a bottom portion of the sample in response to said illuminating electromagnetic field; and directly determining, from said extracted portion, both spectral amplitude and phase of reflection of the electromagnetic field from the top portion of the sample, thereby determining measured spectral signature characterizing the top portion of the sample.

    Test structure design for metrology measurements in patterned samples

    公开(公告)号:US11639901B2

    公开(公告)日:2023-05-02

    申请号:US17498013

    申请日:2021-10-11

    Applicant: NOVA LTD

    Abstract: A test structure for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis, the test structure having a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some of those features of the main pattern, parameters of which are to be controlled during metrology measurements.

    Optical technique for material characterization

    公开(公告)号:US11543294B2

    公开(公告)日:2023-01-03

    申请号:US17263147

    申请日:2019-07-25

    Applicant: NOVA LTD.

    Abstract: A polarized Raman Spectrometric system for defining parameters of a polycrystaline material, the system comprises a polarized Raman Spectrometric apparatus, a computer-controlled sample stage for positioning a sample at different locations, and a computer comprising a processor and an associated memory. The polarized Raman Spectrometric apparatus generates signal(s) from either small sized spots at multiple locations on a sample or from an elongated line-shaped points on the sample, and the processor analyzes the signal(s) to define the parameters of said polycrystalline material.

    Optical phase measurement system and method

    公开(公告)号:US11460415B2

    公开(公告)日:2022-10-04

    申请号:US16882784

    申请日:2020-05-26

    Applicant: NOVA LTD.

    Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

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