PROCESSES AND APPARATUS FOR CLEANING, RINSING, AND DRYING SUBSTRATES
    34.
    发明申请
    PROCESSES AND APPARATUS FOR CLEANING, RINSING, AND DRYING SUBSTRATES 审中-公开
    清洁,冲洗和干燥基材的工艺和装置

    公开(公告)号:US20150090299A1

    公开(公告)日:2015-04-02

    申请号:US14040571

    申请日:2013-09-27

    CPC classification number: H01L21/67057 H01L21/67028

    Abstract: In some embodiments, a module is provided that is configured to clean, rinse and dry a substrate. The module includes (1) a tank having an upper tank region positioned above a lower tank region, the upper tank region having (a) an opening through which a substrate is removed from the tank; (b) a first fluid supply configured to supply a first fluid to a surface of a substrate being removed from the tank; and (c) a first suction mechanism, positioned below the first fluid supply, wherein the first suction mechanism is configured to suction fluid supplied from the first fluid supply so as to deter the suctioned fluid from reaching the lower tank region; and (2) a drying vapor supply positioned above the first fluid supply and configured to supply a drying vapor to a surface of a substrate being removed from the tank. Numerous other aspects are provided.

    Abstract translation: 在一些实施例中,提供了被配置为清洁,漂洗和干燥基底的模块。 模块包括(1)具有位于下罐区域上方的上罐区域的罐,上罐区域具有(a)开口,基板通过该开口从罐中移除; (b)构造成将第一流体供应到从罐中取出的基板的表面的第一流体供应; (c)位于第一流体供给部下方的第一吸引机构,其特征在于,所述第一吸引机构构成为吸入从所述第一流体供给源供给的流体,以阻止所述被吸引的流体到达所述下部箱体区域; 和(2)位于第一流体供应器上方的干燥蒸气供应器,其构造成将干燥蒸气供应到从罐中取出的基板的表面。 提供了许多其他方面。

    Particle coating methods and apparatus

    公开(公告)号:US11242599B2

    公开(公告)日:2022-02-08

    申请号:US16515875

    申请日:2019-07-18

    Abstract: A reactor for coating particles includes a vacuum chamber configured to hold particles to be coated, a vacuum port to exhaust gas from the vacuum chamber via the outlet of the vacuum chamber, a chemical delivery system configured to flow a process gas into the particles via a gas inlet on the vacuum chamber, one or more vibrational actuators located on a first mounting surface of the vacuum chamber, and a controller configured to cause the one or more vibrational actuators to generate a vibrational motion in the vacuum chamber sufficient to induce a vibrational motion in the particles held within the vacuum chamber.

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