公开(公告)号：US11822324B2

公开(公告)日：2023-11-21

申请号：US17366586

申请日：2021-07-02

Applicant: Gigaphoton Inc.

Inventor： Kunihiko Abe ,  Yuji Minegishi ,  Satoru Kikuchi ,  Osamu Wakabayashi

IPC: G05B23/02 ,  G06N20/00 ,  G06N3/02

CPC classification number: G05B23/0283 ,  G06N3/02 ,  G06N20/00

Abstract: A machine learning method according to a viewpoint of the present disclosure is a machine learning method for creating a learning model configured to estimate the life of a consumable of a laser apparatus, the method including acquiring first life-related information containing data on a parameter relating to the life of the consumable, the data recorded in correspondence with different numbers of oscillation pulses during a period from the start of use of the consumable to replacement thereof, dividing the first life-related information into a plurality of levels each representing the degree of degradation of the consumable in accordance with the numbers of oscillation pulses to create training data, creating the learning model by performing machine learning using the created training data, and saving the created learning model.

公开(公告)号：US11604416B2

公开(公告)日：2023-03-14

申请号：US17511128

申请日：2021-10-26

Applicant: Gigaphoton Inc.

Inventor： Koji Kakizaki ,  Masakazu Kobayashi ,  Akira Suwa ,  Osamu Wakabayashi

IPC: G03F7/20 ,  H01S3/11 ,  H01S3/225 ,  G03F9/00

Abstract: A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position.

公开(公告)号：US11217962B2

公开(公告)日：2022-01-04

申请号：US16707880

申请日：2019-12-09

Applicant: Gigaphoton Inc.

Inventor： Masaki Arakawa ,  Osamu Wakabayashi

IPC: H01S3/23 ,  G02B27/09 ,  H01S3/00 ,  H01S3/038 ,  H01S3/08 ,  H01S3/225 ,  G02B5/00 ,  H01S3/083

Abstract: A laser system includes: A. a solid-state laser apparatus configured to output a pulse laser beam having light intensity distribution in a Gaussian shape that is rotationally symmetric about an optical path axis; B. an amplifier including a pair of discharge electrodes and configured to amplify the pulse laser beam in a discharge space between the pair of discharge electrodes; and C. a conversion optical system configured to convert the light intensity distribution of the pulse laser beam output from the amplifier into a top hat shape in each of a discharge direction of the pair of discharge electrodes and a direction orthogonal to the discharge direction.

公开(公告)号：US10971883B2

公开(公告)日：2021-04-06

申请号：US16178351

申请日：2018-11-01

Applicant: Gigaphoton Inc.

Inventor： Natsushi Suzuki ,  Osamu Wakabayashi ,  Hiroaki Tsushima ,  Masanori Yashiro

IPC: H01S3/036 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  H01S3/23 ,  B01D53/04 ,  B01D53/68 ,  B01D53/86

Abstract: A gas purification system may include: a circulation gas pipe in which a second end is connected at a first position to a second pipe through which gas is supplied from a gas supply source; a booster pump; a gas purification unit; a first tank in the circulation gas pipe; a first valve positioned between the gas supply source and the first position, the first valve having an open position and a closed position; and a second valve positioned between the first tank and the second end, the second valve having an open position and a closed position, the second valve configured to be in the closed position when the first valve is in the open position.

公开(公告)号：US10863613B2

公开(公告)日：2020-12-08

申请号：US16560611

申请日：2019-09-04

Applicant: Gigaphoton Inc.

Inventor： Shinji Okazaki ,  Osamu Wakabayashi

IPC: H05H7/06 ,  G03F7/20 ,  H05H7/04

Abstract: An EUV light generator including the following components: A. an electron storage ring including a first linear section and a second linear section; B. an electron supplier configured to supply the electron storage ring with an electron bunch; C. a high-frequency acceleration cavity disposed in the first linear section and configured to accelerate the electron bunch in such a way that a length Lez of the electron bunch satisfies “0.09 m≤Lez≤3 m;” and D. an undulator disposed in the second linear section and configured to output EUV light when the electron bunch enters the undulator.

公开(公告)号：US10710194B2

公开(公告)日：2020-07-14

申请号：US16429091

申请日：2019-06-03

Applicant: Gigaphoton Inc.

Inventor： Kouji Kakizaki ,  Osamu Wakabayashi

IPC: B23K26/0622 ,  G02B21/36 ,  H01S3/094 ,  H03K7/08 ,  B23K26/08 ,  B23K26/53 ,  B23K26/03 ,  H01M2/14 ,  B23K26/042 ,  B23K26/32 ,  B23K26/40 ,  H01M8/1069 ,  H01J37/244 ,  H01J37/285 ,  H01J37/04 ,  H01J49/00

Abstract: A laser processing system includes a wavelength tunable laser apparatus capable of changing the wavelength of pulsed laser light to be outputted, an optical system irradiating a workpiece with the pulsed laser light, a reference wavelength acquisition section acquiring a reference wavelength corresponding to photon absorption according to the material of the workpiece, a laser processing controller controlling the wavelength tunable laser apparatus to perform preprocessing before final processing performed on the workpiece, changes the wavelength of the pulsed laser light over a predetermined range containing the reference wavelength, and performs wavelength search preprocessing at a plurality of wavelengths, a processed state measurer measuring a processed state on a wavelength basis achieved by the wavelength search preprocessing performed at the plurality of wavelengths, and an optimum wavelength determination section assessing the processed state on a wavelength basis to determine an optimum wavelength used in the final processing.

公开(公告)号：US10290992B2

公开(公告)日：2019-05-14

申请号：US15895634

申请日：2018-02-13

Applicant: Gigaphoton Inc.

Inventor： Hiroshi Umeda ,  Osamu Wakabayashi

IPC: H01S3/097 ,  H01S3/104 ,  H01S3/225 ,  H01L21/20 ,  H01S3/23

Abstract: The laser system includes a first laser apparatus, a second laser apparatus, a charging voltage measuring unit configured to measure the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, at least one bleeding circuit configured to reduce the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, and a bleeding circuit controller configured to control the at least one bleeding circuit based on the voltage measured by the charging voltage measuring unit.

公开(公告)号：US10251255B2

公开(公告)日：2019-04-02

申请号：US16137312

申请日：2018-09-20

Applicant: Gigaphoton Inc.

Inventor： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC: H05G2/00 ,  H01S3/23 ,  H01S3/104 ,  H01S3/16 ,  H01S3/223 ,  H01S3/11 ,  H01S3/09 ,  H01S3/00 ,  H01S3/102

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US10205297B2

公开(公告)日：2019-02-12

申请号：US15912633

申请日：2018-03-06

Applicant: Gigaphoton Inc.

Inventor： Hirotaka Miyamoto ,  Osamu Wakabayashi

IPC: H01S3/137 ,  H01S3/225 ,  H01S3/036 ,  H01S3/134

Abstract: A narrow band excimer laser apparatus includes a line narrowing module that narrows the spectral line width of laser light, a nitrogen gas introducing unit, a first valve that restricts the flow of nitrogen gas from the introducing unit into a casing of the module, an exhaust unit that causes gas to flow out from the casing, an exhaust pump for exhausting the gas from the casing, a second valve that restricts the exhausting of gas from the exhaust unit, an atmosphere discharge unit that discharges the gas within the casing into the atmosphere, a third valve that restricts the discharge of gas into the atmosphere, and a control unit that closes the second valve while opening the first and third valves, supplies nitrogen gas into the casing, then closes the third valve while opening the first and second valves, drives the exhaust pump, and causes laser oscillation thereafter.

公开(公告)号：US10177520B2

公开(公告)日：2019-01-08

申请号：US15792111

申请日：2017-10-24

Applicant: Gigaphoton Inc.

Inventor： Takeshi Asayama ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC: H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/038

Abstract: The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.