Zero-Misalignment Via-Pad Structures
    36.
    发明申请
    Zero-Misalignment Via-Pad Structures 有权
    零不对准通孔焊盘结构

    公开(公告)号:US20160183370A1

    公开(公告)日:2016-06-23

    申请号:US14576107

    申请日:2014-12-18

    Abstract: A photoresist is deposited on a seed layer on a substrate. A first region of the photoresist is removed to expose a first portion of the seed layer to form a via-pad structure. A first conductive layer is deposited onto the first portion of the seed layer. A second region of the photoresist adjacent to the first region is removed to expose a second portion of the seed layer to form a line. A second conductive layer is deposited onto the first conductive layer and the second portion of the seed layer.

    Abstract translation: 光致抗蚀剂沉积在基底上的种子层上。 去除光致抗蚀剂的第一区域以暴露种子层的第一部分以形成通孔垫结构。 第一导电层沉积在种子层的第一部分上。 去除与第一区域相邻的光致抗蚀剂的第二区域以暴露种子层的第二部分以形成线。 第二导电层沉积在第一导电层和籽晶层的第二部分上。

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