公开(公告)号：US5614151A

公开(公告)日：1997-03-25

申请号：US483078

申请日：1995-06-07

Applicant: Thurston C. LeVay ,  James A. Rummel

Inventor： Thurston C. LeVay ,  James A. Rummel

IPC: A61L2/10 ,  A61L2/20 ,  B01J19/12 ,  C02F1/32 ,  C02F1/78 ,  H01J65/04 ,  A61L2/12

CPC classification number: A61L2/10 ,  A61L2/202 ,  B01J19/124 ,  C02F1/325 ,  H01J65/042 ,  C02F1/78 ,  C02F2201/3223

Abstract: A sanitizer uses a radiant energy source such as a microwave source to excite a gas contained in a bulb so that the gas produces ultraviolet radiation that can be used to sanitize substances exposed to the radiation. The ultraviolet radiation may also be used to generate ozone from oxygen in air or another gas containing oxygen and the ozone may be used by itself or in combination with ultraviolet exposure to sanitize substances. The bulb for generating ultraviolet radiation can be shaped so that substances to be sterilized are able to pass through the bulb, so that objects (even metal objects) are enclosed by the bulb and shielded from the radiant energy source, or so that the bulb is located at the end of a waveguide and can be positioned to sanitize inaccessible surfaces or substances.

Abstract translation: 消毒器使用诸如微波源的辐射能源来激发包含在灯泡中的气体，使得气体产生可用于消除暴露于辐射的物质的紫外线辐射。 紫外线辐射也可用于从空气中的氧气或含有氧的另一种气体中产生臭氧，臭氧可以单独使用或与紫外线暴露于消毒物质结合使用。 用于产生紫外线辐射的灯泡可以被成形为使得被灭菌的物质能够通过灯泡，使得物体（甚至金属物体）被灯泡包围并且被遮蔽的辐射能源，或者使得灯泡是 位于波导的端部并且可以定位成消毒不可接近的表面或物质。

公开(公告)号：US4718974A

公开(公告)日：1988-01-12

申请号：US1645

申请日：1987-01-09

Applicant: Behrooz Minaee

Inventor： Behrooz Minaee

IPC: B01J19/12 ,  G03F7/42 ,  B44C1/22 ,  B29C37/00 ,  C03C15/00 ,  C03C25/06

CPC classification number: G03F7/42 ,  B01J19/124

Abstract: Apparatus and method for removing organic polymers, such as photoresist, from the surface of an object, such as a semiconductor wafer. The apparatus comprises a microwave energy source and a reaction chamber housing an ultraviolet lamp and a platform for holding a semiconductor wafer. A portion of the chamber's exterior, between the ultraviolet lamp and the microwave energy source, is permeable to microwaves. The reaction chamber has an inlet and an outlet for passing a reaction gas through the reaction chamber. The platform is situated so that the full surface of a semiconductor wafer thereon is exposed to light emitted by the ultrtaviolet lamp which responds to microwave stimulation from the microwave energy source by emitting ultraviolet radiation having a preselected wavelength between 100 and 300 angstroms. Photoresist can be stripped from a semiconductor wafer on the platform by energizing the ultraviolet lamp while passing a reaction gas through the reaction chamber and thereby ablating organic polymers and impurities from the surface of the semiconductor wafer.

Abstract translation: 从诸如半导体晶片的物体的表面去除有机聚合物如光致抗蚀剂的装置和方法。 该装置包括微波能源和容纳紫外灯的反应室和用于保持半导体晶片的平台。 在紫外灯和微波能量源之间的腔室外部的一部分是微波可渗透的。 反应室具有用于使反应气体通过反应室的入口和出口。 平台的位置使得其上的半导体晶片的整个表面暴露于由紫外线灯发射的光，其通过发射具有100至300埃之间的预选波长的紫外线辐射来响应来自微波能量源的微波刺激。 通过在使反应气体通过反应室的同时激发紫外线灯，从而从半导体晶片的表面烧蚀有机聚合物和杂质，可以从平台上的半导体晶片剥离光致抗蚀剂。