公开(公告)号：US20070215961A1

公开(公告)日：2007-09-20

申请号：US11277024

申请日：2006-03-20

Applicant: Lianzhong Yu

Inventor： Lianzhong Yu

IPC: H01L29/82 ,  H01L29/84

CPC classification number: B81C1/00484 ,  B81B2201/0235 ,  B81B2201/033 ,  B81B2203/0136 ,  B81C2201/019

Abstract: A method of manufacturing a vertical comb structure for a micro electromechanical (MEMS) device. Tooth structures are formed on a first wafer. A second wafer is then bonded to the tooth structures of the first wafer. The tooth structures are then released to form a comb structure. Forming the tooth structures on the first wafer includes using oxidation, photolithography, etching, epitaxy, and chemical and mechanical polishing to create the tooth structures on the first wafer.

Abstract translation: 一种制造用于微机电（MEMS）装置的垂直梳结构的方法。 齿结构形成在第一晶片上。 然后将第二晶片接合到第一晶片的齿结构。 然后释放牙结构以形成梳结构。 在第一晶片上形成齿结构包括使用氧化，光刻，蚀刻，外延和化学和机械抛光以在第一晶片上产生齿结构。

公开(公告)号：US20060228896A1

公开(公告)日：2006-10-12

申请号：US11095071

申请日：2005-03-31

Applicant: Dennis Greywall

Inventor： Dennis Greywall

IPC: H01L21/302 ,  H01L21/461

CPC classification number: B81C1/00404 ,  B81B2201/033

Abstract: A method of fabricating a device using a multi-layered wafer that has an embedded etch mask adapted to map a desired device structure onto an adjacent (poly)silicon layer. Due to the presence of the embedded mask, it becomes possible to delay the etching that forms the mapped structure in the (poly)silicon layer until a relatively late fabrication stage. As a result, flatness of the (poly)silicon layer is preserved for the deposition of any necessary over-layers, which substantially obviates the need for filling the voids created by the structure formation with silicon oxide.

Abstract translation: 一种使用具有适于将期望的器件结构映射到相邻（多）硅层上的嵌入式蚀刻掩模的多层晶片制造器件的方法。 由于嵌入式掩模的存在，可以延迟在（多）硅层中形成映射结构的蚀刻，直到相对较晚的制造阶段。 结果，保留了（多）硅层的平坦度，用于沉积任何必需的上层，这基本上消除了填充由氧化硅形成的结构形成的空隙的需要。

公开(公告)号：US20060227553A1

公开(公告)日：2006-10-12

申请号：US11348788

申请日：2006-02-07

Applicant: Tomoaki Nakamura ,  Makoto Inoguchi

Inventor： Tomoaki Nakamura ,  Makoto Inoguchi

IPC: F21S8/00

CPC classification number: G02B26/0841 ,  B81B3/0051 ,  B81B2201/033 ,  B81B2201/042

Abstract: An actuator includes: a base section; an object having a body portion and a holding portion holding the body portion in a manner that the body portion is movable against the base section; a movable comb-tooth portion extending from the object side in a direction substantially perpendicular to a formation direction of the holding portion; and a fixed comb-tooth portion which extends from the base section in a direction substantially perpendicular to the formation direction of the holding portion and which is arranged at a position at which the fixed comb-tooth portion is engaged with but having a gap from the movable comb-tooth portion; the fixed comb-tooth portion being composed of a steady-voltage-receiving fixed comb tooth that steadily supplies a drive voltage and a variable-voltage-receiving fixed comb tooth that receives a controlled voltage.

Abstract translation: 致动器包括：基部; 物体具有主体部分和保持部分，其保持主体部分，使得主体部分能够相对于基部移动; 从所述物体侧沿与所述保持部的形成方向大致垂直的方向延伸的可动梳齿部; 以及固定梳齿部，其从与所述保持部的形成方向大致正交的方向从所述基部延伸，并且所述固定梳齿部配置在所述固定梳齿部与所述固定梳齿部接合的位置， 活动梳齿部分; 固定梳齿部分由稳定地提供驱动电压的稳压接收固定梳齿和接收受控电压的可变电压接收固定梳齿构成。

公开(公告)号：US20060203319A1

公开(公告)日：2006-09-14

申请号：US11371089

申请日：2006-03-09

Applicant: Norinao Kouma ,  Osamu Tsuboi ,  Hiromitsu Soneda ,  Satoshi Ueda

Inventor： Norinao Kouma ,  Osamu Tsuboi ,  Hiromitsu Soneda ,  Satoshi Ueda

IPC: G02B26/08

CPC classification number: B81C1/00547 ,  B81B2201/033

Abstract: A pair of comb-teeth electrodes are made from a material substrate including a first conduction layer, a second conduction layer and an intervening insulation layer. The paired electrodes includes first and second comb-teeth electrodes. The first comb-teeth electrode is composed of a first conductor derived from the first conduction layer, a second conductor derived from the second conduction layer and an insulator derived from the insulation layer. The second comb-teeth electrode is derived from the second conduction layer.

Abstract translation: 一对梳齿电极由包括第一导电层，第二导电层和中间绝缘层的材料基板制成。 成对电极包括第一和第二梳齿电极。 第一梳齿电极由衍生自第一导电层的第一导体，源自第二导电层的第二导体和源自绝缘层的绝缘体构成。 第二梳齿电极源自第二导电层。

公开(公告)号：US07083737B2

公开(公告)日：2006-08-01

申请号：US10791756

申请日：2004-03-04

Applicant: Jin-ho Lee ,  Young-chul Ko ,  Do-hyun Kong

Inventor： Jin-ho Lee ,  Young-chul Ko ,  Do-hyun Kong

IPC: H01L21/302

CPC classification number: B81C3/001 ,  B81B2201/033 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/04 ,  B81B2203/058 ,  B81C1/00142 ,  B81C2201/0132 ,  B81C2203/038 ,  Y10T29/42 ,  Y10T29/435

Abstract: A micro-actuator having a stage capable of a see-saw motion and a method for its manufacture are disclosed. In the micro-actuator according to the present invention, a plurality of parallel driving comb-type electrodes are formed on the bottom of the stage, and a plurality of parallel fixed comb-type electrodes are formed on a base plate. At both sides of the stage is a torsion bar that enables the see-saw motion. The torsion bar is supported by a frame comprised of a first frame layer and a second frame layer. The torsion bar and the first frame layer form one body. The first and second frame layers are bonded by a metal eutectic bonding layer between metal layers.

Abstract translation: 公开了一种具有能够进行跷跷板运动的平台的微致动器及其制造方法。 在本发明的微型致动器中，在台架的底部形成多个平行的驱动梳状电极，在基板上形成多个平行的固定梳状电极。 在舞台的两侧是一个扭杆，可以实现跷跷板的动作。 扭杆由包括第一框架层和第二框架层的框架支撑。 扭杆和第一框架层形成一体。 第一和第二框架层通过在金属层之间的金属共晶接合层结合。

公开(公告)号：US06925710B1

公开(公告)日：2005-08-09

申请号：US10112063

申请日：2002-03-27

Applicant: Jennifer Scalf ,  Satinderpal Pannu

Inventor： Jennifer Scalf ,  Satinderpal Pannu

IPC: B81B3/00 ,  H05K3/02

CPC classification number: B81C1/00126 ,  B81B2201/033 ,  B81B2201/045 ,  B81B2203/0136 ,  B81C2203/051 ,  Y10T29/49126 ,  Y10T29/49155 ,  Y10T29/49156

Abstract: Methods of making microelectromechanical combdrive devices are disclosed. The device may optionally be formed using three device layers. A moveable element and flexure may be formed from a first device layer. The second device layer may be attached to the first and a first set of comb teeth are formed from the second device layer. One or more comb teeth in the first set extend from a major surface of the moveable element. A third device layer is attached to the second device layer and a second set of comb teeth are formed from the third device layer. An alignment target is formed in the first device layer. Corresponding alignment holes are formed in the second or third device layers.

Abstract translation: 公开了制造微机电梳状驱动装置的方法。 该装置可以可选地使用三个装置层形成。 可移动元件和挠曲可以由第一器件层形成。 第二装置层可以附接到第一装置层，并且第一组梳齿由第二装置层形成。 第一组中的一个或多个梳齿从可移动元件的主表面延伸。 第三器件层附接到第二器件层，并且第二组梳齿由第三器件层形成。 在第一器件层中形成对准靶。 相应的对准孔形成在第二或第三器件层中。

公开(公告)号：US20040256686A1

公开(公告)日：2004-12-23

申请号：US10821263

申请日：2004-04-08

Applicant: STMicroelectronics S.r.l.

Inventor： Simone Sassolini ,  Mauro Marchi ,  Marco Del Sarto ,  Lorenzo Baldo

IPC: H01L029/82 ,  H01L021/30

CPC classification number: H01L21/76898 ,  B81B2201/033 ,  B81B2201/045 ,  B81C1/00484 ,  B81C1/00896 ,  B81C2201/019 ,  G02B6/357 ,  G02B6/3584

Abstract: A method for manufacturing a micro-electro-mechanical device, which has supporting parts and operative parts, includes providing a first semiconductor wafer, having a first layer of semiconductor material and a second layer of semiconductor material arranged on top of the first layer, forming first supporting parts and first operative parts of the device in the second layer, forming temporary anchors in the first layer, and bonding the first wafer to a second wafer, with the second layer facing the second wafer. After bonding the first wafer and the second wafer together, second supporting parts and second operative parts of said device are formed in the first layer. The temporary anchors are removed from the first layer to free the operative parts formed therein.

Abstract translation: 一种具有支撑部件和操作部件的微电子机械装置的制造方法，包括提供具有第一层半导体材料的第一半导体晶片和布置在第一层顶部的第二半导体材料层，形成 在第二层中的装置的第一支撑部分和第一操作部分，在第一层中形成临时锚固件，以及将第一晶片结合到第二晶片，第二层面向第二晶片。 在将第一晶片和第二晶片接合在一起之后，所述器件的第二支撑部件和第二操作部分形成在第一层中。 将临时锚固件从第一层移除以释放其中形成的操作部件。

公开(公告)号：US06819822B2

公开(公告)日：2004-11-16

申请号：US09751660

申请日：2000-12-28

Applicant: Behrang Behin ,  Michael J. Daneman ,  Meng-Hsiung Kiang ,  Kam-Yin Lau ,  Satinderpall Pannu

Inventor： Behrang Behin ,  Michael J. Daneman ,  Meng-Hsiung Kiang ,  Kam-Yin Lau ,  Satinderpall Pannu

IPC: G02B635

CPC classification number: G02B6/3556 ,  B81B3/0021 ,  B81B2201/033 ,  B81B2201/045 ,  B81B2203/0181 ,  B81B2203/058 ,  B81B2207/07 ,  B81C1/00214 ,  G02B6/3512 ,  G02B6/3518 ,  G02B6/3542 ,  G02B6/3546 ,  G02B6/356 ,  G02B6/357 ,  G02B6/3584 ,  G02B26/0833 ,  G02B26/085 ,  G02B26/0858 ,  G02B26/0866 ,  H02N1/008

Abstract: A two-dimensional scanner consists of a rotatable gimbal structure with vertical electrostatic comb-drive actuators and sensors. The scanner's two axes of rotation may be controlled independently by activating two sets of vertical comb-drive actuators. The first set of vertical comb-drive actuator is positioned in between a outer frame of the gimbal structure and the base, and the second set of vertical comb-drive actuator is positioned in between the inner part of the gimbal structure and the outer frame of the gimbal structure. The inner part of the gimbal structure may include a reflective surface, and the device may be used as a mirror. Furthermore, the capacitance of the vertical comb-drives may be measured to monitor the angular position of the mirror, and the capacitive position-monitoring signal may be used to implement closed-loop feedback control of the mirror angle. The two-dimensional scanner may be fabricated in a semiconductor process. Two-dimensional scanners may be used to produce fiber-optic switches.

Abstract translation: 二维扫描器由可旋转的万向架结构与垂直静电梳状驱动致动器和传感器组成。 扫描仪的两个旋转轴可以通过激活两组垂直梳齿驱动执行器来独立控制。 第一组垂直梳齿驱动致动器位于万向架结构的外框架和基座之间，第二组垂直梳齿驱动致动器定位在万向架结构的内部和外框之间 万向架结构。 万向节结构的内部可以包括反射表面，并且该装置可以用作反射镜。 此外，可以测量垂直梳状驱动器的电容以监视反射镜的角度位置，并且可以使用电容位置监视信号来实现镜角的闭环反馈控制。 二维扫描器可以在半导体工艺中制造。 二维扫描仪可用于生产光纤交换机。

公开(公告)号：US06809392B2

公开(公告)日：2004-10-26

申请号：US10371899

申请日：2003-02-20

Applicant: Mark G. Allen ,  Charles C. Chung

Inventor： Mark G. Allen ,  Charles C. Chung

IPC: H01L31058

CPC classification number: H01L21/761 ,  B81B3/0086 ,  B81B2201/033 ,  Y10S257/93

Abstract: A micromachined structure having electrically isolated components is formed by thermomigrating a dopant through a substrate to form a doped region within the substrate. The doped region separates two portions of the substrate. The dopant is selected such that the doped region electrically isolates the two portions of the substrate from each other via junction isolation.

Abstract translation: 具有电隔离组分的微加工结构通过通过衬底热掺杂掺杂剂形成，以在衬底内形成掺杂区域。 掺杂区域分离衬底的两部分。 选择掺杂剂使得掺杂区域通过结隔离将衬底的两个部分彼此电隔离。

公开(公告)号：US20040198063A1

公开(公告)日：2004-10-07

申请号：US10607838

申请日：2003-06-27

Inventor： Kanakasabapathi Subramanian ,  Xiaojun T. Huang ,  Noel C. MacDonald

IPC: H01L021/302 ,  H01L021/461

CPC classification number: B81C1/00626 ,  B81B2201/033 ,  H01L21/3086

Abstract: Multi-level structures are formed in a semiconductor substrate by first forming a pattern of lines or structures of different widths. Width information on the pattern is decoded by processing steps into level information to form a MEMS structure. The pattern is etched to form structures having a first floor. The structures are oxidized until structures of thinner width are substantially fully oxidized. A portion of the oxide is then etched to expose the first floor. The first floor is then etched to form a second floor. The oxide is then optionally removed, leaving a multi-level structure. In one embodiment, high aspect ratio comb actuators are formed using the multi-level structure process.

Abstract translation: 通过首先形成不同宽度的线或结构的图案，在半导体衬底中形成多层结构。 图案上的宽度信息通过处理步骤被解码成级信息以形成MEMS结构。 蚀刻图案以形成具有一层的结构。 结构被氧化，直到较薄宽度的结构基本上被完全氧化。 然后蚀刻一部分氧化物以露出第一层。 然后蚀刻第一层以形成二楼。 然后任选地除去氧化物，留下多层结构。 在一个实施例中，使用多层结构工艺形成高纵横比梳状致动器。