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    Glass composition and method for producing glass article
    32.
    发明申请
    Glass composition and method for producing glass article 失效
    玻璃制品的玻璃组合物和方法

    公开(公告)号：US20070197366A1

    公开(公告)日：2007-08-23

    申请号：US10576291

    申请日：2004-10-19

    Applicant: Shigeaki Aoki ,  Hiroki Nagai ,  Masataka Takagi

    Inventor： Shigeaki Aoki ,  Hiroki Nagai ,  Masataka Takagi

    IPC: C03C3/00 ,  C03B5/16

    CPC classification number: C03C3/00 ,  C03B5/16 ,  C03B5/193 ,  C03B5/235 ,  C03B2201/20 ,  C03C1/00 ,  C03C13/00 ,  C03C2201/06 ,  C03C2203/10 ,  C03C2203/52 ,  C03C2203/54

    Abstract: The glass composition of the present invention is an inorganic glass composition in which the volume ratio of helium with a mass number of 3 to helium with a mass number of 4, namely 3He/4He in the glass (0° C., 1 atm) is smaller than the volume ratio 3He/4He in the atmosphere. The method of producing a glass article of the present invention includes the steps of: melting a glass raw material by heating; homogenizing molten glass; forming the molten glass into a desired shape; and cooling the shaped glass to room temperature, in which helium with a certain mass ratio is dissolved in the glass material so that the glass article of the present invention is obtained.

    Abstract translation: 本发明的玻璃组合物是将质量数为4的氦质量数为3的氦的体积比为3的无机玻璃组合物，即He / 玻璃（0℃，1大气压）中的He小于He气体中的He / 4 He体积比。 本发明的玻璃制品的制造方法包括以下步骤：通过加热熔化玻璃原料; 均质化熔融玻璃; 将所述熔融玻璃形成为期望的形状; 将成形玻璃冷却至室温，将具有一定质量比的氦溶解在玻璃材料中，得到本发明的玻璃制品。

    Method of making extreme ultraviolet lithography glass substrates
    36.
    发明申请
    Method of making extreme ultraviolet lithography glass substrates 审中-公开
    制造极紫外光刻玻璃基板的方法

    公开(公告)号：US20040025542A1

    公开(公告)日：2004-02-12

    申请号：US10456318

    申请日：2003-06-05

    Inventor： Laura J. Ball ,  Sylvain Rakotoarison

    IPC: C03B019/06 ,  C03B037/018

    CPC classification number: C03B19/143 ,  C03B19/01 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/30 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42

    Abstract: A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.

    Abstract translation: 用于制造极紫外光刻工具玻璃基板的方法包括产生等离子体，将包含二氧化硅前体和二氧化钛前体的反应物输送到等离子体中以产生二氧化钛和二氧化硅颗粒，并将二氧化钛和二氧化硅颗粒沉积在沉积表面上以形成均匀的 二氧化钛掺杂二氧化硅。 本发明提供了不含条纹变化的均匀玻璃基底，并提供有益的极紫外光刻反射光学器件。

    Isotopically altered optical fiber
    37.
    发明申请
    Isotopically altered optical fiber 失效
    同位素改变的光纤

    公开(公告)号：US20030128955A1

    公开(公告)日：2003-07-10

    申请号：US10322148

    申请日：2002-12-18

    Inventor： Douglas C. Allan ,  John T. Brown ,  Lisa C. Chacon ,  Adam J. G. Ellison ,  James C. Fajardo ,  Stuart Gray ,  Keith L. House ,  Karl W. Koch III ,  Dale R. Powers ,  James A. West

    IPC: G02B006/02

    CPC classification number: C03C13/045 ,  C03B37/01413 ,  C03B37/01446 ,  C03B37/01807 ,  C03B37/01823 ,  C03B37/01853 ,  C03B2201/20 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2203/22 ,  C03B2207/30 ,  C03B2207/36 ,  C03C4/0042 ,  C03C13/046 ,  G02B6/02 ,  G02B6/02228 ,  G02B6/02271 ,  G02B6/03644 ,  G02B6/03677 ,  G02B6/03694

    Abstract: An isotopically-altered, silica based optical fiber is provided having lower losses, broader bandwidth, and broader Raman gain spectrum characteristics than conventional silica-based fiber. A heavier, less naturally abundant isotope of silicon or oxygen is substituted for a lighter, more naturally abundant isotope to shift the infrared absorption to a slightly longer wavelength. In one embodiment, oxygen-18 is substituted for the much more naturally abundant oxygen-16 at least in the core region of the fiber. The resulting isotopically-altered fiber has a minimum loss of 0.044 dB/km less than conventional fiber, and a bandwidth that is 17 percent broader for a loss range between 0.044-0.034 dB/km. The fiber may be easily manufactured with conventional fiber manufacturing equipment by way of a plasma chemical vapor deposition technique. When a 50 percent substitution of oxygen-18 for oxygen-16 is made in the core region of the fiber, the Raman gain spectrum is substantially broadened.

    Abstract translation: 提供了一种同位素改性的二氧化硅基光纤，其比传统的二氧化硅基光纤具有更低的损耗，更宽的带宽和更广泛的拉曼增益光谱特性。 更重，更不自然丰富的硅或氧的同位素代替较轻的，更自然的丰富的同位素，以将红外吸收转移到稍长的波长。 在一个实施方案中，氧-18至少在纤维的核心区域中替代天然丰富的氧-16。 所得到的同位素改变的光纤比常规光纤的损耗最小为0.044 dB / km，对于0.044-0.034 dB / km之间的损耗范围，宽带宽为17％。 纤维可以通过等离子体化学气相沉积技术容易地用传统的纤维制造设备制造。 当在纤维的纤芯区域中进行氧-16取代氧-16的50％时，拉曼增益谱显着扩大。

    Oxygen doping of silicon oxyfluoride glass
    39.
    发明授权
    Oxygen doping of silicon oxyfluoride glass 失效
    氟氧化硅玻璃的氧掺杂

    公开(公告)号：US06502426B2

    公开(公告)日：2003-01-07

    申请号：US09997782

    申请日：2001-11-28

    Applicant: Lisa A. Moore ,  Charlene M. Smith

    Inventor： Lisa A. Moore ,  Charlene M. Smith

    IPC: C03B3200

    CPC classification number: G03F7/70958 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/54 ,  G03F1/60

    Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a “dry,” silicon oxyfluoride glass which contains doped O2 molecules and which exhibits very high transmittance and laser transmission durability in the vacuum ultraviolet (VUV) wavelength region. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm contains intersticial O2 molecules which provide improved endurance to laser exposure. Preferably the O2 doped silicon oxyfluoride glass is characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

    Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模衬底是含有掺杂的O 2分子并且在真空紫外（VUV）波长区域中显示非常高的透射率和激光透射耐久性的“干式”氟氧化硅玻璃。 除了含氟并且具有很少或不具有OH含量之外，本发明的适用于157nm的光掩模衬底的氟氧化硅玻璃含有间隔的O 2分子，其提供了对激光曝光的改善的耐久性。 优选地，掺杂氧的氟氧化硅玻璃的特征在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

    Method of making a polarizing glass
    40.
    发明申请
    Method of making a polarizing glass 失效
    制造偏光玻璃的方法

    公开(公告)号：US20020053221A1

    公开(公告)日：2002-05-09

    申请号：US09906182

    申请日：2001-07-16

    Inventor： David G. Grossman ,  Lisa R. Vandegrift ,  Joseph M. Williams ,  George N. Whitbred III

    IPC: C03B032/00

    CPC classification number: C03C14/006 ,  C03B23/047 ,  C03B32/02 ,  C03B2201/20 ,  C03B2201/40 ,  C03B2201/58 ,  C03C2214/08 ,  C03C2214/30

    Abstract: A method of producing a polarizing glass article that exhibits a broad band of high contrast polarizing properties in the infrared region of the radiation spectrum. The polarizing glass is phase-separated or exhibits photochromic properties based on silver, copper, or copper-cadmium halide crystals or a combination thereof, which are precipitated in the glass and having a size in the range of 200-5000 null. The glass has a surface layer containing elongated silver, copper, or copper cadmium metal particles, or a mixture thereof. The method comprises subjecting the glass article to a time-temperature cycle in which the temperature is at least about 76null C. or greater above the glass softening point, in a step to thermally form and precipitate large halide crystals, and elongated metallic particles under a stress of not over about 3000 psi, preferably not over about 2675 psi.

    Abstract translation: 一种制造在辐射光谱的红外区域中具有宽对比度偏振特性的偏光玻璃制品的方法。 偏光玻璃被相分离或显示基于银，铜或镉 - 镉的结晶或其组合的光致变色性质，其在玻璃中析出并且尺寸在200-5000范围内。 玻璃具有含有细长银，铜或铜镉金属颗粒或其混合物的表面层。 该方法包括在玻璃软化点以上温度至少约76℃或更高的时间温度循环下，在形成和沉淀大的卤化物晶体的步骤中，使细长的金属颗粒在 应力不超过约3000psi，优选不超过约2675psi。

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