公开(公告)号：US20140118732A1

公开(公告)日：2014-05-01

申请号：US14065876

申请日：2013-10-29

Applicant: W. Stanley Ayers

Inventor： W. Stanley Ayers

IPC: G01N21/01 ,  G01N21/65

CPC classification number: G01N21/65 ,  G01J3/0286 ,  G01J3/44 ,  G01M3/26 ,  G01M3/329 ,  G01N2201/0227

Abstract: An analytical instrument suitable for a use in a variety of industrial environments features a housing having a sealed primary chamber filled with a dry, inert gas at a first static pressure. An instrumentation system is disposed within the primary chamber, where fire hazard is eliminated by the inert gas. The housing additionally includes a reference chamber holding a gas a second pressure lower than the first pressure. One or more pressure switches, in pressure-sensing relationship with both chambers, is operative to interrupt the application of power to the instrumentation system if the differential between first and second pressures falls below a predetermined value. In this manner, the instrumentation system is rendered safe whenever the primary chamber is breached or otherwise loses inert gas pressure.

Abstract translation: 适于在各种工业环境中使用的分析仪器具有壳体，该壳体具有在第一静压下填充有干燥的惰性气体的密封的主室。 仪器系统设置在主室内，通过惰性气体消除火灾危险。 壳体还包括保持气体的参考室，第二压力低于第一压力。 如果第一和第二压力之间的差值低于预定值，则与两个室的压力感应关系中的一个或多个压力开关可操作以中断对仪表系统的功率的施加。 以这种方式，当主室被破坏或以其他方式损失惰性气体压力时，仪器系统变得安全。

公开(公告)号：US07466418B2

公开(公告)日：2008-12-16

申请号：US11670376

申请日：2007-02-01

Applicant: David Nilson ,  Brad Rice ,  Tamara Troy

Inventor： David Nilson ,  Brad Rice ,  Tamara Troy

IPC: G01J3/30 ,  G01N21/25

CPC classification number: G01N21/6456 ,  A01K1/031 ,  A61M16/104 ,  A61M16/18 ,  A61M16/202 ,  A61M2016/0039 ,  G01N2021/1787 ,  G01N2021/6463 ,  G01N2021/6471 ,  G01N2021/6484 ,  G01N2201/0227 ,  G01N2201/0826

Abstract: A macroscopic fluorescence illumination assembly is provided for use with an imaging apparatus with a light-tight imaging compartment. The imaging apparatus includes an interior wall defining a view port extending into the imaging compartment to enable viewing of a specimen contained therein. The illumination assembly includes a specimen support surface facing toward the view port of the imaging apparatus. The support surface defines a window portion that enables the passage of light there through. The window portion is selectively sized and dimensioned such that the specimen, when supported atop the support surface, can be positioned and seated over the window portion in a manner forming a light-tight seal substantially there between.

Abstract translation: 提供了一种宏观荧光照明组件，用于与具有不透光成像室的成像装置一起使用。 该成像设备包括限定了一个视图端口的内壁，该视图端口延伸到成像室中以使得能够观察其中容纳的样本。 照明组件包括面向成像设备的视口的样本支撑表面。 支撑表面限定了能够使光通过的窗口部分。 窗口部分被选择性地定尺寸和尺寸使得当被支撑在支撑表面上方时，样本可以以基本上在其之间形成不透光密封的方式被定位和安置在窗口部分上。

公开(公告)号：US07217942B2

公开(公告)日：2007-05-15

申请号：US10644745

申请日：2003-08-21

Applicant: Hideki Tanaka

Inventor： Hideki Tanaka

IPC: H01L21/00

CPC classification number: H01J37/32935 ,  G01N21/68 ,  G01N2201/0227 ,  G01N2201/023

Abstract: In a plasma processing apparatus that forms plasma from a process gas by supplying the process gas into a processing container and applying high-frequency power to an electrode provided inside the processing container on which a workpiece is placed and executes specific plasma processing on the processing surface of the workpiece, apparatus state parameter data indicating a state of the plasma processing apparatus are obtained through measurement executed by a parameter measuring instrument, optical data are obtained through measurement executed by an optical measuring instrument and electrical data are obtained through measurement executed by an electrical measuring instrument. A means for plasma leak judgment judges that a plasma leak has occurred if there is a fluctuation in the data.

Abstract translation: 在等离子体处理装置中，通过将处理气体供给到处理容器中并将高频电力施加在设置有工件的处理容器内部的电极上，从而从处理气体形成等离子体，并对处理面进行特定的等离子体处理 通过由参数测量仪器执行的测量获得指示等离子体处理装置的状态的装置状态参数数据，通过光学测量仪器执行的测量获得光学数据，并且通过由电气执行的测量获得电气数据 测量仪器。 用于等离子体泄漏判定的装置判断如果数据有波动，则发生等离子体泄漏。

公开(公告)号：US20060203244A1

公开(公告)日：2006-09-14

申请号：US11434606

申请日：2006-05-15

Applicant: David Nilson ,  Brad Rice ,  Tamara Troy

Inventor： David Nilson ,  Brad Rice ,  Tamara Troy

IPC: G01N21/25

CPC classification number: G01N21/6456 ,  G01N2021/1787 ,  G01N2021/6471 ,  G01N2021/6484 ,  G01N2201/0227 ,  G01N2201/0826

Abstract: A dual illumination system is disclosed for use with an imaging apparatus. The imaging apparatus defines a light-tight imaging compartment with an interior wall having a view port extending into the imaging compartment. This view port enables data acquisition of a biological specimen contained in the imaging compartment. The dual illumination system includes a first illumination assembly configured to direct structured light onto a first side of the specimen to enable structured light and surface topography measurements thereof. A second illumination assembly then directs light at the specimen wherein diffused fluorescent light emanates from a surface thereof for receipt through the view port to acquire fluorescence data of the specimen. The combination of structured light imaging and fluorescence imaging enables 3D diffuse tomographic reconstructions of fluorescent probe location and concentration.

公开(公告)号：US07068370B2

公开(公告)日：2006-06-27

申请号：US11151218

申请日：2005-06-13

Applicant: Allan Rosencwaig ,  Lanhua Wei

Inventor： Allan Rosencwaig ,  Lanhua Wei

IPC: G01J4/00

CPC classification number: H01L21/02046 ,  G01N21/211 ,  G01N21/9501 ,  G01N2201/0227 ,  G01N2201/023 ,  H01L21/02054 ,  H01L21/67028 ,  H01L21/67115 ,  H01L22/20

Abstract: A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing this contamination layer prior to measurement. This contamination layer can be effectively removed in a non-destructive fashion by subjecting the wafer to a cleaning step. In one embodiment, the cleaning is performed by exposing the wafer to microwave radiation. Alternatively, the wafer can be cleaned with a radiant heat source. These two cleaning modalities can be used alone or in combination with each other or in combination with other cleaning modalities. The cleaning step may be carried out in air, an inert atmosphere or a vacuum. Once the cleaning has been performed, the wafer can be measured using any number of known optical measurement systems.

Abstract translation: 公开了一种改善半导体晶片测量的方法。 在过去，由于在有意沉积的介电层上的污染层的不可预测的增长，测量的重复性受到不利影响。 在测量之前，通过去除这个污染层可以提高重复性。 通过使晶片进行清洁步骤，可以非破坏性地有效地去除该污染层。 在一个实施例中，通过将晶片暴露于微波辐射来进行清洁。 或者，可以用辐射热源清洁晶片。 这两种清洁方式可以单独使用或彼此组合使用或与其他清洁模式组合使用。 清洁步骤可以在空气，惰性气氛或真空中进行。 一旦执行了清洁，就可以使用任何数量的已知光学测量系统测量晶片。

公开(公告)号：US06985222B2

公开(公告)日：2006-01-10

申请号：US10423379

申请日：2003-04-25

Applicant: Hsi-Kuei Cheng ,  Chu-Chang Chen ,  Ting-Chun Wang ,  Szu-An Wu ,  Ying-Lang Wang ,  Hsien-Ping Feng

Inventor： Hsi-Kuei Cheng ,  Chu-Chang Chen ,  Ting-Chun Wang ,  Szu-An Wu ,  Ying-Lang Wang ,  Hsien-Ping Feng

IPC: G01N21/88

CPC classification number: G01N21/55 ,  G01N21/8422 ,  G01N2201/0227

Abstract: A system and method for detecting chamber leakage by measuring the reflectivity of an oxidized thin film. In a preferred embodiment, a method of detecting leaks in a chamber includes providing a first monitor workpiece, placing the first monitor workpiece in the chamber, and forming at least one film on the first monitor workpiece. The reflectivity of the least one film of the first monitor workpiece is measured, wherein the reflectivity indicates whether there are leaks in the at least one seal of the chamber. In another embodiment, the method includes providing a second monitor workpiece, placing the second monitor workpiece in the chamber, and forming at least one film on the second monitor workpiece. The reflectivity of the at least one film of the second monitor workpiece is measured, and the second monitor workpiece film reflectivity is compared to the first monitor workpiece film reflectivity.

Abstract translation: 通过测量氧化薄膜的反射率来检测室泄漏的系统和方法。 在优选实施例中，检测腔室泄漏的方法包括提供第一监测工件，将第一监测器工件放置在腔室中，以及在第一监测器工件上形成至少一个膜。 测量第一监视器工件的至少一个膜的反射率，其中反射率指示在室的至少一个密封件中是否有泄漏。 在另一个实施例中，该方法包括提供第二监视器工件，将第二监视器工件放置在腔室中，以及在第二监视器工件上形成至少一个膜。 测量第二监测工件的至少一个膜的反射率，并将第二监测工件膜反射率与第一监测工件膜反射率进行比较。

公开(公告)号：US20050219535A1

公开(公告)日：2005-10-06

申请号：US11155078

申请日：2005-06-17

Applicant: David Nilson ,  Brad Rice ,  Tamara Troy

Inventor： David Nilson ,  Brad Rice ,  Tamara Troy

IPC: A01K1/03 ,  A22B3/00 ,  A61M16/00 ,  A61M16/10 ,  A61M16/18 ,  A61M16/20 ,  G01N21/64

CPC classification number: G01N21/6456 ,  A01K1/031 ,  A61M16/104 ,  A61M16/18 ,  A61M16/202 ,  A61M2016/0039 ,  G01N2021/1787 ,  G01N2021/6463 ,  G01N2021/6471 ,  G01N2021/6484 ,  G01N2201/0227 ,  G01N2201/0826

Abstract: A macroscopic fluorescence illumination assembly is provided for use with an imaging apparatus with a light-tight imaging compartment. The imaging apparatus includes an interior wall defining a view port extending into the imaging compartment to enable viewing of a specimen contained therein. The illumination assembly includes a specimen support surface sized and dimensioned for receipt in the imaging compartment, and oriented to face toward the view port of the imaging apparatus. The support surface is substantially opaque and defines a window portion that enables the passage of light there through. The window portion is selectively sized and dimensioned such that the specimen, when supported atop the support surface, can be positioned and seated over the window portion in a manner forming a light-tight seal substantially there between. The illumination assembly further includes an excitation light source, and a bundle of fiber optic strands having proximal ends thereof in optical communication with the light source. The distal ends of the strands terminate proximate the window portion of the support surface. The distal ends each emit a respective beam of light originating from the light source which are then collectively directed toward the window portion and into a bottom side of the specimen wherein the diffused light passes there through and exits a topside thereof for receipt through the view port to view the fluorescence of the specimen.

Abstract translation: 提供了一种宏观荧光照明组件，用于与具有不透光成像室的成像装置一起使用。 该成像设备包括限定了一个视图端口的内壁，该视图端口延伸到成像室中以使得能够观察其中容纳的样本。 照明组件包括尺寸和尺寸适于接收在成像室中的样本支撑表面，并且被定向成面向成像设备的视口。 支撑表面基本上是不透明的，并且限定了能够使光通过的窗口部分。 窗口部分被选择性地定尺寸和尺寸使得当被支撑在支撑表面上方时，样本可以以基本上在其之间形成不透光密封的方式被定位和安置在窗口部分上。 照明组件还包括激发光源，以及一束光纤束，其光纤束的近端与光源光学连通。 股线的末端终止于支撑表面的窗口部分。 远端各自发出源自光源的相应光束，然后将它们共同指向窗口部分并进入样本的底侧，其中漫射光通过其并穿过其顶侧并通过观察端口接收 以观察样品的荧光。

公开(公告)号：US06714300B1

公开(公告)日：2004-03-30

申请号：US09294869

申请日：1999-04-20

Applicant: Allan Rosencwaig ,  Lanhua Wei

Inventor： Allan Rosencwaig ,  Lanhua Wei

IPC: G01J400

CPC classification number: H01L21/02046 ,  G01N21/211 ,  G01N21/9501 ,  G01N2201/0227 ,  G01N2201/023 ,  H01L21/02054 ,  H01L21/67028 ,  H01L21/67115 ,  H01L22/20

Abstract: A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing this contamination layer prior to measurement. This contamination layer can be effectively removed in a non-destructive fashion by subjecting the wafer to a cleaning step. In one embodiment, the cleaning is performed by exposing the wafer to microwave radiation. Alternatively, the wafer can be cleaned with a radiant heat source. These two cleaning modalities can be used alone or in combination with each other or in combination with other cleaning modalities. The cleaning step may be carried out in air, an inert atmosphere or a vacuum. Once the cleaning has been performed, the wafer can be measured using any number of known optical measurement systems.

公开(公告)号：USD1042183S1

公开(公告)日：2024-09-17

申请号：US29919639

申请日：2023-12-05

Applicant: Wyatt Technology LLC

Designer： Sigrid C. Kuebler ,  Ross E. Bryant ,  Shiladitya Sen ,  Ryan Olson ,  Nicholas Wong ,  Marco Vanella ,  Ryan Thomas ,  Patrick Tufts ,  Jared Naito

CPC classification number: G01N21/47 ,  G01N2201/0227

Abstract: FIG. 1 is a front top perspective view of a first embodiment of an apparatus for measuring light scattering of a sample showing the new design; and,
FIG. 2 is a partial top perspective view thereof.
The broken lines in the figures are shown for the purpose of illustrating portions of the apparatus that form no part of the claimed design.

公开(公告)号：US20230358686A1

公开(公告)日：2023-11-09

申请号：US17951195

申请日：2022-09-23

Applicant: Wistron Corporation

Inventor： Yi-Hui Chen ,  Chen-Fa Wang

IPC: G01N21/88 ,  G06V10/40

CPC classification number: G01N21/8806 ,  G06V10/40 ,  G01N2201/0227

Abstract: An optical detection device includes a base, a cartridge placing portion, a shield cover, a processor, and an optical sensor. The base includes an opening. The cartridge placing portion is located in the base, and is in communication with the opening. The shield cover is configured to open or close the opening. When the optical sensor is actuated, the shield cover closes the opening to prevent external ambient light from entering the opening to affect the optical sensor during sensing.