公开(公告)号：US20130228700A1

公开(公告)日：2013-09-05

申请号：US13839064

申请日：2013-03-15

Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY

Inventor： Paulo C. Lozano ,  Natalya Anna Brikner ,  Chase Spencer Coffman

IPC: H01J37/08 ,  C25F3/14

CPC classification number: H01J37/08 ,  C25F3/14 ,  F03H1/0012 ,  H01J9/025 ,  H01J27/26 ,  H01J2237/0802

Abstract: An ionic liquid ion source can include a microfabricated body including a base and a tip. The body can be formed of a porous material compatible with at least one of an ionic liquid or room-temperature molten salt. The body can have a pore size gradient that decreases from the base of the body to the tip of the body, such that the at least one of an ionic liquid or room-temperature molten salt is capable of being transported through capillarity from the base to the tip.

公开(公告)号：US20120068067A1

公开(公告)日：2012-03-22

申请号：US13276879

申请日：2011-10-19

Applicant: Lawrence Scipioni

Inventor： Lawrence Scipioni

IPC: H01J37/26

CPC classification number: H01J37/08 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/0453 ,  H01J2237/0653 ,  H01J2237/0802 ,  H01J2237/31732 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: The disclosure relates to ion beams systems, such as gas field ion microscopes, having multiple modes of operation, as well as related methods. In some embodiments, the disclosure provides a method of operating a gas field ion microscope system that includes a gas field ion source, where the gas field ion source includes a tip including a plurality of atoms.

Abstract translation: 本公开涉及具有多种操作模式的离子束系统，例如气体离子显微镜，以及相关方法。 在一些实施例中，本公开提供了一种操作包括气体离子源的气体场离子显微镜系统的方法，其中气体场离子源包括具有多个原子的尖端。

公开(公告)号：US5825035A

公开(公告)日：1998-10-20

申请号：US745657

申请日：1996-11-08

Applicant: Michinobu Mizumura ,  Yuuichi Hamamura ,  Junzou Azuma ,  Akira Shimase ,  Takashi Kamimura ,  Fumikazu Itoh ,  Kaoru Umemura ,  Yoshimi Kawanami ,  Yuuichi Madokoro

Inventor： Michinobu Mizumura ,  Yuuichi Hamamura ,  Junzou Azuma ,  Akira Shimase ,  Takashi Kamimura ,  Fumikazu Itoh ,  Kaoru Umemura ,  Yoshimi Kawanami ,  Yuuichi Madokoro

IPC: H01J37/317

CPC classification number: H01J37/3056 ,  H01J2237/0802 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/0817 ,  H01J2237/31732 ,  H01J2237/31742

Abstract: A processing method using a plasma ion source for generating a focused ion beam, characterized by covering, with an insulator, an inner wall of a plasma holding vessel excluding a reference electrode for applying a voltage to a plasma and an ion extraction electrode for extracting ions from the plasma, and employing means of continuously controlling the absolute value of an ion beam current in a range of from 1 to 10 .mu.A by changing the absolute value of an ion extraction voltage applied between the reference electrode and the ion extraction electrode in a range of from 0 to 100 V; and an apparatus for carrying out the processing method. This is advantageous in stabilizing the ion beam current and in preventing the ion beam from being made dim even when the current value of the ion beam is changed.

Abstract translation: 一种使用等离子体离子源产生聚焦离子束的处理方法，其特征在于，用绝缘体覆盖除了用于向等离子体施加电压的参考电极之外的等离子体保持容器的内壁和用于提取离子的离子提取电极 并且通过改变在参考电极和离子提取电极之间施加的离子提取电压的绝对值，在1至10μA的范围内连续地控制离子束电流的绝对值的方法， 范围为0〜100V; 以及用于执行处理方法的装置。 这有利于稳定离子束电流，并且即使当离子束的电流值改变时也防止离子束变暗。

公开(公告)号：US5583344A

公开(公告)日：1996-12-10

申请号：US595993

申请日：1996-02-09

Applicant: Michinobu Mizumura ,  Yuuichi Hamamura ,  Junzou Azuma ,  Akira Shimase ,  Takashi Kamimura ,  Fumikazu Itoh ,  Kaoru Umemura ,  Yoshimi Kawanami ,  Yuuichi Madokoro

Inventor： Michinobu Mizumura ,  Yuuichi Hamamura ,  Junzou Azuma ,  Akira Shimase ,  Takashi Kamimura ,  Fumikazu Itoh ,  Kaoru Umemura ,  Yoshimi Kawanami ,  Yuuichi Madokoro

IPC: G01Q30/20 ,  G01Q60/52 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J37/3056 ,  H01J2237/0802 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/0817 ,  H01J2237/31732 ,  H01J2237/31742 ,  H01J2237/31749

Abstract: A processing method and a processing apparatus realizing the method use a focused ion beam generator. The apparatus includes a plasma or liquid metal ion source producing ions not influencing electric characteristics of a sample, an ion beam generator for extracting ions from the ion source into an ion beam, an ion beam focusing device for focusing the ion beam, an irradiator for irradiating the focused ion beam onto the sample, and a sample chamber in which the sample to be irradiated for processing is installed. The focused ion beam is irradiated onto a sample such as a silicon wafer or device to conduct on a particular position of the sample a fine machining work, a fine layer accumulation, and an analysis.

公开(公告)号：US4994711A

公开(公告)日：1991-02-19

申请号：US455110

申请日：1989-12-22

Applicant: Jesse N. Matossian

Inventor： Jesse N. Matossian

IPC: H01J27/26

CPC classification number: H01J27/26 ,  H01J2237/0802

Abstract: A solid electrolyte ion source has an emitting tip which is small enough to concentrate an elecric field from an extraction plate and thereby significantly increase the extracted current density compared to prior solid electrolyte sources. The source is heated to a temperature sufficient to induce a thermionic ion emission from the tip. The ion emission can be varied independent of the extraction field by varying the degree of heating, thereby preserving a constant focused ion beam spot size during changes of beam brightness. The tip preferably has a radius in the approximate range of 1-10 microns. The source can be used for ion-microprobe surface analysis and micro-circuit fabrication applications previously unavailable with solid electrolyte sources.

Abstract translation: 固体电解质离子源具有足够小的发射尖端以从提取板浓缩电场，从而与现有固体电解质源相比显着增加提取的电流密度。 将源加热到足以引起来自尖端的热离子离子发射的温度。 离子发射可以通过改变加热程度而与提取场无关地变化，从而在光束亮度改变期间保持恒定的聚焦离子束斑点尺寸。 尖端优选地具有在1-10微米的近似范围内的半径。 该源可用于以前不能用于固体电解质源的离子 - 微孔表面分析和微电路制造应用。