Abstract:
Embodiments of a semiconductor wafer having wafer-level die attach metallization on a back-side of the semiconductor wafer, resulting semiconductor dies, and methods of manufacturing the same are disclosed. In one embodiment, a semiconductor wafer includes a semiconductor structure and a front-side metallization that includes front-side metallization elements for a number of semiconductor die areas. The semiconductor wafer also includes vias that extend from a back-side of the semiconductor structure to the front-side metallization elements. A back-side metallization is on the back-side of the semiconductor structure and within the vias. For each via, one or more barrier layers are on a portion of the back-side metallization that is within the via and around a periphery of the via. The semiconductor wafer further includes wafer-level die attach metallization on the back-side metallization other than the portions of the back-side metallization that are within the vias and around the peripheries of the vias.
Abstract:
A device includes a vacuum nozzle, a driver, a measuring unit, and a controller. The nozzle lifts and holds a photoelectric element having a first electrode and a second electrode. The driver drives the nozzle to press the photoelectric element onto a substrate having a soldering pad and a contact, such that the second electrode is electrically connected to the soldering pad via a layer of conductive glue.The measuring unit measures a resistance across the first electrode and the contact of the substrate when the photoelectric element is pressed onto the substrate. The controller controls the driver to drive the nozzle to keep pressing the photoelectric element harder and harder into the substrate until the resistance stops decreasing, that is, when the layer of conductive glue is at its thinnest.
Abstract:
A semiconductor device connected using an anisotropic conductive adhesive composition, the anisotropic conductive adhesive composition including a thermosetting polymerization initiator; and tetrahydrofurfuryl (meth)acrylate or furfuryl (meth)acrylate, wherein the tetrahydrofurfuryl (meth)acrylate or furfuryl (meth)acrylate is present in the composition in an amount of 1 wt % to 25 wt %, based on the total weight of the composition in terms of solid content.
Abstract:
The invention relates to an electrical module (100) for being received by automatic placement machines by means of generating a vacuum, comprising a carrier substrate (10), at least one component (20, 21) disposed on the carrier substrate (10), and a cover element (30) disposed above the at least one component (20, 21). A fixing component (40) by which the cover element (30) is attached to the at least one component (21) is disposed between the cover element (30) and the at least one component (21). The cover element can be implemented as a dimensionally stable, flat film by means of which it is possible to suction the module by means of vacuum for a placement method, and to place said module at a position on a circuit board.
Abstract:
A semiconductor apparatus adhesive composition having excellent adhesion properties when pressure-bonded and has excellent connection reliability and insulation reliability when hardened and an adhesive sheet using this adhesive composition. An adhesive composition including: (A) a silicone resin constituted of a repeating unit represented by the following general formula (1); (B) a thermosetting resin; and (C) a compound having a flux activity, where R1 to R4 represent univalent hydrocarbon groups having carbon numbers from 1 to 8, which are equal to or different from each other; each of l and m is an integer from 1 to 100; each of a, b, c, and d is 0 or a positive number and meets 0
Abstract translation:一种半导体装置粘合剂组合物,当粘合时具有优异的粘合性能,并且当硬化时具有优异的连接可靠性和绝缘可靠性,以及使用该粘合剂组合物的粘合 一种粘合剂组合物,其包含:(A)由以下通式(1)表示的重复单元构成的有机硅树脂; (B)热固性树脂; 和(C)具有助焊剂活性的化合物,其中R 1至R 4表示碳数为1至8的一价烃基,它们彼此相同或不同; 1和m各自为1至100的整数; a,b,c和d中的每一个为0或正数,满足0 <(c + d)/(a + b + c + d) 并且X和Y各自为二价有机基团。
Abstract:
Electronic circuit arrangement, includes a chip and a chip carrier having a substrate and a chip contact location. At least the chip contact location is provided with a soldering layer. The chip includes a bonding layer. A silver layer for eutectic bonding with the bonding layer is provided on the soldering layer in the region of the chip contact location.
Abstract:
Electronic circuit arrangement, includes a chip and a chip carrier having a substrate and a chip contact location. At least the chip contact location is provided with a soldering layer. The chip includes a bonding layer. A silver layer for eutectic bonding with the bonding layer is provided on the soldering layer in the region of the chip contact location.
Abstract:
A method of making 3D integrated circuits and a 3D integrated circuit structure. There is a first semiconductor structure joined to a second semiconductor structure. Each semiconductor structure includes a semiconductor wafer, a front end of the line (FEOL) wiring on the semiconductor wafer, a back end of the line (BEOL) wiring on the FEOL wiring, an insulator layer on the BEOL wiring and a metallic layer on the insulator layer. The first semiconductor structure is aligned with the second semiconductor structure such that the metallic layers of each of the semiconductor structures face each other. The metallic layers of each of the semiconductor structures are in contact with and bonded to each other by a metal to metal bond wherein the bonded metallic layers form an electrically isolated layer.
Abstract:
An object of the invention is to provide a method for producing a conductive member having low electrical resistance, and the conductive member is obtained using a low-cost stable conductive material composition that does not contain an adhesive. A method for producing a semiconductor device in which silver or silver oxide provided on a surface of a base and silver or silver oxide provided on a surface of a semiconductor element are bonded, includes the steps of arranging a semiconductor element on a base such that silver or silver oxide provided on a surface of the semiconductor element is in contact with silver or silver oxide provided on a surface of the base, temporarily bonding the semiconductor element and the base by applying a pressure or an ultrasonic vibration to the semiconductor element or the base, and permanently bonding the semiconductor element and the base by applying heat having a temperature of 150 to 900° C. to the semiconductor device and the base.
Abstract:
Electronic circuit arrangement, includes a chip and a chip carrier having a substrate and a chip contact location. At least the chip contact location is provided with a soldering layer. The chip includes a bonding layer. A silver layer for eutectic bonding with the bonding layer is provided on the soldering layer in the region of the chip contact location.