Abstract:
Apparatus for an ion engine comprises a three-grid accelerator system with the decelerator grid biased negative of the beam plasma. This arrangement substantially reduces the charge-exchange ion current reaching the accelerator grid at high tank pressures, which minimizes erosion of the accelerator grid due to charge-exchange ion sputtering, known to be the major accelerator grid wear mechanism. An improved method for life testing ion engines is also provided using the disclosed apparatus. In addition, the invention can also be applied in materials processing.
Abstract:
A method and apparatus for modifying the inner surface of a tube by ion surface modification techniques, such as ion implantation, ion mixing and ion beam assisted coating. The apparatus includes a plasma source, preferably a vacuum arc, a first magnet for guiding the plasma into a drift tube. A second magnet is spaced from the first magnet and has a current running opposite to the first magnet. A radial extractor surrounds the area between the magnets, which form a cusp therebetween. The plasma follows the field lines, exiting the drift tube to the extractor, where the ions are removed and accelerated outwardly in a radial direction. With the entire apparatus placed in a tube, the ions will impact the inner wall of the tube. The resulting ion implantation advantageously modifies the surface, typically increasing wear and erosion resistance, improving corrosion resistance, increasing fatigue life, etc. The apparatus may be used to coat the tube interior with the cathode material by operating the extractor at a lower voltage or omitting the extractor. The apparatus may be inserted in tubes and moved along the tube to treat the walls of very long tubes.
Abstract:
A sealed neutron tube is set forth, containing a low-pressure gaseous deuterium-tritium mixture wherefrom an ion source (13) forms an ion beam which traverses an acceleration electrode (17) and is projected with high energy onto a target (16) in order to produce therein a fusion reaction which causes an emission of neutrons. In accordance with the invention, the ion source comprises a cold cathode with strictly electrostatic confinement of ionizing electrons; this is achieved by using an anode which is connected to a positive potential and which has a weakly collective surface facing the repulsive surface of the cathode cavity; the anode is arranged along the axis of the cavity in which it is arranged; said cavity constitutes the internal part of the cathode (15) in which the electrons (e.sub.2) which oscillate along very long paths in comparison with the dimensions of the cathode cavity ionize the gas and form an ionized gas wherefrom the ion beam (22) is extracted for standard ion optical device (17).
Abstract:
An ion source according to the present invention includes a first chamber, including a main chamber having an electron generating arrangement therein, and a sub-chamber communicating with the main chamber through a nozzle, for producing a first plasma by a discharge. A supply is also provided for supplying a first gas for a discharge into the main chamber, as well as an electron extracting arrangement for extracting electrons from the first plasma. Also included are a second chamber for producing a second plasma by discharge excitation of the extracted electrons and ionizing a second gas as a source gas, a further supply for supplying the second gas into the second chamber, and a magnetic field generator for generating a magnetic field for guiding the extracted electrons toward the second chamber. The electron extracting arrangement includes an electrode between the sub-chamber and the second chamber. The electrode has a first hole, formed at a position opposite to the opening of the nozzle, for allowing the extracted electrons to pass therethrough and to move into the second chamber, and second holes, arranged around the first hole, for allowing part of the first gas injected from the nozzle to pass therethrough and to move into the second chamber. Part of the first gas is drawn into the second chamber through the second holes of the electrode, and the density of the first gas passing through the first hole is decreased.
Abstract:
An electrode for a plasma arc torch and a method of fabricating the same are disclosed, and wherein the electrode includes a copper holder having a lower end which mounts an emissive insert which acts as the cathode terminal for the arc during operation. Where the torch is used in an oxidizing atmosphere, the copper holder tends to oxidize, and the arc tends to attach to the oxidized copper rather than the insert, which results in the rapid destruction of the holder. To prevent this destruction, the present invention incorporates a sleeve of silver or other metal having a relatively high work function, and which is positioned to surround the insert and form an annular ring on the lower end surface of the holder and thus to surround the exposed end face of the emissive insert. The annular ring serves to prevent arcing from the copper holder, and so that the arc is maintained on the insert.
Abstract:
A vacuum arc source of ions of metals utilizing the principle of forming anode spots, whose anode surface (8) is fed with liquid metal (7) originating from a reservoir (6) through a connection member (9). The connection member is preferably constituted by a material chosen so that it has with respect to the liquid metal a great difference in the temperatures required to obtain the same vapor tension. The mode of feeding through the connection member is in embodiments of the invention obtained by means of a porous material (13) or contiguous slots (14). The liquid metals can be liquid at the ambient temperature (gallium, caesium) or be liquified by heating (tin, indium).
Abstract:
A vacuum arc ion device having a plasma-emissive cathode and an anode, each being energized with suitable potentials, and having the further structure for eliminating micro drops of molten material which micro drops are emitted for certain materials during plasma formation.
Abstract:
Method of ionizing a gas within a chamber having a cathode disposed therein, wherein the sputtering effect upon the cathode is substantially reduced to prolong the life of the cathode. The cathode within the chamber is initially activated to emit thermal electrons by applying a voltage thereto. The gas to be ionized is then introduced into the chamber along with an active gas. Ionization of the gas to be ionized is then achieved by subjecting the gas to be ionized to the thermal electrodes emitted by the cathode. The voltage applied to the cathode and the voltage between the cathode and the wall of the chamber are regulated so as to maintain a substantially constant electric arc current flowing from the wall of the chamber to the cathode. A predetermined mixture ratio is maintained as between the active gas and the gas to be ionized within the chamber so as to induce growth in the volume of the cathode at least partially offsetting the removal of atoms from the cathode caused by sputtering, the predetermined mixture ratio being maintained by controlling the introduction of the active gas into the chamber.
Abstract:
An ion source for producing an ion beam utilized for fabrication and processing of semiconductors, thin films or the like includes a plasma producing chamber equipped with first magnetic means for limiting a plasma region and a plasma expansion chamber provided in combination with the plasma producing chamber on the side where a beam extracting electrode is disposed. The plasma expansion chamber is provided with second magnet array for confining and holding a plasma region therein which is of a larger area than that of the plasma region formed in the plasma producing chamber.
Abstract:
A source of a beam of ions includes in a housing a cathode filament, an anode spaced from the cathode and housing an ion emission opening therethrough and an intermediate electrode between the cathode and anode and having an opening therethrough in alignment with the opening in the anode. An inlet opening extends through the housing into the space between the anode and the intermediate electrode to admit a flow of starting gas and the gas to be ionized into the housing. An outlet opening is through the housing adjacent the cathode and a pump is connected to the outlet opening. In the operation of the ion source a flow of the starting gas is provided through the housing and over the cathode to initiate the discharge. Then the gas to be ionized is admitted into the housing. Some of the gas is ionized to generate the desired ions and the rest of the gas is drawn out of the housing to remove impurities generated at the cathode and thereby increase the lifetime of the cathode. Once the ionizing gas is admitted into the housing, the flow of the starting gas is stopped.