公开(公告)号：US20210079527A1

公开(公告)日：2021-03-18

申请号：US17011828

申请日：2020-09-03

Applicant: ASM IP HOLDING B.V.

Inventor： Carl Louis White ,  Eric James Shero ,  Kyle Fondurulia

IPC: C23C16/48 ,  C23C16/52 ,  C23C16/44

Abstract: Systems and methods related to temperature zone control systems can include a reactant source cabinet that is configured to be at least partially evacuated, a vessel base that is configured to hold solid source chemical reactant therein, and a lid that is coupled to a distal portion of the vessel base. The lid may include one or more lid valves. The system may further include a plurality of gas panel valves that are configured to deliver gas from a gas source to the vessel. The system may include a heating element that is configured to heat the one or more lid valves. The system may include a heat shield, a first portion of which is disposed between the one or more lid valves and the vessel base. A second portion of the heat shield may be disposed between the first heating element and the plurality of gas panel valves.

公开(公告)号：US20210071301A1

公开(公告)日：2021-03-11

申请号：US17011833

申请日：2020-09-03

Applicant: ASM IP HOLDING B.V.

Inventor： Paul Ma ,  Carl Louis White ,  Eric James Shero

IPC: C23C16/455

Abstract: Herein disclosed are systems and methods related to solid source chemical intermediate fill vessels. The fill vessel can include a proximate end, a distal end, and a base disposed at the proximate end that is configured to hold solid source chemical reactant therein. The intermediate fill vessel can further include a lid at the distal end comprising a second thermal conductor. The lid can include a chemical inlet, a carrier gas inlet, and a chemical outlet. The fill vessel can further include an intermediate layer that is disposed between the base and the lid. The intermediate layer may include an insulator that is configured to reduce heat flow between the base and the lid.

公开(公告)号：US20200373187A1

公开(公告)日：2020-11-26

申请号：US16875088

申请日：2020-05-15

Applicant: ASM IP HOLDING B.V.

Inventor： Raj Singu ,  Todd Robert Dunn ,  Carl Louis White ,  Herbert Terhorst ,  Eric James Shero ,  Bhushan Zope

IPC: H01L21/683 ,  B25B11/00

Abstract: A workpiece susceptor body can include a front face configured to support a workpiece, a back face opposite the front face, a workpiece contact zone at least partially forming a support boundary on an inner portion of the front face, and a plurality of axial channels disposed within the susceptor body. The workpiece contact zone can be disposed radially inward of an outer edge of a workpiece positioned on the front face in a processing configuration. Each of the plurality of axial channels may connect to corresponding openings extending into an outer portion of the front face. Each of the openings may be disposed radially outward of the workpiece contact zone of the susceptor body.

公开(公告)号：US10480072B2

公开(公告)日：2019-11-19

申请号：US15182504

申请日：2016-06-14

Applicant: ASM IP HOLDING, B.V.

Inventor： Eric James Shero ,  Mohith E. Verghese ,  Carl Louis White ,  Herbert Terhorst ,  Dan Maurice

IPC: C23C16/455 ,  H01L21/02

Abstract: A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

公开(公告)号：US20190157054A1

公开(公告)日：2019-05-23

申请号：US16251534

申请日：2019-01-18

Applicant: ASM IP Holding B.V.

Inventor： Carl Louis White ,  Mohith Verghese ,  Eric James Shero ,  Todd Robert Dunn

IPC: H01J37/32

Abstract: Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.

公开(公告)号：US10276355B2

公开(公告)日：2019-04-30

申请号：US14656588

申请日：2015-03-12

Applicant: ASM IP Holding B.V.

Inventor： Carl Louis White ,  Mohith Verghese ,  Eric James Shero ,  Todd Robert Dunn

IPC: H01J37/32

Abstract: Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.

公开(公告)号：US20180094350A1

公开(公告)日：2018-04-05

申请号：US15283120

申请日：2016-09-30

Applicant: ASM IP Holding B.V.

Inventor： Mohith Verghese ,  Eric James Shero ,  Carl Louis White ,  Kyle Fondurulia

IPC: C23C16/448 ,  C23C16/455

CPC classification number: C23C16/4481

Abstract: Herein disclosed are systems and methods related to solid source chemical vaporizer vessels and multiple chamber deposition modules. In some embodiments, a solid source chemical vaporizer includes a housing base and a housing lid. Some embodiments also include a first and second tray configured to be housed within the housing base, wherein each tray defines a first serpentine path adapted to hold solid source chemical and allow gas flow thereover. In some embodiments, a multiple chamber deposition module includes first and second vapor phase reaction chambers and a solid source chemical vaporizer vessel to supply each of the first and second vapor phase reaction chambers.

公开(公告)号：US20170011909A1

公开(公告)日：2017-01-12

申请号：US14792051

申请日：2015-07-06

Applicant: ASM IP HOLDING B.V.

Inventor： Carl Louis White ,  John Kevin Shugrue

IPC: H01L21/02 ,  C25D5/34 ,  C23C16/455

CPC classification number: C23C16/4404 ,  C25D11/04 ,  C25D11/16

Abstract: An apparatus and methods are provided related to a surface of a reaction chamber assembly component. The surface may be roughened and/or anodized to provide desirable emissivity and porosity to help reduce burn-in time of a reaction chamber and to help reduce particles within the chamber. The apparatus and methods may be suitable for thin film deposition on semiconductor or other substrates.

Abstract translation: 提供了与反应室组件部件的表面相关的装置和方法。 表面可以被粗糙化和/或阳极氧化以提供所需的发射率和孔隙率，以帮助减少反应室的燃烧时间并帮助减少室内的颗粒。 该装置和方法可适用于半导体或其它基板上的薄膜沉积。

公开(公告)号：US20160268107A1

公开(公告)日：2016-09-15

申请号：US14656588

申请日：2015-03-12

Applicant: ASM IP Holding B.V.

Inventor： Carl Louis White ,  Mohith Verghese ,  Eric James Shero ,  Todd Robert Dunn

IPC: H01J37/32

CPC classification number: H01J37/32899 ,  H01J37/3244 ,  H01J37/32513 ,  H01J37/32715 ,  H01J37/32733

Abstract: Multi-zone reactors, systems including a multi-zone reactor, and methods of using the systems and reactors are disclosed. Exemplary multi-zone reactors include a movable susceptor assembly and a moveable plate. The movable susceptor assembly and movable plate can move vertically between reaction zones of a reactor to expose a substrate to multiple processes or reactants.

Abstract translation: 公开了多区域反应器，包括多区域反应器的系统以及使用该系统和反应器的方法。 示例性多区域反应器包括可移动基座组件和可移动板。 活动基座组件和可移动板可以在反应器的反应区之间垂直移动以将基底暴露于多个过程或反应物。

公开(公告)号：US20160268102A1

公开(公告)日：2016-09-15

申请号：US14645234

申请日：2015-03-11

Applicant: ASM IP Holding B.V.

Inventor： Carl Louis White ,  Eric James Shero ,  Mohith Verghese

IPC: H01J37/32 ,  B08B7/00 ,  C23C16/455

CPC classification number: H01J37/32449 ,  B08B7/00 ,  C23C16/45544 ,  C23C16/45557 ,  C23C16/4583 ,  H01J37/32458 ,  H01J37/32816

Abstract: Gas-phase reactors and systems are disclosed. Exemplary reactors include a reaction chamber having a tapered height. Tapering the height of the reactor is thought to reduce a pressure drop along the flow of gasses through the reactor. Exemplary reactors can also include a spacer within a gap to control a flow of gas between a region and a reaction chamber.

Abstract translation: 公开了气相反应器和系统。 示例性反应器包括具有锥形高度的反应室。 据认为，将反应器的高度缩小以减少沿着气体通过反应器的气流的压降。 示例性反应器还可以包括在间隙内的间隔物，以控制区域和反应室之间的气体流。