公开(公告)号：US20240310639A1

公开(公告)日：2024-09-19

申请号：US18675404

申请日：2024-05-28

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G02B27/01

CPC classification number: G02B27/0172 ,  G02B27/0176

Abstract: Metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device are provided. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase ψ at a reference point directly adjacent to a second surface of the at least one optical device.

公开(公告)号：US20240142693A1

公开(公告)日：2024-05-02

申请号：US18495409

申请日：2023-10-26

Applicant: Applied Materials, Inc.

Inventor： Ludovic GODET ,  Jinxin FU

IPC: F21V8/00 ,  G02B5/18

CPC classification number: G02B6/0065 ,  G02B5/1852

Abstract: Methods for modifying the interface of optical substrates. To achieve desirable optical properties, surface defects need to be removed from the interface layer. In one example, a substrate is exposed to an ion beam then a high temperature bake or laser annealing to correct the interface layer. In another example, a high energy ion beam can be used to remove the interface layer then a new interface layer can be added during a high temperature bake or laser annealing with a protective layer added last. If not removed surface defects in the interface layer may absorb a percentage of light in a single interaction. In a waveguide, light may bounce ten to hundreds of times inside a substrate causing significant light loss. Therefore, removing the surface defects significantly increases waveguide efficiency.

公开(公告)号：US20240142690A1

公开(公告)日：2024-05-02

申请号：US18473079

申请日：2023-09-22

Applicant: Applied Materials, Inc.

Inventor： Yingdong LUO ,  Jinxin FU ,  Zhengping YAO ,  Daihua ZHANG ,  Ludovic GODET

IPC: F21V8/00

CPC classification number: G02B6/0016 ,  G02B6/002 ,  G02B6/0036 ,  G02B6/0046 ,  G02B6/0065

Abstract: An apparatus for waveguides and a method of fabricating a waveguide combiner having at least one grating with trenches gap-filled with variable refractive index materials. At least two trenches of at least one grating includes a first gap-fill material having a first volume and a first refractive index, and a second gap-fill material having a second volume and a second refractive index different than the first refractive index. Control of the deposition of first volume and the deposition of second volume in an inkjet deposition process provide for the formation of the grating with two trenches that have different refractive indices and different gap-fill depths. The first gap-fill material and the second gap-fill material merge to form the gap-filler. Therefore, by controlling the varied refractive indices and different gap-fill depths the waveguide combiner is optimized by efficiency or a color uniformity.

公开(公告)号：US20240142339A1

公开(公告)日：2024-05-02

申请号：US18384126

申请日：2023-10-26

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ravi KOMANDURI ,  Chi-Yuan YANG

IPC: G01M11/02

CPC classification number: G01M11/0257

Abstract: The present disclosure relates to metrology measurement systems, and related methods. In one or more embodiments a system, includes a substrate support, and an optical arm. The optical arm includes a light source operable to project a first beam on a first light path. The optical arm also includes a first lens, a first beam splitter, a second lens, a first detector, and an aperture. The first lens is disposed on the first light path and between the substrate support and the light source. The first beam splitter is disposed on the first light path. The first beam splitter is positioned between the substrate support and the light source. The first detector is disposed on the second light path. The second lens focuses the second beam to a second beam diameter. The aperture is disposed between the second lens and the first detector.

公开(公告)号：US20240125670A1

公开(公告)日：2024-04-18

申请号：US18397977

申请日：2023-12-27

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Kang LUO ,  Fariah HAYEE ,  Ludovic GODET

IPC: G01M11/02

CPC classification number: G01M11/0285 ,  G01M11/0207

Abstract: A method of optical device metrology is provided. The method includes introducing a first type of light into a first optical device during a first time period, the first optical device including an optical substrate and an optical film disposed on the optical substrate, the first optical device further including a first surface, a second surface, and one or more sides connecting the first surface with the second surface; and measuring, during the first time period, a quantity of the first type of light transmitted from a plurality of locations on the first surface or the second surface during the first time period, wherein the measuring is performed by a detector coupled to one or more fiber heads positioned to collect the light transmitted from the plurality of locations.

公开(公告)号：US20240101937A1

公开(公告)日：2024-03-28

申请号：US18472688

申请日：2023-09-22

Applicant: Applied Materials, Inc.

Inventor： Wei WU ,  Jhenghan YANG ,  Yongmei CHEN ,  Jinxin FU ,  Ludovic GODET

IPC: C11D7/32 ,  C11D11/00

CPC classification number: C11D7/3281 ,  C11D11/0023 ,  C11D11/0064 ,  C11D11/007

Abstract: Embodiments of the present disclosure herein include a method of removing a contamination material from an optical device. The method may include disposing an optical device in a process chamber, the optical device having optical device structures formed in a substrate, the contamination material is disposed at least on sidewalls of the optical device structures and within trenches between the optical device structures, and exposing the optical device to a plasma generated in the process chamber, the plasma generated from oxygen gas (O2), chlorine gas (Cl2), Argon (Ar), or a combination thereof, the exposing the optical device to the plasma removes the contamination material.

公开(公告)号：US20230314126A1

公开(公告)日：2023-10-05

申请号：US18118269

申请日：2023-03-07

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G01B11/26 ,  G02B5/30 ,  G02B3/00 ,  G02B26/12

CPC classification number: G01B11/26 ,  G02B5/3025 ,  G02B3/00 ,  G02B26/123 ,  G02B2207/123

Abstract: Embodiments described herein provide for a measurement system having an aperture filtering component and methods of utilizing the measurement system. The measurement system described herein includes a measurement arm and a stage. The measurement arm projects a light beam to a top surface of an optical device structure. Multi-reflection beams resulting from reflections and diffraction off other surfaces of a non-opaque substrate leads to interference. The measurement arm includes an aperture (e.g., an aperture filtering component) that filters the multi-reflection beams from being relayed to the detector. As such, only images of the light beam are relayed to the detector.

公开(公告)号：US20230230991A1

公开(公告)日：2023-07-20

申请号：US18185863

申请日：2023-03-17

Applicant: Applied Materials, Inc.

Inventor： Jinxin FU ,  Yongan XU ,  Ludovic GODET ,  Naamah ARGAMAN ,  Robert Jan VISSER

IPC: H04N25/611 ,  H04N23/16 ,  H04N25/13 ,  H04N5/265

CPC classification number: H04N25/611 ,  H04N23/16 ,  H04N25/134 ,  H04N5/265

Abstract: An imaging system and a method of creating composite images are provided. The imaging system includes one or more lens assemblies coupled to a sensor. When reflected light from an object enters the imaging system, incident light on the metalens filter systems creates filtered light, which is turned into composite images by the corresponding sensors. Each metalens filter system focuses the light into a specific wavelength, creating the metalens images. The metalens images are sent to the processor, wherein the processor combines the metalens images into one or more composite images. The metalens images are combined into a composite image, and the composite image has reduced chromatic aberrations.

公开(公告)号：US20230046330A1

公开(公告)日：2023-02-16

申请号：US17876195

申请日：2022-07-28

Applicant: Applied Materials, Inc.

Inventor： Yangyang SUN ,  Jinxin FU ,  Ludovic GODET

IPC: G02B27/01

Abstract: Embodiments described herein provide for metrology tools and methods of obtaining a full-field optical field of an optical device to determine multiple metrology metrics of the optical device. A metrology tool is utilized to split a light beam into a first light path and a second light path. The first light path and the second light path are combined into a combined light beam and delivered to the detector. The detector measures the intensity of the combined light beam. A first equation and second equation are utilized in combination with the intensity measurements to determine an amplitude and phase Ψ at a reference point directly adjacent to a second surface of the at least one optical device.

公开(公告)号：US20220368817A1

公开(公告)日：2022-11-17

申请号：US17661928

申请日：2022-05-04

Applicant: Applied Materials, Inc.

Inventor： MICHAEL DAVID-SCOTT KEMP ,  Jinxin FU

IPC: H04N5/225 ,  G06T7/00

Abstract: Embodiments described herein relate to an inspection system for illumination of optical devices. The inspection system includes a stage, a focusing lens, a light source, a reflective surface, and a camera. The inspection system is operable to provide a light to a substrate. The substrate is positioned on the inspection system such that an edge of the substrate is exposed. The inspection system focuses light to the edge such that the light propagates through the substrate. The light is coupled out of the substrate, illuminating one or more optical devices disposed on the substrate. The illumination allows the camera to capture images to be inspected. The images are inspected to detect defects of the substrate.