公开(公告)号：US20040157003A1

公开(公告)日：2004-08-12

申请号：US10479033

申请日：2003-11-26

Inventor： Hubert Baumgart ,  Karl-Heinz Joost ,  Uwe Meisenburg

IPC: C08F002/48 ,  B05D003/00 ,  G21H005/00 ,  C08J007/18

CPC classification number: C09D175/16 ,  B05D3/0486 ,  B05D3/067 ,  B05D7/52 ,  B05D7/56 ,  C08G18/6254 ,  C08G18/8175 ,  C09D133/066 ,  C08L2666/28

Abstract: A process for producing coatings, in which (I) coating materials are applied to substrates or to uncured, part-cured and/or fully cured coating films present on said substrates, and (II) the resulting films of the coating materials are cured thermally and with actinic radiation, alone or together with the coating films, which involves (1) conducting the actinic radiation cure under an oxygen-depleted atmosphere and (2) the coating materials comprising (A) meth(acrylate) copolymers which have an OH number of from 100 to 220 mg KOH/G, a glass transition temperature of null35 to null60null C., a number-average molecular weight of from 1 000 to 10 000 daltons and a mass-average molecular weight of from 2 000 to 40 000 daltons and which contain in copolymerized form an amount of hydroxyl-containing monomers (a) that corresponds to the OH number, of which (a1) from 20 to 90% by weight are based on (a), 4-hydroxybutyl (meth)acrylate and/or 2-alkylpropane-1,3-diol mono-(meth)acrylate, and (a2) from 10 to 80% by weight are based on (a), other hydroxyl-containing olefinically unsaturated monomers; and (B) from 0.2 to 8% by weight of photoinitiators.

Abstract translation: 一种制备涂层的方法，其中（I）涂层材料施加到基材上或者存在于所述基材上的未固化，部分固化和/或完全固化的涂膜，和（II）所得涂层材料的膜被热固化 和光化辐射，单独或与涂膜一起，其包括（1）在贫氧气氛下进行光化辐射固化和（2）包含（A）具有OH数的（A）甲基丙烯酸酯共聚物的涂料 100至220mg KOH / G，玻璃化转变温度为-35至+ 60℃，数均分子量为1000至10,000道尔顿，质均分子量为2 000至 40,000道尔顿，其以共聚形式含有相应于OH值的含羟基单体（a）的量，其中（a1）为20至90重量％，基于（a），4-羟基丁基（甲基） ）丙烯酸酯和/或2-烷基丙烷-1,3-二醇单（甲基）丙烯酸酯，和（a2）10 至80重量％基于（a），其它含羟基的烯属不饱和单体; 和（B）0.2至8重量％的光引发剂。

公开(公告)号：US06770324B2

公开(公告)日：2004-08-03

申请号：US09828308

申请日：2001-04-06

Applicant: Michael A. Hooker

Inventor： Michael A. Hooker

IPC: B05D312

CPC classification number: B05D5/02 ,  B05D3/0486 ,  B05D3/067 ,  B29C45/14811 ,  B29K2995/002 ,  B29K2995/0087 ,  B41M7/0045 ,  B41M7/0054 ,  B41M7/0081 ,  B41M7/009 ,  Y10T428/24802 ,  Y10T428/31507

Abstract: In the present invention, a protective coating is preferably formed as a plurality of dots upon a surface to be protected. The dots have a selected size, cover a selected amount of the underlying surface, and are preferably isolated from one another by uncoated surfaces. This coating not only provides the coated substrate or object (and the cured coating itself) with significantly increased flexibility and formability, but also with a wide range of possible surface finishes and textures. Due to the increased coating flexibility and formability, the coated substrate or object can be partially or even fully cured prior to forming operations such as injection molding or film shaping. The substrate or object is therefore less susceptible to damage from handling and from machine operations. One highly preferred coating embodiment is produced with ink having a controllable stipple amount for a significantly increased range of possible coating finishes and textures.

Abstract translation: 在本发明中，保护涂层优选在待保护表面上形成多个点。 点具有选定的尺寸，覆盖选定量的下表面，并且优选地通过未涂覆的表面彼此隔离。 该涂层不仅提供涂覆的基底或物体（和固化的涂层本身），具有显着增加的柔性和成形性，而且还具有广泛的可能的表面光洁度和纹理。 由于增加的涂层柔韧性和成形性，涂布的基材或物体在成型操作（例如注射成型或成膜）之前可以部分或甚至完全固化。 因此，基材或物体不易受到处理和机器操作的损害。 一个非常优选的涂层实施例由具有可控点数的油墨制成，以显着提高可能的涂层表面和纹理的范围。

公开(公告)号：US20040001921A1

公开(公告)日：2004-01-01

申请号：US10179587

申请日：2002-06-26

Applicant: Imation Corp.

Inventor： William Blake Kolb ,  Gary L. Huelsman ,  Thomas M. Milbourn ,  Timothy J. Edman ,  Joseph F. Fuller

IPC: B05D001/02

CPC classification number: B05D3/0486 ,  B05C5/005 ,  B05C5/007 ,  B05D1/28 ,  B05D1/305 ,  G11B5/842

Abstract: The invention is generally directed to techniques for reducing premature drying of solvent-based coatings, including premature drying at sites on the apparatus that applies the coatings. By introduction of solvent vapor proximate to the coating apparatus, and by passively bringing the solvent vapor to the site, the risk of premature drying is reduced. In the presence of the solvent vapor, solvent in the coating fluid tends not to evaporate quickly. The solvent vapor may be introduced by any of a variety of solvent vapor emission devices, and may be brought to the site passively by, for example, increasing the concentration of solvent vapor in a boundary layer that moves with the substrate being coated, diffusion, or natural convection.

Abstract translation: 本发明一般涉及减少溶剂型涂料过早干燥的技术，包括在施加涂层的装置上的位置处的过早干燥。 通过在涂布装置附近引入溶剂蒸气，并通过被动地将溶剂蒸气带到现场，降低了过早干燥的风险。 在溶剂蒸气的存在下，涂层液中的溶剂不易迅速蒸发。 溶剂蒸气可以通过各种溶剂蒸汽发射装置中的任何一种引入，并且可以被动地被带到现场，例如通过增加随涂覆的基底，扩散等移动的边界层中的溶剂蒸气的浓度， 或自然对流。

公开(公告)号：US06670287B2

公开(公告)日：2003-12-30

申请号：US10151967

申请日：2002-05-22

Applicant: Masami Akimoto ,  Yoichi Deguchi

Inventor： Masami Akimoto ,  Yoichi Deguchi

IPC: H01L2131

CPC classification number: H01L21/6715 ,  B05D1/005 ,  B05D3/0263 ,  B05D3/0486 ,  B05D3/0493 ,  B05D3/068 ,  B05D5/00 ,  H01L21/31 ,  H01L21/3105

Abstract: A closed space is formed in a reduced pressure drying station, and the closed space is brought to a vacuum state. In this state, an EB unit irradiates a wafer mounted on a hot plate with an electron beam to foam an insulating film material. Subsequently, the hot plate is raised to a predetermined temperature, and drying processing is performed under a reduced pressure. As described above, since the foaming processing is performed in the reduced pressure drying station, bubbles remain in the insulating film, so that the existence of the bubbles can decrease the relative dielectric constant.

公开(公告)号：US06623792B2

公开(公告)日：2003-09-23

申请号：US09780797

申请日：2001-02-09

Applicant: Toshihiro Akimori

Inventor： Toshihiro Akimori

IPC: G11B370

CPC classification number: G11B7/246 ,  B05D3/0486 ,  G11B7/007 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/259 ,  G11B7/2595 ,  G11B7/26

Abstract: This invention provides a method for producing a CD-R optical recording medium. A first stack at a first stage is created by forming on a substrate a recording layer containing an organic dyestuff and a metal layer. At least after a formation of the metal layer; the first stack is transported from the first stage along a transport path towards a second stage through an atmosphere having a relative humidity. The relative humidity is maintained at 40% or less. To control the relative humidity, a shielding plate may be provided around the transport path. An air conditioner may locally control the relative humidity of an area encircled by this shielding plate.

Abstract translation: 本发明提供一种制造CD-R光记录介质的方法。 通过在衬底上形成含有有机染料和金属层的记录层来产生第一阶段的第一叠层。 至少在形成金属层之后; 第一堆叠从第一阶段沿着输送路径朝向第二阶段通过具有相对湿度的气氛输送。 相对湿度保持在40％以下。 为了控制相对湿度，可以在输送路径周围设置遮蔽板。 空调可以局部地控制由该屏蔽板包围的区域的相对湿度。

公开(公告)号：US20020146543A1

公开(公告)日：2002-10-10

申请号：US09828308

申请日：2001-04-06

Inventor： Michael A. Hooker

IPC: B32B027/14

CPC classification number: B05D5/02 ,  B05D3/0486 ,  B05D3/067 ,  B29C45/14811 ,  B29K2995/002 ,  B29K2995/0087 ,  B41M7/0045 ,  B41M7/0054 ,  B41M7/0081 ,  B41M7/009 ,  Y10T428/24802 ,  Y10T428/31507

Abstract: In the present invention, a protective coating is preferably formed as a plurality of dots upon a surface to be protected. The dots have a selected size, cover a selected amount of the underlying surface, and are preferably isolated from one another by uncoated surfaces. This coating not only provides the coated substrate or object (and the cured coating itself) with significantly increased flexibility and formability, but also with a wide range of possible surface finishes and textures. Due to the increased coating flexibility and formability, the coated substrate or object can be partially or even fully cured prior to forming operations such as injection molding or film shaping. The substrate or object is therefore less susceptible to damage from handling and from machine operations. One highly preferred coating embodiment is produced with ink having a controllable stipple amount for a significantly increased range of possible coating finishes and textures.

Abstract translation: 在本发明中，保护涂层优选在待保护表面上形成多个点。 点具有选定的尺寸，覆盖选定量的下表面，并且优选地通过未涂覆的表面彼此隔离。 该涂层不仅提供涂覆的基底或物体（和固化的涂层本身），具有显着增加的柔性和成形性，而且还具有广泛的可能的表面光洁度和纹理。 由于增加的涂层柔韧性和成形性，涂布的基材或物体在成型操作（例如注射成型或成膜）之前可以部分或甚至完全固化。 因此，基材或物体不易受到处理和机器操作的损害。 一个非常优选的涂层实施例由具有可控点数的油墨制成，以显着提高可能的涂层表面和纹理的范围。

公开(公告)号：US20020127871A1

公开(公告)日：2002-09-12

申请号：US10151967

申请日：2002-05-22

Inventor： Masami Akimoto ,  Yoichi Deguchi

IPC: H01L021/31 ,  H01L021/469

CPC classification number: H01L21/6715 ,  B05D1/005 ,  B05D3/0263 ,  B05D3/0486 ,  B05D3/0493 ,  B05D3/068 ,  B05D5/00 ,  H01L21/31 ,  H01L21/3105

Abstract: A closed space is formed in a reduced pressure drying station, and the closed space is brought to a vacuum state. In this state, an EB unit irradiates a wafer mounted on a hot plate with an electron beam to foam an insulating film material. Subsequently, the hot plate is raised to a predetermined temperature, and drying processing is performed under a reduced pressure. As described above, since the foaming processing is performed in the reduced pressure drying station, bubbles remain in the insulating film, so that the existence of the bubbles can decrease the relative dielectric constant.

Abstract translation: 在减压干燥站中形成封闭空间，封闭空间成为真空状态。 在这种状态下，EB单元用电子束照射安装在热板上的晶片，以发泡绝缘膜材料。 随后，将热板升高至预定温度，并在减压下进行干燥处理。 如上所述，由于在减压干燥站中进行发泡处理，所以在绝缘膜中残留有气泡，使得气泡的存在可以降低相对介电常数。

公开(公告)号：US20020004100A1

公开(公告)日：2002-01-10

申请号：US09795924

申请日：2001-02-28

Inventor： Emir Gurer ,  Tom Zhong ,  John Lewellen ,  Ed Lee ,  Robert P. Mandal ,  James C. Grambow ,  Ted C. Bettes ,  Donald R. Sauer ,  Edmond R. Ward

IPC: B05D003/12

CPC classification number: H01L21/6715 ,  B05C5/0208 ,  B05C5/0254 ,  B05D1/005 ,  B05D1/265 ,  B05D3/0486

Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.

公开(公告)号：US20010033895A1

公开(公告)日：2001-10-25

申请号：US09840179

申请日：2001-04-24

Applicant: Tokyo Electron Limited

Inventor： Tomohide Minami ,  Takahiro Kitano ,  Yuji Matsuyama

IPC: B05D003/12 ,  B05C011/02

CPC classification number: H01L21/6715 ,  B05D1/005 ,  B05D3/0466 ,  B05D3/0486 ,  G03F7/162

Abstract: The present invention is a film forming method for forming a film of a coating solution on a substrate, comprising the steps of spreading the coating solution supplied to a center of the substrate by rotating the substrate, and supplying solvent vapor of the coating solution to the coating solution spread over the substrate while rotating the substrate to thin the film of the coating solution formed on the substrate. Accordingly, it becomes possible that the film of the coating solution which is formed by spreading the coating solution over the substrate is maintained at a low viscosity, and that the film can be further thinned. The necessary quantity of the coating solution can be also reduced. Moreover, since solvent vapor is supplied onto the coating film, by controlling the supply quantity or the supply position of the solvent vapor, the uniformity of the coating solution film can be obtained, and the thickness of the coating solution film can be controlled.

Abstract translation: 本发明是一种在基板上形成涂布液的膜的成膜方法，其特征在于，包括以下步骤：通过旋转所述基板将供给到所述基板的中心的涂布液扩散，并将所述涂布液的溶剂蒸气供给到 涂布溶液在衬底上铺展，同时旋转衬底以使形成在衬底上的涂布溶液的薄膜变薄。 因此，通过将涂布液涂布在基板上而形成的涂布液的膜保持低粘度，并且可以进一步减薄膜。 所需量的涂布溶液也可以减少。 此外，由于溶剂蒸气被供给到涂膜上，通过控制溶剂蒸气的供给量或供给位置，可以获得涂布液的均匀性，并且可以控制涂布液膜的厚度。

公开(公告)号：US20010017103A1

公开(公告)日：2001-08-30

申请号：US09842395

申请日：2001-04-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuhiro Takeshita ,  Shinji Nagashima ,  Makoto Muramatsu ,  Yoji Mizutani ,  Kazutoshi Yano ,  Kyoshige Katayama

IPC: C23C014/00

CPC classification number: H01L21/6708 ,  B05D1/005 ,  B05D3/0486 ,  B05D3/107 ,  H01L21/6715 ,  Y10S134/902

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract translation: 在转移晶片W之前，产生并排出混合气体，从而抑制了在气体引入室3开始时的溶剂成分的浓度和温度的波动。 将晶片W携带到老化单元中之后的胶凝步骤分为几个步骤。 直到晶片W的温度达到预定的处理温度，混合气体中的溶剂组分的平均浓度相对于晶片W的温度逐渐升高。由此，在将晶片W转移到密封室之后， 可以防止溶剂成分的气体冷凝。