公开(公告)号：US08201452B2

公开(公告)日：2012-06-19

申请号：US12448911

申请日：2008-01-17

Applicant: Marten Oldsen ,  Ulrich Hofmann

Inventor： Marten Oldsen ,  Ulrich Hofmann

IPC: G01P15/08

CPC classification number: B81B3/0051 ,  B81B7/0067 ,  B81B2201/042 ,  B81B2201/047 ,  B81C1/00317 ,  B81C2203/0109 ,  B81C2203/0154 ,  G02B26/0833 ,  Y10T29/49826

Abstract: The present invention relates to a housing for one or more micromechanical and/or micro-optic components, wherein the housing exhibits a supporting substrate having at least one micromechanical and/or micro-optic component and at least one cap substrate, which is joined to the supporting substrate. The supporting substrate and the at least one cap substrate form at least one cavity, which at least partially encloses the at least one micromechanical and/or micro-optic component, wherein the side of at least one cap substrate facing the at least one micromechanical and/or micro-optic component exhibits at least one optical window and at least one mechanical stop.Furthermore, the object of the present invention is a method for producing such a housing, wherein the method is particularly usable for encapsulation at the wafer level.

Abstract translation: 本发明涉及一种用于一个或多个微机械和/或微光学部件的壳体，其中所述壳体呈现出具有至少一个微机械和/或微光学部件和至少一个盖基板的支撑基板， 支撑基板。 支撑衬底和至少一个帽衬底形成至少一个空腔，其至少部分地包围至少一个微机械和/或微光学部件，其中至少一个帽衬底的面向至少一个微机械和 /或微光学部件表现出至少一个光学窗口和至少一个机械止动件。 此外，本发明的目的是一种用于制造这种壳体的方法，其中该方法特别可用于晶片级的封装。

公开(公告)号：US20120119425A1

公开(公告)日：2012-05-17

申请号：US12946624

申请日：2010-11-15

Applicant: Roman C. Gutierrez ,  Robert J. Calvet ,  Xiaolei Liu ,  Guiqin Wang ,  Ankur Jain

Inventor： Roman C. Gutierrez ,  Robert J. Calvet ,  Xiaolei Liu ,  Guiqin Wang ,  Ankur Jain

IPC: F16F13/00 ,  H05K13/00

CPC classification number: B81B7/00 ,  B81B7/0016 ,  B81B2201/047 ,  Y10T29/49002

Abstract: A method for making a motion control feature for an actuator device of a type that has a moveable component coupled to an opposing fixed component for out-of-plane rotational movement relative thereto includes forming first and second flaps respectively extending from the moveable and fixed components and toward the opposing component and operable to effect one or more of damping movement of the moveable component relative to the fixed component and/or restraining movement of the moveable component relative to the fixed component in a direction substantially perpendicular to the actuator device.

Abstract translation: 一种制造用于致动器装置的运动控制特征的方法，所述致动器装置具有联接到相对的固定部件的可移动部件，用于相对于其相对的固定部件进行平面外旋转运动，所述方法包括形成分别从可移动和固定部件延伸的第一和第二翼片 并且朝向相对的部件并且可操作以实现可移动部件相对于固定部件的阻尼运动和/或可移动部件相对于固定部件在大致垂直于致动器装置的方向上的约束运动中的一个或多个。

公开(公告)号：US08164815B2

公开(公告)日：2012-04-24

申请号：US12795294

申请日：2010-06-07

Applicant: Ana R. Londergan ,  Bangalore R. Natarajan ,  Evgeni Gousev ,  James Randolph Webster ,  David Heald

Inventor： Ana R. Londergan ,  Bangalore R. Natarajan ,  Evgeni Gousev ,  James Randolph Webster ,  David Heald

IPC: G02F1/00

CPC classification number: G02B26/001 ,  B81B3/0008 ,  B81B2201/047

Abstract: Devices, methods, and systems comprising a MEMS device, for example, an interferometric modulator, that comprises a cavity in which a layer coats multiple surfaces. The layer is conformal or non-conformal. In some embodiments, the layer is formed by atomic layer deposition (ALD). Preferably, the layer comprises a dielectric material. In some embodiments, the MEMS device also exhibits improved characteristics, such as improved electrical insulation between moving electrodes, reduced stiction, and/or improved mechanical properties.

Abstract translation: 包括MEMS器件（例如干涉式调制器）的器件，方法和系统，其包括其中层涂覆多个表面的空腔。 该层是保形的或非保形的。 在一些实施例中，该层由原子层沉积（ALD）形成。 优选地，该层包括电介质材料。 在一些实施例中，MEMS器件还表现出改进的特性，例如移动电极之间的改善的电绝缘性，降低的静摩擦力和/或改善的机械性能。

公开(公告)号：US20120086998A1

公开(公告)日：2012-04-12

申请号：US13324656

申请日：2011-12-13

Applicant: Hsin-Fu Wang ,  Ming-Hau Tung ,  Stephen Zee

Inventor： Hsin-Fu Wang ,  Ming-Hau Tung ,  Stephen Zee

IPC: G02B26/00 ,  C23F1/44

CPC classification number: G02B26/001 ,  B81B3/0072 ,  B81B2201/047 ,  B81C1/00793 ,  B81C2201/0167

Abstract: Described herein is the use of a diffusion barrier layer between metallic layers in MEMS devices. The diffusion barrier layer prevents mixing of the two metals, which can alter desired physical characteristics and complicate processing. In one example, the diffusion barrier layer may be used as part of a movable reflective structure in interferometric modulators.

Abstract translation: 这里描述的是在MEMS器件中在金属层之间使用扩散阻挡层。 扩散阻挡层防止两种金属的混合，这可改变所需的物理特性并使加工变得复杂。 在一个示例中，扩散阻挡层可以用作干涉式调制器中的可移动反射结构的一部分。

公开(公告)号：US08064124B2

公开(公告)日：2011-11-22

申请号：US12128469

申请日：2008-05-28

Applicant: Wonsuk Chung ,  Steve Zee ,  Teruo Sasagawa

Inventor： Wonsuk Chung ,  Steve Zee ,  Teruo Sasagawa

IPC: G02B26/00

CPC classification number: B81C1/00801 ,  B81B2201/047 ,  B81C2201/014 ,  G02B26/001 ,  Y10T428/31678

Abstract: The fabrication of a MEMS device such as an interferometric modulator is improved by employing an etch stop layer between a sacrificial layer and a an electrode. The etch stop may reduce undesirable over-etching of the sacrificial layer and the electrode. The etch stop layer may also serve as a barrier layer, buffer layer, and/or template layer. The etch stop layer may include silicon-rich silicon nitride.

Abstract translation: 通过在牺牲层和电极之间采用蚀刻停止层来改善诸如干涉式调制器之类的MEMS器件的制造。 蚀刻停止可以减少对牺牲层和电极的不希望的过蚀刻。 蚀刻停止层也可以用作阻挡层，缓冲层和/或模板层。 蚀刻停止层可以包括富硅的氮化硅。

公开(公告)号：US20110227101A1

公开(公告)日：2011-09-22

申请号：US13150482

申请日：2011-06-01

Applicant: Chen-Jean Chou

Inventor： Chen-Jean Chou

IPC: H01L33/08 ,  H01L21/326

CPC classification number: B81B7/0022 ,  B81B2201/047 ,  G09G2300/0426 ,  G09G2330/04

Abstract: Microelectronic devices may be fabricated while being protected from damage by electrostatic discharge. In one embodiment, a shorting circuit is connected to elements of the microelectronic device, where the microelectronic device is part of a chip-on-glass system. In one aspect of this embodiment, a portion of the shorting circuit is in an area of a substrate where a microchip is bonded. In another embodiment, shorting links of the shorting circuit are comprised of a fusible material, where the fusible material may be disabled by an electrical current capable of fusing the shorting links.

Abstract translation: 可以制造微电子器件，同时防止静电放电损坏。 在一个实施例中，短路电路连接到微电子器件的元件，其中微电子器件是玻璃上芯片系统的一部分。 在本实施例的一个方面，短路电路的一部分在与芯片接合的基板的区域中。 在另一个实施例中，短路电路的短路链路由可熔材料组成，其中可熔化材料可能被能够熔化短路连接的电流所禁止。

公开(公告)号：US07990601B2

公开(公告)日：2011-08-02

申请号：US12727171

申请日：2010-03-18

Applicant: Lauren Palmateer

Inventor： Lauren Palmateer

IPC: G02F1/03

CPC classification number: B81B3/007 ,  B81B7/0038 ,  B81B2201/047 ,  B81C2203/0163 ,  G02B26/001

Abstract: A package structure and method of packaging an interferometric modulator with a reinforcing substance to help support the integrity of the package. In some embodiments the reinforcing substance is a desiccant integrated into the backplate or the transparent substrate.

Abstract translation: 一种封装结构和方法，用于将具有加强物质的干涉式调制器封装以帮助支持封装的完整性。 在一些实施方案中，增强物质是整合到背板或透明基底中的干燥剂。

公开(公告)号：US07944599B2

公开(公告)日：2011-05-17

申请号：US11772777

申请日：2007-07-02

Applicant: Clarence Chui ,  William Cummings ,  Brian Gally ,  Lior Kogut ,  Ming-Hau Tung ,  Yeh-Jiun Tung ,  Chih-Wei Chiang ,  Denis Endisch

Inventor： Clarence Chui ,  William Cummings ,  Brian Gally ,  Lior Kogut ,  Ming-Hau Tung ,  Yeh-Jiun Tung ,  Chih-Wei Chiang ,  Denis Endisch

IPC: G02B26/00

CPC classification number: G02B26/001 ,  B81B3/0051 ,  B81B2201/047 ,  G02B26/023 ,  G02B26/08 ,  G02F1/01 ,  G02F1/0128 ,  G02F1/133621 ,  G02F1/29 ,  G09G3/3466 ,  G09G3/3696 ,  Y10T29/42

Abstract: A microelectromechanical (MEMS) device includes a substrate, a movable element over the substrate, and an actuation electrode above the movable element. The movable element includes a deformable layer and a reflective element. The deformable layer is spaced from the reflective element.

Abstract translation: 微机电（MEMS）装置包括衬底，在衬底上方的可移动元件以及可移动元件上方的致动电极。 可移动元件包括可变形层和反射元件。 可变形层与反射元件间隔开。

公开(公告)号：US20110090554A1

公开(公告)日：2011-04-21

申请号：US12975119

申请日：2010-12-21

Applicant: Yeh-Jiun Tung

Inventor： Yeh-Jiun Tung

IPC: G02B26/00

CPC classification number: G02B26/001 ,  B81B3/0008 ,  B81B3/0059 ,  B81B2201/047 ,  G02B26/0841

Abstract: The present disclosure relates to the mitigation of stiction in MEMS devices. In some embodiments, a MEMS device may be provided with one or more restoration features that provide an assisting mechanical force for mitigating stiction. The restoration feature may be implemented as one or more deflectable elements, where the deflectable elements may have various configurations or shapes, such as a chevron, cross, and the like. For example, the restoration feature can be a cantilever that deflects when at least one component comes into contact or proximity with another component. Multiple restoration features also may be employed and placed strategically within the MEMS device to maximize their effectiveness in mitigating stiction.

Abstract translation: 本公开涉及减轻MEMS器件中的静电。 在一些实施例中，MEMS器件可以设置有一个或多个恢复特征，其提供用于减轻静脉的辅助机械力。 恢复特征可以被实现为一个或多个可偏转元件，其中可偏转元件可以具有各种构造或形状，例如人字纹，十字形等。 例如，恢复特征可以是当至少一个部件与另一部件接触或接近时偏转的悬臂。 可以采用多个恢复特征并将其置于MEMS装置中，以最大限度地提高其在减轻静脉阻力方面的有效性。

公开(公告)号：US20110058243A1

公开(公告)日：2011-03-10

申请号：US12946583

申请日：2010-11-15

Applicant: Chun-Ming Wang

Inventor： Chun-Ming Wang

IPC: G02B26/02 ,  H01L21/302

CPC classification number: G02B26/0841 ,  B81B3/0072 ,  B81B2201/047 ,  B81B2203/0163 ,  B81B2203/019 ,  B81B2203/0307 ,  B81B2203/053 ,  B81C1/00142 ,  B81C1/00666 ,  B81C2201/0167 ,  G02B26/001 ,  Y10S359/90

Abstract: Certain MEMS devices include layers patterned to have tapered edges. One method for forming layers having tapered edges includes the use of an etch leading layer. Another method for forming layers having tapered edges includes the deposition of a layer in which the upper portion is etchable at a faster rate than the lower portion. Another method for forming layers having tapered edges includes the use of multiple iterative etches. Another method for forming layers having tapered edges includes the use of a liftoff mask layer having an aperture including a negative angle, such that a layer can be deposited over the liftoff mask layer and the mask layer removed, leaving a structure having tapered edges.

Abstract translation: 某些MEMS器件包括被图案化以具有渐缩边缘的层。 用于形成具有渐缩边缘的层的一种方法包括使用蚀刻引导层。 用于形成具有锥形边缘的层的另一种方法包括沉积一层，其中上部可以比下部更快的速度进行刻蚀。 用于形成具有渐缩边缘的层的另一种方法包括使用多个迭代蚀刻。 用于形成具有锥形边缘的层的另一种方法包括使用具有包括负角度的孔的剥离掩模层，使得可以在剥离掩模层上沉积一层，并且去除掩模层，留下具有渐缩边缘的结构。