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    Projection lithography photomasks and methods of making
    41.
    发明授权
    Projection lithography photomasks and methods of making 失效
    投影光刻光掩模和制作方法

    公开(公告)号：US06319634B1

    公开(公告)日：2001-11-20

    申请号：US09397572

    申请日：1999-09-16

    Applicant: George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

    Inventor： George Edward Berkey ,  Lisa Anne Moore ,  Michelle Diane Pierson

    IPC: G03F900

    CPC classification number: C03C4/0085 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/043 ,  C03B23/045 ,  C03B23/051 ,  C03B23/07 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/50 ,  G03F1/60

    Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

    Abstract translation: 本发明是制造光刻光掩模和光掩模坯料的方法。 制造光刻光掩模和光掩模坯料的方法包括提供OH含量低于50ppm的氟氧化硅玻璃管。 该方法还包括切割氟氧化硅玻璃管，使氟氧化硅玻璃管扁平化，并将扁平切割的氟氧化硅玻璃管形成具有平坦表面的光掩模坯料。 本发明包括玻璃光刻掩模预制件。 玻璃光刻掩模预制件是具有OH含量<= 10ppm的纵向硅氧氟化物玻璃管，F wt。 ％浓度> = 0.5wt。 ％。

    Synthetic quartz glass and production process
    42.
    发明申请
    Synthetic quartz glass and production process 失效
    合成石英玻璃及生产工艺

    公开(公告)号：US20010018834A1

    公开(公告)日：2001-09-06

    申请号：US09747953

    申请日：2000-12-27

    Inventor： Koji Matsuo ,  Hisatoshi Otsuka ,  Kazuo Shirota

    IPC: C03B019/01 ,  C03B037/018 ,  C03B020/00

    CPC classification number: C03B19/1423 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40

    Abstract: A process for producing synthetic quartz glass using a burner composed of a plurality of concentric nozzles involves the steps of feeding a silica-forming raw material gas and a fluorine compound gas to a reaction zone from a center nozzle, feeding oxygen gas from a second nozzle outside the center nozzle, and feeding oxygen gas and/or hydrogen gas from a third nozzle. The silica-forming raw material gas is hydrolyzed to form fine particles of silica, which particles are deposited on a rotatable substrate so as to form a porous silica matrix, which is then fused to give the quartz glass. The flow rate of the oxygen gas fed from the second nozzle and the flow rate of the raw material gas are controlled so as to provide a 1.1- to 3.5-fold stoichiometric excess of oxygen. The excess oxygen suppresses SinullSi bond formation in the quartz glass, enabling the production of synthetic quartz glass having a high transmittance in the vacuum ultraviolet region.

    Abstract translation: 使用由多个同心喷嘴构成的燃烧器来生产合成石英玻璃的方法包括以下步骤：将来自中心喷嘴的二氧化硅生成原料气体和氟化合物气体供给到反应区域，从第二喷嘴 在中心喷嘴外部，并且从第三喷嘴供给氧气和/或氢气。 二氧化硅形成原料气体被水解以形成二氧化硅细颗粒，该颗粒沉积在可转动的基底上，以便形成多孔二氧化硅基质，然后熔化以得到石英玻璃。 控制从第二喷嘴供给的氧气的流量和原料气体的流量，从而提供1.1-3.5倍化学计量的过量的氧气。 过量的氧抑制石英玻璃中的Si-Si键的形成，能够在真空紫外线区域中制造具有高透射率的合成石英玻璃。

    Continuous production of synthetic silica doped with fluorine
    45.
    发明授权
    Continuous production of synthetic silica doped with fluorine 失效
    连续生产掺杂氟的合成二氧化硅

    公开(公告)号：US4221825A

    公开(公告)日：1980-09-09

    申请号：US58471

    申请日：1979-07-18

    Applicant: Pierre Guerder ,  Andre Ranson

    Inventor： Pierre Guerder ,  Andre Ranson

    IPC: C03B37/014 ,  C03C3/06 ,  C03C17/02 ,  C03C25/02 ,  G02B1/10

    CPC classification number: C03B37/01413 ,  C03B37/014 ,  C03B37/01426 ,  C03C3/06 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2207/81 ,  C03B2207/85 ,  C03C2201/12 ,  C03C2203/44 ,  Y10S65/16

    Abstract: The present invention relates to a process for the continuous manufacture of vitreous synthetic silica doped with fluorine. This process consists of decomposing a silicon compound free of hydrogen in the flame of an inductive plasma burner, thereby forming silica upon reacting with the oxygen contained in the burner feed gas. A gaseous inorganic fluorine compound free of hydrogen, is sent into the flame preferably from outside the burner. Said fluorine compound simultaneously with the silicon compound decomposes whereby fluorine is introduced into the silica, lowering its index of refraction. The doped silica is then deposited on a heat-stable support in the form of a vitreous mass. The doped synthetic silica is particularly useful for making preforms for optical transmission fibers.

    Abstract translation: 本发明涉及连续制造掺杂有氟的玻璃态合成二氧化硅的方法。 该方法包括在感应等离子体燃烧器的火焰中分解不含氢的硅化合物，从而在与燃烧器进料气体中包含的氧反应时形成二氧化硅。 不含氢的气体无机氟化合物优选从燃烧器外部送入火焰中。 所述氟化合物与硅化合物同时分解，由此将氟引入二氧化硅中，降低其折射率。 然后将掺杂的二氧化硅以玻璃体的形式沉积在热稳定的载体上。 掺杂的合成二氧化硅特别可用于制造用于光传输纤维的预成型件。

    METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH
    47.
    发明申请
    METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH 有权
    用于生产钛酸二氧化硅玻璃的方法，用于根据其生产的EUV光刻和空白

    公开(公告)号：US20160185645A1

    公开(公告)日：2016-06-30

    申请号：US14911506

    申请日：2014-07-22

    Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

    Inventor： Stefan OCHS ,  Klaus BECKER ,  Stephan THOMAS

    IPC: C03B19/14 ,  C03C4/00 ,  G03F1/52 ,  C03C3/00

    CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2204/00 ,  G03F1/52 ,  G03F1/60

    Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.

    Abstract translation: Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色，导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基，并在玻璃化之前进行氧处理，这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法，其在羟基含量小于120ppm时，在400nm的波长范围内显示出至少70％的内部透射率（样品厚度10mm） 在玻璃化之前，将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例为Ti3 + / Ti4 +＆nlE; 5×10-4。

    OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT
    48.
    发明申请
    OPTICAL COMPONENT MADE OF QUARTZ GLASS FOR USE IN ArF EXCIMER LASER LITHOGRAPHY AND METHOD FOR PRODUCING THE COMPONENT 有权
    在ArF EXCIMER激光光刻仪中使用的QUARTZ玻璃的光学元件及其制造方法

    公开(公告)号：US20160002092A1

    公开(公告)日：2016-01-07

    申请号：US14769382

    申请日：2014-02-19

    Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

    Inventor： Bodo KUEHN

    IPC: C03C3/06 ,  G02B1/00 ,  C03B32/02 ,  C03C4/04 ,  C03B19/14

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

    Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193nm when measured using the applied wavelength of 193 nm and a second measured value M633nm when measured using a measured wavelength of 633 nm. The ratio M193nm/M633nm is less than 1.7.

    Abstract translation: 由合成石英玻璃制成的光学部件包括基本上不含氧缺陷部位的玻璃结构，氢含量为0.1×1016〜1.0×1018分子/ cm3，SiH基含量小于2×1017分子/ cm3， 羟基含量为0.1〜100wt。 ppm，并且有效温度低于1070℃。光学组件响应于波长为193nm的辐射的照射，使用脉冲宽度为125的5×109脉冲对激光引起的折射率变化 ns，相应的能量密度为500μJ/ cm2，脉冲重复频率为2000Hz。 当使用193nm的施加波长测量时，该变化达到第一测量值M193nm，并且当使用633nm的测量波长测量时，该变化达到第二测量值M633nm。 M193nm / M633nm的比例小于1.7。

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