公开(公告)号：US20150013906A1

公开(公告)日：2015-01-15

申请号：US13942502

申请日：2013-07-15

Applicant: Lam Research Corporation

Inventor： Andreas Fischer ,  John Holland

IPC: H01L21/02

CPC classification number: H01J37/00 ,  H01J37/32091 ,  H01J37/32366 ,  H01J37/32385 ,  H01J37/32568 ,  H01J37/32642 ,  H01L2221/00

Abstract: A plasma processing system having at least a plasma processing chamber for performing plasma processing of a substrate and utilizing at least a first processing state and a second processing state. Plasma is present above the center region of the substrate during the first processing stale to perform plasma processing of at least the center region during the first processing state. Plasma is absent above the center region of the substrate but present adjacent to the bevel edge region during the second processing state to at least perform plasma processing of the bevel edge region during the second processing state. During the second processing state, the upper electrode is in an RF floating state and the substrate is disposed on the lower electrode surface.

Abstract translation: 一种等离子体处理系统，至少具有用于对基板进行等离子体处理并利用至少第一处理状态和第二处理状态的等离子体处理室。 在第一处理过程期间，等离子体存在于衬底的中心区域之上，以在第一处理状态期间至少执行中心区域的等离子体处理。 在第二处理状态期间，等离子体不存在于基板的中心区域上方，但在斜边缘区域附近存在，以至少在第二处理状态期间执行斜面边缘区域的等离子体处理。 在第二处理状态期间，上电极处于RF浮置状态，并且衬底设置在下电极表面上。

公开(公告)号：US20140200866A1

公开(公告)日：2014-07-17

申请号：US13742881

申请日：2013-01-16

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD ,  NATIONAL TAIWAN UNIVERSITY

Inventor： Kuen-Yu TSAI ,  Chun-Hung LIU

IPC: G06F17/50

CPC classification number: G06F17/18 ,  G03F1/70 ,  G03F7/70433 ,  G03F7/705 ,  H01J37/00 ,  H01J37/3174 ,  H01J2237/31761 ,  H01J2237/31762

Abstract: A method for establishing a parametric model of a semiconductor process is provided. A first intermediate result is generated according to layout data and a non-parametric model of the semiconductor process. A first response is obtained according to the first intermediate result. A specific mathematical function is selected from a plurality of mathematical functions, and the parametric model is obtained according to the specific mathematical function. A second intermediate result is generated according to the layout data and the parametric model. A second response is obtained according to the second intermediate result. It is determined whether the parametric model is an optimal model according to the first and second responses.

Abstract translation: 提供了一种用于建立半导体工艺的参数模型的方法。 根据布局数据和半导体工艺的非参数模型生成第一中间结果。 根据第一中间结果获得第一响应。 从多个数学函数中选择具体的数学函数，并且根据具体的数学函数获得参数模型。 根据布局数据和参数模型生成第二个中间结果。 根据第二中间结果获得第二响应。 根据第一和第二响应确定参数模型是否是最优模型。

公开(公告)号：US08519354B2

公开(公告)日：2013-08-27

申请号：US12863801

申请日：2009-02-11

Applicant: Nicholas Charipar ,  Jason Harper ,  Zheng Ouyang ,  Robert Graham Cooks

Inventor： Nicholas Charipar ,  Jason Harper ,  Zheng Ouyang ,  Robert Graham Cooks

IPC: H01J49/26

CPC classification number: H01J37/32009 ,  H01J27/022 ,  H01J37/00 ,  H01J37/32348 ,  H01J49/02 ,  H01J49/105 ,  H01J49/142 ,  H01J2237/0044 ,  H05H1/24 ,  H05H1/2406 ,  H05H1/30 ,  H05H2001/2412 ,  H05H2001/2443 ,  H05H2240/10 ,  H05H2240/20 ,  Y10T436/145555 ,  Y10T436/147777 ,  Y10T436/173076 ,  Y10T436/203332 ,  Y10T436/24

Abstract: The present invention generally relates to a low temperature plasma probe for desorbing and ionizing at least one analyte in a sample material and methods of use thereof. In one embodiment, the invention generally relates to a low temperature plasma probe including: a housing having a discharge gas inlet port, a probe tip, two electrodes, and a dielectric barrier, in which the two electrodes are separated by the dielectric barrier, in which application of voltage from a power supply generates a low temperature plasma, and in which the low temperature plasma is propelled out of the discharge region by the electric field and/or the discharge gas flow.

公开(公告)号：US20130213945A1

公开(公告)日：2013-08-22

申请号：US13765022

申请日：2013-02-12

Applicant: Heiko Stegmann

Inventor： Heiko Stegmann

IPC: G01N23/04

CPC classification number: G01N23/04 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/045 ,  G01N2001/2886 ,  H01J37/00 ,  H01J37/317 ,  H01J2237/206 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods and apparatus are disclosed for the preparation of microscopic samples using light pulses. Material volumes greater than 100 μm3 are removed. The methods include inspecting an object with a scanning electron microscope (SEM) or a focused ion beam (FIB). The inspection includes recording an image of the object. The methods also includes delineating within the object a region to be investigated, and delineating a laser-machining path based on the image of the object so that a sample can be prepared out of the object. The methods further include using laser-machining along the delineated laser-machining path to remove a volume that is to be ablated, and inspecting the object with the scanning electron microscope (SEM) or a focused ion beam (FIB).

Abstract translation: 公开了使用光脉冲制备微观样品的方法和装置。 去除大于100 mum3的物料体积。 这些方法包括用扫描电子显微镜（SEM）或聚焦离子束（FIB）检查物体。 检查包括记录对象的图像。 该方法还包括在对象内描绘待研究的区域，并且基于对象的图像描绘激光加工路径，从而可以从对象中准备样本。 所述方法还包括沿着描绘的激光加工路径使用激光加工以去除要消融的体积，并用扫描电子显微镜（SEM）或聚焦离子束（FIB）检查物体。

公开(公告)号：US20100088042A1

公开(公告)日：2010-04-08

申请号：US12630307

申请日：2009-12-03

Applicant: Minori NOGUCHI ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuyai Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori NOGUCHI ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuyai Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01N21/88 ,  G06F19/00

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the specimen, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the specimen and passed through a filter which blocks diffraction light resulting from patterns formed on the specimen, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the specimen, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.

Abstract translation: 用于检测试样缺陷的装置和方法包括：照射光学单元，其将聚焦在激光束上的激光倾斜投射在试样的表面上;照射单元，其安装试样并可移动的检测光学单元， 图像传感器，由从样本反射的光形成的光的图像，并且通过滤光器，该滤光器阻挡由形成在样本上的图案产生的衍射光;处理从检测光学单元的图像传感器输出的信号提取的信号处理器 样本的缺陷以及显示由信号处理器提取的缺陷的信息的显示单元。 过滤器可调。

公开(公告)号：US20060030060A1

公开(公告)日：2006-02-09

申请号：US11244080

申请日：2005-10-06

Applicant: Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: G01R31/26 ,  H01L21/66

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An apparatus for detecting defects on a specimen including am illumination optical unit which obliquely projects a laser onto a region which is longer in one direction than in a direction transverse to said one direction on a surface of a specimen, a table unit which mounts said specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from said specimen in both directions of the one direction and the direction transverse and which reflected light in both directions is formed on said image sensor while said table is moving, a signal processor which processes a signal outputted from said image sensor of said detection optical unit to extract defects of said specimen. A display unit which displays information of defects extracted by said signal processor.

Abstract translation: 一种用于检测试样上的缺陷的装置，包括：am照明光学单元，其将激光倾斜地突出到在一个方向上比沿着与所述一个方向横切的方向在一个方向上长的区域;安装所述样本的台单元 检测光学单元，其利用图像传感器检测在所述图像传感器上形成有从所述一个方向的两个方向和横向方向反射的光形成的光，并且在所述图像传感器上形成两个方向的反射光 当所述表移动时，信号处理器处理从所述检测光学单元的所述图像传感器输出的信号，以提取所述样本的缺陷。 一种显示由所述信号处理器提取的缺陷信息的显示单元。

公开(公告)号：US20020168787A1

公开(公告)日：2002-11-14

申请号：US10170378

申请日：2002-06-14

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: H01L021/66

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.

Abstract translation: 缺陷检查方法包括以相对于垂直于基板的线的方向以相对于基板的方向倾斜预定的方向的方式照射具有与纵向方向基本平行的光的照明狭缝状光束到具有电路图案的基板， 相对于电路图案的一组主要直线的表面上的梯度，其纵向方向几乎垂直于衬底的运动方向。 通过使用图像传感器接收由诸如存在于照明基板上的异物的缺陷反射的散射光，并且通过使用图像传感器将其转换为检测信号，并且对提取的指示诸如异物的缺陷的信号进行缺陷判断 检测信号输出的基础。

公开(公告)号：US5818042A

公开(公告)日：1998-10-06

申请号：US898383

申请日：1997-07-22

Applicant: Giorgio Riga ,  Richard D. Mundy ,  Mario A. Nobre

Inventor： Giorgio Riga ,  Richard D. Mundy ,  Mario A. Nobre

IPC: G01Q30/02 ,  G01Q60/00 ,  H01J37/00 ,  H01J37/26

CPC classification number: G01Q30/04 ,  B82Y35/00 ,  H01J37/00 ,  H01J2237/28 ,  H01J2237/3114

Abstract: Apparatus for creating scaled three-dimensional physical models of characteristics of microscopic objects, includes a transducer apparatus including a transducer for creating first electrical signals representative of the magnitude of a physical characteristic of the microscopic object at a selected point within a selected area thereof, the first electrical signals having a first component defining said selected point and a second component related to the magnitude of the physical characteristic, a material shaping apparatus configured to create a physical model in a workspace, the workspace having an area related to the selected area of the microscopic object by a first selected scale factor, the material shaping apparatus including apparatus responsive to second electrical signals representing x, y, and z co-ordinates in the workspace for directing the formation of the physical model; and control apparatus, connected to the transducer apparatus and the material shaping apparatus, for converting the first electrical signals from the transducer to the second electrical signals and supplying the electrical signals to the material shaping apparatus, the control apparatus processing the first electrical signals according to the first and second selected scale factors.

Abstract translation: 用于创建微观物体特征的缩放三维物理模型的装置包括换能器装置，其包括用于产生代表在其选定区域内的选定点处的微观物体的物理特性的大小的第一电信号的换能器， 第一电信号具有限定所述选定点的第一分量和与所述物理特性的大小有关的第二分量;材料成形装置，被配置为在工作空间中创建物理模型，所述工作空间具有与所选择的区域的所选区域相关的区域 所述材料成形设备包括响应于在工作空间中表示x，y和z坐标的第二电信号的装置，用于引导物理模型的形成; 以及连接到换能器装置和材料成型装置的控制装置，用于将来自换能器的第一电信号转换为第二电信号，并将电信号提供给材料成形装置，所述控制装置根据 第一和第二选择的比例因子。

公开(公告)号：US5463459A

公开(公告)日：1995-10-31

申请号：US46720

申请日：1993-04-16

Applicant: Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC: G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68 ,  G01N21/89 ,  G02B27/46 ,  G06F15/46

CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01R31/308 ,  H01J37/00 ,  H01L21/67253 ,  H01L21/67288 ,  G01N2021/8822 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L22/12

Abstract: A defect detecting apparatus including an illumination system for radiating a light of a plane wave linearly to a substrate having repetitive patterns of different pitches; a focusing optical system for focusing a light image reflected from the substrate thus illuminated by the illumination system; a spatial filter disposed intermediate the focusing optical system so as to shield a diffraction light from repetitive patterns of a small pitch on the substrate; a detector for detecting the light image formed by the focusing optical system; an erasing means for comparing and erasing signals which are generated on the basis of repetitive patterns of a large pitch and obtained through the spatial filter, out of signals detected by the detector; and a defect detecting means for detecting defects on the substrate in accordance with a signal detected by the detector, as well as a method applied to the said apparatus.

Abstract translation: 一种缺陷检测装置，包括用于将平面波的光线线性地发射到具有不同间距的重复图案的基板的照明系统; 聚焦光学系统，用于聚焦由照明系统照射的从基板反射的光图像; 设置在聚焦光学系统之间的空间滤光器，以便屏蔽来自基板上的小间距的重复图案的衍射光; 用于检测由聚焦光学系统形成的光图像的检测器; 擦除装置，用于根据由检测器检测到的信号，比较和擦除基于大间距的重复图案并通过空间滤波器获得的信号; 以及缺陷检测装置，用于根据由检测器检测的信号检测基板上的缺陷，以及应用于所述装置的方法。

公开(公告)号：US4305000A

公开(公告)日：1981-12-08

申请号：US957483

申请日：1978-11-03

Applicant: Richard N. Cheever

Inventor： Richard N. Cheever

IPC: H01J37/073 ,  A61L2/08 ,  G21K5/04 ,  H01J33/00 ,  H01J37/00 ,  H01J37/06 ,  H01J37/30

CPC classification number: H01J37/00 ,  A61L2/08

Abstract: This disclosure is concerned with a process of and apparatus for producing relatively low energy electron beams through pulsed cold-cathode beam generation in a mode of operation involving an important intermediate region of a substantially linear depth-dose profile characteristic that reduces the sensitivity to possible voltage variations, and with improved triggering structures that significantly improve reliability and minimize erratic pulse generation and missing pulses, thus particularly adapting the process and apparatus for such stringent applications as production-line sterilization of surfaces, materials or workpieces passed by the apparatus.

Abstract translation: 本公开涉及通过脉冲冷阴极束产生的相对低能量电子束的生产方法和装置，该方法包括基本上线性深度剂量分布特征的重要中间区域，该特征降低了对可能的电压的敏感性 变化和改进的触发结构，显着提高了可靠性并最大程度地减少了不规则的脉冲产生和缺失的脉冲，从而特别适用于用于由设备通过的表面，材料或工件的生产线灭菌等严格应用的工艺和设备。