公开(公告)号：US20240050977A1

公开(公告)日：2024-02-15

申请号：US18260575

申请日：2022-01-04

Applicant: Tokyo Electron Limited

Inventor： Shogo INABA

IPC: B05C11/10 ,  B05C11/08

CPC classification number: B05C11/10 ,  B05C11/08 ,  H01L21/6838

Abstract: A coating treatment apparatus for applying a coating solution to a peripheral portion of a substrate, includes: a holding and rotating part holding and rotating the substrate; a coating solution supply nozzle supplying the coating solution to the peripheral portion of the substrate; a moving mechanism moving the coating solution supply nozzle; and a controller controlling the holding and rotating part, coating solution supply nozzle, and moving mechanism, wherein the controller performs control of, while rotating the holding and rotating part: by controlling the moving mechanism while supplying the coating solution by the coating solution supply nozzle, both moving the coating solution supply nozzle from an outside of a perimeter of the substrate to a predetermined position at a periphery on the substrate at a first speed and then moving the coating solution supply nozzle from the predetermined position to the outside of the perimeter at a higher second speed.

公开(公告)号：US20240042704A1

公开(公告)日：2024-02-08

申请号：US17879851

申请日：2022-08-03

Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC

Inventor： Dalong GAO ,  Ryan GERGELY ,  Prateek MISHRA ,  Paul E. CRITTENDEN

IPC: B29C65/52 ,  B05C11/10

CPC classification number: B29C65/524 ,  B05C11/1013 ,  B29C2037/90

Abstract: A reconditioning device includes: a first shearing plate; a second shearing plate; and a housing. The housing includes: a first member configured to hold the first shearing plate and comprising an input for receiving a material; a second member connected to the first member to form an inner cavity, a portion of the inner cavity is located in a gap between the first shearing plate and the second shearing plate; and an output member connected to a pipeline of a production applicator and configured to output the material subsequent to shearing. The shaft extends through the second member, is connected to the second shearing plate, and is configured to be rotated to shear the material disposed in the gap between the first shearing plate and the second shearing plate.

公开(公告)号：US20240024912A1

公开(公告)日：2024-01-25

申请号：US18043359

申请日：2021-08-18

Applicant: TORAY ENGINEERING CO., LTD.

Inventor： Kazunori MAEDA ,  Kenji KITAJIMA ,  Atsushi WATANABE ,  Masashi MOTOI

IPC: B05C5/02 ,  B05C11/10

CPC classification number: B05C5/0258 ,  B05C5/0262 ,  B05C11/10

Abstract: A coating device comprises a die with a slit that is longer in a width direction and discharges a coating liquid to form a coating film on a substrate, a first flow path that supplies the coating liquid toward the die, a first manifold that is linked to the first flow path and holds the coating liquid that flows in from the first flow path, a plurality of second flow paths that are linked to the first manifold, a second manifold that is linked to the second flow paths and the slit, is longer in the width direction, and holds the coating liquid that flows in from the second flow paths, and an adjustment unit that is provided along at least one of the second flow paths and adjusts a flow of the coating liquid flowing through the at least one of the second flow paths.

公开(公告)号：US20240024910A1

公开(公告)日：2024-01-25

申请号：US18480040

申请日：2023-10-03

Applicant: Dürr Systems AG

Inventor： Bernd Locher ,  Sebastian Gries

IPC: B05C5/02 ,  H01M10/653 ,  H01M50/293 ,  B05C11/10 ,  H01M50/202

CPC classification number: B05C5/0212 ,  H01M10/653 ,  H01M50/293 ,  B05C11/1013 ,  B05C11/1036 ,  H01M50/202

Abstract: The disclosure relates to an application device for applying an application agent (e.g. heat-conducting paste) into a cavity, in particular in a battery module of an electric battery. The application device according to the disclosure comprises a nozzle for dispensing the application agent through the nozzle and a first pressure sensor for measuring a first pressure reading (pA, pB) of the application agent upstream of the nozzle. The disclosure additionally provides a second pressure sensor for measuring a second pressure reading (pD) of the coating agent downstream of the first pressure sensor, in particular in the nozzle. Furthermore, the disclosure comprises a corresponding application method.

公开(公告)号：US11880213B2

公开(公告)日：2024-01-23

申请号：US17320733

申请日：2021-05-14

Applicant: Tokyo Electron Limited

Inventor： Mikio Nakashima ,  Akinori Tanaka ,  Nobuhiro Ogata ,  Isamu Miyamoto

IPC: G05D7/06 ,  H01L21/67 ,  B05C11/10 ,  G01M3/38 ,  G01F1/661

CPC classification number: G05D7/0635 ,  B05C11/1026 ,  H01L21/6708 ,  H01L21/67023 ,  H01L21/67253 ,  G01F1/661 ,  G01M3/38

Abstract: A substrate liquid processing apparatus includes: at least one liquid pipe through which a processing liquid flows; a discharge nozzle configured to discharge the processing liquid supplied via the at least one liquid pipe; a valve mechanism configured to regulate a flow of the processing liquid in the at least one liquid pipe; and a liquid detection sensor configured to detect presence or absence of the processing liquid in the at least one liquid pipe, wherein in a state in which the valve mechanism is operating so that the processing liquid in the at least one liquid pipe is located at an upstream of a first pipe measurement site of the at least one liquid pipe, the liquid detection sensor detects the presence or absence of the processing liquid at the first pipe measurement site located at a first measurement point.

公开(公告)号：US20240017285A1

公开(公告)日：2024-01-18

申请号：US18253247

申请日：2021-11-10

Applicant: Focke & Co. (GmbH & Co. KG)

Inventor： Martin Wiehe ,  Martin Eilts ,  Jan-Christian Walter

IPC: B05C11/10 ,  F16K31/06 ,  F16K37/00

CPC classification number: B05C11/1026 ,  F16K31/0675 ,  B05C11/1034 ,  F16K37/0041

Abstract: An application device for applying a flowable medium onto a substrate, having a discharge valve having a closure member which, in its open position, releases a metering opening of the discharge valve, such that the flowable medium can flow through the metering opening in the direction of the substrate, wherein the closure member is movable by an electromagnet of the discharge valve from a closing position, in which it closes the metering opening, to an open position, and having a main control unit, which is connected to the discharge valve, and which delivers electrical output voltage signals which moves and maintains the closure member to the open position. A modification unit is arranged between the main control unit and the discharge valve, which is configured such it receives output voltage signals from the main control unit, modifies these signals and relays the latter in a modified form to the electromagnet.

公开(公告)号：US20230398565A1

公开(公告)日：2023-12-14

申请号：US18032905

申请日：2021-10-22

Applicant: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO

Inventor： Rob Jacob HENDRIKS ,  Robin Bernardus Johannes KOLDEWEIJ ,  Md Tahmid HOSSAIN

IPC: B05C5/02 ,  B05D1/26 ,  B05C11/10

CPC classification number: B05C5/0262 ,  B05C5/0229 ,  B05D1/265 ,  B05C11/1039

Abstract: The present disclosure pertains to a deposition system, a method and use of such system for filling a groove provided into surface of a workpiece with a printable medium, in particular a highly viscous paste. The system includes a deposition head that includes a first deposition chamber that extends to a first orifice. The orifice is reversibly closed off between at least two shutter elements. In some embodiments the system is a dual chamber system, each chamber having a reversible closable orifice. The system is arranged to maintain a flush physical relationship between the workpiece and the terminal ends of the shutter elements, so as to, upon application of a working pressure, fill the groove.

公开(公告)号：US11833335B2

公开(公告)日：2023-12-05

申请号：US16979593

申请日：2019-03-15

Applicant: MUSASHI ENGINEERING, INC.

Inventor： Kazumasa Ikushima

IPC: B05C11/10 ,  B05C5/02 ,  B05D1/26 ,  A61M5/315 ,  A61M5/31

CPC classification number: A61M5/31576 ,  A61M5/31513 ,  A61M5/31528 ,  A61M5/31548 ,  B05C5/0225 ,  B05C11/1031 ,  A61M2005/3128 ,  B05C5/0233 ,  B05D1/26

Abstract: Problem: To provide a liquid-material discharge device that enables easier correction of a changed discharge amount during discharge operation than conventional techniques. Solution: A liquid-material discharge device according to the present invention, which includes a discharging member having a rod-shaped body, a liquid chamber wider than the discharging member, in which a tip portion of the discharging member is disposed, a discharge port communicating with the liquid chamber, a liquid feed path that makes the liquid chamber communicate with a liquid-material reservoir, and a driving device configured to drive the discharging member, includes a discharge amount adjustment member positioned at the liquid feed path, and a member position adjustment mechanism configured to shift a position of the discharge amount adjustment member within the liquid feed path, the discharge amount adjustment member being kept from interrupting communication between the liquid chamber and the liquid-material reservoir.

公开(公告)号：US20230364635A1

公开(公告)日：2023-11-16

申请号：US17744245

申请日：2022-05-13

Applicant: ADVANCED JET AUTOMATION CO., LTD

Inventor： Lu-Min Chen ,  Tsung-Lin Tsai

IPC: B05C11/10

CPC classification number: B05C11/1005 ,  B05C11/1026

Abstract: A dual-valve automatic calibration system comprises a primary positioner, a first secondary positioner and a second secondary positioner: the first secondary positioner and the second secondary positioner are connected with a first fluid coating unit and a second fluid coating unit, respectively; the primary positioner comprises a primary X-axis positioner and a primary Y-axis positioner; both the first secondary positioner and the second secondary positioner are connected with the primary X-axis positioner. In contrast to the prior art that a secondary positioner is installed on a primary Z-axis positioner, a dual-valve automatic calibration system contributes to promotion of positioning precision on the Z-axis and reduction of a burden imposed on the Z-axis.

公开(公告)号：US11805634B2

公开(公告)日：2023-10-31

申请号：US17392998

申请日：2021-08-03

Applicant: Illinois Tool Works Inc.

Inventor： Ronald J. Forget ,  Thomas J. Karlinski ,  Scott A. Reid

IPC: B05C5/02 ,  B05C11/10 ,  H05K13/04 ,  H05K13/08

CPC classification number: H05K13/0469 ,  B05C5/0225 ,  B05C11/1015 ,  H05K13/0815 ,  H05K2203/0126

Abstract: A dispensing system includes a frame, a support coupled to the frame, a dispensing unit configured to dispense viscous material, and a gantry assembly coupled to the frame. The gantry assembly includes a gantry configured to support the dispensing unit and to move the dispensing unit in x-axis, y-axis and z-axis directions and a tilt and rotate subassembly configured to tilt and rotate the dispensing unit. The dispensing system further includes a controller configured to control dispensing unit and the gantry assembly to perform a dispense operation on the electronic substrate. The controller is configured to simultaneously coordinate the movement of the gantry assembly and the tilt and rotate subassembly to position and orient the nozzle of the dispensing unit a predetermined distance and orientation from the electronic substrate while dispensing material along a three-dimensional path.