公开(公告)号：US11879784B2

公开(公告)日：2024-01-23

申请号：US17250852

申请日：2019-09-13

Applicant: Hahn-Schickard-Gesellschaft für angewandte Forschung e. V.

Inventor： Alfons Dehé ,  Achim Bittner ,  Daniel Biesinger

IPC: G01N21/17 ,  G01J5/08 ,  G01J3/10 ,  G01N21/3504 ,  B81B7/02

CPC classification number: G01J5/0896 ,  B81B7/02 ,  G01J3/108 ,  G01N21/1702 ,  G01N21/3504 ,  B81B2201/032 ,  B81B2201/033 ,  H05B2203/032

Abstract: The invention relates to a modulatable infrared emitter comprising a MEMS heating element and an actuator, wherein the actuator triggers shape and/or structure changes of the MEMS heating element. Said change in shape and/or structure of the MEMS heating element may vary the ratio of the emitting area to the total area, thereby producing a change in intensity of the emitted infrared beam. The invention further relates to a manufacturing method for the infrared emitter, a method for modulated emission of infrared radiation using the infrared emitter, and preferred uses of the infrared emitter. In further preferred aspects the invention relates to a system comprising the infrared emitter and a control device for regulating the actuator.

公开(公告)号：US11662361B2

公开(公告)日：2023-05-30

申请号：US17168698

申请日：2021-02-05

Applicant: Atlantic Inertial Systems Limited

Inventor： Christopher Paul Fell ,  Alan Malvern

IPC: G01P15/125 ,  G01D3/06 ,  G01L1/14 ,  G01P21/00

CPC classification number: G01P15/125 ,  B81B2201/033 ,  G01D3/066 ,  G01L1/144 ,  G01P21/00

Abstract: A capacitive accelerometer includes a proof mass, first and second fixed capacitive electrodes, and a DC biasing element arranged to apply a DC voltage (VB) to the proof mass based on a threshold acceleration value. A first closed loop circuit is arranged to detect a signal resulting from displacement of the proof mass and control the pulse width modulation signal generator to apply the first and second drive signals V1, V2 with a variable mark:space ratio. A second closed loop circuit keeps the mark:space ratio constant and to change the magnitude, VB, of the DC voltage applied to the proof mass by the DC biasing element so as to provide a net electrostatic restoring force on the proof mass for balancing the inertial force of the applied acceleration and maintaining the proof mass at a null position, when the applied acceleration is greater than a threshold acceleration value.

公开(公告)号：US20170278646A1

公开(公告)日：2017-09-28

申请号：US15512285

申请日：2015-07-10

Applicant: Sony Corporation

Inventor： Shinya MORITA

IPC: H01H1/00

CPC classification number: H01H1/0036 ,  B81B2201/033 ,  B81B2203/0136 ,  B81B2203/051 ,  H01H59/0009 ,  H01H2001/0042 ,  H01H2001/0063 ,  H01H2001/0078

Abstract: [Object] To be capable of promptly performing a switching operation of a switch.[Solving Means] In a switching apparatus according to an embodiment of the present technology, a movable electrode includes a first movable electrode piece, a second movable electrode piece, and a movable contact point. A first fixed electrode includes first and second fixed electrode pieces, the first and second fixed electrode pieces facing each other with the first movable electrode piece disposed between the first and second fixed electrode pieces, the first fixed electrode piece facing the first movable electrode piece with a gap narrower than a gap between the second fixed electrode piece and the first movable electrode piece. A second fixed electrode includes third and fourth fixed electrode pieces, the third and fourth fixed electrode pieces facing each other with the second movable electrode piece disposed between the third and fourth fixed electrode pieces, the third fixed electrode piece facing the second movable electrode piece with a gap narrower than a gap between the fourth fixed electrode piece and the second movable electrode piece. A first fixed contact point is in contact with the movable contact point, the movable contact point moving in a first direction by an electrostatic attractive force between the movable electrode and the first fixed electrode. A second fixed contact point is in contact with the movable contact point, the movable contact point moving in a second direction opposite to the first direction by an electrostatic attractive force between the movable electrode and the second fixed electrode.

公开(公告)号：US20170197825A1

公开(公告)日：2017-07-13

申请号：US15468682

申请日：2017-03-24

Applicant: MEMS DRIVE, INC.

Inventor： Roman Gutierrez ,  Tony Tang ,  Xiaolei Liu ,  Matthew Ng ,  Guiqin Wang

IPC: B81C1/00

CPC classification number: B81C1/00476 ,  B81B2201/033 ,  B81C1/00619 ,  B81C99/0095 ,  B81C2201/0132 ,  B81C2201/056

Abstract: A simplified MEMS fabrication process and MEMS device is provided that allows for cheaper and lighter-weight MEMS devices to be fabricated. The process comprises etching a plurality of holes or other feature patterns into a MEMS device, and then etching away the underlying wafer such that, after the etching process, the MEMS device is the required thickness and the individual die are separated, avoiding the extra steps of wafer thinning and die dicing. By etching trenches into the substrate wafer and filling them with a MEMS base material, sophisticated taller MEMS devices with larger force may be made.

公开(公告)号：US20170190568A1

公开(公告)日：2017-07-06

申请号：US14985175

申请日：2015-12-30

Applicant: MEMS DRIVE, INC.

Inventor： Gerardo MORABITO ,  Xiaolei LIU ,  Guiqin WANG ,  Roman GUTIERREZ ,  Matthew NG

IPC: B81B3/00 ,  H02N1/00

CPC classification number: B81B3/0051 ,  B81B7/0016 ,  B81B2201/033 ,  B81B2203/0118 ,  B81B2203/0136 ,  H02N1/006

Abstract: Shock-resistant MEMS structures are disclosed. In one implementation, a motion control flexure for a MEMS device includes: a rod including a first and second end, wherein the rod is tapered along its length such that it is widest at its center and thinnest at its ends; a first hinge directly coupled to the first end of the rod; and a second hinge directly coupled to the second of the rod. In another implementation, a conductive cantilever for a MEMS device includes: a curved center portion includes a first and second end, wherein the center portion has a point of inflection; a first root coupled to the first end of the center portion; and a second root coupled to the second end of the center portion. In yet another implementation, a shock stop for a MEMS device is described.

公开(公告)号：US09547020B2

公开(公告)日：2017-01-17

申请号：US14314243

申请日：2014-06-25

Applicant: MURATA MANUFACTURING CO., LTD.

Inventor： Matti Liukku ,  Ville Pekka Rytkönen

IPC: G01P15/125 ,  B81B3/00 ,  G01P15/18 ,  G01P15/13 ,  G01P15/08

CPC classification number: G01P15/125 ,  B81B3/0078 ,  B81B2201/0235 ,  B81B2201/033 ,  G01P15/0802 ,  G01P15/131 ,  G01P15/18 ,  G01P2015/0814 ,  G01P2015/0871

Abstract: The invention relates to a capacitive micromechanical sensor structure comprising a stator structure rigidly anchored to a substrate and a rotor structure movably anchored by means of spring structures to the substrate. The stator structure has a plurality of stator finger support beams and the rotor structure has a plurality of rotor finger support beams. Stator fingers along the stator finger support beam of the stator structure extend into rotor gaps along the rotor finger support beam of the rotor structure, and rotor fingers along the rotor finger support beam of the rotor structure extend into stator gaps along the stator finger support beam of the stator structure.

Abstract translation: 本发明涉及一种电容微机械传感器结构，其包括刚性地锚定到基底的定子结构和通过弹簧结构可移动地锚定到基底的转子结构。 定子结构具有多个定子指状支撑梁，转子结构具有多个转子手指支撑梁。 沿着定子结构的定子指状支撑梁的定子指状物沿着转子结构的转子指状支撑梁延伸到转子间隙中，沿着转子结构的转子指状支撑梁的转子指状物沿着定子指状支撑梁延伸到定子间隙中 的定子结构。

公开(公告)号：US20160227117A1

公开(公告)日：2016-08-04

申请号：US14630437

申请日：2015-02-24

Applicant: MEMS Start, LLC

Inventor： ROMAN GUTIERREZ

IPC: H04N5/232 ,  H02N1/00 ,  H04N5/225

CPC classification number: H04N5/23287 ,  B81B3/0062 ,  B81B2201/033 ,  B81B2203/0136 ,  G03B3/10 ,  G03B2205/0053 ,  G03B2205/0084 ,  H02N1/008 ,  H04N5/2252 ,  H04N5/2253 ,  H04N5/2254

Abstract: An actuator for moving a platform having electrical connections is provided. The actuator includes an outer frame connected to an inner frame by one or more spring elements that are electrically conductive. The actuator further includes one or more comb drive actuators that apply a controlled force between the outer frame and the inner frame. Each of the comb drive actuators includes one or more comb drives. Moreover, a method for moving a platform having electrical connections is also provided. The method includes connecting an outer frame to an inner frame using one or more spring elements that are electrically conductive. The method further includes generating a controlled force using one or more comb drive actuators. Each of the comb drive actuators includes one or more comb drives. In addition, the method includes applying the controlled force between the outer frame and the inner frame.

Abstract translation: 提供了用于移动具有电连接的平台的致动器。 致动器包括通过一个或多个导电的弹簧元件连接到内框架的外框架。 致动器还包括一个或多个梳状驱动致动器，其在外框架和内框架之间施加受控的力。 每个梳状驱动致动器包括一个或多个梳状驱动器。 此外，还提供了一种用于移动具有电连接的平台的方法。 该方法包括使用一个或多个导电弹簧元件将外框架连接到内框架。 该方法还包括使用一个或多个梳状驱动致动器产生受控的力。 每个梳状驱动致动器包括一个或多个梳状驱动器。 此外，该方法包括在外框架和内框架之间施加受控力。

公开(公告)号：US20160204716A1

公开(公告)日：2016-07-14

申请号：US14910622

申请日：2014-07-30

Applicant: NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY ,  OMRON CORPORATION ,  KABUSHIKI KAISHA SAGINOMIYA SEISAKUSHO

Inventor： Masato SUZUKI ,  Akito MORI ,  Gen HASHIGUCHI ,  Tatsuhiko SUGIYAMA ,  Hiroshi IMAMOTO ,  Masatoshi OBA ,  Hiroyuki MITSUYA ,  Hisayuki ASHIZAWA ,  Kazunori ISHIBASHI

IPC: H02N1/00 ,  F16K31/02 ,  G02B26/02 ,  B81B3/00 ,  H01H59/00

CPC classification number: H02N1/008 ,  B81B3/0054 ,  B81B2201/018 ,  B81B2201/0292 ,  B81B2201/033 ,  B81B2201/036 ,  B81B2201/047 ,  B81B2203/0109 ,  B81B2203/0163 ,  B81B2203/051 ,  F16K31/02 ,  G02B26/02 ,  H01H59/00

Abstract: An actuator includes: an electrostatic actuation mechanism including a stationary electrode and a movable electrode; a first movable part driven by the electrostatic actuation mechanism; a first elastic support part that elastically supports the first movable part; an electret formed in at least one of the stationary electrode and the movable electrode; and a drive control unit that controls application of voltage to the electrostatic actuation mechanism. In the actuator a plurality of stable states are set in which the first movable part is positioned at a stable position at which an electrostatic force generated by the electret matches with an elastic force exerted by the first elastic support part or at a stable position near such stable position. By applying a voltage to the electrostatic actuation mechanism, the first movable part may be displaced from any stable position to another stable position.

Abstract translation: 致动器包括：静电致动机构，包括固定电极和可动电极; 由静电致动机构驱动的第一可动部; 第一弹性支撑部，其弹性地支撑所述第一可动部; 在所述固定电极和所述可动电极中的至少一个上形成的驻极体; 以及驱动控制单元，其控制对静电致动机构施加电压。 在致动器中，设置多个稳定状态，其中第一可移动部件位于由驻极体产生的静电力与由第一弹性支撑部分施加的弹力相匹配的稳定位置处，或者靠近这样的稳定​​位置 稳定的位置。 通过向静电致动机构施加电压，第一可动部件可以从任何稳定位置移动到另一个稳定位置。

公开(公告)号：US20150177272A1

公开(公告)日：2015-06-25

申请号：US14407898

申请日：2013-05-31

Applicant: Purdue Research Foundation

Inventor： Jason V. Clark

IPC: G01P15/125 ,  B81B3/00 ,  B81C99/00 ,  G01Q20/00 ,  G01K11/00

CPC classification number: G01P15/125 ,  B81B3/0051 ,  B81B2201/0235 ,  B81B2201/033 ,  B81C99/003 ,  B81C99/0045 ,  G01C19/5755 ,  G01K11/00 ,  G01P15/097 ,  G01P21/00 ,  G01P2015/0871 ,  G01Q20/00 ,  G01Q40/00

Abstract: Methods of measuring displacement of a movable mass in a microelectromechanical system (MEMS) include driving the mass against two displacement-stopping surfaces and measuring corresponding differential capacitances of sensing capacitors such as combs. A MEMS device having displacement-stopping surfaces is described. Such a MEMS device can be used in a method of measuring properties of an atomic force microscope (AFM) having a cantilever and a deflection sensor, or in a temperature sensor having a displacement-sensing unit for sensing a movable mass permitted to vibrate along a displacement axis. A motion-measuring device can include pairs of accelerometers and gyroscopes driven 90° out of phase.

Abstract translation: 测量微机电系统（MEMS）中可移动质量块的位移的方法包括对两个位移停止表面驱动质量，并测量感应电容器（如梳子）的对应微分电容。 描述了具有位移停止表面的MEMS器件。 这种MEMS器件可以用于测量具有悬臂和偏转传感器的原子力显微镜（AFM）的性质的方法中，或者在具有位移感测单元的温度传感器中使用，该位移感测单元用于感测允许沿着 位移轴。 运动测量装置可以包括驱动90°异相的加速度计和陀螺仪对。

公开(公告)号：US20150021745A1

公开(公告)日：2015-01-22

申请号：US14336477

申请日：2014-07-21

Applicant: Atlantic lnertial Systems Limited

Inventor： Tracey Hawke ,  Mark Venables ,  lan Sturland ,  Rebecka Eley

IPC: B81C1/00 ,  B81B3/00 ,  H01L21/3065 ,  H01L21/308

CPC classification number: B81C1/00531 ,  B81B3/0064 ,  B81B2201/033 ,  B81B2203/033 ,  B81C1/00388 ,  B81C1/00619 ,  B81C2201/0112 ,  H01L21/3065 ,  H01L21/308

Abstract: A method of reactive ion etching a substrate 46 to form at least a first and a second etched feature (42, 44) is disclosed. The first etched feature (42) has a greater aspect ratio (depth:width) than the second etched feature (44). In a first etching stage the substrate (46) is etched so as to etch only said first feature (42) to a predetermined depth. Thereafter in a second etching stage, the substrate (46) is etched so as to etch both said first and said second features (42, 44) to a respective depth. A mask (40) may be applied to define apertures corresponding in shape to the features (42, 44). The region of the substrate (46) in which the second etched feature (44) is to be produced is selectively masked with a second maskant (50) during the first etching stage, The second maskant (50) is then removed prior to the second etching stage.

Abstract translation: 公开了一种反应离子蚀刻衬底46以形成至少第一和第二蚀刻特征（42,44）的方法。 第一蚀刻特征（42）具有比第二蚀刻特征（44）更大的纵横比（深度：宽度）。 在第一蚀刻阶段中，蚀刻衬底（46）以仅将所述第一特征（42）仅蚀刻到预定深度。 此后，在第二蚀刻阶段，蚀刻衬底（46）以便将所述第一和第二特征（42,44）都蚀刻到相应的深度。 可以施加掩模（40）以限定形状对应于特征（42,44）的孔。 在第一蚀刻阶段期间，用第二掩模（50）选择性地掩蔽其中要产生第二蚀刻特征（44）的衬底（46）的区域，然后在第二蚀刻阶段之前将第二掩模（50） 蚀刻阶段。