Flame detector
    52.
    发明授权
    Flame detector 有权
    火焰探测器

    公开(公告)号:US09134181B2

    公开(公告)日:2015-09-15

    申请号:US14251795

    申请日:2014-04-14

    Abstract: A system and method are disclosed for detecting open flames in an outdoor environment. Structurally, the outdoor flame detector includes both an ultra-violet (UV) detector and a Radio Frequency (RF) detector. While operating within predetermined parameters, these detectors respectively create an event signal(s) and a cancel signal(s). In detail, the UV detector will output an event signal whenever UV radiation with a fluence above a predetermined value is incident on the UV detector. On the other hand, the RF detector will output a cancel signal whenever it receives an RF component transmitted in an electrical arc discharge having an intensity above a predetermined threshold. The event signal and the cancel signal are then individually and collectively evaluated by a computer to distinguish between an actual open flame and a non-flame event, such as an electric arc discharge (e.g. lightening, electric motors and arc welding).

    Abstract translation: 公开了用于在户外环境中检测明火的系统和方法。 结构上,室外火焰探测器包括紫外线(UV)检测器和射频(RF)检测器。 当在预定参数内操作时,这些检测器分别产生事件信号和消除信号。 详细地,当紫外线检测器入射到高于预定值的UV辐射时,UV检测器将输出事件信号。 另一方面,RF检测器每当接收到具有高于预定阈值的强度的电弧放电中发送的RF分量时,将输出取消信号。 事件信号和取消信号然后由计算机单独和集体评估,以区分实际的明火和非火焰事件,例如电弧放电(例如减光,电动马达和电弧焊)。

    Welding arc apparel with UV or thermochromic activated images
    53.
    发明授权
    Welding arc apparel with UV or thermochromic activated images 有权
    具有紫外线或热致变色激活图像的焊接电弧服

    公开(公告)号:US09121776B2

    公开(公告)日:2015-09-01

    申请号:US13645662

    申请日:2012-10-05

    Abstract: A welding accessory and a system for detecting thermal and/or UV radiation exposure during welding operations are disclosed. The welding accessory may have a surface exposed to thermal and/or UV radiation generated by electric arc welding, a first image visible without exposure to the thermal and/or UV radiation, and a second image formed from either a UV activated dye that is visible only after exposure to UV radiation generated by the electric welding arc or a thermochromic dye that is visible only after exposure to a predetermined level of thermal radiation generated by the welding arc. A system may include either a thermal or UV exposure indicator with a first state and at least a second state, and include either a thermochromic or UV activated dye adapted to provide a reversible or persistent visual indication upon exposure to radiation. The visual indication may include any combination of symbols, logos, images, text, or other decorative or informational designs as desired.

    Abstract translation: 公开了焊接附件和用于在焊接操作期间检测热和/或UV辐射暴露的系统。 焊接附件可能具有暴露于通过电弧焊接产生的热和/或UV辐射的表面,第一图像可见而不暴露于热和/或UV辐射,以及由可见的UV活化染料形成的第二图像 仅在暴露于由电焊弧产生的UV辐射或仅在暴露于由焊接电弧产生的预定水平的热辐射之后才可见的热变色染料。 系统可以包括具有第一状态和至少第二状态的热或UV曝光指示器,并且包括适于在暴露于辐射时提供可逆或持续视觉指示的热致变色或UV活化染料。 视觉指示可以包括符号,标志,图像,文本或其他装饰或信息设计的任何组合。

    Ultraviolet monitoring systems, methods, and devices
    54.
    发明授权
    Ultraviolet monitoring systems, methods, and devices 有权
    紫外线监测系统,方法和装置

    公开(公告)号:US09119891B2

    公开(公告)日:2015-09-01

    申请号:US13991642

    申请日:2011-12-05

    Abstract: In embodiments, a control system for a UV air treatment system, especially one used for cleaning a fume stream such as in a kitchen exhaust system, detects a need for cleaning maintenance on the UV light source based on changes in light intensity. The system further detects the light intensity each time the UV light source is cleaned to determine if the drop in intensity after cleaning indicates that the UV light source should be replaced. The cleaning and replacement requirements are indicated automatically by a user interface.

    Abstract translation: 在实施例中,用于UV空气处理系统的控制系统,特别是用于清洁诸如厨房排气系统中的烟气流的UV空气处理系统,基于光强度的变化来检测对UV光源的清洁维护的需要。 该系统进一步检测每次UV光源被清洁时的光强度,以确定清洁后强度的下降是否应更换UV光源。 清洁和更换要求由用户界面自动指示。

    Exposure amount evaluation method and photomask
    55.
    发明授权
    Exposure amount evaluation method and photomask 有权
    曝光量评估方法和光掩模

    公开(公告)号:US09110374B2

    公开(公告)日:2015-08-18

    申请号:US13237736

    申请日:2011-09-20

    Applicant: Satoshi Tanaka

    Inventor: Satoshi Tanaka

    Abstract: According to the exposure amount evaluation method of the embodiment, a photomask including a long-wavelength light reflective film and a mask pattern is set in an EUV exposure apparatus. The long-wavelength light reflective film reflects long-wavelength light having a wavelength longer than that of EUV light and absorbs the EUV light. The mask pattern is formed by an absorption film which is arranged on the upper side of the long-wavelength light reflective film and absorbs the EUV light and the long-wavelength light. A substrate on which resist is coated are set in the EUV exposure apparatus. Exposure light reflected by the photomask is irradiated to the substrate, and a light amount distribution of the long-wavelength light irradiated to the substrate is measured on the basis of an exposure amount of the exposure light irradiated to the substrate.

    Abstract translation: 根据本实施例的曝光量评估方法,在EUV曝光装置中设置包括长波长光反射膜和掩模图案的光掩模。 长波长光反射膜反射长于EUV光的波长的长波长的光并吸收EUV光。 掩模图案由布置在长波长光反射膜的上侧并吸收EUV光和长波长光的吸收膜形成。 在EUV曝光装置中设置涂布有抗蚀剂的基板。 照射到光掩模的曝光光照射到基板上,并且基于照射到基板的曝光光的曝光量来测量照射到基板的长波长光的光量分布。

    EXTREME ULTRA-VIOLET (EUV) INSPECTION SYSTEMS
    56.
    发明申请
    EXTREME ULTRA-VIOLET (EUV) INSPECTION SYSTEMS 审中-公开
    极端超紫外(EUV)检测系统

    公开(公告)号:US20150192459A1

    公开(公告)日:2015-07-09

    申请号:US14589902

    申请日:2015-01-05

    Inventor: Damon F. Kvamme

    Abstract: Disclosed are methods and apparatus for reflecting, towards a sensor, extreme ultra-violet (EUV) light that is reflected from a target substrate. The system includes a first mirror arranged to receive and reflect the EUV light that is reflected from the target substrate, a second mirror arranged to receive and reflect the EUV light that is reflected by the first mirror, a third mirror arranged to receive and reflect the EUV light that is reflected by the second mirror, and a fourth mirror arranged to receive and reflect the EUV light that is reflected by the third mirror. The first mirror has an aspherical surface. The second, third, and fourth mirrors each have a spherical surface.

    Abstract translation: 公开了用于向传感器反射从目标衬底反射的极紫外(EUV)光的方法和装置。 该系统包括布置成接收和反射从目标基板反射的EUV光的第一反射镜,布置成接收和反射由第一反射镜反射的EUV光的第二反射镜,布置成接收和反射 由第二反射镜反射的EUV光和被配置为接收和反射由第三反射镜反射的EUV光的第四反射镜。 第一个镜子有一个非球面。 第二,第三和第四反射镜各自具有球面。

    UV DOSIMETRY SYSTEM FOR SAFE UV EXPOSURE
    57.
    发明申请
    UV DOSIMETRY SYSTEM FOR SAFE UV EXPOSURE 有权
    用于安全紫外线曝光的紫外线测定系统

    公开(公告)号:US20150177056A1

    公开(公告)日:2015-06-25

    申请号:US14575831

    申请日:2014-12-18

    Abstract: A UV exposure dosimetry system includes at least one UV sensor that accurately measures the UV irradiance intensity. The UV dosimetry system integrates the measured UV irradiance intensity over time to calculate the real-time UV dosage and the vitamin D production by taking into account factors comprising UV sensor location, body surface area, clothing coverage, and sunscreen usage. Based on the measurement, the system can predict the time remaining to skin burn and the time remaining to reach daily goal of vitamin D production. The system also calculates the UV index in real-time, and can crowd source the measured data in a network. The UV dosimetry system supports multi-user control through an advanced and user friendly input and output interface.

    Abstract translation: UV曝光剂量测定系统包括至少一个UV传感器,其精确地测量紫外线辐照强度。 UV剂量测定系统通过考虑到UV传感器位置,体表面积,衣物覆盖率和防晒霜使用量的因素,将测量的紫外线辐照度随时间整合,以计算实时紫外线剂量和维生素D的生产。 基于测量,该系统可以预测皮肤灼伤的时间和剩余的时间达到维生素D生产的每日目标。 该系统还实时计算UV指数,并可以将网络中的测量数据聚集在一起。 UV剂量测定系统通过先进且用户友好的输入和输出接口支持多用户控制。

    ROOM STERILIZATION METHOD AND SYSTEM
    58.
    发明申请
    ROOM STERILIZATION METHOD AND SYSTEM 审中-公开
    房间灭菌方法与系统

    公开(公告)号:US20150086420A1

    公开(公告)日:2015-03-26

    申请号:US14263774

    申请日:2014-04-28

    Applicant: Steriliz, LLC

    Inventor: Sam Trapani

    Abstract: A sterilization system consisting of a mobile emitter, a sensing subsystem and a data logging subsystem is described. The emitter has one or more UV emitting lamps or devices. The sensing system comprises at least one remote UV sensor and at least one door sensor. The door sensor comprises a safety shut off door detector and may contain an emergency stop detector and arming detector to protect people from being exposed to UV energy. The system has a remote control for starting, stopping and setting system parameters which include but are not limited to: treatment time, dosage, room size, room number, unit number, floor, facility name, operator name, operator identification number, password, default dosage values, dosage, and patient identification number. The number of treatments per unit of time can be maximized because of the use of incident light measurement.

    Abstract translation: 描述了由移动发射器,感测子系统和数据记录子系统组成的灭菌系统。 发射器具有一个或多个UV发射灯或器件。 感测系统包括至少一个远程UV传感器和至少一个门传感器。 门传感器包括安全关闭门检测器,并且可以包含紧急停止检测器和布防检测器,以防止人们暴露于紫外线能量。 系统具有启动,停止和设置系统参数的遥控器,包括但不限于:治疗时间,剂量,房间大小,房间号,单位号码,楼层,设施名称,操作人员名称,操作员识别号码,密码, 默认剂量值,剂量和患者识别号码。 由于使用入射光测量,每单位时间的处理次数可以最大化。

    DEVICE AND METHOD FOR DETERMINATION OF SAFE TANNING TIME
    59.
    发明申请
    DEVICE AND METHOD FOR DETERMINATION OF SAFE TANNING TIME 有权
    用于确定安全时间的装置和方法

    公开(公告)号:US20150083934A1

    公开(公告)日:2015-03-26

    申请号:US14391938

    申请日:2013-04-11

    Applicant: SKINPLAN AB

    Inventor: Martina Richter

    Abstract: The invention relates to a container for sunscreen agent in which the sunscreen agent has a specific predetermined sun-protection factor, comprising a sealing device (2) by which the container (1) can be closed to make its opening (8) completely sealed, the container (1) being provided with at least one sun sensor (3) arranged to indicate the current UV intensity by changing its hue depending on the UV intensity of the radiation striking the sensor (3), said container further comprising a colour-reference range (4) for comparative reading of the hue of the sensor to enable the determination of UV intensity, and time indicator (50) for determining the period of time during which a person of a specific skin type can expose his or her skin to solar radiation at said determined UV intensity without sunburn arising, provided said person has applied the sunscreen agent from the container to the skin, said sun sensor (3) being arranged as an integral part of the container (1) and being positioned such that it is completely covered by the sealing device (2) when the sealing device (2) is sealed.

    Abstract translation: 本发明涉及一种防晒剂容器,其中防晒剂具有特定的预定防晒系数,包括密封装置(2),容器(1)可以通过该密封装置封闭以使其开口(8)完全密封, 所述容器(1)设置有至少一个太阳传感器(3),所述至少一个太阳传感器(3)被布置成根据撞击所述传感器(3)的辐射的UV强度改变其色调来指示当前的UV强度,所述容器还包括颜色参考 范围(4),用于比较读取传感器的色调以确定UV强度;以及时间指示器(50),用于确定特定皮肤类型的人可以将他或她的皮肤暴露于太阳下的时间段 如果所述人已经将防晒剂从容器施加到皮肤上,则在所述确定的UV强度下没有晒伤产生的辐射,所述太阳传感器(3)被布置为容器(1)的一体部分, 当密封装置(2)被密封时,其被密封装置(2)完全覆盖。

    WAVEFRONT ADJUSTMENT IN EXTREME ULTRA-VIOLET (EUV) LITHOGRAPHY
    60.
    发明申请
    WAVEFRONT ADJUSTMENT IN EXTREME ULTRA-VIOLET (EUV) LITHOGRAPHY 有权
    超声波紫外线(EUV)光栅的WAVEFRONT调整

    公开(公告)号:US20150069253A1

    公开(公告)日:2015-03-12

    申请号:US14022355

    申请日:2013-09-10

    Abstract: Some embodiments of the present disclosure related to a method to form and operate the reflective surface to compensate for aberration effects on pattern uniformity. In some embodiments, the reflective surface comprises a mirror of within reduction optics of an EUV illumination tool. In some embodiments, the reflective surface comprises a reflective reticle. An EUV reflective surface topography comprising a reflective surface is disposed on a surface of a substrate, and is manipulated by mechanical force or thermal deformation. The substrate includes a plurality of cavities, where each cavity is coupled to a deformation element configured to expand a volume of the cavity and consequently deform a portion of the reflective surface above each cavity, for local control of the reflective surface through thermal deformation of a resistive material subject to an electric current, or mechanical deformation due to pressurized gas within the cavity or a piezoelectric effect.

    Abstract translation: 本公开的一些实施例涉及形成和操作反射表面以补偿对图案均匀性的像差影响的方法。 在一些实施例中,反射表面包括EUV照明工具的还原光学器件内的反射镜。 在一些实施例中,反射表面包括反射光罩。 包括反射表面的EUV反射表面形貌设置在基板的表面上,并且通过机械力或热变形来操纵。 衬底包括多个空腔,其中每个空腔耦合到变形元件,该变形元件被配置为膨胀空腔的体积,并因此使反射表面的一部分在每个空腔之上变形,以便通过热变形来对反射表面进行局部控制 受到电流的电阻材料或由腔内的加压气体引起的机械变形或压电效应。

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