Abstract:
A reflective resin sheet is bonded to one face of a supporting substrate transmitting a radiation ray and a resin sheet of the same material as that of the reflective resin sheet to the other face of the supporting substrate. A phosphor layer converting a radiation ray into visible light is formed additionally on the reflective resin sheet formed on one face of the supporting substrate. The phosphor layer is enclosed with an additional moisture-proof layer and the reflective resin sheet. It is possible to obtain a scintillator panel higher in sensitivity characteristics, stabilized in quality and more cost-effective by placing the reflective resin sheet between the supporting substrate and the phosphor layer.
Abstract:
The invention relates to an arrangement for transporting radicals. The arrangement includes a plasma generator and a guiding body. The plasma generator includes a chamber (2) in which a plasma may be formed. The chamber has an inlet (5) for receiving an input gas, and one or more outlets (6) for removal of at least one of the plasma and radicals created therein. The guiding body is hollow and is arranged for guiding radicals formed in the plasma towards an area or volume at which contaminant deposition is to be removed. The chamber inlet is coupled to a pressure device (40) for providing a pulsed pressure into the chamber so as to create a flow in the guiding body.
Abstract:
The present invention relates to X-rayimage acquisition technology in general. Employing phase-contrast imaging for X-rayimage acquisition may significantly enhance the visibility of structures in images acquired. However, phase-contrast information may only be obtainable in a small detector region with subsequent image acquisitions requiring individual phase stepping states to allow reconstruction of an X-ray image. Accordingly, a grating arrangement for phase-contrast imaging is provided which may allow on the fly phase stepping during a field of view scan. According to the present invention a grating arrangement (1) for phase-contrast imaging is provided, comprising a first grating element (8) and a second grating element (10). Each of the first grating element (8) and the second grating element (10) comprises a trench structure. The trench structure comprises at least one trench region (9) and at least one barrier region (3). The at least one trench region (9) and the at least one barrier region (3) are at least locally arranged in parallel. The first grating element (8) and the second grating element (10) are arranged such that the trench structure of the first grating element (8) and the trench structure of the second grating element (10) are non-parallel comprising an angle α.
Abstract:
An analysis method for use in a radiation imaging apparatus employing intensity information of interference fringes of radiation rays that have passed through a detected object includes the steps of generating first phase information of the detected object wrapped into a range of 2π from the intensity information of the interference fringes; generating information on an absorption intensity gradient of the detected object from the intensity information of the interference fringes; generating a weighting function on the basis of an absolute value of a gradient in the information on the absorption intensity gradient; and generating second phase information by unwrapping the first phase information by using the weighting function.
Abstract:
A conductive substrate (18) and an etching substrate (20) are bonded to each other. An etch mask (25) is formed on the etching substrate (20) using a photolithography technique. On the etching substrate (20), grooves (20a) and X-ray transmitting sections (14b) are formed by dry etching using Bosch process. The grooves (20a) are filled with Au (27) by an electroplating method using the conductive substrate (18) as an electrode. Thus, X-ray absorbing sections (14a) are formed.
Abstract:
An X-ray imaging system is provided with an X-ray source (11), first and second absorption gratings (31, 32), and a flat panel detector (FPD) (30), and obtains a phase contrast image of an object H by performing imaging while moving the second absorption grating (32) in x direction relative to the first absorption grating (31). The following mathematical expression is satisfied where p1′ denotes a period of a first pattern image at a position of the second absorption grating (32), and p2′ denotes a substantial grating pitch of the second absorption grating (32), and DX denotes a dimension, in the x-direction, of an X-ray imaging area of each pixel of the FPD (30). Here, “n” denotes a positive integer. DX≠n×(p1′×p2′)/|p1′−p2′|
Abstract:
A high sensitivity transient grating ultrafast radiation to optical image converter is based on a fixed transmission grating adjacent to a semiconductor substrate. X-rays or optical radiation passing through the fixed transmission grating is thereby modulated and produces a small periodic variation of refractive index or transient grating in the semiconductor through carrier induced refractive index shifts. An optical or infrared probe beam tuned just below the semiconductor band gap is reflected off a high reflectivity mirror on the semiconductor so that it double passes therethrough and interacts with the radiation induced phase grating therein. A small portion of the optical beam is diffracted out of the probe beam by the radiation induced transient grating to become the converted signal that is imaged onto a detector.
Abstract:
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
Abstract:
There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.
Abstract:
In a focus detector arrangement and method for an x-ray apparatus for generating projection or tomographic phase-contrast images of an examination subject, a beam of coherent x-rays is generated by an anode that has areas of different radiation emission characteristics arranged in bands thereon, that proceed parallel to grid lines of a phase grid that is used to generate the phase-contrast images.