Scintillator panel and radiation detector
    51.
    发明授权
    Scintillator panel and radiation detector 有权
    闪烁面板和辐射探测器

    公开(公告)号:US09158009B2

    公开(公告)日:2015-10-13

    申请号:US12565324

    申请日:2009-09-23

    Abstract: A reflective resin sheet is bonded to one face of a supporting substrate transmitting a radiation ray and a resin sheet of the same material as that of the reflective resin sheet to the other face of the supporting substrate. A phosphor layer converting a radiation ray into visible light is formed additionally on the reflective resin sheet formed on one face of the supporting substrate. The phosphor layer is enclosed with an additional moisture-proof layer and the reflective resin sheet. It is possible to obtain a scintillator panel higher in sensitivity characteristics, stabilized in quality and more cost-effective by placing the reflective resin sheet between the supporting substrate and the phosphor layer.

    Abstract translation: 将反射树脂片粘合到支撑基板的一个面上,该支撑基板将与辐射线和与反射树脂片材相同的材料的树脂片材传送到支撑基板的另一个面。 在形成在支撑基板的一个面上的反射树脂片上另外形成将辐射线转换成可见光的荧光体层。 荧光体层被附加的防潮层和反射树脂片包围。 通过将反射树脂片放置在支撑基板和荧光体层之间,可以获得灵敏度特性更高,质量稳定,成本更高的闪烁体面板。

    Arrangement and method for transporting radicals
    52.
    发明授权
    Arrangement and method for transporting radicals 有权
    自由基运输的安排和方法

    公开(公告)号:US09123507B2

    公开(公告)日:2015-09-01

    申请号:US14385802

    申请日:2013-03-20

    Abstract: The invention relates to an arrangement for transporting radicals. The arrangement includes a plasma generator and a guiding body. The plasma generator includes a chamber (2) in which a plasma may be formed. The chamber has an inlet (5) for receiving an input gas, and one or more outlets (6) for removal of at least one of the plasma and radicals created therein. The guiding body is hollow and is arranged for guiding radicals formed in the plasma towards an area or volume at which contaminant deposition is to be removed. The chamber inlet is coupled to a pressure device (40) for providing a pulsed pressure into the chamber so as to create a flow in the guiding body.

    Abstract translation: 本发明涉及一种输送自由基的装置。 该装置包括等离子体发生器和引导体。 等离子体发生器包括可以形成等离子体的腔室(2)。 腔室具有用于接收输入气体的入口(5)和用于去除其中产生的至少一种等离子体和自由基的一个或多个出口(6)。 引导体是中空的,并且被布置成用于将形成在等离子体中的自由基引导到要去除污染物沉积的区域或体积。 腔室入口联接到压力装置(40),用于向腔室提供脉冲压力,以便在引导体中产生流动。

    Non-parallel grating arrangement with on-the-fly phase stepping, X-ray system
    53.
    发明授权
    Non-parallel grating arrangement with on-the-fly phase stepping, X-ray system 有权
    非平行光栅布置,具有飞行相位步进,X射线系统

    公开(公告)号:US08848863B2

    公开(公告)日:2014-09-30

    申请号:US13514061

    申请日:2010-12-03

    CPC classification number: G21K1/06 A61B6/484 G21K2201/06 G21K2207/005

    Abstract: The present invention relates to X-rayimage acquisition technology in general. Employing phase-contrast imaging for X-rayimage acquisition may significantly enhance the visibility of structures in images acquired. However, phase-contrast information may only be obtainable in a small detector region with subsequent image acquisitions requiring individual phase stepping states to allow reconstruction of an X-ray image. Accordingly, a grating arrangement for phase-contrast imaging is provided which may allow on the fly phase stepping during a field of view scan. According to the present invention a grating arrangement (1) for phase-contrast imaging is provided, comprising a first grating element (8) and a second grating element (10). Each of the first grating element (8) and the second grating element (10) comprises a trench structure. The trench structure comprises at least one trench region (9) and at least one barrier region (3). The at least one trench region (9) and the at least one barrier region (3) are at least locally arranged in parallel. The first grating element (8) and the second grating element (10) are arranged such that the trench structure of the first grating element (8) and the trench structure of the second grating element (10) are non-parallel comprising an angle α.

    Abstract translation: 本发明一般涉及X射线图像采集技术。 采用X射线图像采集的相位对比成像可以显着增强获得的图像中结构的可视性。 然而,相位对比度信息只能在小的检测器区域中获得,随后的图像采集需要各个相位步进状态以允许重建X射线图像。 因此,提供了用于相位对比成像的光栅装置,其可以在视野扫描期间在飞行阶段上进行步进。 根据本发明,提供了一种用于相位对比成像的光栅装置(1),包括第一光栅元件(8)和第二光栅元件(10)。 第一光栅元件(8)和第二光栅元件(10)中的每一个包括沟槽结构。 沟槽结构包括至少一个沟槽区(9)和至少一个势垒区(3)。 至少一个沟槽区域(9)和至少一个阻挡区域(3)至少局部地平行布置。 第一光栅元件(8)和第二光栅元件(10)被布置成使得第一光栅元件(8)的沟槽结构和第二光栅元件(10)的沟槽结构不平行,包括角度α 。

    Analysis method, radiation imaging apparatus using analysis method, and analysis program for executing analysis method
    54.
    发明授权
    Analysis method, radiation imaging apparatus using analysis method, and analysis program for executing analysis method 失效
    分析方法,辐射成像仪使用分析方法,分析程序执行分析方法

    公开(公告)号:US08520799B2

    公开(公告)日:2013-08-27

    申请号:US13060112

    申请日:2009-10-28

    Abstract: An analysis method for use in a radiation imaging apparatus employing intensity information of interference fringes of radiation rays that have passed through a detected object includes the steps of generating first phase information of the detected object wrapped into a range of 2π from the intensity information of the interference fringes; generating information on an absorption intensity gradient of the detected object from the intensity information of the interference fringes; generating a weighting function on the basis of an absolute value of a gradient in the information on the absorption intensity gradient; and generating second phase information by unwrapping the first phase information by using the weighting function.

    Abstract translation: 一种用于使用已经通过检测对象的辐射线的干涉条纹的强度信息的放射线成像设备的分析方法包括以下步骤:从被检测到的物体的强度信息生成包含在2pi范围内的检测对象的第一相位信息 干涉条纹; 根据干涉条纹的强度信息生成关于被检测物体的吸收强度梯度的信息; 基于关于吸收强度梯度的信息中的梯度的绝对值生成加权函数; 以及通过使用所述加权函数展开所述第一相位信息来产生第二相位信息。

    GRID FOR RADIATION IMAGING AND METHOD FOR PRODUCING THE SAME
    55.
    发明申请
    GRID FOR RADIATION IMAGING AND METHOD FOR PRODUCING THE SAME 有权
    用于辐射成像的网格及其制造方法

    公开(公告)号:US20120307976A1

    公开(公告)日:2012-12-06

    申请号:US13521725

    申请日:2011-03-18

    Inventor: Yasuhisa Kaneko

    Abstract: A conductive substrate (18) and an etching substrate (20) are bonded to each other. An etch mask (25) is formed on the etching substrate (20) using a photolithography technique. On the etching substrate (20), grooves (20a) and X-ray transmitting sections (14b) are formed by dry etching using Bosch process. The grooves (20a) are filled with Au (27) by an electroplating method using the conductive substrate (18) as an electrode. Thus, X-ray absorbing sections (14a) are formed.

    Abstract translation: 导电基板(18)和蚀刻基板(20)彼此接合。 使用光刻技术在蚀刻基板(20)上形成蚀刻掩模(25)。 在蚀刻基板(20)上,通过使用Bosch工艺的干蚀刻形成槽(20a)和X射线透过部(14b)。 通过使用导电性基板(18)作为电极的电镀方法将凹槽(20a)填充有Au(27)。 因此,形成X射线吸收部(14a)。

    RADIATION IMAGING SYSTEM
    56.
    发明申请
    RADIATION IMAGING SYSTEM 有权
    辐射成像系统

    公开(公告)号:US20120288056A1

    公开(公告)日:2012-11-15

    申请号:US13522010

    申请日:2011-02-02

    Abstract: An X-ray imaging system is provided with an X-ray source (11), first and second absorption gratings (31, 32), and a flat panel detector (FPD) (30), and obtains a phase contrast image of an object H by performing imaging while moving the second absorption grating (32) in x direction relative to the first absorption grating (31). The following mathematical expression is satisfied where p1′ denotes a period of a first pattern image at a position of the second absorption grating (32), and p2′ denotes a substantial grating pitch of the second absorption grating (32), and DX denotes a dimension, in the x-direction, of an X-ray imaging area of each pixel of the FPD (30). Here, “n” denotes a positive integer. DX≠n×(p1′×p2′)/|p1′−p2′|

    Abstract translation: X射线成像系统设置有X射线源(11),第一和第二吸收光栅(31,32)和平板检测器(FPD)(30),并且获得物体的相位对比图像 H,通过在相对于第一吸收光栅(31)的x方向上移动第二吸收光栅(32)的同时执行成像。 满足以下数学表达式,其中p1'表示第二吸收光栅(32)的位置处的第一图案图像的周期,p2'表示第二吸收光栅(32)的实质光栅间距,DX表示 在所述FPD(30)的每个像素的X射线成像区域的x方向上的尺寸。 这里,n表示正整数。 DX≠n×(p1'×p2')/ | p1'-p2'|

    Ultrafast Transient Grating Radiation to Optical Image Converter
    57.
    发明申请
    Ultrafast Transient Grating Radiation to Optical Image Converter 有权
    超快速瞬态光栅辐射到光学图像转换器

    公开(公告)号:US20120250133A1

    公开(公告)日:2012-10-04

    申请号:US13423498

    申请日:2012-03-19

    Abstract: A high sensitivity transient grating ultrafast radiation to optical image converter is based on a fixed transmission grating adjacent to a semiconductor substrate. X-rays or optical radiation passing through the fixed transmission grating is thereby modulated and produces a small periodic variation of refractive index or transient grating in the semiconductor through carrier induced refractive index shifts. An optical or infrared probe beam tuned just below the semiconductor band gap is reflected off a high reflectivity mirror on the semiconductor so that it double passes therethrough and interacts with the radiation induced phase grating therein. A small portion of the optical beam is diffracted out of the probe beam by the radiation induced transient grating to become the converted signal that is imaged onto a detector.

    Abstract translation: 对光学图像转换器的高灵敏度瞬态光栅超快辐射基于与半导体衬底相邻的固定透射光栅。 因此通过固定透射光栅的X射线或光学辐射被调制,并且通过载流子引起的折射率偏移在半导体中产生折射率或瞬态光栅的小的周期性变化。 调谐在半导体带隙正下方的光学或红外探测光束从半导体上的高反射率镜反射,使得其双重通过,并与其中的辐射诱导相位光栅相互作用。 光束的一小部分被辐射诱导的瞬态光栅衍射出探测光束,成为被成像到检测器上的转换信号。

    Source-collector module with GIC mirror and xenon liquid EUV LPP target system
    58.
    发明授权
    Source-collector module with GIC mirror and xenon liquid EUV LPP target system 有权
    源收集器模块采用GIC镜和氙液EUV LPP目标系统

    公开(公告)号:US08258485B2

    公开(公告)日:2012-09-04

    申请号:US12807165

    申请日:2010-08-30

    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

    Abstract translation: 用于产生发射EUV辐射的激光产生等离子体(LPP)的源极集电极模块(SOCOMO)以及相对于LPP布置并具有输入端和输出端的掠入射收集器(GIC)反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP,其中来自光源部分的脉冲激光束照射目标部分中的氙液体。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射,并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

    Illumination system particularly for microlithography
    59.
    再颁专利
    Illumination system particularly for microlithography 失效
    照明系统特别适用于微光刻

    公开(公告)号:USRE42065E1

    公开(公告)日:2011-01-25

    申请号:US11981032

    申请日:2001-09-28

    Abstract: There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.

    Abstract translation: 提供了一种用于具有波长≦̸ 193nm的微光刻的照明系统。 照明系统包括主光源,第一光学部件,第二光学部件,图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件,产生至少部分地叠加在像平面中的场上的多个图像。 第二光学部件包括第一光学系统,其包括具有正光焦度的至少第三场反射镜和包括至少具有正光焦度的第二场反射镜的第二光学系统。 第一光学系统在第一光学系统和第二光学系统之间的平面内成像多个次级光源,形成多个第三光源,并且第二光学系统在出射光瞳中成像多个第三光源。

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