-
公开(公告)号：US4737973A
公开(公告)日：1988-04-12
申请号：US941647
申请日：1986-12-15
Applicant: Taro Ogawa , Shinji Kuniyoshi , Yoshinori Nakayama , Takeshi Kimura
Inventor： Taro Ogawa , Shinji Kuniyoshi , Yoshinori Nakayama , Takeshi Kimura
CPC classification number: B82Y10/00 , G03F7/70158 , G03F7/70575 , G21K1/062 , G21K2201/061 , G21K2201/062 , G21K2201/067
Abstract: A focusing X-ray crystal monochromator in which one or more crystal layers having different spacings of lattice plane are stacked on a crystal base. Due to different spacings of lattice plane, the angle of reflection and diffraction of a diverging incident X-ray beam can be so changed that the beam takes a parallel or focusing direction for monochromatization. Thus, the monochromator of the present invention can be applied to the X-ray lithography for transferring a pattern of high resolution or the X-ray analysis such as the fine X-ray diffraction.
Abstract translation: 将其中具有不同晶格面间隔的一个或多个晶体层堆叠在晶体基底上的聚焦X射线晶体单色仪。 由于晶格面的不同间隔，发散的入射X射线束的反射角和衍射角可以如此改变，使得束取平行或聚焦方向进行单色化。 因此，本发明的单色仪可以应用于用于转印高分辨率图案或X射线分析的精细X射线衍射的X射线光刻。
-
公开(公告)号：US3885153A
公开(公告)日：1975-05-20
申请号：US48142174
申请日：1974-06-20
Applicant: US ENERGY
Inventor： SCHOENBORN BENNO P , CASPAR DONALD L D
CPC classification number: B82Y10/00 , G21K1/062 , G21K2201/061 , G21K2201/062 , G21K2201/068
Abstract: This invention provides an artificial monochromator crystal for efficiently selecting a narrow band of neutron wavelengths from a neutron beam having a Maxwellian wavelength distribution, by providing on a substrate a plurality of germanium layers, and alternate periodic layers of a different metal having tailored thicknesses, shapes, and volumetric and neutron scattering densities.
Abstract translation: 本发明提供一种人造单色器晶体，用于通过在衬底上提供多个锗层和具有定制的厚度，形状的不同金属的交替周期性层，从具有麦克斯韦波长分布的中子束有效地选择中子波长窄带 ，以及体积和中子散射密度。
-
公开(公告)号：US11915837B2
公开(公告)日：2024-02-27
申请号：US17378094
申请日：2021-07-16
Inventor： William Graves , Lucas Malin
IPC: G21K1/06 , H01S4/00 , H05G2/00 , G01N23/20008
CPC classification number: G21K1/062 , G01N23/20008 , H01S4/00 , H05G2/008 , G01N2223/0565 , G01N2223/102 , G21K2201/061 , G21K2201/067
Abstract: A method includes simulating diffraction in a transmission geometry of relativistic electron bunches from a crystallographic structure of a crystal thereby simulating diffraction of the relativistic electron bunches into a plurality of Bragg peaks. The method includes selecting a range of angles between a direction of propagation of the relativistic electron bunches and a normal direction of crystal including an angle at which a diffraction portion is maximized. The method includes sequentially accelerating a plurality of physical electron bunches to relativistic energies toward a physical crystal having the crystallographic structure and diffracting the plurality of physical electron bunches off the physical crystal at different angles and measuring the diffraction portion into the respective Bragg peak at the different angles. The method includes selecting a final angle based on the measured diffraction portion into the respective Bragg peak at the different angles and generating a pulse of light.
-
公开(公告)号：US20190235141A1
公开(公告)日：2019-08-01
申请号：US16338013
申请日：2017-09-25
Inventor： Philipp Naujok , Sergiy Yulin , Norbert Kaiser
CPC classification number: G02B5/0891 , B82Y10/00 , C23C14/35 , G03F7/70958 , G21K1/062 , G21K2201/061
Abstract: A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.
-
公开(公告)号：US09645503B2
公开(公告)日：2017-05-09
申请号：US14210625
申请日：2014-03-14
Applicant: Carl Zeiss SMT GmbH
Inventor： Ingo Saenger , Joerg Zimmermann , Daniel Kraehmer , Johannes Ruoff , Martin Meier , Frank Schlesener , Christoph Hennerkes , Wolfgang Singer
CPC classification number: G03F7/702 , B82Y10/00 , G02B19/0023 , G02B19/0047 , G02B19/0071 , G02B19/0095 , G02B27/286 , G03F7/70166 , G03F7/70175 , G03F7/70566 , G21K1/062 , G21K2201/061 , G21K2201/064 , G21K2201/067
Abstract: A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.
-
Patent Agency Ranking
公开(公告)号：US20170017150A1
公开(公告)日：2017-01-19
申请号：US15281056
申请日：2016-09-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
CPC classification number: G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
Abstract translation: 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。
-
公开(公告)号：US09395630B2
公开(公告)日：2016-07-19
申请号：US13704222
申请日：2011-03-17
Applicant: Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
Inventor： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
IPC: G03F7/20 , B82Y10/00 , B82Y40/00 , C01B31/04 , G02B5/08 , G02B5/20 , G02B27/00 , G03F1/24 , G03F1/62 , G21K1/06 , H01B1/04 , H01B1/24 , G03B27/54
CPC classification number: G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
Abstract translation: 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。 颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。 间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。
-
公开(公告)号：US09364190B2
公开(公告)日：2016-06-14
申请号：US13300083
申请日：2011-11-18
Applicant: Susanne Madeline Lee , Aurelie Boudier , Serge Louis Wilfrid Muller
Inventor： Susanne Madeline Lee , Aurelie Boudier , Serge Louis Wilfrid Muller
CPC classification number: A61B6/482 , A61B6/08 , A61B6/4021 , A61B6/502 , A61B6/588 , B82Y10/00 , G21K1/06 , G21K2201/061 , G21K2201/064 , H01J35/06 , H01J2235/068
Abstract: A mammograph is provided. The mammograph includes a source of X-rays; a detector of X-rays, the source being configured to emit at least one beam of X-rays to the detector; and an optic control device configured to control the direction of X-rays emitted by the source such that the X-rays emitted by the source are substantially parallel to one another.
Abstract translation: 提供乳房X光检查。 乳房X线照相术包括X射线源; X射线检测器，所述源被配置为向所述检测器发射至少一束X射线; 以及光学控制装置，被配置为控制由所述源发射的X射线的方向，使得由所述源发射的X射线基本上彼此平行。
-
59.发明授权Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter 有权光谱纯度滤光片，光刻设备和制造光谱纯度滤光片的方法公开(公告)号：US09195152B2
公开(公告)日：2015-11-24
申请号：US13119895
申请日：2009-08-26
Applicant: Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Petrus Elizabeth Maria Kuijpers
Inventor： Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Petrus Elizabeth Maria Kuijpers
CPC classification number: G03F7/7095 , B82Y10/00 , G02B5/208 , G03F7/70191 , G03F7/70575 , G21K1/10 , G21K2201/061
Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.
Abstract translation: 透射光谱纯度滤光器被配置为透射极紫外辐射。 光谱纯度滤光器包括具有多个孔的滤光器部分，其被配置为透射极紫外辐射并抑制第二类型辐射的透射。 每个孔径均通过各向异性蚀刻工艺制造。
-
60.发明授权公开(公告)号：US08693090B2
公开(公告)日：2014-04-08
申请号：US13000674
申请日：2009-07-01
Applicant: Christof Metzmacher
Inventor： Christof Metzmacher
CPC classification number: G02B5/283 , B82Y10/00 , G21K1/062 , G21K2201/061 , G21K2201/067
Abstract: The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of ≦5 nm and essentially made out of a material with a sputter resistance of ≦10 nm per 108 shots and whereby the second layer is provided in the path of the incident and/or reflected EUV light.
Abstract translation: 本发明涉及一种改进的EUV反射元件，其包括：a）基本上由高反射材料制成的第一层; b）具有＆nlE; 5nm厚度的第二层，并且基本上由溅射电阻为n1E的材料制成; 每108次照射10nm，由此第二层设置在入射和/或反射的EUV光的路径中。
-
-
-
-
-
-
-
-
-
Search Results
299
records
(took 0.019 seconds)
