X-ray system
    51.
    发明授权
    X-ray system 有权
    X光系统

    公开(公告)号:US06606371B2

    公开(公告)日:2003-08-12

    申请号:US09745236

    申请日:2000-12-19

    CPC classification number: G21K1/06 G21K2201/062 G21K2201/064 G21K2201/067

    Abstract: A reflective lens with at least one curved surface formed of polycrystalline material. In one embodiment, a lens structure includes a substrate having a surface of predetermined curvature and a film formed along a surface of the substrate with multiple individual members each having at least one similar orientation relative to the portion of the substrate surface adjacent the member such that collectively the members provide predictable angles for diffraction of x-rays generated from a common source. A system is also provided for performing an operation with x-rays. In one embodiment, a system includes a source for generating the x-rays, a polycrystalline surface region having crystal spacing suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, and transmitting the reflected x-rays to a reference position. An associated method includes providing x-rays to polycrystalline surface region having crystal spacings suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, transmitting the reflected x-rays to a reference position and positioning a sample between the surface region and the reference position so that the x-rays are transmitted through the sample.

    Abstract translation: 具有由多晶材料形成的至少一个曲面的反射透镜。 在一个实施例中,透镜结构包括具有预定曲率的表面的基底和沿着基底的表面形成的膜,多个单独的构件各自具有相对于邻近构件的基底表面的部分的至少一个相似的取向,使得 共同地,这些构件为从公共源产生的x射线的衍射提供可预测的角度。 还提供了一种用于使用X射线进行操作的系统。 在一个实施例中,系统包括用于产生x射线的源,具有适合于沿着该区域以相同的布拉格角反射多个x射线的晶体间距的多晶表面区域,以及将反射的x射线透射到 参考位置。 相关联的方法包括向具有晶体间距的多晶表面区域提供x射线,该晶体间距适于沿着该区域以相同的布拉格角反射多个x射线,将反射的x射线透射到参考位置,并将样品定位在表面 区域和参考位置,使得x射线透射通过样品。

    Illumination system particularly for microlithography
    52.
    发明授权
    Illumination system particularly for microlithography 有权
    照明系统特别适用于微光刻

    公开(公告)号:US06438199B1

    公开(公告)日:2002-08-20

    申请号:US09679718

    申请日:2000-09-29

    Abstract: The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.

    Abstract translation: 本发明涉及一种照明系统,特别是对于具有波长<= 193nm的微光刻,其包括光源,第一光学部件,第二光学部件,图像平面和出射光瞳。 第一光学部件将光源变换成由所述出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有多个第一光栅元件的第一光学元件,其被成像到所述图像平面中,产生至少部分地叠加在所述图像平面中的场上的多个图像。 第一光栅元件以第一偏转角偏转入射光束,其中第一偏转角中的至少两个是不同的。 第一光栅元件优选地是矩形的,其中该场是环的一段。 为了将第一光栅元件的矩形图像变换成环形的区段,第二光学部件包括用于将场成形为环形部分的第一场镜。

    Method and apparatus for fabricating curved crystal X-ray optics
    53.
    发明申请
    Method and apparatus for fabricating curved crystal X-ray optics 有权
    制造弯曲晶体X射线光学元件的方法和装置

    公开(公告)号:US20010031034A1

    公开(公告)日:2001-10-18

    申请号:US09854054

    申请日:2001-05-12

    Inventor: David B. Wittry

    CPC classification number: G21K1/06 G21K2201/062 G21K2201/064 G21K2201/067

    Abstract: A method and apparatus for fabricating x-ray optics of the type having a doubly curved crystal lamella attached to a backing plate that is positioned and aligned for use in a spectrometer, monochromator or point-focusing instrument. The fabrication method is an improvement over the one described in U.S. Pat. No. 6,236,710 and provides for simpler and more accurate prepositioning the crystal lamella relative to the backing plate. This method utilizes an apparatus with a removable top and a removable liner; said top containing one or more micrometer screws, and said liner being made of a material to which the bonding agent does not adhere. During fabrication of the optic by pressing the crystal against a doubly curved mold via the viscous bonding agent, excess bonding agent escapes through channels in the liner. The liner is suitably configured so that the completed optic can be easily removed and the mold and fabrication apparatus can be reused many times.

    Abstract translation: 一种用于制造这种类型的X射线光学器件的方法和装置,该方法和装置具有连接到背板的双曲面晶片,其被定位和对准以用于光谱仪,单色仪或点聚焦仪器。 制造方法是比美国专利中描述的方法更好的改进。 No.6,236,710并且提供了相对于背板更简单和更准确地预定晶片。 该方法利用具有可拆卸顶部和可拆卸衬垫的装置; 所述顶部包含一个或多个千分尺螺钉,并且所述衬垫由粘合剂不粘附到的材料制成。 在通过粘性粘合剂将晶体压靠双曲模具制造光学元件期间,过量的粘合剂通过衬管中的通道逸出。 该衬套适当地构造成使得完整的光学元件能够容易地移除,并且模具和制造装置可以被重复使用多次。

    Method and apparatus for producing monochromatic radiography with a bent
laue crystal
    54.
    发明授权
    Method and apparatus for producing monochromatic radiography with a bent laue crystal 失效
    用弯曲光泽晶体生产单色射线照相的方法和装置

    公开(公告)号:US6038285A

    公开(公告)日:2000-03-14

    申请号:US16891

    申请日:1998-02-02

    CPC classification number: G21K1/06 G21K2201/062 G21K2201/064

    Abstract: A method and apparatus for producing a monochromatic beam. A plurality of beams are generated from a polyenergetic source. The beams are then transmitted through a bent crystal, preferably a bent Laue crystal, having a non-cylindrical shape. A position of the bent crystal is rocked with respect to the polyenergetic source until a plurality of divergent monochromatic beams are emitted from the bent crystal.

    Abstract translation: 一种用于产生单色光束的方法和装置。 从多能源产生多个光束。 然后将光束透过具有非圆柱形状的弯曲晶体,优选弯曲的Laue晶体。 弯曲晶体的位置相对于多能源摇摆,直到从弯曲晶体发射多个发散单色光束。

    Optical element of multilayered thin film for x-rays and neutrons
    55.
    发明授权
    Optical element of multilayered thin film for x-rays and neutrons 失效
    用于x射线和中子的多层薄膜的光学元件

    公开(公告)号:US5799056A

    公开(公告)日:1998-08-25

    申请号:US755294

    申请日:1996-11-22

    Applicant: George Gutman

    Inventor: George Gutman

    Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

    Abstract translation: 本发明涉及生产具有横向和深度梯度多层薄膜的平面和弯曲光学元件的新方法,特别是具有极高精度的多层,用于软和硬x射线和中子以及通过这些方法实现的光学元件。 为了提高光学元件的性能,分离出d间隔和曲率的误差并随后进行补偿。

    Grating monochromators and spectrometers based on surface normal rotation
    56.
    发明授权
    Grating monochromators and spectrometers based on surface normal rotation 失效
    基于表面正常旋转的光栅单色仪和光谱仪

    公开(公告)号:US5274435A

    公开(公告)日:1993-12-28

    申请号:US841421

    申请日:1992-02-26

    Abstract: An optical system and method comprising a diffraction grating which rotates about its surface normal to change the magnitude of the wavelength diffracted to an image location. At grazing incidence, such a rotation is determined to maintain the diffracted image in focus over a wide range in scanned wavelength. Monochromator and spectrometer embodiments include plane and curved surface gratings with both classical and varied-spaced groove patterns, and a variety of illumination geometries. In the simplest case, a grazing incidence monochromator is constructed in which a self-focusing classical spherical grating scans the value in wavelength which is transmitted between fixed slits located on the Rowland circle of the grating. The diffracted image remains in perfect focus over two octaves in wavelength at high efficiency, with both entrance and exit slits fixed in position, and the radiation aperture is constant.

    Abstract translation: 一种光学系统和方法,包括围绕其表面法线旋转的衍射光栅,以将衍射的波长的大小改变为图像位置。 在掠入射处,确定这样的旋转以使衍射图像在扫描波长的宽范围内保持焦点。 单色器和光谱仪实施例包括具有经典和不同间隔的凹槽图案的平面和曲面光栅以及各种照明几何形状。 在最简单的情况下,构建了掠入射单色仪,其中自聚焦经典球形光栅扫描位于光栅的罗兰圆上的固定狭缝之间传输的波长值。 衍射图像以高效率保持在两个八度波长上的完美对焦,入射和出射狭缝均固定在适当位置,辐射孔径恒定。

    X-ray lithography source
    57.
    发明授权
    X-ray lithography source 失效
    X射线光刻源

    公开(公告)号:US5077774A

    公开(公告)日:1991-12-31

    申请号:US570210

    申请日:1990-08-21

    CPC classification number: G03F7/70033 G21K1/06 G21K5/08 H01J35/00 G21K2201/064

    Abstract: A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.

    Abstract translation: 用于生产集成电路的X射线光刻的高强度,便宜的X射线源。 用25至250MeV的高能电子束轰击箔堆,以产生500eV至3keV的软X射线通量。 描述了增加X射线总功率并使X射线束横截面均匀的方法。 全部描述了获得期望的X射线束场尺寸,最佳频谱和中和通量的方法。 还描述了获得多个站操作的方法,其使得该过程更有效和经济。 令人满意的这些问题使过渡辐射成为一种中等价格的X光源,用于光刻。

    System of mirrors for guiding an electromagnetic wave
    58.
    发明授权
    System of mirrors for guiding an electromagnetic wave 失效
    用于引导电磁波的镜子系统

    公开(公告)号:US5042931A

    公开(公告)日:1991-08-27

    申请号:US343375

    申请日:1989-04-26

    Inventor: Georges Mourier

    CPC classification number: G21K1/06 G02B19/0023 G02B19/0033 G21K2201/064

    Abstract: A system of at least three concave mirrors (M1, M2, M3 . . . ) of cylindrical form are arranged with the concave part of the first mirror M1 facing towards the second mirror M2 and with the planes defined by the straight sections of the two mirrors which are perpendicular to each other. The arrangement further has the concave part of the third mirror M3 facing towards the second mirror M2 with the planes defined by the straight sections of the two mirrors M3, M2 perpendicularly to each other. Successive mirrors are placed in a crosswise fashion with respect to their nearest neighbor in order to provide for applications in the guiding of millimeter and sub-millimeter electromagnetic waves for plasma physics.

    Focusing and guiding X-rays with tapered capillaries
    59.
    发明授权
    Focusing and guiding X-rays with tapered capillaries 失效
    用锥形毛细管聚焦和引导X射线

    公开(公告)号:US5001737A

    公开(公告)日:1991-03-19

    申请号:US492401

    申请日:1990-03-07

    CPC classification number: G21K1/06 G21K1/02 G21K2201/064

    Abstract: Apparatus for directing and focusing X-rays by the new method of confinement is disclosed. A capillary having an inlet end and an outlet end with a generally tubular or rectangular inner wall surface defines a longitudinal central opening. The central opening is tapered inwardly from the inlet end to the outlet end. X-rays are directed into the inlet end at angles less than the critical glancing angle for the inner wall surface to direct X-rays through the capillary to a focus point near the capillary outlet end.

    Abstract translation: 公开了通过新的限制方法引导和聚焦X射线的装置。 具有入口端和具有大致管状或矩形内壁表面的出口端的毛细管限定纵向中心开口。 中心开口从入口端到出口端向内逐渐变细。 X射线以小于内壁表面的临界扫视角度的角度被引导到入口端,以将X射线穿过毛细管到毛细管出口端附近的聚焦点。

    X-ray mirror apparatus and method of manufacturing the same
    60.
    发明授权
    X-ray mirror apparatus and method of manufacturing the same 失效
    X射线镜装置及其制造方法

    公开(公告)号:US4940319A

    公开(公告)日:1990-07-10

    申请号:US342793

    申请日:1989-04-25

    CPC classification number: G21K1/06 G21K2201/064 G21K2201/067

    Abstract: An X-ray mirror apparatus includes a substantially cylindrical mirror body and a pair of light shielding members provided at both open ends of the mirror body. The inner surface of the mirror body constitutes a reflecting mirror surface having a surface of revolution. Each light shielding member has a light shielding plate arranged at the opened end of the mirror body to block it, and an annular slit allowing passage of X-rays entering onto and reflected on the reflecting mirror surface. A cylindrical fitting member is fixed to the light shielding plate to be coaxial with the slit. The fitting member is fitted on the opened end portion of the mirror body, thereby positioning the light shielding member so that the slit is located coaxial with the axis of the reflecting mirror surface.

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