PROCESS FOR MANUFACTURING CONDUCTIVE FILM AND PRINTED WIRING BOARD
    53.
    发明申请
    PROCESS FOR MANUFACTURING CONDUCTIVE FILM AND PRINTED WIRING BOARD 审中-公开
    制造导电膜和印刷电路板的方法

    公开(公告)号:US20150245479A1

    公开(公告)日:2015-08-27

    申请号:US14708016

    申请日:2015-05-08

    Abstract: The process for manufacturing a conductive film, said process being capable of achieving efficient progress of reduction of a metal oxide into a metal and yielding a conductive film which exhibits excellent adhesion to a substrate; and a printed wiring board. This process includes: a step for applying a dispersion which contains metal oxide particles to a substrate to form a precursor film which contains the particles; and a step for irradiating the precursor film with a continuous-wave laser beam while scanning the laser beam relatively, and thereby reducing the metal oxide in an irradiated area to form a metal-containing conductive film. In the process, the scanning speed is 1.0 m/s or more, the laser power of the continuous-wave laser beam is 6.0 W or more, and the irradiation time per point on the surface of the precursor film is 1.0 μs or more.

    Abstract translation: 制造导电膜的方法,所述方法能够实现将金属氧化物还原成金属并产生对衬底具有优异粘附性的导电膜的有效进展; 和印刷线路板。 该方法包括:将含有金属氧化物颗粒的分散体施加到基材上以形成含有颗粒的前体膜的步骤; 以及在相对地扫描激光束的同时用连续波激光束照射前体膜的步骤,从而在照射区域中还原金属氧化物以形成含金属的导电膜。 在该过程中,扫描速度为1.0m / s以上,连续波激光的激光功率为6.0W以上,前体膜表面的每点的照射时间为1.0μs以上。

    CIRCUIT BOARD AND CIRCUIT BOARD MANUFACTURING METHOD
    56.
    发明申请
    CIRCUIT BOARD AND CIRCUIT BOARD MANUFACTURING METHOD 审中-公开
    电路板和电路板制造方法

    公开(公告)号:US20150173185A1

    公开(公告)日:2015-06-18

    申请号:US14635429

    申请日:2015-03-02

    Abstract: A circuit board structure and a manufacturing method for a circuit board that ensures an electrical connection between a metal foil and a projection without using a conductive adhesive and is less likely to cause a decrease in the reliability of the connection due to the interlayer separation or the like is provided. A circuit board includes an insulating layer, a lower main surface wiring pattern and an upper main surface wiring pattern disposed on either side of the insulating layer, and an interlayer connection conductor passing through the insulating layer in a thickness direction and electrically connecting to the lower main surface wiring pattern and the upper main surface wiring pattern. The interlayer connection conductor is formed integrally with the lower main surface wiring pattern, and is bonded to the upper main surface wiring pattern via an intermetallic compound.

    Abstract translation: 一种用于电路板的电路板结构和制造方法,其确保金属箔和突起之间的电连接而不使用导电粘合剂,并且不太可能导致由于层间隔离引起的连接的可靠性降低 喜欢被提供。 电路板包括绝缘层,下主表面布线图案和布置在绝缘层两侧的上主表面布线图案,以及层间连接导体,其沿​​厚度方向穿过绝缘层并电连接到下层 主表面布线图案和上表面布线图案。 层间连接导体与下主表面布线图形一体地形成,并且通过金属间化合物结合到上主表面布线图案。

    SILVER THICK FILM PASTE HERMETICALLY SEALED BY SURFACE THIN FILM MULTILAYER
    59.
    发明申请
    SILVER THICK FILM PASTE HERMETICALLY SEALED BY SURFACE THIN FILM MULTILAYER 有权
    表面薄膜多层密封的银膜薄膜

    公开(公告)号:US20150090478A1

    公开(公告)日:2015-04-02

    申请号:US14502745

    申请日:2014-09-30

    CPC classification number: H05K1/115 H05K3/4629 H05K2201/0338

    Abstract: A ceramic substrate comprises a plurality of ceramic sheets, a plurality of inner conductive layers, a plurality of vias, and an upper conductive layer. The ceramic sheets are stacked one on top of another and include a top ceramic sheet. The inner conductive layers include electrically conductive material that forms electrically conductive features on an upper surface of each ceramic sheet excluding the top ceramic sheet. The vias are formed in each of the ceramic sheets with each via being filled with electrically conductive material. The upper conductive layer includes electrically conductive material that forms electrically conductive features on an upper surface of the top ceramic sheet. The upper conductive layer is constructed from a stack of four sublayers. A first sublayer is formed from titanium. A second sublayer is formed from copper. A third sublayer is formed from platinum. A fourth sublayer is formed from gold.

    Abstract translation: 陶瓷基板包括多个陶瓷片,多个内导电层,多个通孔和上导电层。 陶瓷片层叠在一起,并且包括顶部陶瓷片。 内部导电层包括导电性材料,其在除了顶部陶瓷片之外的每个陶瓷片的上表面上形成导电特征。 在每个陶瓷片中形成通孔,每个通孔填充有导电材料。 上导电层包括在顶部陶瓷片的上表面上形成导电特征的导电材料。 上导电层由四个子层的堆叠构成。 第一子层由钛形成。 第二子层由铜形成。 第三子层由铂形成。 第四子层由金形成。

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