公开(公告)号：US2580357A

公开(公告)日：1951-12-25

申请号：US51971644

申请日：1944-01-26

Applicant: BRUCE MCDUFFIE ,  SCHELBERG ARTHUR D ,  THOMPSON ROBERT W

Inventor： BRUCE MCDUFFIE ,  SCHELBERG ARTHUR D ,  THOMPSON ROBERT W

IPC: B01J3/00 ,  B01J15/00 ,  C01G1/06 ,  C01G43/12

CPC classification number: B01J3/006 ,  B01J15/00 ,  C01G1/06 ,  C01G43/12

公开(公告)号：US1200499A

公开(公告)日：1916-10-10

申请号：US7094116

申请日：1916-01-08

Applicant: ISHIKAWA ICHIRO

Inventor： ISHIKAWA ICHIRO

CPC classification number: B01J3/006 ,  B01D3/085

公开(公告)号：US1183097A

公开(公告)日：1916-05-16

申请号：US1914866324

申请日：1914-10-12

Applicant: CORN PROD REFINING CO

Inventor： MERRILL JOSEPH J

CPC classification number: F26B15/12 ,  B01J3/006

公开(公告)号：US361367A

公开(公告)日：1887-04-19

申请号：US361367D

CPC classification number: B01J3/006 ,  B01D3/085

公开(公告)号：US156592A

公开(公告)日：1874-11-03

申请号：US156592D

CPC classification number: B01D3/085 ,  B01J3/006

公开(公告)号：US11766651B1

公开(公告)日：2023-09-26

申请号：US16840637

申请日：2020-04-06

Applicant: National Technology & Engineering Solutions of Sandia, LLC

Inventor： Charles A. Walker ,  Peter D. D. Schwindt ,  Grant Biedermann ,  Dennis J. De Smet ,  Jongmin Lee

IPC: B01J3/00 ,  B01J3/03 ,  C03C3/12 ,  F04D19/04 ,  F16J12/00 ,  G02B1/11

CPC classification number: B01J3/006 ,  B01J3/004 ,  B01J3/03 ,  C03C3/125 ,  F04D19/04 ,  F16J12/00 ,  G02B1/11

Abstract: A sealed, passively pumped, polycrystalline ceramic vacuum chamber and method for fabricating the chamber are disclosed. The body of the vacuum chamber is made from a polycrystalline ceramic, for example, alumina. The vacuum chamber includes one or more windows made from a transparent ceramic, for example, sapphire, to accommodate optical access, while remaining amorphous-glass free to minimize or eliminate helium permeation. The vacuum chamber components are joined via laser welding or furnace brazing and the completed chamber is bakeable at temperatures up to 400° C. The vacuum chamber can operate at high or ultra-high vacuum pressures for an extended period through the use of one or more getter-based pumps. The vacuum chamber may include one or more atomic sources depending upon the application.

公开(公告)号：US09931607B2

公开(公告)日：2018-04-03

申请号：US14381338

申请日：2013-02-28

Applicant: Gediminas Galinis

Inventor： Klaus Von Haeften ,  Gediminas Galinis

IPC: B01J3/00 ,  B01J4/00 ,  B01J19/24 ,  A61K49/00 ,  C01B33/02 ,  C09K11/59 ,  C23C14/34 ,  H01J37/34

CPC classification number: B01J3/006 ,  A61K49/005 ,  B01J4/002 ,  B01J19/24 ,  B01J2204/002 ,  B01J2219/00085 ,  B01J2219/00137 ,  C01B33/02 ,  C01P2006/60 ,  C09K11/59 ,  C23C14/34 ,  H01J37/34 ,  H01J37/3464 ,  H01J2237/002 ,  Y10T428/2982

Abstract: The invention provides a new apparatus (20) and method for producing entirely new types of nanoparticles exhibiting novel properties. The apparatus comprises a vacuum chamber (22) containing a gas and feed means (1) for feeding a liquid jet (26) into the chamber and through the gas. The invention extends to the new types of nanoparticles per se, and to uses of such nanoparticles in various biomedical applications, such as in therapy and diagnosis, as well as in opto-electronics.

公开(公告)号：US20170349757A1

公开(公告)日：2017-12-07

申请号：US15538956

申请日：2014-12-23

Applicant: ESSILOR INTERNATIONAL (COMPAGNIE GENERAL D'OPTIQUE) ,  NIKON CORPORATION ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE - CNRS

Inventor： Manuel THEODET ,  Cyril AYMONIER

IPC: C09C1/36 ,  C09C1/40 ,  C09C1/24 ,  B01J3/00 ,  C09C1/04 ,  C01B13/14 ,  C09C3/08 ,  C09C1/30

CPC classification number: C09C1/3669 ,  B01J3/006 ,  B01J3/008 ,  C01B13/145 ,  C01B13/366 ,  C01G23/053 ,  C01G25/02 ,  C01P2002/72 ,  C01P2002/82 ,  C01P2002/88 ,  C01P2004/04 ,  C01P2004/64 ,  C09C1/043 ,  C09C1/24 ,  C09C1/3063 ,  C09C1/407 ,  C09C3/08 ,  Y02P20/544

Abstract: The invention concerns a continuous flow process for manufacturing surface modified metal oxide nanoparticles by supercritical solvothermal synthesis in an reaction medium flowing within a continuous flow chamber, said continuous flow chamber containing a hydrolysis area and a supercritical area, said process comprising the introduction of a flow of metal oxide precursor into the continuous flow chamber at a point P located in the hydrolysis area or in the supercritical area, and the introduction of a flow of is located downstream of P1 with respect to the flow direction, as well as the device for carrying out this process.

公开(公告)号：US20170304792A1

公开(公告)日：2017-10-26

申请号：US15528587

申请日：2015-11-30

Applicant: UNIVERSITE DE NANTES ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

Inventor： Erwan LE MENN ,  Adriana OANCEA ,  Gabriel TOBIE ,  Olivier GRASSET

IPC: B01J3/00 ,  B01J3/03 ,  B01J3/02 ,  G01N37/00

CPC classification number: B01J3/006 ,  B01J3/004 ,  B01J3/02 ,  B01J3/03 ,  G01N37/00

Abstract: A device for synthesising and studying compounds under controlled temperatures and pressures includes: a body delimiting a vacuum chamber including temperature-regulation means and vacuum-application means, and having one or more viewing windows enabling the inside of the chamber to be observed from the outside; temperature-regulation means that are intended for regulating the temperature inside the vacuum chamber; and vacuum-application means that are intended for regulating the pressure in the vacuum chamber; wherein it includes, inside the vacuum chamber, a sealed structure delimiting a sealed chamber having one or more viewing window facing said one or more windows in said body, and at least one pipe that is in fluid communication firstly with the inside of said sealed chamber and secondly with an outlet that is made in the body and provided in order to be connected to one or more sources of gas for synthesising said compound or sample.

公开(公告)号：US20160068951A1

公开(公告)日：2016-03-10

申请号：US14522350

申请日：2014-10-23

Applicant: Applied Materials, Inc.

Inventor： Danny D. WANG ,  Jun Tae CHOI ,  Rupankar CHOUDHURY ,  Zhong Qiang HUA ,  Juan Carlos ROCHA-ALVAREZ ,  Jason Michael LAMB

IPC: C23C16/44 ,  C23C16/50

CPC classification number: C23C16/4409 ,  B01J3/002 ,  B01J3/006 ,  C23C16/455 ,  C23C16/507

Abstract: Alignment systems employing actuators provide relative displacement between lid assemblies of process chambers and substrates, and related methods are disclosed. A process chamber includes chamber walls defining a process volume in which a substrate may be placed and the walls support a lid assembly of the process chamber. The lid assembly contains at least one of an energy source and a process gas dispenser. Moreover, an alignment system may include at least one each of a bracket, an interface member, and an actuator. By attaching the bracket to the chamber wall and securing the interface member to the lid assembly, the actuator may communicate with the bracket and the interface member to provide relative displacement between the chamber wall and the lid assembly. In this manner, the lid assembly may be positioned relative to the substrate to improve process uniformity across the substrate within the process chamber.

Abstract translation: 使用致动器的对准系统提供了处理室和衬底的盖组件之间的相对位移，并且公开了相关方法。 处理室包括限定其中可以放置基底的处理体积的室壁，并且壁支撑处理室的盖组件。 盖组件包含能量源和工艺气体分配器中的至少一个。 此外，对准系统可以包括托架，接口构件和致动器中的至少一个。 通过将支架附接到室壁并将接口构件固定到盖组件，致动器可以与支架和接口构件连通，以在室壁和盖组件之间提供相对的位移。 以这种方式，盖组件可以相对于衬底定位，以提高处理室内的衬底上的工艺均匀性。