公开(公告)号：US20180119304A1

公开(公告)日：2018-05-03

申请号：US15377799

申请日：2016-12-13

Applicant: HYUNDAI MOTOR COMPANY ,  KIA MOTORS CORPORATION ,  SAMSHIN CHEMICAL CO., LTD.

Inventor： Hyun-Gyung KIM ,  Dong-Eun CHA ,  Jin-Young Yoon ,  Woo-Taik OH

IPC: C25D5/54 ,  B05D1/32 ,  C25D5/02 ,  C25D5/34 ,  B60R19/52

CPC classification number: C25D5/54 ,  B05D1/32 ,  B05D1/322 ,  B05D2201/00 ,  B60R19/52 ,  B60R2019/525 ,  B60Y2304/03 ,  B60Y2410/122 ,  C25D5/022 ,  C25D5/34 ,  C25D5/56 ,  C25D7/00

Abstract: A partial plating method for a resin part of a vehicle may include a masking step of applying masking paint on an injection molded product made of a plastic resin to divide the injection molded product into a plating area on which a metal component is to be plated and a non-plating area on which the metal component is not to be plated, an etching step of etching the masked injection molded product in an etching solution to elute some components of the resin from the plating area, and an electroplating step of electroplating the etched injection molded product in a plating bath.

公开(公告)号：US20180106154A1

公开(公告)日：2018-04-19

申请号：US15292589

申请日：2016-10-13

Applicant: General Electric Company

Inventor： Donald Joseph BALDWIN ,  Joshua Lee MARGOLIES ,  Jacob John Kittleson

IPC: F01D5/28 ,  B05D1/32 ,  B05D3/12 ,  B05B15/04

CPC classification number: F01D5/288 ,  B05B12/20 ,  B05D1/322 ,  B05D3/12 ,  C04B41/009 ,  C04B41/52 ,  C04B41/89 ,  F05D2220/32 ,  F05D2300/611 ,  C04B35/565 ,  C04B35/806 ,  C04B35/584 ,  C04B35/58085 ,  C04B41/4527 ,  C04B41/4572 ,  C04B41/5096 ,  C04B41/5024

Abstract: A method of forming an article includes forming a plurality of channels and ridges in a silicon-containing layer on a surface of a substrate of the article using a mask placed on the surface of the substrate or the silicon-containing layer.

公开(公告)号：US20170027761A1

公开(公告)日：2017-02-02

申请号：US15225536

申请日：2016-08-01

Applicant: KCI USA, INC.

Inventor： Deborah Addison ,  Sally STEPHENS ,  Patrick Joseph BROSNAN ,  Gary STREET ,  Ian TEET ,  Risham AMJAD

IPC: A61F13/02 ,  B05D3/02 ,  B05D1/28 ,  B05D1/32 ,  C09J5/06 ,  C09J7/02

CPC classification number: A61F13/0283 ,  A61F13/0206 ,  A61F13/025 ,  A61F13/0276 ,  B05D1/28 ,  B05D1/322 ,  B05D3/0254 ,  C09J5/06 ,  C09J7/22 ,  C09J7/26 ,  C09J7/38 ,  C09J183/04 ,  C09J2201/606 ,  C09J2423/106 ,  C09J2475/006 ,  C09J2483/00 ,  Y10T428/24802

Abstract: A method of applying a patterned coating of a silicone adhesive to a substrate sheet, comprising the steps of pattern coating a silicone precursor composition onto the substrate, followed by thermally curing the precursor composition coated on the substrate. The precursor composition is a viscous fluid, and the pattern coating is performed by suitably modified block printing, intaglio printing or screen printing methods. Also provided are coated substrates obtainable by the methods of the invention, and wound dressings comprising such coated substrates.

Abstract translation: 一种将硅树脂粘合剂的图案化涂层施加到基材片的方法，包括以下步骤：将硅氧烷前体组合物图案涂布到基材上，然后热固化涂覆在基材上的前体组合物。 前体组合物是粘性流体，并且图案涂层通过适当改进的块印刷，凹版印刷或丝网印刷方法进行。 还提供了可通过本发明的方法获得的涂覆基材和包含这种涂布的基材的伤口敷料。

公开(公告)号：US20160263620A1

公开(公告)日：2016-09-15

申请号：US15064074

申请日：2016-03-08

Applicant: Taiwan Green Point Enterprises Co., Ltd.

Inventor： Li-Jun LI ,  Wen-Bo WU ,  Jian-Jun SUN ,  Jian-Fang HU

IPC: B05D5/06 ,  B05D3/06 ,  B23K26/00

CPC classification number: B23K26/359 ,  B05D1/322 ,  B05D3/12 ,  B23K26/18 ,  B23K26/364 ,  G09F1/00

Abstract: A method of making a patterned article includes: forming a shielding layer on a substrate; patterning the shielding layer and the substrate to form a cavity that extends through the shielding layer into the substrate so as to form a recess in the substrate, the recess being defined by a recess-defining surface of the substrate; forming a color layer on the recess-defining surface of the substrate so that the color layer is defined with an indentation; and removing the shielding layer after forming the color layer.

Abstract translation: 制造图案制品的方法包括：在基材上形成屏蔽层; 图案化所述屏蔽层和所述基板以形成延伸穿过所述屏蔽层进入所述基板的空腔，以在所述基板中形成凹部，所述凹部由所述基板的凹陷限定表面限定; 在所述基板的所述凹部限定表面上形成着色层，使得所述着色层被限定为凹陷; 以及在形成彩色层之后去除屏蔽层。

公开(公告)号：US20150224536A1

公开(公告)日：2015-08-13

申请号：US14697080

申请日：2015-04-27

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Takeshi KOSHIBA ,  Ikuo YONEDA ,  Tetsuro NAKASUGI

IPC: B05D1/32

CPC classification number: B05D1/322 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: A pattern forming method includes determining an amount of curable resin to be formed on a substrate, the curable resin having volatility, the amount of the curable resin being determined by a calculation considering volatile loss of the curable resin, the calculation being performed for each of a plurality of regions of the substrate, forming the curable resin having the determined amount on the substrate, the forming the curable resin being performed for each of the plurality of regions of the substrate, contacting the curable resin formed on the substrate with a template, the template including a pattern to be filled with the curable resin by the contacting, and curing the curable resin under a condition where the curable resin is in contact with the template.

Abstract translation: 图案形成方法包括确定在基材上形成的固化性树脂的量，所述固化性树脂具有挥发性，所述固化性树脂的量是通过考虑了固化性树脂的挥发性损失的计算而计算的， 基板的多个区域，在基板上形成具有确定量的固化树脂，对基板的多个区域中的每一个进行固化树脂的形成，使形成在基板上的可固化树脂与模板接触， 模板包括通过接触填充固化树脂的图案，并且在可固化树脂与模板接触的条件下固化可固化树脂。

公开(公告)号：US08927437B2

公开(公告)日：2015-01-06

申请号：US13961017

申请日：2013-08-07

Applicant: National Tsing Hua University

Inventor： Rong-Ming Ho ,  Han-Yu Hsueh ,  Ming-Shiuan She ,  Hung-Ying Chen ,  Shangjr Gwo

IPC: H01L21/02 ,  C09D5/00 ,  B82Y30/00 ,  B82Y40/00 ,  G02B1/11 ,  G02B1/12 ,  B05D1/32 ,  B05D5/02

CPC classification number: C09D5/006 ,  B05D1/322 ,  B05D5/02 ,  B82Y30/00 ,  B82Y40/00 ,  G02B1/118 ,  G02B1/12 ,  H01L21/02104 ,  Y10T428/1036 ,  Y10T428/1045 ,  Y10T428/12528 ,  Y10T428/249953 ,  Y10T428/249969 ,  Y10T428/24997

Abstract: Nanoporous polymers with gyroid nanochannels can be fabricated from the self-assembly of degradable block copolymer, polystyrene-b-poly(L-lactide) (PS-PLLA), followed by the hydrolysis of PLLA blocks. A well-defined nanohybrid material with SiO2 gyroid nanostructure in a PS matrix can be obtained using the nanoporous PS as a template for the sol-gel reaction. After subsequent UV degradation of the PS matrix, a highly porous inorganic gyroid network remains, yielding a single-component material with an exceptionally low refractive index (as low as 1.1).

Abstract translation: 具有旋转纳米通道的纳米多孔聚合物可以由可降解嵌段共聚物，聚苯乙烯-b-聚（L-丙交酯）（PS-PLLA）的自组装，然后PLLA嵌段的水解制备。 使用纳米多孔PS作为溶胶 - 凝胶反应的模板，可以获得在PS基体中具有SiO 2回旋纳米结构的明确定义的纳米杂化材料。 在PS基体的随后的UV降解之后，残留高度多孔的无机回旋网络，产生具有极低折射率（低至1.1）的单组分材料。

公开(公告)号：US20140349031A1

公开(公告)日：2014-11-27

申请号：US14280700

申请日：2014-05-19

Applicant: MIMAKI ENGINEERING CO., LTD.

Inventor： NORIKAZU NAKAMURA ,  ISAO TABAYASHI ,  MASARU OHNISHI

IPC: B05D5/00

CPC classification number: B05D5/00 ,  B05D1/02 ,  B05D1/322 ,  B05D5/06 ,  B05D2202/25

Abstract: This invention is to appropriately color aluminum materials. A method for producing a colored aluminum article by coloring an aluminum material includes: a mask forming step S104 of forming a defined region coating mask that covers a pre-defined region of the aluminum material; a coloring step S106 of coloring the aluminum material with a dye in a region not covered by the defined region coating mask; and a mask detaching step S108 of detaching the defined region coating mask from the aluminum material after the coloring step S106. In the mask forming step S104, a mask forming liquid as a liquid for forming the defined region coating mask is ejected onto the aluminum material with a liquid ejection head that ejects liquid using an inkjet system.

Abstract translation: 本发明是适当地使铝材料着色。 通过着色铝材料制造着色铝制品的方法包括：形成覆盖铝材料的预定区域的限定区域涂层掩模的掩模形成步骤S104; 着色步骤S106，在没有被限定区域涂覆掩模覆盖的区域内用染料着色铝材料; 以及在着色步骤S106之后从铝材料上分离限定区域涂层掩模的掩模拆卸步骤S108。 在掩模形成步骤S104中，将用于形成限定区域涂覆掩模的液体的掩模形成液体喷射到使用喷墨系统喷射液体的液体喷射头的铝材料上。

公开(公告)号：US20140255661A1

公开(公告)日：2014-09-11

申请号：US14124809

申请日：2012-06-07

Applicant: Joseph Masrud ,  Lorenzo Mangolini ,  Eric L. Granstrom ,  Arkady Garbar ,  Dmitry Lekhtman ,  Dov Zamir

Inventor： Joseph Masrud ,  Lorenzo Mangolini ,  Eric L. Granstrom ,  Arkady Garbar ,  Dmitry Lekhtman ,  Dov Zamir

IPC: B05D1/28 ,  B05D3/12 ,  B05D1/32

CPC classification number: B05D1/28 ,  B05D1/322 ,  B05D3/12 ,  B05D5/02 ,  B05D5/12 ,  B05D2201/02 ,  B05D2350/60 ,  C08K2003/0806 ,  C09D5/24 ,  C09D7/61 ,  C09D7/67 ,  C09D11/52 ,  H05K1/097 ,  H05K3/1275 ,  Y10T428/24802

Abstract: Methods of producing patterned articles using a composition that includes a non-volatile component in a volatile liquid carrier, where the liquid carrier is in the form of an emulsion comprising a continuous phase and a second phase in the form of domains dispersed in the continuous phase.

Abstract translation: 使用包含挥发性液体载体中的非挥发性成分的组合物生产图案化制品的方法，其中液体载体为包含分散在连续相中的结构域的连续相和第二相的乳液形式 。

公开(公告)号：US08677929B2

公开(公告)日：2014-03-25

申请号：US13338173

申请日：2011-12-27

Applicant: Alexander J. Berger ,  Terry Bluck ,  Vinay Shah ,  Judy Huang ,  Karthik Janakiraman ,  Chau T. Nguyen ,  Greg Stumbo

Inventor： Alexander J. Berger ,  Terry Bluck ,  Vinay Shah ,  Judy Huang ,  Karthik Janakiraman ,  Chau T. Nguyen ,  Greg Stumbo

IPC: B05C3/00 ,  B05C19/02 ,  B65G37/00 ,  B65G47/12 ,  H01L21/00 ,  H01L25/00 ,  B05D1/18

CPC classification number: H01L31/1876 ,  B05D1/322 ,  B05D1/327 ,  C23C14/042 ,  C23C16/042 ,  Y02E10/50 ,  Y02P70/521

Abstract: Disclosed are methods and apparatus for masking of substrates for deposition, and subsequent lifting of the mask with deposited material. Masking materials are utilized that can be used in high temperatures and vacuum environment. The masking material has minimal outgassing once inside a vacuum chamber and withstand the temperatures during deposition process. The mask is inkjeted over the wafers and, after deposition, removed using agitation, such as ultrasonic agitation, or using laser burn off.

Abstract translation: 公开了用于掩蔽用于沉积的基底的方法和装置，以及随后用沉积材料提起掩模。 使用可在高温和真空环境中使用的遮蔽材料。 掩模材料一旦在真空室内就具有最小的除气，并能承受沉积过程中的温度。 将掩模喷涂在晶片上，并且在沉积之后，使用搅拌（例如超声波搅拌）或使用激光烧掉来除去掩模。

公开(公告)号：US20140004709A1

公开(公告)日：2014-01-02

申请号：US13961017

申请日：2013-08-07

Applicant: National Tsing Hua University

Inventor： Rong-Ming HO ,  Han-Yu HSUEH ,  Ming-Shiuan SHE ,  Hung-Ying CHEN ,  Shangjr GWO

IPC: C09D5/00 ,  H01L21/02

CPC classification number: C09D5/006 ,  B05D1/322 ,  B05D5/02 ,  B82Y30/00 ,  B82Y40/00 ,  G02B1/118 ,  G02B1/12 ,  H01L21/02104 ,  Y10T428/1036 ,  Y10T428/1045 ,  Y10T428/12528 ,  Y10T428/249953 ,  Y10T428/249969 ,  Y10T428/24997

Abstract: Nanoporous polymers with gyroid nanochannels can be fabricated from the self-assembly of degradable block copolymer, polystyrene-b-poly(L-lactide) (PS-PLLA), followed by the hydrolysis of PLLA blocks. A well-defined nanohybrid material with SiO2 gyroid nanostructure in a PS matrix can be obtained using the nanoporous PS as a template for the sol-gel reaction. After subsequent UV degradation of the PS matrix, a highly porous inorganic gyroid network remains, yielding a single-component material with an exceptionally low refractive index (as low as 1.1).

Abstract translation: 具有旋转纳米通道的纳米多孔聚合物可以由可降解嵌段共聚物，聚苯乙烯-b-聚（L-丙交酯）（PS-PLLA）的自组装，然后PLLA嵌段的水解制备。 使用纳米多孔PS作为溶胶 - 凝胶反应的模板，可以获得在PS基体中具有SiO 2回旋纳米结构的明确定义的纳米杂化材料。 在PS基体的随后的UV降解之后，残留高度多孔的无机回旋网络，产生具有极低折射率（低至1.1）的单组分材料。