中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

95 records (took 0.021 seconds)

    METHOD AND A SYSTEM FOR DETECTION OF HAZARDOUS CHEMICALS IN A NON-METALLIC CONTAINER
    65.
    发明申请
    METHOD AND A SYSTEM FOR DETECTION OF HAZARDOUS CHEMICALS IN A NON-METALLIC CONTAINER 审中-公开
    用于检测非金属容器中危险化学品的方法和系统

    公开(公告)号：US20160178525A1

    公开(公告)日：2016-06-23

    申请号：US14374928

    申请日：2013-09-02

    Applicant: INDIAN INSTITUTE OF SCIENCE

    Inventor： Siva UMAPATHY ,  Sanchita SIL ,  John KIRAN

    IPC: G01N21/65 ,  G01N33/22 ,  G01N21/51

    CPC classification number: G01N21/65 ,  G01N21/51 ,  G01N33/227 ,  G01N2201/06113 ,  G01N2201/063

    Abstract: The invention provides a method for detection of hazardous chemicals in a non-metallic container. The method comprises of irradiating the sample at a predefined location with an electromagnetic radiation of specific wavelength; selectively capturing a certain component of the scattered electromagnetic radiation to obtain a plurality of profiles; and filtering the profiles to obtain a signature specific to at least one hazardous chemical present in the container. The invention provides a system for obtaining a signature specific to the hazardous chemicals in the container.

    Abstract translation: 本发明提供了一种用于在非金属容器中检测危险化学品的方法。 该方法包括在预定位置用特定波长的电磁辐射照射样品; 选择性地捕获散射电磁辐射的某一部分以获得多个轮廓; 并过滤轮廓以获得特定于容器中存在的至少一种危险化学品的特征。 本发明提供一种用于获得特定于容器中的危险化学品的签名的系统。

    Laser Differential Confocal Mapping-Spectrum Microscopic Imaging Method and Device
    66.
    发明申请
    Laser Differential Confocal Mapping-Spectrum Microscopic Imaging Method and Device 有权
    激光微分共焦光谱显微镜成像方法与装置

    公开(公告)号：US20150346101A1

    公开(公告)日：2015-12-03

    申请号：US14366266

    申请日：2013-08-08

    Applicant: Weiqian ZHAO ,  Han CUI ,  Lirong QIU ,  Yun WANG

    Inventor： Weiqian ZHAO ,  Han CUI ,  Lirong QIU ,  Yun WANG

    IPC: G01N21/65 ,  G01N21/47

    CPC classification number: G01N21/47 ,  G01N21/65 ,  G01N21/658 ,  G01N2201/063

    Abstract: The present invention belongs to a technical field of optical microscopic imaging and spectral measurement, and discloses a laser differential confocal mapping-spectrum microscopic imaging method and device. The core concept of the present invention is to combine the differential confocal detection and the spectrum detection techniques and use a dichroic beam splitting system (13) to separate the Rayleigh light for geometric position detection from the Raman scattering light for spectrum detection, by mean of the property that the zero-cross point of the differential confocal curve (43) accurately corresponds to the focus of the objective, the spectral information at focus of the excitation spot being accurately captured by the zero trigger to accomplish the spectrum detection with high spatial resolution. Therefore, the present invention provides a method and device that may be able to accomplish the spectrum detection with high spatial resolution to a micro-area of a sample.

    Abstract translation: 本发明属于光学显微成像和光谱测量的技术领域，并且公开了一种激光微分共焦映射光谱显微成像方法和装置。 本发明的核心概念是组合差分共聚焦检测和光谱检测技术，并使用二向色分束系统（13）将用于几何位置检测的瑞利光与用于光谱检测的拉曼散射光分离，通过 差分共聚焦点曲线（43）的零交叉点准确地对应于物镜的焦点，激发点焦点处的光谱信息被零点触发精确地捕获，完成高空间分辨率的光谱检测 。 因此，本发明提供了一种能够以高空间分辨率对样品的微区进行光谱检测的方法和装置。

    DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSERVATION DEVICE PROVIDED WITH SAME
    67.
    发明申请
    DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSERVATION DEVICE PROVIDED WITH SAME 审中-公开
    缺陷检测方法和缺陷检测装置和缺陷检测装置

    公开(公告)号：US20150116712A1

    公开(公告)日：2015-04-30

    申请号：US14587271

    申请日：2014-12-31

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Yuko OTANI ,  Takehiro TACHIZAKI ,  Masahiro WATANABE ,  Shunichi MATSUMOTO

    IPC: G01N21/95 ,  G01N21/47 ,  G01N21/21

    CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/063

    Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

    Abstract translation: 所公开的使用电子显微镜等精细观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的装置可以将观察到的缺陷可靠地插入电子显微镜领域或 喜欢，可以是一个规模较小的设备。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜具有结合了重新检测缺陷的光学显微镜，并且插入空间滤光器和分布偏振元件 在使用该光学显微镜进行暗视场观察时在瞳孔平面上。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜具有结合了重新检测缺陷的光学显微镜，并且在制造时将分配滤波器插入瞳孔平面 使用该光学显微镜进行暗场观测。

    OPTOMECHANICAL ACCELEROMETER
    68.
    发明申请
    OPTOMECHANICAL ACCELEROMETER 有权
    机电加速度计

    公开(公告)号：US20150020590A1

    公开(公告)日：2015-01-22

    申请号：US14379744

    申请日：2013-03-01

    Applicant: California Institute of Technology ,  University of Rochester

    Inventor： Oskar Painter ,  Martin Winger ,  Qiang Lin ,  Alexander Krause ,  Tim D. Blasius

    IPC: G01P15/093 ,  G01N21/55 ,  B82Y99/00 ,  B81B3/00 ,  B81C1/00 ,  G01N21/59 ,  H01L21/02

    CPC classification number: G01P15/093 ,  B81B3/0051 ,  B81B3/0067 ,  B81B3/0083 ,  B81B2201/0235 ,  B81C1/00015 ,  B82Y99/00 ,  G01N21/55 ,  G01N21/59 ,  G01N2201/06113 ,  G01N2201/063 ,  H01L21/02373

    Abstract: Technologies are generally described for operating and manufacturing optomechanical accelerometers. In some examples, an optomechanical accelerometer device is described that uses a cavity resonant displacement sensor based on a zipper photonic crystal nano-cavity to measure the displacement of an integrated test mass generated by acceleration applied to the chip. The cavity-resonant sensor may be fully integrated on-chip and exhibit an enhanced displacement resolution due to its strong optomechanical coupling. The accelerometer structure may be fabricated in a silicon nitride thin film and constitute a rectangular test mass flexibly suspended on high aspect ratio inorganic nitride nano-tethers under high tensile stress. By increasing the mechanical Q-factors through adjustment of tether width and tether length, the noise-equivalent acceleration (NEA) may be reduced, while maintaining a large operation bandwidth. The mechanical Q-factor may be improved with thinner (e.g.,

    Abstract translation: 技术通常被描述为操作和制造光机加速度计。 在一些示例中，描述了使用基于拉链光子晶体纳米腔的空腔谐振位移传感器来测量由施加到芯片的加速度产生的集成测试质量的位移的光机械加速度计装置。 空腔谐振传感器可以完全集成在芯片上，并由于其强大的光机械耦合而呈现出增强的位移分辨率。 加速度计结构可以制造在氮化硅薄膜中，并且在高拉伸应力下构成柔性地悬挂在高纵横比无机氮化物纳米系绳上的矩形测试质量。 通过调整系绳宽度和系绳长度来增加机械Q因子，可以降低噪声等效加速度（NEA），同时保持较大的运行带宽。 可以通过更薄（例如<1微米）和更长的系链（例如10-560微米）来改善机械Q因子。

    DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSERVATION DEVICE PROVIDED WITH SAME
    69.
    发明申请
    DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSERVATION DEVICE PROVIDED WITH SAME 有权
    缺陷检测方法和缺陷检测装置和缺陷检测装置

    公开(公告)号：US20120274931A1

    公开(公告)日：2012-11-01

    申请号：US13510300

    申请日：2010-11-12

    Applicant: Yuko Otani ,  Takehiro Tachizaki ,  Masahiro Watanabe ,  Shunichi Matsumoto

    Inventor： Yuko Otani ,  Takehiro Tachizaki ,  Masahiro Watanabe ,  Shunichi Matsumoto

    IPC: G01N21/88

    CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/063

    Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope (5), which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optimal microscope (14) that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope (14). The electron microscope (5), which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optimal microscope (14) that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope (14).

    Abstract translation: 所公开的使用电子显微镜等精细观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的装置可以将观察到的缺陷可靠地插入电子显微镜领域或 喜欢，可以是一个规模较小的设备。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜（5）具有结合有重新检测缺陷的最佳显微镜（14），以及空间滤波器 当使用该光学显微镜（14）进行暗视场观察时，在瞳平面处插入分布偏振元件。 观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜（5）具有结合重新检测缺陷的最佳显微镜（14），并且插入分配滤波器 在使用该光学显微镜（14）进行暗视场观察时在瞳孔平面上。

Patent Agency Ranking