公开(公告)号：US3617281A

公开(公告)日：1971-11-02

申请号：US3617281D

申请日：1970-01-30

Applicant: POLAROID CORP

Inventor： LINDIN GREGORY E

IPC: G03B33/14 ,  G03C7/12 ,  G03F7/20 ,  G03C9/00

CPC classification number: G03F7/201 ,  G03B33/14 ,  G03C7/12 ,  Y10S430/147 ,  Y10S430/153

Abstract: A selected portion of a photosensitive element comprising a lenticular surface may be exposed by forming said element into an arc while said element is moving through an exposure area and exposing said photosensitive element to a source of radiation actinic thereto, said source being so placed as to be incident only upon a preselected portion of said photosensitive material.

公开(公告)号：US2791504A

公开(公告)日：1957-05-07

申请号：US54172355

申请日：1955-10-20

Applicant: DU PONT

Inventor： PLAMBECK JR LOUIS

IPC: C08F2/48 ,  C08F2/50 ,  G03F7/029 ,  G03F7/20

CPC classification number: G03F7/2014 ,  G03F7/029 ,  G03F7/201 ,  Y10S430/16

公开(公告)号：US20240201597A1

公开(公告)日：2024-06-20

申请号：US18592049

申请日：2024-02-29

Applicant: Carl Zeiss SMT GmbH

Inventor： Stephan Six

IPC: G03F7/20

CPC classification number: G03F7/2004 ,  G03F7/2008 ,  G03F7/201

Abstract: A DUV lithography apparatus comprises: a light source for generating DUV radiation at at least one operating wavelength in the DUV wavelength range; a photomask; and an optical element which transmits the DUV radiation and is spaced apart from the photomask and to which an absorbent coating is applied. The absorbent coating has absorbent microstructures which cover a surface region to which the absorbent coating is applied with a surface area proportion of less than 0.1% and optionally more than 0.01%.

公开(公告)号：US11994802B2

公开(公告)日：2024-05-28

申请号：US17464185

申请日：2021-09-01

Applicant: Waymo LLC

Inventor： James Dunphy ,  David Hutchison

IPC: G03F7/20 ,  G03F7/00 ,  G03F7/26 ,  G02B5/08

CPC classification number: G03F7/201 ,  G03F7/0005 ,  G03F7/2008 ,  G03F7/2014 ,  G03F7/26 ,  G03F7/7015 ,  G02B5/0891

Abstract: Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example system may include an optical component configured to direct light from a light source to illuminate a photoresist material at a desired angle and to expose at least a portion of an angled structure in the photoresist material, where the photoresist material overlays at least a portion of a top surface of a substrate. The optical component includes a container containing an light-coupling material that is selected based in part on the desired angle. The optical component also includes a mirror arranged to reflect at least a portion of the light to illuminate the photoresist material at the desired angle.

公开(公告)号：US20240061341A1

公开(公告)日：2024-02-22

申请号：US18265876

申请日：2021-12-17

Applicant: XSYS GERMANY GMBH

Inventor： Maximilian THATE ,  Johan VERVAECKE ,  Matthias BEYER

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/2032 ,  G03F7/201 ,  G03F7/7005 ,  G03F7/70525

Abstract: Method for exposing a relief precursor, using a first light source to expose a first side of a relief precursor, a movable second light source to expose a second side of the relief precursor opposite the first side during one or more second exposure periods of one or more second exposure steps, said method comprising the steps of receiving through an operator interface at least one first characteristic representative for the first exposure period and/or at least one second characteristic representative for the one or more second exposure periods determining a sequence of operation for the first light source and the second light source based on the at least one first and/or second characteristic, said sequence being such that each of said one or more second exposure periods either fully overlaps with the first exposure period or does not overlap with the first exposure period.

公开(公告)号：US20230236517A1

公开(公告)日：2023-07-27

申请号：US18130328

申请日：2023-04-03

Applicant: Intel Corporation

Inventor： Changhua LIU ,  Jianyong MO ,  Liang ZHANG

IPC: G03F7/20 ,  B81B1/00 ,  B81C1/00

CPC classification number: G03F7/70733 ,  B81B1/00 ,  B81C1/00111 ,  G03F7/201 ,  B81B2203/0361 ,  B81C2201/0159

Abstract: Embodiments disclosed herein include lithographic patterning systems for non-orthogonal patterning and devices formed with such patterning. In an embodiment, a lithographic patterning system comprises an actinic radiation source, where the actinic radiation source is configured to propagate light along an optical axis. In an embodiment, the lithographic patterning system further comprises a mask mount, where the mask mount is configurable to orient a surface of a mask at a first angle with respect to the optical axis. In an embodiment, the lithographic patterning system further comprises a lens module, and a substrate mount, where the substrate mount is configurable to orient a surface of a substrate at a second angle with respect to the optical axis.

公开(公告)号：US20230229088A1

公开(公告)日：2023-07-20

申请号：US18180504

申请日：2023-03-08

Applicant: Gigaphoton Inc.

Inventor： Takuma YAMANAKA

IPC: G03F7/20 ,  H01S3/225

CPC classification number: G03F7/2006 ,  H01S3/2251 ,  G03F7/201

Abstract: A laser apparatus includes an oscillator, a rotary stage that supports an optical element, a grating, a first driving mechanism that changes the angle of incidence of pulse laser light to be incident on the grating by driving the rotary stage, a second driving mechanism that changes the angle of incidence of the pulse laser light to be incident on the grating by driving the rotary stage by a smaller amount, a wavelength monitor, and a processor that cyclically changes a target wavelength of the pulse laser light. The processor calculates the moving average of drive instruction values by which the second driving mechanism is driven, and when the moving average exceeds a threshold, the processor causes the second driving mechanism to return to an initial position, and drives the first driving mechanism to cancel a change in the angle of incidence caused by the returning operation.

公开(公告)号：US10061201B2

公开(公告)日：2018-08-28

申请号：US15333117

申请日：2016-10-24

Applicant: HRL Laboratories, LLC

Inventor： Sophia S. Yang ,  Alan J. Jacobsen ,  Joanna A. Kolodziejska ,  Robert E. Doty ,  William Carter ,  Jacob M. Hundley

IPC: G03F7/20 ,  G02B6/138

CPC classification number: G03F7/70058 ,  B82Y20/00 ,  G02B6/12002 ,  G02B6/138 ,  G02B2006/1219 ,  G03F7/0037 ,  G03F7/2008 ,  G03F7/201 ,  G03F7/2012

Abstract: A system for fabricating micro-truss structures. A reservoir holds a volume of a liquid photomonomer configured to polymerize to form a photopolymer when exposed to suitable light such as ultraviolet light. A mask at the bottom of the reservoir includes a plurality of apertures. Light enters the reservoir through each aperture from several directions, forming a plurality of self-guided photopolymer waveguides within the reservoir. The light is supplied by one or more sources of collimated light. A plurality of mirrors may reflect the light from a single source of collimated light to form a plurality of collimated beams, that illuminate the photomonomer in the reservoir, through the mask, from a corresponding plurality of directions, to form a micro-truss structure including a plurality of self-guided waveguide members.

公开(公告)号：US10036956B2

公开(公告)日：2018-07-31

申请号：US15145230

申请日：2016-05-03

Applicant: MacDermid Graphics Solutions, LLC

Inventor： Kyle P. Baldwin ,  Jeremy Hogan ,  Miguel Barboza ,  Rogelio Sanchez

IPC: G06F7/20 ,  G03F7/20 ,  B41C1/00

CPC classification number: G03F7/2004 ,  B41C1/006 ,  G03F7/027 ,  G03F7/2008 ,  G03F7/201

Abstract: A method of flood exposing a photocurable printing blank to actinic radiation from a UV LED light source, wherein a high intensity UV LED light source is modulated to a lower intensity. The method includes the steps of: (a) positioning the photocurable printing blank in an exposure unit, wherein the exposure unit comprises one or more high intensity UV LED light sources; (b) modulating intensity of the one or more high intensity UV LED light sources to a lower intensity; and (c) flood exposing the photocurable printing blank through the photographic negative or the digitally imaged mask layer to actinic radiation from the one or more modulated UV LED light sources.

公开(公告)号：US10018908B2

公开(公告)日：2018-07-10

申请号：US15412121

申请日：2017-01-23

Applicant: Toshiba Memory Corporation

Inventor： Naomi Shida ,  Kenji Todori ,  Shigehiko Mori ,  Reiko Yoshimura ,  Hiroyuki Kashiwagi ,  Ikuo Yoneda ,  Tsukasa Tada

IPC: G03F1/38 ,  G03F7/20 ,  G03F1/76 ,  H01L21/308 ,  H01L21/3065 ,  G03F7/16 ,  G03F7/40

CPC classification number: G03F1/76 ,  G03F1/38 ,  G03F1/80 ,  G03F7/16 ,  G03F7/20 ,  G03F7/201 ,  G03F7/40 ,  G03F7/7035 ,  H01L21/3065 ,  H01L21/3086

Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.