公开(公告)号：US08835848B2

公开(公告)日：2014-09-16

申请号：US14180350

申请日：2014-02-13

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik Oh ,  Ho Seob Kim ,  Dae Wook Kim ,  Seung-Joon Ahn

IPC: H01J29/46 ,  H01J3/36 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。

公开(公告)号：US20140175301A1

公开(公告)日：2014-06-26

申请号：US14124408

申请日：2012-06-05

Applicant: Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

Inventor： Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/05 ,  H01J3/18 ,  H01J27/02 ,  H01J3/26

CPC classification number: H01J37/08 ,  H01J3/18 ,  H01J3/26 ,  H01J27/022 ,  H01J27/024 ,  H01J27/22 ,  H01J37/05 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/0827

Abstract: A ion source comprises: a chamber (45), an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.

Abstract translation: 离子源包括：室（45），用于将物质注入到室中的注入，其中所述物质包括至少第一种类，具有位于所述室中的顶点的尖端，其中所述顶点具有由金属 第二种类，用于产生所述物质的离子的发生器，以及调节系统，其适于设置所述室的操作条件以交替地从所述气态第一物质产生离子，以及从所述非气态金属第二物质产生离子。

公开(公告)号：US20140070112A1

公开(公告)日：2014-03-13

申请号：US14084938

申请日：2013-11-20

Applicant: CANON KABUSHIKI KAISHA

Inventor： Hirohito ITO

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/3177 ,  H01J2237/304 ,  H01J2237/31766

Abstract: A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate while scanning the charged-particle beam in a main-scanning direction by the deflector and scanning the substrate in a sub-scanning direction by the stage mechanism. The apparatus includes a blanker unit configured to control irradiation and unirradiation of the substrate with the charged-particle beam, and a controller configured to control the deflector to deflect the charged-particle beam in the sub-scanning direction by an amount of driving of the substrate in the sub-scanning direction by the stage mechanism during a period of time from stop of drawing on the substrate until restart thereof when the drawing on the substrate is stopped and then restarted while the substrate is driven in the sub-scanning direction by the stage mechanism.

Abstract translation: 一种带电粒子束曝光装置，其包括使带电粒子束偏转的偏转器，以及驱动基板的级机构，并且在主扫描方向上沿着主扫描方向扫描带电粒子束时在基板上绘制图案 偏转器，并通过平台机构沿副扫描方向扫描基板。 该设备包括：配置成控制带有带电粒子束的衬底的照射和未照射的消隐器单元;以及控制器，被配置为控制偏转器以使带电粒子束在副扫描方向上偏转一定量的驱动 基板在副扫描方向上由底板机构在基板停止时的时间内直到重新起动，当基板上的拉拔停止时再次启动，同时基板沿副扫描方向被驱动 舞台机制。

公开(公告)号：US08618970B2

公开(公告)日：2013-12-31

申请号：US13682311

申请日：2012-11-20

Applicant: Advantest Corporation ,  Hitachi Information & Communication Engineering, Ltd.

Inventor： Takamasa Sato ,  Ryozo Yoshino ,  Atsushi Higashino

IPC: H03M1/66 ,  H03K19/0175

CPC classification number: H03M1/66 ,  H01J3/26 ,  H01J37/24 ,  H01J37/3174 ,  H01J2237/1504

Abstract: A DA conversion device includes a current output type DA converter, a high-speed operational amplifier operating at a low voltage and configured to generate a voltage corresponding to an output current from the DA converter, and a buffer amplifier connected to an output terminal of the high-speed operational amplifier and operating at a high voltage. The device also includes positive and negative floating power supplies separated from a power supply system and provided as power supplies for driving the DA converter and the high-speed operational amplifier. A midpoint between potentials at the floating power supplies is connected to an output terminal of the buffer amplifier to cause the DA converter and the high-speed operational amplifier to operate mainly based on an output voltage from the buffer amplifier.

Abstract translation: DA转换装置包括电流输出型DA转换器，低电压运行的高速运算放大器，其被配置为产生与来自DA转换器的输出电流相对应的电压;以及缓冲放大器，连接到所述DA转换器的输出端子 高速运算放大器，工作在高电压。 该装置还包括与电源系统分离的正和负浮动电源，并且作为用于驱动DA转换器和高速运算放大器的电源提供。 浮动电源的电位之间的中点连接到缓冲放大器的输出端子，使得DA转换器和高速运算放大器主要基于来自缓冲放大器的输出电压来运行。

公开(公告)号：US08604444B2

公开(公告)日：2013-12-10

申请号：US13702419

申请日：2010-08-20

Applicant: Tadashi Katayose

Inventor： Tadashi Katayose

IPC: H01J3/26

CPC classification number: A61N5/1077 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K5/02 ,  H01J3/26

Abstract: The particle beam irradiation apparatus irradiates a charged particle beam accelerated by a accelerator onto an irradiation subject; the particle beam irradiation apparatus includes a scanning electromagnet that scans the charged particle beam, and a scanning electromagnet moving apparatus that moves the scanning electromagnet in such a way as to change the distance between the scanning electromagnet and the irradiation subject in the beam axis direction of the charged particle beam.

Abstract translation: 粒子束照射装置将由加速器加速的带电粒子束照射到照射对象上; 粒子束照射装置包括扫描带电粒子束的扫描电磁体和扫描电磁体移动装置，该扫描电磁体移动装置以扫描电磁体的方式移动扫描电磁体，以使扫描电磁体和被照射对象之间在射束轴方向上的距离 带电粒子束。

公开(公告)号：US20130270449A1

公开(公告)日：2013-10-17

申请号：US13682311

申请日：2012-11-20

Applicant: Hitachi Information & Communication Engineering, Ltd. ,  ADVANTEST CORPORATION

Inventor： Takamasa Sato ,  Ryozo Yoshino ,  Atsushi Higashino

IPC: H03M1/66 ,  H01J3/26

CPC classification number: H03M1/66 ,  H01J3/26 ,  H01J37/24 ,  H01J37/3174 ,  H01J2237/1504

Abstract: A DA conversion device includes a current output type DA converter, a high-speed operational amplifier operating at a low voltage and configured to generate a voltage corresponding to an output current from the DA converter, and a buffer amplifier connected to an output terminal of the high-speed operational amplifier and operating at a high voltage. The device also includes positive and negative floating power supplies separated from a power supply system and provided as power supplies for driving the DA converter and the high-speed operational amplifier. A midpoint between potentials at the floating power supplies is connected to an output terminal of the buffer amplifier to cause the DA converter and the high-speed operational amplifier to operate mainly based on an output voltage from the buffer amplifier.

Abstract translation: DA转换装置包括电流输出型DA转换器，低电压运行的高速运算放大器，其被配置为产生与来自DA转换器的输出电流相对应的电压;以及缓冲放大器，连接到所述DA转换器的输出端子 高速运算放大器，工作在高电压。 该装置还包括与电源系统分离的正和负浮动电源，并且作为用于驱动DA转换器和高速运算放大器的电源提供。 浮动电源的电位之间的中点连接到缓冲放大器的输出端子，使得DA转换器和高速运算放大器主要基于来自缓冲放大器的输出电压来运行。

公开(公告)号：US08530851B2

公开(公告)日：2013-09-10

申请号：US13723269

申请日：2012-12-21

Applicant: ATTI International Services Company, Inc.

Inventor： Artush A. Abgaryan ,  Eli Levi ,  Thomas Leddy

IPC: H01J3/14

CPC classification number: H01J3/14 ,  H01J3/26 ,  H01J37/244 ,  H01J2237/2446 ,  H01J2237/24507 ,  H01J2237/24514 ,  H01J2237/24542

Abstract: Electron beam profile testing and analysis method is introduced using the MOMS apparatus. The MOMS apparatus includes a Faraday Cup with a knife-wires scanning system which together perform simultaneous measurements. The scanning system has a five-dimensional processing mechanism for measuring different cross sections of an e-beam profile in a path of the e-beam. Measurements are conducted using the scanning system by virtually dividing each cross section into a plurality of subsections and measuring independent current values of at least one wire of the scanning system through which the electron beam passes from every pixel in each of the plurality of subsections. By providing relative movement between the scanning system and e-beam, the measured independent current values are analyzed to obtain the functional form of distribution of current density of the cross-section of the e-beam. The Faraday cup enables simultaneous measurement of the total value of the current.

Abstract translation: 使用MOMS仪器引入电子束剖面测试和分析方法。 MOMS装置包括具有刀线扫描系统的法拉第杯，它们一起执行同时测量。 扫描系统具有用于测量电子束的路径中的电子束轮廓的不同横截面的五维处理机构。 使用扫描系统进行测量，通过将每个横截面实际上划分成多个子部分并且测量扫描系统的至少一根导线的独立电流值，电子束通过该电子束从多个子部分中的每一个中的每个像素通过。 通过提供扫描系统和电子束之间的相对运动，分析测量的独立电流值以获得电子束横截面的电流密度分布的功能形式。 法拉第杯可以同时测量电流的总值。

公开(公告)号：US20130140468A1

公开(公告)日：2013-06-06

申请号：US13705084

申请日：2012-12-04

Applicant: Lawrence Livermore National Security, LLC

Inventor： Yu-Jiuan Chen

IPC: H01J3/26 ,  A61N5/10

CPC classification number: H01J3/26 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1087 ,  G21K1/087

Abstract: Devices and methods are provided to allow rapid deflection of a charged particle beam. The disclosed devices can, for example, be used as part of a hadron therapy system to allow scanning of a target area within a patient's body. The disclosed charged particle beam deflectors include a dielectric wall accelerator (DWA) with a hollow center and a dielectric wall that is substantially parallel to a z-axis that runs through the hollow center. The dielectric wall includes one or more deformed high gradient insulators (HGIs) that are configured to produce an electric field with an component in a direction perpendicular to the z-axis. A control component is also provided to establish the electric field component in the direction perpendicular to the z-axis and to control deflection of a charged particle beam in the direction perpendicular to the z-axis as the charged particle beam travels through the hollow center of the DWA.

Abstract translation: 提供了装置和方法以允许带电粒子束的快速偏转。 所公开的装置可以例如用作强子治疗系统的一部分，以允许扫描患者体内的目标区域。 所公开的带电粒子束偏转器包括具有中空中心的电介质壁加速器（DWA）和基本平行于穿过中空中心的z轴平行的电介质壁。 电介质壁包括一个或多个变形的高梯度绝缘体（HGI），其被配置为产生具有垂直于z轴的方向的分量的电场。 还提供控制组件以在垂直于z轴的方向上建立电场分量，并且当带电粒子束穿过中空中心时，控制带电粒子束在垂直于z轴的方向上的偏转 DWA。

公开(公告)号：US20130126730A1

公开(公告)日：2013-05-23

申请号：US13679181

申请日：2012-11-16

Applicant: National University of Singapore

Inventor： Anjam KHURSHEED ,  Hung Quang Hoang

IPC: H01J3/26 ,  H01J37/26

CPC classification number: H01J49/48 ,  H01J3/26 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J49/44 ,  H01J2237/05 ,  H01J2237/0535 ,  H01J2237/24485

Abstract: A sequential radial mirror analyser (RMA) (100) for facilitating rotationally symmetric detection of charged particles caused by a charged beam incident on a specimen (112) is disclosed. The RMA comprises a 0V equipotential exit grid (116), and a plurality of electrodes (119, 120a, 120b, 120c) electrically configured to generate corresponding electrostatic fields for deflecting at least some of the charged particles of a single energy level to exit through the exit grid (116) to form a second-order focal point on a detector (106). The second-order focal point is associated with the single energy level, and the detector (106) is disposed external to the corresponding electrostatic fields. A related method is also disclosed.

Abstract translation: 公开了一种用于促进由入射在样本（112）上的带电束引起的带电粒子的旋转对称检测的顺序径向镜分析器（RMA）（100）。 RMA包括0V等电位出口格栅（116），以及多个电极（119,120a，120b，120c），其被电配置为产生相应的静电场，用于偏转单个能级的至少一些带电粒子以便通过 出口格栅（116）以在检测器（106）上形成二阶焦点。 二阶焦点与单个能级相关联，并且检测器（106）设置在相应静电场的外部。 还公开了相关方法。

公开(公告)号：US20130092826A1

公开(公告)日：2013-04-18

申请号：US13655129

申请日：2012-10-18

Applicant: FEI Company

Inventor： Tom Miller ,  Gene Mirro ,  Cornelis Sander Kooijman ,  Hendrik Jan de Vos

IPC: H01J3/26

CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.

Abstract translation: 引导带电粒子束的改进方法，其补偿带电粒子通过改变一个或多个偏转器信号而穿过系统所需的时间。 根据本发明的一个实施例，在数模（D / A）转换之前，将数字滤波器应用于扫描图案，以便减少或消除可能由TOF误差引起的过拍影响。 在其他实施例中，也可以使用模拟滤波器或具有较低带宽的信号放大器的使用来补偿TOF误差。 通过改变扫描图案，可以显着减少或消除超拍效果。