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    Compound electron lens for electron microscope and the like
    61.
    发明授权
    Compound electron lens for electron microscope and the like 失效
    用于电子显微镜的化合物​​电子镜片和类似物

    公开(公告)号：US3851172A

    公开(公告)日：1974-11-26

    申请号：US31545572

    申请日：1972-12-15

    Applicant: HITACHI LTD

    Inventor： OZASA S ,  KASAI S

    IPC: H01J29/66 ,  H01J37/141 ,  H01J37/26

    CPC classification number: H01J37/141 ,  H01J29/66

    Abstract: A compound electron lens having at least two exciting coils is disclosed. A gap for bypassing the flux from the coils is disposed in the inner magnetic path located between the coils. The polarities of the exciting currents to the coils are made identical or are reversed whereby the multiplying factor of the lens is varied over a wide range with a minimum of distortion.

    Abstract translation: 公开了具有至少两个励磁线圈的复合电子透镜。 用于绕过来自线圈的磁通的间隙设置在位于线圈之间的内磁路中。 使线圈的励磁电流的极性相同或相反，从而透镜的倍率在最小的变形范围内在宽范围内变化。

    Multi-source charged particle illumination apparatus
    70.
    发明授权
    Multi-source charged particle illumination apparatus 有权

    公开(公告)号：US12125671B2

    公开(公告)日：2024-10-22

    申请号：US17778036

    申请日：2020-11-19

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Stijn Wilem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Albertus Victor Gerardus Mangnus

    IPC: H01J37/317 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

    CPC classification number: H01J37/3177 ,  H01J37/141 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/2817

    Abstract: A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.

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